DE60019821D1 - Vakuumbogen-Verdampfungsquelle und -Aufdampfeinrichtung - Google Patents

Vakuumbogen-Verdampfungsquelle und -Aufdampfeinrichtung

Info

Publication number
DE60019821D1
DE60019821D1 DE60019821T DE60019821T DE60019821D1 DE 60019821 D1 DE60019821 D1 DE 60019821D1 DE 60019821 T DE60019821 T DE 60019821T DE 60019821 T DE60019821 T DE 60019821T DE 60019821 D1 DE60019821 D1 DE 60019821D1
Authority
DE
Germany
Prior art keywords
evaporator
evaporation source
vacuum arc
arc evaporation
vacuum
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE60019821T
Other languages
English (en)
Other versions
DE60019821T2 (de
Inventor
Kazuki Takahara
Hirofumi Fujii
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Kobe Steel Ltd
Original Assignee
Kobe Steel Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from JP00804599A external-priority patent/JP3789667B2/ja
Priority claimed from JP14207399A external-priority patent/JP3728140B2/ja
Application filed by Kobe Steel Ltd filed Critical Kobe Steel Ltd
Publication of DE60019821D1 publication Critical patent/DE60019821D1/de
Application granted granted Critical
Publication of DE60019821T2 publication Critical patent/DE60019821T2/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering
    • C23C14/35—Sputtering by application of a magnetic field, e.g. magnetron sputtering
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32055—Arc discharge
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/3266—Magnetic control means

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • Analytical Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
DE60019821T 1999-01-14 2000-01-13 Vakuumbogen-Verdampfungsquelle und -Aufdampfeinrichtung Expired - Lifetime DE60019821T2 (de)

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
JP00804599A JP3789667B2 (ja) 1999-01-14 1999-01-14 真空アーク蒸発源及び真空アーク蒸着装置
JP804599 1999-01-14
JP14207399 1999-05-21
JP14207399A JP3728140B2 (ja) 1999-05-21 1999-05-21 アーク蒸発源及び真空蒸着装置

Publications (2)

Publication Number Publication Date
DE60019821D1 true DE60019821D1 (de) 2005-06-09
DE60019821T2 DE60019821T2 (de) 2006-01-26

Family

ID=26342468

Family Applications (1)

Application Number Title Priority Date Filing Date
DE60019821T Expired - Lifetime DE60019821T2 (de) 1999-01-14 2000-01-13 Vakuumbogen-Verdampfungsquelle und -Aufdampfeinrichtung

Country Status (5)

Country Link
US (1) US6334405B1 (de)
EP (1) EP1020541B1 (de)
KR (1) KR100343033B1 (de)
DE (1) DE60019821T2 (de)
TW (1) TWI242049B (de)

Families Citing this family (21)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4000764B2 (ja) * 2000-09-18 2007-10-31 日新電機株式会社 真空アーク蒸発装置
KR20020078986A (ko) * 2001-04-12 2002-10-19 현대자동차주식회사 소형자동차의 측면차체구조
BR0317372A (pt) * 2002-12-19 2005-11-16 Unaxis Balzers Ag Fonte de arco de vácuo com dispositivo gerador de campo magnético
EP2466614A3 (de) 2006-05-16 2013-05-22 Oerlikon Trading AG, Trübbach Arcquelle und Magnetanordnung
TWI411696B (zh) 2006-07-19 2013-10-11 Oerlikon Trading Ag 沉積電絕緣層之方法
US7857948B2 (en) * 2006-07-19 2010-12-28 Oerlikon Trading Ag, Trubbach Method for manufacturing poorly conductive layers
CN105632859B (zh) * 2007-04-17 2018-03-30 欧瑞康梅塔普拉斯有限责任公司 真空电弧蒸发源及带有真空电弧蒸发源的电弧蒸发室
JP5496223B2 (ja) * 2008-12-26 2014-05-21 フンダシオン テクニケル アーク・エバポレーターおよびアーク・エバポレーターの操作方法
JP5649308B2 (ja) * 2009-04-28 2015-01-07 株式会社神戸製鋼所 成膜速度が速いアーク式蒸発源及びこのアーク式蒸発源を用いた皮膜の製造方法
JP5318052B2 (ja) 2010-06-23 2013-10-16 株式会社神戸製鋼所 成膜速度が速いアーク式蒸発源、このアーク式蒸発源を用いた皮膜の製造方法及び成膜装置
RU2449513C1 (ru) * 2010-11-30 2012-04-27 Государственное образовательное учреждение высшего профессионального образования "Санкт-Петербургский государственный электротехнический университет "ЛЭТИ" им. В.И. Ульянова (Ленина)" Вакуумно-дуговое устройство
US20130327642A1 (en) * 2011-02-23 2013-12-12 Kabushiki Kaisha Kobe Seiko Sho (Kobe Steel, Ltd.) Arc evaporation source
DE102011015886A1 (de) 2011-04-01 2012-10-04 Carl Freudenberg Kg Verfahren zur Herstellung eines magnetischen Encoderrings
US9153422B2 (en) 2011-08-02 2015-10-06 Envaerospace, Inc. Arc PVD plasma source and method of deposition of nanoimplanted coatings
CN103160792B (zh) * 2011-12-12 2017-02-08 许聪波 镀膜装置
JP5946337B2 (ja) 2012-06-20 2016-07-06 株式会社神戸製鋼所 アーク式蒸発源
JP5421438B1 (ja) 2012-08-15 2014-02-19 中外炉工業株式会社 プラズマ処理装置
JP6403269B2 (ja) * 2014-07-30 2018-10-10 株式会社神戸製鋼所 アーク蒸発源
RU2685828C1 (ru) * 2018-09-26 2019-04-23 Акционерное общество "Научно-производственное объединение "Центральный научно-исследовательский институт технологии машиностроения", АО "НПО "ЦНИИТМАШ" Устройство для нанесения покрытия вакуумно-дуговым испарением
RU2761900C1 (ru) * 2021-02-08 2021-12-13 Федеральное государственное бюджетное учреждение науки Институт радиотехники и электроники им. В.А. Котельникова Российской академии наук Магнетронное распылительное устройство
JP2024067972A (ja) * 2022-11-07 2024-05-17 株式会社神戸製鋼所 アーク蒸発源

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2851320B2 (ja) 1988-09-26 1999-01-27 株式会社神戸製鋼所 真空アーク蒸着装置及び方法
BG49771A1 (en) 1989-07-13 1992-02-14 T I Vakuumni Sistemi Electric- bow evaparator
JPH04236770A (ja) 1991-01-17 1992-08-25 Kobe Steel Ltd 真空アーク蒸着のアークスポットの制御方法及び蒸発源
DE69226360T2 (de) * 1991-03-25 1999-02-25 Commw Scient Ind Res Org Makroteilchenfilter in lichtbogenquelle
CA2065581C (en) 1991-04-22 2002-03-12 Andal Corp. Plasma enhancement apparatus and method for physical vapor deposition
US5597459A (en) * 1995-02-08 1997-01-28 Nobler Technologies, Inc. Magnetron cathode sputtering method and apparatus

Also Published As

Publication number Publication date
TWI242049B (en) 2005-10-21
EP1020541A3 (de) 2000-12-20
US6334405B1 (en) 2002-01-01
KR20000053411A (ko) 2000-08-25
EP1020541A2 (de) 2000-07-19
KR100343033B1 (ko) 2002-07-02
EP1020541B1 (de) 2005-05-04
DE60019821T2 (de) 2006-01-26

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Legal Events

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8364 No opposition during term of opposition