DE60043454D1 - Methode und apparat zur endpunktbestimmung eines photolackentfernungsprozesses - Google Patents
Methode und apparat zur endpunktbestimmung eines photolackentfernungsprozessesInfo
- Publication number
- DE60043454D1 DE60043454D1 DE60043454T DE60043454T DE60043454D1 DE 60043454 D1 DE60043454 D1 DE 60043454D1 DE 60043454 T DE60043454 T DE 60043454T DE 60043454 T DE60043454 T DE 60043454T DE 60043454 D1 DE60043454 D1 DE 60043454D1
- Authority
- DE
- Germany
- Prior art keywords
- photolack
- removal process
- point determination
- final point
- final
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32917—Plasma diagnostics
- H01J37/32935—Monitoring and controlling tubes by information coming from the object and/or discharge
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/26—Processing photosensitive materials; Apparatus therefor
- G03F7/42—Stripping or agents therefor
- G03F7/427—Stripping or agents therefor using plasma means only
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32917—Plasma diagnostics
- H01J37/32935—Monitoring and controlling tubes by information coming from the object and/or discharge
- H01J37/32963—End-point detection
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67242—Apparatus for monitoring, sorting or marking
- H01L21/67253—Process monitoring, e.g. flow or thickness monitoring
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L22/00—Testing or measuring during manufacture or treatment; Reliability measurements, i.e. testing of parts without further processing to modify the parts as such; Structural arrangements therefor
- H01L22/20—Sequence of activities consisting of a plurality of measurements, corrections, marking or sorting steps
- H01L22/26—Acting in response to an ongoing measurement without interruption of processing, e.g. endpoint detection, in-situ thickness measurement
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
- H01J2237/32—Processing objects by plasma generation
- H01J2237/33—Processing objects by plasma generation characterised by the type of processing
- H01J2237/334—Etching
- H01J2237/3342—Resist stripping
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Plasma & Fusion (AREA)
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- General Physics & Mathematics (AREA)
- Power Engineering (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Drying Of Semiconductors (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US09/468,742 US6451158B1 (en) | 1999-12-21 | 1999-12-21 | Apparatus for detecting the endpoint of a photoresist stripping process |
PCT/US2000/034655 WO2001047009A2 (en) | 1999-12-21 | 2000-12-19 | Method and apparatus for detecting the endpoint of a photoresist stripping process |
Publications (1)
Publication Number | Publication Date |
---|---|
DE60043454D1 true DE60043454D1 (de) | 2010-01-14 |
Family
ID=23861050
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE60043454T Expired - Lifetime DE60043454D1 (de) | 1999-12-21 | 2000-12-19 | Methode und apparat zur endpunktbestimmung eines photolackentfernungsprozesses |
Country Status (8)
Country | Link |
---|---|
US (2) | US6451158B1 (de) |
EP (1) | EP1247295B1 (de) |
JP (1) | JP4763955B2 (de) |
KR (1) | KR100767224B1 (de) |
CN (1) | CN1189931C (de) |
AU (1) | AU2443901A (de) |
DE (1) | DE60043454D1 (de) |
WO (1) | WO2001047009A2 (de) |
