ATE343608T1 - Verfahren zur herstellung von organischem silicatpolymer - Google Patents

Verfahren zur herstellung von organischem silicatpolymer

Info

Publication number
ATE343608T1
ATE343608T1 AT01974911T AT01974911T ATE343608T1 AT E343608 T1 ATE343608 T1 AT E343608T1 AT 01974911 T AT01974911 T AT 01974911T AT 01974911 T AT01974911 T AT 01974911T AT E343608 T1 ATE343608 T1 AT E343608T1
Authority
AT
Austria
Prior art keywords
low dielectric
insulating film
silicate polymer
organic silicate
dielectric insulating
Prior art date
Application number
AT01974911T
Other languages
English (en)
Inventor
Min-Jin Ko
Myung-Sun Moon
Dong-Seok Shin
Jung-Won Kang
Hye-Yeong Nam
Heungduk-Ku
Original Assignee
Lg Chemical Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Lg Chemical Ltd filed Critical Lg Chemical Ltd
Application granted granted Critical
Publication of ATE343608T1 publication Critical patent/ATE343608T1/de

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G77/00—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
    • C08G77/02—Polysilicates
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G77/00—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
    • C08G77/48—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule in which at least two but not all the silicon atoms are connected by linkages other than oxygen atoms
    • C08G77/50—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule in which at least two but not all the silicon atoms are connected by linkages other than oxygen atoms by carbon linkages
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G77/00—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
    • C08G77/04—Polysiloxanes
    • C08G77/06—Preparatory processes
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D183/00—Coating compositions based on macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon, with or without sulfur, nitrogen, oxygen, or carbon only; Coating compositions based on derivatives of such polymers
    • C09D183/04—Polysiloxanes
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/31504—Composite [nonstructural laminate]
    • Y10T428/31652—Of asbestos
    • Y10T428/31663—As siloxane, silicone or silane

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Polymers & Plastics (AREA)
  • Health & Medical Sciences (AREA)
  • Medicinal Chemistry (AREA)
  • Materials Engineering (AREA)
  • Wood Science & Technology (AREA)
  • Engineering & Computer Science (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Silicon Polymers (AREA)
  • Formation Of Insulating Films (AREA)
  • Paints Or Removers (AREA)
  • Organic Insulating Materials (AREA)
  • Polymers With Sulfur, Phosphorus Or Metals In The Main Chain (AREA)
AT01974911T 2000-09-18 2001-09-18 Verfahren zur herstellung von organischem silicatpolymer ATE343608T1 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
KR10-2000-0054591A KR100382702B1 (ko) 2000-09-18 2000-09-18 유기실리케이트 중합체의 제조방법

Publications (1)

Publication Number Publication Date
ATE343608T1 true ATE343608T1 (de) 2006-11-15

Family

ID=19689060

Family Applications (1)

Application Number Title Priority Date Filing Date
AT01974911T ATE343608T1 (de) 2000-09-18 2001-09-18 Verfahren zur herstellung von organischem silicatpolymer

Country Status (8)

Country Link
US (1) US7358316B2 (de)
EP (1) EP1328571B1 (de)
JP (1) JP2004509191A (de)
KR (1) KR100382702B1 (de)
CN (1) CN1246362C (de)
AT (1) ATE343608T1 (de)
DE (1) DE60124128T2 (de)
WO (1) WO2002022710A1 (de)

