DE60124128D1 - Verfahren zur herstellung von organischem silicatpolymer - Google Patents

Verfahren zur herstellung von organischem silicatpolymer

Info

Publication number
DE60124128D1
DE60124128D1 DE60124128T DE60124128T DE60124128D1 DE 60124128 D1 DE60124128 D1 DE 60124128D1 DE 60124128 T DE60124128 T DE 60124128T DE 60124128 T DE60124128 T DE 60124128T DE 60124128 D1 DE60124128 D1 DE 60124128D1
Authority
DE
Germany
Prior art keywords
low dielectric
insulating film
silicate polymer
organic silicate
dielectric insulating
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE60124128T
Other languages
English (en)
Other versions
DE60124128T2 (de
Inventor
Min-Jin Ko
Myung-Sun Moon
Dong-Seok Shin
Jung-Won Kang
Hye-Yeong Nam
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
LG Chem Ltd
Original Assignee
LG Chem Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by LG Chem Ltd filed Critical LG Chem Ltd
Publication of DE60124128D1 publication Critical patent/DE60124128D1/de
Application granted granted Critical
Publication of DE60124128T2 publication Critical patent/DE60124128T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G77/00—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
    • C08G77/02—Polysilicates
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G77/00—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
    • C08G77/48—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule in which at least two but not all the silicon atoms are connected by linkages other than oxygen atoms
    • C08G77/50—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule in which at least two but not all the silicon atoms are connected by linkages other than oxygen atoms by carbon linkages
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G77/00—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
    • C08G77/04—Polysiloxanes
    • C08G77/06—Preparatory processes
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D183/00—Coating compositions based on macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon, with or without sulfur, nitrogen, oxygen, or carbon only; Coating compositions based on derivatives of such polymers
    • C09D183/04—Polysiloxanes
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/31504—Composite [nonstructural laminate]
    • Y10T428/31652—Of asbestos
    • Y10T428/31663—As siloxane, silicone or silane

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Organic Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Wood Science & Technology (AREA)
  • Silicon Polymers (AREA)
  • Formation Of Insulating Films (AREA)
  • Organic Insulating Materials (AREA)
  • Paints Or Removers (AREA)
  • Polymers With Sulfur, Phosphorus Or Metals In The Main Chain (AREA)
DE60124128T 2000-09-18 2001-09-18 Verfahren zur herstellung von organischem silicatpolymer Expired - Fee Related DE60124128T2 (de)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
KR10-2000-0054591A KR100382702B1 (ko) 2000-09-18 2000-09-18 유기실리케이트 중합체의 제조방법
KR2000054591 2000-09-18
PCT/KR2001/001563 WO2002022710A1 (en) 2000-09-18 2001-09-18 A process for preparing organic silicate polymer

Publications (2)

Publication Number Publication Date
DE60124128D1 true DE60124128D1 (de) 2006-12-07
DE60124128T2 DE60124128T2 (de) 2007-09-06

Family

ID=19689060

Family Applications (1)

Application Number Title Priority Date Filing Date
DE60124128T Expired - Fee Related DE60124128T2 (de) 2000-09-18 2001-09-18 Verfahren zur herstellung von organischem silicatpolymer

Country Status (8)

Country Link
US (1) US7358316B2 (de)
EP (1) EP1328571B1 (de)
JP (1) JP2004509191A (de)
KR (1) KR100382702B1 (de)
CN (1) CN1246362C (de)
AT (1) ATE343608T1 (de)
DE (1) DE60124128T2 (de)
WO (1) WO2002022710A1 (de)

