DE60128019D1 - Bildsensorstruktur und Herstellungsverfahren dazu - Google Patents
Bildsensorstruktur und Herstellungsverfahren dazuInfo
- Publication number
- DE60128019D1 DE60128019D1 DE60128019T DE60128019T DE60128019D1 DE 60128019 D1 DE60128019 D1 DE 60128019D1 DE 60128019 T DE60128019 T DE 60128019T DE 60128019 T DE60128019 T DE 60128019T DE 60128019 D1 DE60128019 D1 DE 60128019D1
- Authority
- DE
- Germany
- Prior art keywords
- manufacturing
- image sensor
- sensor structure
- image
- sensor
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
- 238000004519 manufacturing process Methods 0.000 title 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/02—Details
- H01L31/0224—Electrodes
- H01L31/022408—Electrodes for devices characterised by at least one potential jump barrier or surface barrier
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
- H01L27/14—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation
- H01L27/144—Devices controlled by radiation
- H01L27/146—Imager structures
- H01L27/14601—Structural or functional details thereof
- H01L27/14603—Special geometry or disposition of pixel-elements, address-lines or gate-electrodes
Landscapes
- Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Power Engineering (AREA)
- Electromagnetism (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Solid State Image Pick-Up Elements (AREA)
- Light Receiving Elements (AREA)
- Measurement Of Radiation (AREA)
- Transforming Light Signals Into Electric Signals (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US522231 | 2000-03-09 | ||
US09/522,231 US6465824B1 (en) | 2000-03-09 | 2000-03-09 | Imager structure |
Publications (2)
Publication Number | Publication Date |
---|---|
DE60128019D1 true DE60128019D1 (de) | 2007-06-06 |
DE60128019T2 DE60128019T2 (de) | 2007-12-27 |
Family
ID=24080027
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE60128019T Expired - Fee Related DE60128019T2 (de) | 2000-03-09 | 2001-01-08 | Bildsensorstruktur und Herstellungsverfahren dazu |
Country Status (5)
Country | Link |
---|---|
US (2) | US6465824B1 (de) |
EP (1) | EP1132968B1 (de) |
JP (1) | JP2001274371A (de) |
DE (1) | DE60128019T2 (de) |
TW (1) | TW503573B (de) |
Families Citing this family (58)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6617561B1 (en) * | 2000-03-09 | 2003-09-09 | General Electric Company | Low noise and high yield data line structure for imager |
US7088323B2 (en) * | 2000-12-21 | 2006-08-08 | Lg.Philips Lcd Co., Ltd. | Liquid crystal display device and method for fabricating the same |
US7009663B2 (en) * | 2003-12-17 | 2006-03-07 | Planar Systems, Inc. | Integrated optical light sensitive active matrix liquid crystal display |
US7023503B2 (en) * | 2002-02-20 | 2006-04-04 | Planar Systems, Inc. | Image sensor with photosensitive thin film transistors |
US7053967B2 (en) | 2002-05-23 | 2006-05-30 | Planar Systems, Inc. | Light sensitive display |
WO2003073159A1 (en) * | 2002-02-20 | 2003-09-04 | Planar Systems, Inc. | Light sensitive display |
DE10238400A1 (de) * | 2002-08-22 | 2004-03-04 | Gottlieb Binder Gmbh & Co. Kg | Vorrichtung zum Montieren von Sitzbezügen |
US20060034492A1 (en) * | 2002-10-30 | 2006-02-16 | Roy Siegel | Hand recognition system |
US20080084374A1 (en) | 2003-02-20 | 2008-04-10 | Planar Systems, Inc. | Light sensitive display |
US6928144B2 (en) * | 2003-08-01 | 2005-08-09 | General Electric Company | Guard ring for direct photo-to-electron conversion detector array |
US6982176B2 (en) * | 2003-10-30 | 2006-01-03 | General Electric Company | Method for monitoring production of pixel detectors and detectors produced thereby |
US7773139B2 (en) | 2004-04-16 | 2010-08-10 | Apple Inc. | Image sensor with photosensitive thin film transistors |
US20060045240A1 (en) * | 2004-08-31 | 2006-03-02 | Buchner Gregory C | Method and apparatus for delayed answering of telecommunications request |
TWI287869B (en) * | 2005-02-16 | 2007-10-01 | Hannstar Display Corp | Structure and manufacturing method of imager array unit |
TWI281586B (en) * | 2005-09-13 | 2007-05-21 | Ind Tech Res Inst | Pixel array |