Families Citing this family (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6451158B1 (en) * | 1999-12-21 | 2002-09-17 | Lam Research Corporation | Apparatus for detecting the endpoint of a photoresist stripping process |
GB0206158D0 (en) * | 2002-03-15 | 2002-04-24 | Intellemetrics Ltd | Use of light emitting chemical reactions for control of semiconductor production processes |
US6862491B2 (en) * | 2002-05-22 | 2005-03-01 | Applied Materials Israel, Ltd. | System and method for process variation monitor |
US20060006139A1 (en) * | 2003-05-09 | 2006-01-12 | David Johnson | Selection of wavelengths for end point in a time division multiplexed process |
CN100401491C (zh) * | 2003-05-09 | 2008-07-09 | 优利讯美国有限公司 | 时分复用处理中的包络跟随器终点检测 |
US20040235299A1 (en) * | 2003-05-22 | 2004-11-25 | Axcelis Technologies, Inc. | Plasma ashing apparatus and endpoint detection process |
US10714436B2 (en) | 2012-12-12 | 2020-07-14 | Lam Research Corporation | Systems and methods for achieving uniformity across a redistribution layer |
US9043743B2 (en) | 2013-10-22 | 2015-05-26 | International Business Machines Corporation | Automated residual material detection |
CN110879198B (zh) * | 2019-11-25 | 2022-10-21 | 中国科学院微电子研究所 | 一种极紫外光刻胶放气污染测试系统 |
Family Cites Families (32)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3647387A (en) | 1970-03-19 | 1972-03-07 | Stanford Research Inst | Detection device |
US4312732A (en) * | 1976-08-31 | 1982-01-26 | Bell Telephone Laboratories, Incorporated | Method for the optical monitoring of plasma discharge processing operations |
US4528438A (en) * | 1976-09-16 | 1985-07-09 | Northern Telecom Limited | End point control in plasma etching |
JPS5448172A (en) * | 1977-09-24 | 1979-04-16 | Tokyo Ouka Kougiyou Kk | Plasma reaction processor |
US4201579A (en) | 1978-06-05 | 1980-05-06 | Motorola, Inc. | Method for removing photoresist by hydrogen plasma |
JPS60136229A (ja) * | 1983-12-23 | 1985-07-19 | Nec Corp | 剥離時間の制御方法 |
US4699689A (en) * | 1985-05-17 | 1987-10-13 | Emergent Technologies Corporation | Method and apparatus for dry processing of substrates |
US4812201A (en) | 1986-07-25 | 1989-03-14 | Tokyo Electron Limited | Method of ashing layers, and apparatus for ashing layers |
JP2600198B2 (ja) | 1987-09-30 | 1997-04-16 | 株式会社島津製作所 | 窒素酸化物測定装置 |
JPH0777212B2 (ja) | 1989-01-30 | 1995-08-16 | 大日本スクリーン製造株式会社 | 基板のレジスト除去洗浄方法 |
JPH04164316A (ja) * | 1990-10-29 | 1992-06-10 | Nec Corp | ホトレジスト除去装置 |
JPH0547717A (ja) * | 1991-01-22 | 1993-02-26 | Tokyo Electron Ltd | プラズマ表面処理の終点検出方法及びプラズマ表面処理装置の状態監視方法 |
JPH04304632A (ja) * | 1991-04-01 | 1992-10-28 | Sony Corp | レジスト除去方法 |
JPH056873A (ja) * | 1991-06-26 | 1993-01-14 | Oki Electric Ind Co Ltd | エツチング終点検出方法およびエツチング装置 |
US5877032A (en) | 1995-10-12 | 1999-03-02 | Lucent Technologies Inc. | Process for device fabrication in which the plasma etch is controlled by monitoring optical emission |
US5308447A (en) * | 1992-06-09 | 1994-05-03 | Luxtron Corporation | Endpoint and uniformity determinations in material layer processing through monitoring multiple surface regions across the layer |
US5499733A (en) * | 1992-09-17 | 1996-03-19 | Luxtron Corporation | Optical techniques of measuring endpoint during the processing of material layers in an optically hostile environment |
US5453157A (en) * | 1994-05-16 | 1995-09-26 | Texas Instruments Incorporated | Low temperature anisotropic ashing of resist for semiconductor fabrication |
