DE60102619D1 - Ellipsometrisches Messverfahren und entsprechende Vorrichtung für in einer Kammer oder dergleichen enthaltene Proben - Google Patents

Ellipsometrisches Messverfahren und entsprechende Vorrichtung für in einer Kammer oder dergleichen enthaltene Proben

Info

Publication number
DE60102619D1
DE60102619D1 DE60102619T DE60102619T DE60102619D1 DE 60102619 D1 DE60102619 D1 DE 60102619D1 DE 60102619 T DE60102619 T DE 60102619T DE 60102619 T DE60102619 T DE 60102619T DE 60102619 D1 DE60102619 D1 DE 60102619D1
Authority
DE
Germany
Prior art keywords
sample
chamber
illuminating beam
window
optical path
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE60102619T
Other languages
English (en)
Other versions
DE60102619T2 (de
Inventor
Jean-Louis Stehle
Pierre Boher
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
PRODUCTION ET DE RECH S APPLIQ
Original Assignee
PRODUCTION ET DE RECH S APPLIQ
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by PRODUCTION ET DE RECH S APPLIQ filed Critical PRODUCTION ET DE RECH S APPLIQ
Application granted granted Critical
Publication of DE60102619D1 publication Critical patent/DE60102619D1/de
Publication of DE60102619T2 publication Critical patent/DE60102619T2/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
    • G01N21/21—Polarisation-affecting properties
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
    • G01N21/21—Polarisation-affecting properties
    • G01N21/211—Ellipsometry
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L22/00—Testing or measuring during manufacture or treatment; Reliability measurements, i.e. testing of parts without further processing to modify the parts as such; Structural arrangements therefor
    • H01L22/10—Measuring as part of the manufacturing process
    • H01L22/12—Measuring as part of the manufacturing process for structural parameters, e.g. thickness, line width, refractive index, temperature, warp, bond strength, defects, optical inspection, electrical measurement of structural dimensions, metallurgic measurement of diffusions

Landscapes

  • Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Biochemistry (AREA)
  • General Health & Medical Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Immunology (AREA)
  • Pathology (AREA)
  • Investigating Or Analysing Materials By Optical Means (AREA)
  • Length Measuring Devices By Optical Means (AREA)
  • Drying Of Semiconductors (AREA)
  • Testing Or Measuring Of Semiconductors Or The Like (AREA)
  • Sampling And Sample Adjustment (AREA)
DE60102619T 2000-05-26 2001-05-17 Ellipsometrisches Messverfahren und entsprechende Vorrichtung für in einer Kammer oder dergleichen enthaltene Proben Expired - Lifetime DE60102619T2 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
FR0006771A FR2809491B1 (fr) 2000-05-26 2000-05-26 Procede et appareil de metrologie ellipsometrique pour echantillon contenu dans une chambre ou analogue
FR0006771 2000-05-26

Publications (2)

Publication Number Publication Date
DE60102619D1 true DE60102619D1 (de) 2004-05-13
DE60102619T2 DE60102619T2 (de) 2005-03-31

Family

ID=8850668

Family Applications (1)

Application Number Title Priority Date Filing Date
DE60102619T Expired - Lifetime DE60102619T2 (de) 2000-05-26 2001-05-17 Ellipsometrisches Messverfahren und entsprechende Vorrichtung für in einer Kammer oder dergleichen enthaltene Proben

Country Status (7)

Country Link
US (1) US6687002B2 (de)
EP (1) EP1158291B9 (de)
JP (1) JP2002071462A (de)
KR (1) KR100808274B1 (de)
AT (1) ATE263965T1 (de)
DE (1) DE60102619T2 (de)
FR (1) FR2809491B1 (de)