US7547572B2 (en) | 2005-11-16 | 2009-06-16 | Emcore Corporation | Method of protecting semiconductor chips from mechanical and ESD damage during handling |
US7612371B2 (en) * | 2006-01-17 | 2009-11-03 | International Business Machines Corporation | Structure to monitor arcing in the processing steps of metal layer build on silicon-on-insulator semiconductors |
US8735797B2 (en) | 2009-12-08 | 2014-05-27 | Zena Technologies, Inc. | Nanowire photo-detector grown on a back-side illuminated image sensor |
US8835831B2 (en) | 2010-06-22 | 2014-09-16 | Zena Technologies, Inc. | Polarized light detecting device and fabrication methods of the same |
US9299866B2 (en) | 2010-12-30 | 2016-03-29 | Zena Technologies, Inc. | Nanowire array based solar energy harvesting device |
US8229255B2 (en) | 2008-09-04 | 2012-07-24 | Zena Technologies, Inc. | Optical waveguides in image sensors |
US8889455B2 (en) | 2009-12-08 | 2014-11-18 | Zena Technologies, Inc. | Manufacturing nanowire photo-detector grown on a back-side illuminated image sensor |
US8546742B2 (en) | 2009-06-04 | 2013-10-01 | Zena Technologies, Inc. | Array of nanowires in a single cavity with anti-reflective coating on substrate |
US8890271B2 (en) * | 2010-06-30 | 2014-11-18 | Zena Technologies, Inc. | Silicon nitride light pipes for image sensors |
US9343490B2 (en) | 2013-08-09 | 2016-05-17 | Zena Technologies, Inc. | Nanowire structured color filter arrays and fabrication method of the same |
US9478685B2 (en) | 2014-06-23 | 2016-10-25 | Zena Technologies, Inc. | Vertical pillar structured infrared detector and fabrication method for the same |
US8866065B2 (en) | 2010-12-13 | 2014-10-21 | Zena Technologies, Inc. | Nanowire arrays comprising fluorescent nanowires |
US9515218B2 (en) | 2008-09-04 | 2016-12-06 | Zena Technologies, Inc. | Vertical pillar structured photovoltaic devices with mirrors and optical claddings |
US8748799B2 (en) | 2010-12-14 | 2014-06-10 | Zena Technologies, Inc. | Full color single pixel including doublet or quadruplet si nanowires for image sensors |
US8274039B2 (en) | 2008-11-13 | 2012-09-25 | Zena Technologies, Inc. | Vertical waveguides with various functionality on integrated circuits |
US8269985B2 (en) | 2009-05-26 | 2012-09-18 | Zena Technologies, Inc. | Determination of optimal diameters for nanowires |
US8519379B2 (en) | 2009-12-08 | 2013-08-27 | Zena Technologies, Inc. | Nanowire structured photodiode with a surrounding epitaxially grown P or N layer |
US9000353B2 (en) | 2010-06-22 | 2015-04-07 | President And Fellows Of Harvard College | Light absorption and filtering properties of vertically oriented semiconductor nano wires |
US8299472B2 (en) | 2009-12-08 | 2012-10-30 | Young-June Yu | Active pixel sensor with nanowire structured photodetectors |
US8791470B2 (en) | 2009-10-05 | 2014-07-29 | Zena Technologies, Inc. | Nano structured LEDs |
US9082673B2 (en) | 2009-10-05 | 2015-07-14 | Zena Technologies, Inc. | Passivated upstanding nanostructures and methods of making the same |
US9406709B2 (en) | 2010-06-22 | 2016-08-02 | President And Fellows Of Harvard College | Methods for fabricating and using nanowires |
US8507840B2 (en) | 2010-12-21 | 2013-08-13 | Zena Technologies, Inc. | Vertically structured passive pixel arrays and methods for fabricating the same |
KR20100037211A (ko) * | 2008-10-01 | 2010-04-09 | 주식회사 동부하이텍 | 이미지 센서 및 그 제조 방법 |
US8106487B2 (en) * | 2008-12-23 | 2012-01-31 | Pratt & Whitney Rocketdyne, Inc. | Semiconductor device having an inorganic coating layer applied over a junction termination extension |
US9310923B2 (en) | 2010-12-03 | 2016-04-12 | Apple Inc. | Input device for touch sensitive devices |
US9329703B2 (en) | 2011-06-22 | 2016-05-03 | Apple Inc. | Intelligent stylus |
US8928635B2 (en) | 2011-06-22 | 2015-01-06 | Apple Inc. | Active stylus |
US8638320B2 (en) | 2011-06-22 | 2014-01-28 | Apple Inc. | Stylus orientation detection |
JP2013243319A (ja) * | 2012-05-23 | 2013-12-05 | Konica Minolta Inc | 放射線画像撮影装置 |
US9557845B2 (en) | 2012-07-27 | 2017-01-31 | Apple Inc. | Input device for and method of communication with capacitive devices through frequency variation |