US5672239A (en) * | 1995-05-10 | 1997-09-30 | Tegal Corporation | Integrated semiconductor wafer processing system |
JPH0936103A (ja) | 1995-07-18 | 1997-02-07 | Ulvac Japan Ltd | 半導体ウェハのエッチング及びレジスト除去のための方法並びに装置 |
US5963336A (en) * | 1995-10-10 | 1999-10-05 | American Air Liquide Inc. | Chamber effluent monitoring system and semiconductor processing system comprising absorption spectroscopy measurement system, and methods of use |
US5882489A (en) * | 1996-04-26 | 1999-03-16 | Ulvac Technologies, Inc. | Processes for cleaning and stripping photoresist from surfaces of semiconductor wafers |
US5795831A (en) | 1996-10-16 | 1998-08-18 | Ulvac Technologies, Inc. | Cold processes for cleaning and stripping photoresist from surfaces of semiconductor wafers |
US5871658A (en) * | 1997-01-13 | 1999-02-16 | Taiwan Semiconductor Manufacturing Company, Ltd. | Optical emisson spectroscopy (OES) method for monitoring and controlling plasma etch process when forming patterned layers |
JPH10261619A (ja) * | 1997-03-19 | 1998-09-29 | Hitachi Ltd | プラズマ処理装置 |
JP2925535B2 (ja) * | 1997-05-22 | 1999-07-28 | キヤノン株式会社 | 環状導波路を有するマイクロ波供給器及びそれを備えたプラズマ処理装置及び処理方法 |
US5969805A (en) * | 1997-11-04 | 1999-10-19 | Micron Technology, Inc. | Method and apparatus employing external light source for endpoint detection |
US6704107B1 (en) * | 1997-11-04 | 2004-03-09 | Micron Technology, Inc. | Method and apparatus for automated, in situ material detection using filtered fluoresced, reflected, or absorbed light |
JPH11176815A (ja) * | 1997-12-15 | 1999-07-02 | Ricoh Co Ltd | ドライエッチングの終点判定方法およびドライエッチング装置 |
JP3252789B2 (ja) * | 1998-04-03 | 2002-02-04 | 日本電気株式会社 | エッチング方法 |
US6335531B1 (en) * | 1999-04-06 | 2002-01-01 | Micron Technology, Inc. | Modification of resist and/or resist processing with fluorescence detection |
US6451158B1 (en) * | 1999-12-21 | 2002-09-17 | Lam Research Corporation | Apparatus for detecting the endpoint of a photoresist stripping process |
-
1999
- 1999-12-21 US US09/468,742 patent/US6451158B1/en not_active Expired - Lifetime
-
2000
- 2000-12-19 KR KR1020027007952A patent/KR100767224B1/ko active IP Right Grant
- 2000-12-19 AU AU24439/01A patent/AU2443901A/en not_active Abandoned
- 2000-12-19 WO PCT/US2000/034655 patent/WO2001047009A2/en active Application Filing
- 2000-12-19 DE DE60043454T patent/DE60043454D1/de not_active Expired - Lifetime
- 2000-12-19 CN CNB00817637XA patent/CN1189931C/zh not_active Expired - Lifetime
- 2000-12-19 JP JP2001547645A patent/JP4763955B2/ja not_active Expired - Lifetime
- 2000-12-19 EP EP00988207A patent/EP1247295B1/de not_active Expired - Lifetime
-
2002
- 2002-06-05 US US10/163,286 patent/US7077971B2/en not_active Expired - Fee Related
Also Published As
Publication number | Publication date |
---|---|
KR100767224B1 (ko) | 2007-10-17 |
CN1413359A (zh) | 2003-04-23 |
JP4763955B2 (ja) | 2011-08-31 |
CN1189931C (zh) | 2005-02-16 |
KR20020061006A (ko) | 2002-07-19 |
JP2003518740A (ja) | 2003-06-10 |
US7077971B2 (en) | 2006-07-18 |
WO2001047009A3 (en) | 2002-01-31 |
EP1247295A2 (de) | 2002-10-09 |
WO2001047009A2 (en) | 2001-06-28 |
US20020148811A1 (en) | 2002-10-17 |
AU2443901A (en) | 2001-07-03 |
US6451158B1 (en) | 2002-09-17 |
EP1247295B1 (de) | 2009-12-02 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
8364 | No opposition during term of opposition |