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KR100405312B1 (ko) * 2001-04-11 2003-11-12 주식회사 엘지 유기실리케이트 중합체 및 이를 함유하는 저유전 절연막
KR100419069B1 (ko) * 2001-06-21 2004-02-19 주식회사 엘지화학 유기실리케이트 중합체 및 이를 함유하는 저유전 절연막
US7834119B2 (en) * 2002-04-18 2010-11-16 Lg Chem, Ltd. Organic silicate polymer and insulation film comprising the same
KR100508903B1 (ko) * 2002-05-06 2005-08-17 주식회사 엘지화학 저유전 절연막 형성용 조성물 및 절연막 제조 방법
KR100508902B1 (ko) * 2002-05-06 2005-08-17 주식회사 엘지화학 유기실리케이트 중합체 및 이를 함유하는 절연막
KR20040018710A (ko) * 2002-08-26 2004-03-04 주식회사 엘지화학 유기실리케이트 중합체의 제조방법
TWI240959B (en) 2003-03-04 2005-10-01 Air Prod & Chem Mechanical enhancement of dense and porous organosilicate materials by UV exposure
US7098149B2 (en) 2003-03-04 2006-08-29 Air Products And Chemicals, Inc. Mechanical enhancement of dense and porous organosilicate materials by UV exposure
JP2004307692A (ja) * 2003-04-09 2004-11-04 Shin Etsu Chem Co Ltd 多孔質膜形成用組成物、多孔質膜の製造方法、多孔質膜、層間絶縁膜及び半導体装置
JP2004307693A (ja) * 2003-04-09 2004-11-04 Shin Etsu Chem Co Ltd 多孔質膜形成用組成物、多孔質膜の製造方法、多孔質膜、層間絶縁膜、及び半導体装置
KR20050024721A (ko) * 2003-09-01 2005-03-11 삼성전자주식회사 신규 실록산계 수지 및 이를 이용한 반도체 층간 절연막
US8053159B2 (en) 2003-11-18 2011-11-08 Honeywell International Inc. Antireflective coatings for via fill and photolithography applications and methods of preparation thereof
KR101277916B1 (ko) * 2005-05-20 2013-06-21 스미또모 가가꾸 가부시키가이샤 중합체 조성물 및 그것을 이용한 고분자 발광 소자
CN101273115A (zh) * 2005-08-03 2008-09-24 阿拉巴马大学 硅烷作为氢源
US7705062B2 (en) * 2005-09-08 2010-04-27 The United States Of America As Represented By The Secretary Of The Navy Nanoporous organosilicas as pre-concentration materials for sensors
GB0524189D0 (en) * 2005-11-28 2006-01-04 Welding Inst Process for the production of organosilsesquioxanes
US8642246B2 (en) 2007-02-26 2014-02-04 Honeywell International Inc. Compositions, coatings and films for tri-layer patterning applications and methods of preparation thereof
US8557877B2 (en) 2009-06-10 2013-10-15 Honeywell International Inc. Anti-reflective coatings for optically transparent substrates
MY165503A (en) * 2011-04-27 2018-03-27 Nippon Steel & Sumitomo Metal Corp Surface-treated metal material and aqueous metal surface-treatment agent
US8864898B2 (en) 2011-05-31 2014-10-21 Honeywell International Inc. Coating formulations for optical elements
WO2012170755A1 (en) 2011-06-09 2012-12-13 Waters Technologies Corporation A porous material and devices for performing separations, filtrations, and catalysis and ek pumps, and methods of making and using the same
EP3194502A4 (de) 2015-04-13 2018-05-16 Honeywell International Inc. Polysiloxanformulierungen und beschichtungen für optoelektronische anwendungen
WO2023051912A1 (de) * 2021-09-29 2023-04-06 Wacker Chemie Ag Verfahren zur herstellung von silanol-armen polyorganosiloxanen

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JPS5294353A (en) * 1976-02-04 1977-08-08 Kansai Paint Co Ltd Production of silica-resin composite
US4159206A (en) * 1977-03-18 1979-06-26 Rohm And Haas Company Weatherable, abrasion resistant coating composition, method, and coated articles
US4539232A (en) 1982-06-03 1985-09-03 Owens-Illinois, Inc. Solventless liquid organopolysiloxanes
JPH078913B2 (ja) * 1987-06-03 1995-02-01 信越化学工業株式会社 オルガノポリシロキサンの製造方法
US5181141A (en) * 1989-03-31 1993-01-19 Hoya Corporation Anti-reflection optical element
JPH0320331A (ja) * 1989-06-16 1991-01-29 Shin Etsu Chem Co Ltd 溶剤可溶性ポリオルガノシルセスキオキサンの製造方法
KR930002256B1 (ko) * 1990-06-01 1993-03-27 현대전자산업 주식회사 Pcm클럭 발생회로
RU2044014C1 (ru) * 1992-07-06 1995-09-20 Государственный научно-исследовательский институт химических реактивов и особо чистых химических веществ Способ получения пленкообразующего раствора и способ получения диэлектрического покрытия с использованием этого раствора
KR100265777B1 (ko) * 1993-08-05 2000-09-15 김순택 화상표시장치의 반사방지막 제조방법, 및 이를 채용한 화상표시장치
US5654090A (en) * 1994-04-08 1997-08-05 Nippon Arc Co., Ltd. Coating composition capable of yielding a cured product having a high refractive index and coated articles obtained therefrom
US5733644A (en) * 1994-04-15 1998-03-31 Mitsubishi Chemical Corporation Curable composition and method for preparing the same
JP2914868B2 (ja) * 1994-04-15 1999-07-05 信越化学工業株式会社 オルガノポリシロキサンの製造方法
US6168773B1 (en) * 1995-12-20 2001-01-02 E. I. Du Pont De Nemours And Company Rapid process for making silica gel and silicate polymer and low density gels made thereby
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DE60021476T2 (de) * 1999-06-04 2006-05-24 Jsr Corp. Beschichtungszusammensetzung für die Filmherstellung und Material für isolierenden Schichten

Also Published As

Publication number Publication date
JP2004509191A (ja) 2004-03-25
US20030191269A1 (en) 2003-10-09
CN1458947A (zh) 2003-11-26
WO2002022710A1 (en) 2002-03-21
EP1328571B1 (de) 2006-10-25
EP1328571A1 (de) 2003-07-23
KR20020021864A (ko) 2002-03-23
DE60124128D1 (de) 2006-12-07
DE60124128T2 (de) 2007-09-06
US7358316B2 (en) 2008-04-15
CN1246362C (zh) 2006-03-22
KR100382702B1 (ko) 2003-05-09

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