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KR100405312B1 (ko) * 2001-04-11 2003-11-12 주식회사 엘지 유기실리케이트 중합체 및 이를 함유하는 저유전 절연막
KR100419069B1 (ko) * 2001-06-21 2004-02-19 주식회사 엘지화학 유기실리케이트 중합체 및 이를 함유하는 저유전 절연막
DE60322202D1 (de) * 2002-04-18 2008-08-28 Lg Chemical Ltd Isolierfilm
KR100508902B1 (ko) * 2002-05-06 2005-08-17 주식회사 엘지화학 유기실리케이트 중합체 및 이를 함유하는 절연막
KR100508903B1 (ko) * 2002-05-06 2005-08-17 주식회사 엘지화학 저유전 절연막 형성용 조성물 및 절연막 제조 방법
KR20040018710A (ko) * 2002-08-26 2004-03-04 주식회사 엘지화학 유기실리케이트 중합체의 제조방법
US7098149B2 (en) 2003-03-04 2006-08-29 Air Products And Chemicals, Inc. Mechanical enhancement of dense and porous organosilicate materials by UV exposure
TWI240959B (en) 2003-03-04 2005-10-01 Air Prod & Chem Mechanical enhancement of dense and porous organosilicate materials by UV exposure
JP2004307692A (ja) * 2003-04-09 2004-11-04 Shin Etsu Chem Co Ltd 多孔質膜形成用組成物、多孔質膜の製造方法、多孔質膜、層間絶縁膜及び半導体装置
JP2004307693A (ja) * 2003-04-09 2004-11-04 Shin Etsu Chem Co Ltd 多孔質膜形成用組成物、多孔質膜の製造方法、多孔質膜、層間絶縁膜、及び半導体装置
KR20050024721A (ko) * 2003-09-01 2005-03-11 삼성전자주식회사 신규 실록산계 수지 및 이를 이용한 반도체 층간 절연막
US8053159B2 (en) 2003-11-18 2011-11-08 Honeywell International Inc. Antireflective coatings for via fill and photolithography applications and methods of preparation thereof
EP2236561B1 (de) * 2005-05-20 2013-07-03 Sumitomo Chemical Company, Limited Polymerzusammensetzung und dieselbe verwendende lichtemittierende Vorrichtung auf Polymerbasis
CA2617742A1 (en) * 2005-08-03 2007-02-15 The University Of Alabama Silanes as a source of hydrogen
US7705062B2 (en) * 2005-09-08 2010-04-27 The United States Of America As Represented By The Secretary Of The Navy Nanoporous organosilicas as pre-concentration materials for sensors
GB0524189D0 (en) 2005-11-28 2006-01-04 Welding Inst Process for the production of organosilsesquioxanes
US8642246B2 (en) 2007-02-26 2014-02-04 Honeywell International Inc. Compositions, coatings and films for tri-layer patterning applications and methods of preparation thereof
US8557877B2 (en) 2009-06-10 2013-10-15 Honeywell International Inc. Anti-reflective coatings for optically transparent substrates
JP5336002B2 (ja) * 2011-04-27 2013-11-06 新日鐵住金株式会社 表面処理金属材及び水系金属表面処理剤
US8864898B2 (en) 2011-05-31 2014-10-21 Honeywell International Inc. Coating formulations for optical elements
WO2012170755A1 (en) 2011-06-09 2012-12-13 Waters Technologies Corporation A porous material and devices for performing separations, filtrations, and catalysis and ek pumps, and methods of making and using the same
US10544329B2 (en) 2015-04-13 2020-01-28 Honeywell International Inc. Polysiloxane formulations and coatings for optoelectronic applications
CN118119651A (zh) * 2021-09-29 2024-05-31 瓦克化学股份公司 用于制备低硅醇聚有机硅氧烷的方法

Family Cites Families (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5294353A (en) * 1976-02-04 1977-08-08 Kansai Paint Co Ltd Production of silica-resin composite
US4159206A (en) * 1977-03-18 1979-06-26 Rohm And Haas Company Weatherable, abrasion resistant coating composition, method, and coated articles
US4539232A (en) * 1982-06-03 1985-09-03 Owens-Illinois, Inc. Solventless liquid organopolysiloxanes
JPH078913B2 (ja) * 1987-06-03 1995-02-01 信越化学工業株式会社 オルガノポリシロキサンの製造方法
US5181141A (en) * 1989-03-31 1993-01-19 Hoya Corporation Anti-reflection optical element
JPH0320331A (ja) * 1989-06-16 1991-01-29 Shin Etsu Chem Co Ltd 溶剤可溶性ポリオルガノシルセスキオキサンの製造方法
KR930002256B1 (ko) * 1990-06-01 1993-03-27 현대전자산업 주식회사 Pcm클럭 발생회로
RU2044014C1 (ru) * 1992-07-06 1995-09-20 Государственный научно-исследовательский институт химических реактивов и особо чистых химических веществ Способ получения пленкообразующего раствора и способ получения диэлектрического покрытия с использованием этого раствора
KR100265777B1 (ko) * 1993-08-05 2000-09-15 김순택 화상표시장치의 반사방지막 제조방법, 및 이를 채용한 화상표시장치
US5654090A (en) * 1994-04-08 1997-08-05 Nippon Arc Co., Ltd. Coating composition capable of yielding a cured product having a high refractive index and coated articles obtained therefrom
US5733644A (en) * 1994-04-15 1998-03-31 Mitsubishi Chemical Corporation Curable composition and method for preparing the same
JP2914868B2 (ja) * 1994-04-15 1999-07-05 信越化学工業株式会社 オルガノポリシロキサンの製造方法
AU1421597A (en) * 1995-12-20 1997-07-14 E.I. Du Pont De Nemours And Company Rapid process for making silica gel and silicate polymer and low density gels made thereby
KR20010006553A (ko) * 1997-04-17 2001-01-26 크리스 로저 에이치 다중밀도의 미세공극성 유전체 코팅된 기판 및 그 코팅방법
EP1790703B1 (de) * 1998-04-24 2014-07-30 JGC Catalysts and Chemicals Ltd. Beschichtungsflüssigkeit für Filme auf Silika-Basis mit niedriger Dielektrizitätskonstante und mit diesem Film beschichtetes Substrat
EP1058274B1 (de) * 1999-06-04 2005-07-27 JSR Corporation Beschichtungszusammensetzung für die Filmherstellung und Material für isolierenden Schichten

Also Published As

Publication number Publication date
KR20020021864A (ko) 2002-03-23
EP1328571B1 (de) 2006-10-25
KR100382702B1 (ko) 2003-05-09
CN1246362C (zh) 2006-03-22
DE60124128T2 (de) 2007-09-06
WO2002022710A1 (en) 2002-03-21
EP1328571A1 (de) 2003-07-23
ATE343608T1 (de) 2006-11-15
JP2004509191A (ja) 2004-03-25
CN1458947A (zh) 2003-11-26
US20030191269A1 (en) 2003-10-09
US7358316B2 (en) 2008-04-15

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee