DE60101232D1 - Elektronenemittierende Quelle, Baugruppe und Verfahren zu deren Herstellung - Google Patents
Elektronenemittierende Quelle, Baugruppe und Verfahren zu deren HerstellungInfo
- Publication number
- DE60101232D1 DE60101232D1 DE60101232T DE60101232T DE60101232D1 DE 60101232 D1 DE60101232 D1 DE 60101232D1 DE 60101232 T DE60101232 T DE 60101232T DE 60101232 T DE60101232 T DE 60101232T DE 60101232 D1 DE60101232 D1 DE 60101232D1
- Authority
- DE
- Germany
- Prior art keywords
- assembly
- making
- same
- emitting source
- electron emitting
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y10/00—Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J9/00—Apparatus or processes specially adapted for the manufacture, installation, removal, maintenance of electric discharge tubes, discharge lamps, or parts thereof; Recovery of material from discharge tubes or lamps
- H01J9/02—Manufacture of electrodes or electrode systems
- H01J9/022—Manufacture of electrodes or electrode systems of cold cathodes
- H01J9/025—Manufacture of electrodes or electrode systems of cold cathodes of field emission cathodes
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y30/00—Nanotechnology for materials or surface science, e.g. nanocomposites
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B32/00—Carbon; Compounds thereof
- C01B32/05—Preparation or purification of carbon not covered by groups C01B32/15, C01B32/20, C01B32/25, C01B32/30
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J1/00—Details of electrodes, of magnetic control means, of screens, or of the mounting or spacing thereof, common to two or more basic types of discharge tubes or lamps
- H01J1/02—Main electrodes
- H01J1/30—Cold cathodes, e.g. field-emissive cathode
- H01J1/304—Field-emissive cathodes
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y40/00—Manufacture or treatment of nanostructures
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S427/00—Coating processes
- Y10S427/102—Fullerene type base or coating
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S977/00—Nanotechnology
- Y10S977/902—Specified use of nanostructure
- Y10S977/932—Specified use of nanostructure for electronic or optoelectronic application
- Y10S977/939—Electron emitter, e.g. spindt emitter tip coated with nanoparticles
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2000037672 | 2000-02-16 | ||
JP2000037672A JP3595233B2 (ja) | 2000-02-16 | 2000-02-16 | 電子放出源及びその製造方法 |
Publications (2)
Publication Number | Publication Date |
---|---|
DE60101232D1 true DE60101232D1 (de) | 2003-12-24 |
DE60101232T2 DE60101232T2 (de) | 2004-04-22 |
Family
ID=18561531
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE60101232T Expired - Lifetime DE60101232T2 (de) | 2000-02-16 | 2001-02-16 | Elektronenemittierende Quelle, Baugruppe und Verfahren zu deren Herstellung |
Country Status (8)
Country | Link |
---|---|
US (2) | US6522055B2 (de) |
EP (1) | EP1126494B1 (de) |
JP (1) | JP3595233B2 (de) |
KR (1) | KR100411623B1 (de) |
CN (1) | CN1185674C (de) |
CA (1) | CA2335213C (de) |
DE (1) | DE60101232T2 (de) |
TW (1) | TW495790B (de) |
Families Citing this family (50)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR100360470B1 (ko) * | 2000-03-15 | 2002-11-09 | 삼성에스디아이 주식회사 | 저압-dc-열화학증착법을 이용한 탄소나노튜브 수직배향증착 방법 |
JP2002025477A (ja) * | 2000-07-07 | 2002-01-25 | Ise Electronics Corp | 平面ディスプレイ及びその製造方法 |
US7259510B1 (en) * | 2000-08-30 | 2007-08-21 | Agere Systems Inc. | On-chip vacuum tube device and process for making device |
FR2815954B1 (fr) * | 2000-10-27 | 2003-02-21 | Commissariat Energie Atomique | Procede et dispositif de depot par plasma a la resonance cyclotron electronique de nanotubes de carbone monoparois et nanotubes ainsi obtenus |
ATE275530T1 (de) * | 2001-02-26 | 2004-09-15 | Nanolight Internat Ltd | Verfahren zur bildung einer kohlenstoffnanoröhren enthaltenden beschichtung auf einem substrat |
JP3768937B2 (ja) * | 2001-09-10 | 2006-04-19 | キヤノン株式会社 | 電子放出素子、電子源及び画像表示装置の製造方法 |
JP3839713B2 (ja) | 2001-12-12 | 2006-11-01 | 株式会社ノリタケカンパニーリミテド | 平面ディスプレイの製造方法 |
FR2833935B1 (fr) * | 2001-12-26 | 2004-01-30 | Commissariat Energie Atomique | Procede de fabrication d'au moins un nanotube entre deux elements electriquement conducteurs et dispositif pour mettre en oeuvre un tel procede |
JP4404961B2 (ja) * | 2002-01-08 | 2010-01-27 | 双葉電子工業株式会社 | カーボンナノ繊維の製造方法。 |
KR100837393B1 (ko) * | 2002-01-22 | 2008-06-12 | 삼성에스디아이 주식회사 | 탄소와 친화도가 높은 금속을 전극으로 구비하는 전자소자 |
US7638727B2 (en) * | 2002-05-08 | 2009-12-29 | Btu International Inc. | Plasma-assisted heat treatment |
US20060237398A1 (en) * | 2002-05-08 | 2006-10-26 | Dougherty Mike L Sr | Plasma-assisted processing in a manufacturing line |
US7497922B2 (en) * | 2002-05-08 | 2009-03-03 | Btu International, Inc. | Plasma-assisted gas production |
US20060057016A1 (en) * | 2002-05-08 | 2006-03-16 | Devendra Kumar | Plasma-assisted sintering |
US20060233682A1 (en) * | 2002-05-08 | 2006-10-19 | Cherian Kuruvilla A | Plasma-assisted engine exhaust treatment |
AU2002325215A1 (en) * | 2002-05-08 | 2003-11-11 | Leonhard Kurz Gmbh And Co. Kg | Method of decorating large plastic 3d objects |
US20050233091A1 (en) * | 2002-05-08 | 2005-10-20 | Devendra Kumar | Plasma-assisted coating |
US20060228497A1 (en) * | 2002-05-08 | 2006-10-12 | Satyendra Kumar | Plasma-assisted coating |
BR0309810A (pt) * | 2002-05-08 | 2007-04-10 | Dana Corp | sistemas e método de tratamento da exaustão de motor e veìculo móvel |
US7445817B2 (en) * | 2002-05-08 | 2008-11-04 | Btu International Inc. | Plasma-assisted formation of carbon structures |
AU2003301728A1 (en) * | 2002-06-21 | 2004-05-25 | Nanomix. Inc. | Dispersed growth of nanotubes on a substrate |
JP3876313B2 (ja) * | 2002-11-12 | 2007-01-31 | 国立大学法人 北海道大学 | 繊維状固体炭素集合体の製造方法 |
US7189940B2 (en) * | 2002-12-04 | 2007-03-13 | Btu International Inc. | Plasma-assisted melting |
US6933222B2 (en) * | 2003-01-02 | 2005-08-23 | Intel Corporation | Microcircuit fabrication and interconnection |
JP3697257B2 (ja) | 2003-03-25 | 2005-09-21 | キヤノン株式会社 | カーボンファイバー、電子放出素子、電子源、画像形成装置、ライトバルブ、二次電池の製造方法 |
JP3878571B2 (ja) * | 2003-04-15 | 2007-02-07 | 株式会社ノリタケカンパニーリミテド | 電子放出源の製造方法 |
KR101065308B1 (ko) * | 2004-02-04 | 2011-09-16 | 삼성에스디아이 주식회사 | 광전기화학전지 |
US20050238810A1 (en) * | 2004-04-26 | 2005-10-27 | Mainstream Engineering Corp. | Nanotube/metal substrate composites and methods for producing such composites |
US20060006780A1 (en) * | 2004-07-06 | 2006-01-12 | Chun-Yen Hsiao | Electron emission source of field emission display and method for making the same |
US20060083927A1 (en) * | 2004-10-15 | 2006-04-20 | Zyvex Corporation | Thermal interface incorporating nanotubes |
WO2006127037A2 (en) * | 2004-11-05 | 2006-11-30 | Dana Corporation | Atmospheric pressure processing using microwave-generated plasmas |
JP4781662B2 (ja) * | 2004-11-17 | 2011-09-28 | シャープ株式会社 | カーボンナノチューブの作製方法およびカーボンナノチューブの作製装置 |
KR20060059747A (ko) * | 2004-11-29 | 2006-06-02 | 삼성에스디아이 주식회사 | 전자방출 표시장치 |
FR2880200B1 (fr) * | 2004-12-24 | 2012-08-17 | St Microelectronics Sa | Plaquette munie de conducteurs transverses et application a une pile a combustible |
KR100657953B1 (ko) * | 2005-02-23 | 2006-12-14 | 삼성에스디아이 주식회사 | 전계 방출 표시장치의 실링 구조 및 그 제조 방법 |
CN100462300C (zh) * | 2005-07-29 | 2009-02-18 | 鸿富锦精密工业(深圳)有限公司 | 碳纳米管生长装置 |
JP5049473B2 (ja) * | 2005-08-19 | 2012-10-17 | 株式会社アルバック | 配線形成方法及び配線 |
CN100467370C (zh) * | 2005-09-12 | 2009-03-11 | 鸿富锦精密工业(深圳)有限公司 | 一种碳纳米管制备装置及方法 |
US20070084407A1 (en) * | 2005-10-14 | 2007-04-19 | Hon Hai Precision Industry Co., Ltd. | Apparatus and method for manufacturing carbon nanotubes |
CN100573808C (zh) * | 2006-03-22 | 2009-12-23 | 清华大学 | 场发射照明光源及其制造方法 |
JP4523562B2 (ja) * | 2006-03-23 | 2010-08-11 | 株式会社ノリタケカンパニーリミテド | 電子放出源及びその製造方法 |
US7635945B2 (en) * | 2006-07-21 | 2009-12-22 | Tsinghua University | Field emission device having a hollow shaped shielding structure |
JP2008071501A (ja) * | 2006-09-12 | 2008-03-27 | Noritake Co Ltd | 蛍光表示装置 |
WO2011004609A1 (ja) * | 2009-07-08 | 2011-01-13 | Ohmae Nobuo | Co2リサイクリング方法、co2削減方法、および装置 |
CN102064063B (zh) | 2010-12-24 | 2012-08-29 | 清华大学 | 场发射阴极装置及其制备方法 |
CN102097264B (zh) * | 2011-01-21 | 2012-11-28 | 东南大学 | 一种大电流场致发射阴极结构 |
WO2013175806A1 (ja) * | 2012-05-25 | 2013-11-28 | 株式会社ティサポート | Co2リサイクリング装置およびco2リサイクリングシステム |
CN103896245B (zh) * | 2012-12-29 | 2016-01-20 | 清华大学 | 反应器及生长碳纳米管的方法 |
JP2017107816A (ja) * | 2015-12-11 | 2017-06-15 | 株式会社堀場エステック | 熱電子放出用フィラメント、四重極質量分析計、及び残留ガス分析方法 |
KR102616653B1 (ko) * | 2018-12-14 | 2023-12-21 | 삼성전자주식회사 | 탄소섬유 대전장치 및 이를 구비한 가전기기 |
Family Cites Families (11)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR100365444B1 (ko) * | 1996-09-18 | 2004-01-24 | 가부시끼가이샤 도시바 | 진공마이크로장치와이를이용한화상표시장치 |
DE69834673T2 (de) | 1997-09-30 | 2006-10-26 | Noritake Co., Ltd., Nagoya | Verfahren zur Herstellung einer Elektronenemittierenden Quelle |
JP3740295B2 (ja) | 1997-10-30 | 2006-02-01 | キヤノン株式会社 | カーボンナノチューブデバイス、その製造方法及び電子放出素子 |
JP3902883B2 (ja) | 1998-03-27 | 2007-04-11 | キヤノン株式会社 | ナノ構造体及びその製造方法 |
JP2002518280A (ja) | 1998-06-19 | 2002-06-25 | ザ・リサーチ・ファウンデーション・オブ・ステイト・ユニバーシティ・オブ・ニューヨーク | 整列した自立炭素ナノチューブおよびその合成 |
JP3497740B2 (ja) | 1998-09-09 | 2004-02-16 | 株式会社東芝 | カーボンナノチューブの製造方法及び電界放出型冷陰極装置の製造方法 |
US6250984B1 (en) * | 1999-01-25 | 2001-06-26 | Agere Systems Guardian Corp. | Article comprising enhanced nanotube emitter structure and process for fabricating article |
WO2000052726A1 (en) | 1999-03-04 | 2000-09-08 | Electrovac, Fabrikation Elektrotechnischer Spezialartikel Gesellschaft M.B.H. | Cathode structure for a field emission display |
KR100480773B1 (ko) * | 2000-01-07 | 2005-04-06 | 삼성에스디아이 주식회사 | 카본 나노 튜브를 이용한 3극 전계방출소자의 제작방법 |
US7335603B2 (en) * | 2000-02-07 | 2008-02-26 | Vladimir Mancevski | System and method for fabricating logic devices comprising carbon nanotube transistors |
US6495258B1 (en) * | 2000-09-20 | 2002-12-17 | Auburn University | Structures with high number density of carbon nanotubes and 3-dimensional distribution |
-
2000
- 2000-02-16 JP JP2000037672A patent/JP3595233B2/ja not_active Expired - Fee Related
-
2001
- 2001-02-08 TW TW090102801A patent/TW495790B/zh not_active IP Right Cessation
- 2001-02-09 CA CA002335213A patent/CA2335213C/en not_active Expired - Fee Related
- 2001-02-15 US US09/784,868 patent/US6522055B2/en not_active Expired - Fee Related
- 2001-02-16 EP EP01103842A patent/EP1126494B1/de not_active Expired - Lifetime
- 2001-02-16 DE DE60101232T patent/DE60101232T2/de not_active Expired - Lifetime
- 2001-02-16 KR KR10-2001-0007908A patent/KR100411623B1/ko not_active IP Right Cessation
- 2001-02-16 CN CNB011040491A patent/CN1185674C/zh not_active Expired - Fee Related
-
2002
- 2002-09-12 US US10/241,975 patent/US6652923B2/en not_active Expired - Fee Related
Also Published As
Publication number | Publication date |
---|---|
CA2335213C (en) | 2003-09-30 |
US20010028209A1 (en) | 2001-10-11 |
EP1126494B1 (de) | 2003-11-19 |
EP1126494A1 (de) | 2001-08-22 |
TW495790B (en) | 2002-07-21 |
JP3595233B2 (ja) | 2004-12-02 |
CN1185674C (zh) | 2005-01-19 |
DE60101232T2 (de) | 2004-04-22 |
KR20010082722A (ko) | 2001-08-30 |
JP2001229806A (ja) | 2001-08-24 |
CN1309408A (zh) | 2001-08-22 |
US20030013372A1 (en) | 2003-01-16 |
US6522055B2 (en) | 2003-02-18 |
CA2335213A1 (en) | 2001-08-16 |
KR100411623B1 (ko) | 2003-12-18 |
US6652923B2 (en) | 2003-11-25 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
8364 | No opposition during term of opposition |