US9176604B2 (en) | 2012-07-27 | 2015-11-03 | Apple Inc. | Stylus device |
US9652090B2 (en) | 2012-07-27 | 2017-05-16 | Apple Inc. | Device for digital communication through capacitive coupling |
US9935152B2 (en) | 2012-12-27 | 2018-04-03 | General Electric Company | X-ray detector having improved noise performance |
US10048775B2 (en) | 2013-03-14 | 2018-08-14 | Apple Inc. | Stylus detection and demodulation |
US9939935B2 (en) | 2013-07-31 | 2018-04-10 | Apple Inc. | Scan engine for touch controller architecture |
FR3012663B1 (fr) * | 2013-10-25 | 2015-12-04 | Thales Sa | Generateur de rayons x a capteur de flux integre |
US9917133B2 (en) * | 2013-12-12 | 2018-03-13 | General Electric Company | Optoelectronic device with flexible substrate |
EP3117204B1 (de) | 2014-03-13 | 2021-06-16 | General Electric Company | Gekrümmter digitaler röntgenstrahldetektor zur schweissnahtprüfung |
US10067618B2 (en) | 2014-12-04 | 2018-09-04 | Apple Inc. | Coarse scan and targeted active mode scan for touch |
US10474277B2 (en) | 2016-05-31 | 2019-11-12 | Apple Inc. | Position-based stylus communication |
EP3355355B1 (de) * | 2017-01-27 | 2019-03-13 | Detection Technology Oy | Asymmetrisch positionierte schutzringkontakte |
JP7308595B2 (ja) * | 2018-07-02 | 2023-07-14 | Tianma Japan株式会社 | イメージセンサ |
Family Cites Families (14)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH05303116A (ja) * | 1992-02-28 | 1993-11-16 | Canon Inc | 半導体装置 |
US5463225A (en) * | 1992-06-01 | 1995-10-31 | General Electric Company | Solid state radiation imager with high integrity barrier layer and method of fabricating |
US5233181A (en) * | 1992-06-01 | 1993-08-03 | General Electric Company | Photosensitive element with two layer passivation coating |
US5401668A (en) | 1993-09-02 | 1995-03-28 | General Electric Company | Method for fabrication solid state radiation imager having improved scintillator adhesion |
US5399884A (en) * | 1993-11-10 | 1995-03-21 | General Electric Company | Radiation imager with single passivation dielectric for transistor and diode |
US5389775A (en) * | 1993-12-03 | 1995-02-14 | General Electric Company | Imager assembly with multiple common electrode contacts |
US5517031A (en) * | 1994-06-21 | 1996-05-14 | General Electric Company | Solid state imager with opaque layer |
WO1998005187A1 (en) * | 1996-07-29 | 1998-02-05 | Cambridge Display Technology Limited | Electroluminescent devices with electrode protection |
JP3813990B2 (ja) * | 1996-09-04 | 2006-08-23 | ケンブリッジ ディスプレイ テクノロジー リミテッド | 有機発光デバイスおよびその製造方法 |
US5777355A (en) | 1996-12-23 | 1998-07-07 | General Electric Company | Radiation imager with discontinuous dielectric |
US6037609A (en) * | 1997-01-17 | 2000-03-14 | General Electric Company | Corrosion resistant imager |
US6232626B1 (en) * | 1999-02-01 | 2001-05-15 | Micron Technology, Inc. | Trench photosensor for a CMOS imager |
KR100477788B1 (ko) * | 1999-12-28 | 2005-03-22 | 매그나칩 반도체 유한회사 | 커패시터가 접속된 포토다이오드를 갖는 씨모스이미지센서 및 그 제조방법 |
TWI282625B (en) * | 2002-08-01 | 2007-06-11 | Au Optronics Corp | Method of forming a thin film transistor liquid crystal display |
-
2000
- 2000-03-09 US US09/522,231 patent/US6465824B1/en not_active Expired - Fee Related
-
2001
- 2001-01-03 TW TW090100138A patent/TW503573B/zh not_active IP Right Cessation
- 2001-01-08 EP EP01300120A patent/EP1132968B1/de not_active Expired - Lifetime
- 2001-01-08 DE DE60128019T patent/DE60128019T2/de not_active Expired - Fee Related
- 2001-01-09 JP JP2001001110A patent/JP2001274371A/ja not_active Withdrawn
-
2002
- 2002-07-02 US US10/187,241 patent/US6680216B2/en not_active Expired - Fee Related
Also Published As
Publication number | Publication date |
---|---|
EP1132968A2 (de) | 2001-09-12 |
JP2001274371A (ja) | 2001-10-05 |
TW503573B (en) | 2002-09-21 |
EP1132968A3 (de) | 2005-03-30 |
US6465824B1 (en) | 2002-10-15 |
EP1132968B1 (de) | 2007-04-25 |
DE60128019T2 (de) | 2007-12-27 |
US6680216B2 (en) | 2004-01-20 |
US20020195601A1 (en) | 2002-12-26 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
8364 | No opposition during term of opposition | ||
8339 | Ceased/non-payment of the annual fee |