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US7333198B1 (en) 2003-04-03 2008-02-19 J.A. Woollam Co., Inc. Sample orientation system and method
US6982792B1 (en) 2000-03-21 2006-01-03 J.A. Woollam Co. Inc Spectrophotometer, ellipsometer, polarimeter and the like systems
FR2812941B1 (fr) * 2000-08-10 2002-10-11 Air Liquide Procede de controle en temps reel de l'elaboration d'une structure en couches minces par mesure elipsometrique
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US8570513B2 (en) 2003-02-28 2013-10-29 J.A. Woollam Co., Inc. Ellipsometric investigation and analysis of textured samples
US7253900B1 (en) 2003-05-28 2007-08-07 J.A. Woollam Co., Inc. Ellipsometer or polarimeter and the like system with multiple detector element detector in environmental control chamber including secure sample access
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WO2007102783A1 (en) * 2006-03-07 2007-09-13 Nanyang Technological University Microfluidic immunoassay device
US20090066970A1 (en) * 2007-05-21 2009-03-12 Muetec Automatisierte Mikroskopie Und Messtechnik Gmbh Arrangement and method for improving the measurement accuracy in the nm range for optical systems
US7742160B2 (en) * 2008-01-15 2010-06-22 International Business Machines Corporation Determining angle of incidence with respect to workpiece
US7800756B2 (en) * 2008-07-09 2010-09-21 Raytheon Company Method and apparatus for analyzing coatings on curved surfaces
US8248606B1 (en) 2008-09-15 2012-08-21 J.A. Woollam Co., Inc. Sample mapping in environmental chamber
TW201023286A (en) * 2008-12-15 2010-06-16 Inotera Memories Inc Portable wafer inspection system
US8248607B1 (en) 2009-08-04 2012-08-21 J.A. Woollam Co., Inc. Empirical correction for spectroscopic ellipsometric measurements of rough or textured surfaces
KR101105328B1 (ko) 2009-11-23 2012-01-16 한국표준과학연구원 분자 흡착 및 해리 동특성 측정장치 및 측정방법
KR101037790B1 (ko) * 2010-04-23 2011-05-27 나노바이오시스 주식회사 듀얼 광원을 포함하는 형광 편광 분석 장치
US8559008B2 (en) 2011-04-07 2013-10-15 Nanometrics Incorporated Ellipsometer focusing system
KR101383652B1 (ko) 2012-10-15 2014-04-09 한국표준과학연구원 분자접합특성 및 완충용액 굴절률 동시 측정장치 및 측정방법
CA2933814C (en) 2014-02-18 2018-07-10 Halliburton Energy Services, Inc. Imaging systems for optical computing devices
US20200024727A1 (en) * 2015-12-12 2020-01-23 Indian Institute of Technology Guwahati System, apparatus and method for monitoring of surface profile and thickness measurement in thin films
US9933357B1 (en) * 2016-02-25 2018-04-03 J. A. Woollam Co., Inc. Elliposometer system with polarization state generator and polarization state analyzer in environmental chamber
US10551608B2 (en) * 2016-03-24 2020-02-04 Molecular Devices, Llc Imaging system with ancillary image detector for sample location
IT201700118624A1 (it) * 2017-10-19 2019-04-19 Thales Alenia Space Italia Spa Con Unico Socio Metodi e relativo sistema per misurare deformazioni termo-elastiche di un oggetto
US11385167B2 (en) 2019-10-01 2022-07-12 Onto Innovation Inc. Beamsplitter based ellipsometer focusing system
KR102418637B1 (ko) * 2020-09-21 2022-07-08 한국표준과학연구원 다중반사 액침 실리콘 기반 미세유로 측정장치 및 측정방법

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Also Published As

Publication number Publication date
KR100808274B1 (ko) 2008-02-29
KR20010107735A (ko) 2001-12-07
EP1158291B9 (de) 2004-11-03
FR2809491A1 (fr) 2001-11-30
US20020024668A1 (en) 2002-02-28
EP1158291A1 (de) 2001-11-28
US6687002B2 (en) 2004-02-03
ATE263965T1 (de) 2004-04-15
JP2002071462A (ja) 2002-03-08
DE60102619T2 (de) 2005-03-31
EP1158291B1 (de) 2004-04-07
FR2809491B1 (fr) 2008-07-04

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8332 No legal effect for de
8370 Indication related to discontinuation of the patent is to be deleted
8364 No opposition during term of opposition