DE69810704D1 - Rotierende freistehende Verdampfungsquelle - Google Patents

Rotierende freistehende Verdampfungsquelle

Info

Publication number
DE69810704D1
DE69810704D1 DE69810704T DE69810704T DE69810704D1 DE 69810704 D1 DE69810704 D1 DE 69810704D1 DE 69810704 T DE69810704 T DE 69810704T DE 69810704 T DE69810704 T DE 69810704T DE 69810704 D1 DE69810704 D1 DE 69810704D1
Authority
DE
Germany
Prior art keywords
freestanding
rotating
evaporation source
evaporation
source
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE69810704T
Other languages
English (en)
Other versions
DE69810704T2 (de
Inventor
Russel J Hill
P A Joel Smith
Ping Chang
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Ferrotec USA Corp
Original Assignee
BOC Group Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by BOC Group Inc filed Critical BOC Group Inc
Publication of DE69810704D1 publication Critical patent/DE69810704D1/de
Application granted granted Critical
Publication of DE69810704T2 publication Critical patent/DE69810704T2/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C23C14/28—Vacuum evaporation by wave energy or particle radiation
    • C23C14/30—Vacuum evaporation by wave energy or particle radiation by electron bombardment
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C23C14/246—Replenishment of source material

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Toxicology (AREA)
  • Physical Vapour Deposition (AREA)
DE69810704T 1997-06-23 1998-06-19 Rotierende freistehende Verdampfungsquelle Expired - Lifetime DE69810704T2 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US08/880,246 US5905753A (en) 1997-06-23 1997-06-23 Free-standing rotational rod-fed source

Publications (2)

Publication Number Publication Date
DE69810704D1 true DE69810704D1 (de) 2003-02-20
DE69810704T2 DE69810704T2 (de) 2003-10-16

Family

ID=25375834

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69810704T Expired - Lifetime DE69810704T2 (de) 1997-06-23 1998-06-19 Rotierende freistehende Verdampfungsquelle

Country Status (6)

Country Link
US (1) US5905753A (de)
EP (1) EP0887435B1 (de)
JP (1) JP4397979B2 (de)
KR (1) KR100495647B1 (de)
CA (1) CA2237280C (de)
DE (1) DE69810704T2 (de)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE102007008674B4 (de) * 2006-02-20 2010-03-25 Von Ardenne Anlagentechnik Gmbh Verfahren und Vorrichtung zur langzeitstabilen Beschichtung flächiger Substrate
US8748773B2 (en) * 2007-03-30 2014-06-10 Ati Properties, Inc. Ion plasma electron emitters for a melting furnace
DE102009005513B4 (de) 2009-01-20 2015-12-10 Von Ardenne Gmbh Verfahren und Vorrichtung zur langzeitstabilen Beschichtung von Substraten mittels Elektronenstrahlverdampfung
DE102009037326A1 (de) 2009-08-14 2011-02-17 Von Ardenne Anlagentechnik Gmbh Verfahren und Vorrichtung zur langzeitstabilen plasmaaktivierten Vakuumbedampfung
DE102010041150A1 (de) * 2010-05-26 2011-12-01 Von Ardenne Anlagentechnik Gmbh Verfahren und Einrichtung zur Vakuumbeschichtung von Substraten
EP3725911A1 (de) * 2019-04-16 2020-10-21 Max-Planck-Gesellschaft zur Förderung der Wissenschaften e.V. Quellenanordnung, abscheidungsvorrichtung und verfahren zum abscheiden von quellmaterial

Family Cites Families (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB1037675A (en) * 1962-05-08 1966-08-03 Lucas Industries Ltd Vacuum deposition of metals
DE1521251B2 (de) * 1966-05-03 1970-03-26 Farbenfabriken Bayer Aktiengesellschaft, 5090 Leverkusen Vorrichtung und Verfahren zum gleichmäßigen Verdampfen und Auftragen von hochschmelzenden Materialien, insbesondere Quarz
US3377419A (en) * 1966-06-29 1968-04-09 Lokomotivbau Elektrotech Electron beam multichamber high vacuum furnace
US3454814A (en) * 1966-07-29 1969-07-08 Atomic Energy Commission Tubular vapor source
US3730962A (en) * 1971-08-24 1973-05-01 Airco Inc Electron beam furance with material-evaporant equilibrium control
US3756193A (en) * 1972-05-01 1973-09-04 Battelle Memorial Institute Coating apparatus
US4130416A (en) * 1973-04-19 1978-12-19 Zaboronok Georgy F Method of preparing a furnace charge when smelting refractory metals and alloys
US4027093A (en) * 1976-03-01 1977-05-31 Optical Coating Laboratory, Inc. Ingot gripper assembly
DE2650215A1 (de) * 1976-11-02 1978-05-11 G F Paul Dipl Phys Dr Mueller Verdampfereinrichtung mit elektronenstrahlheizung zur verdampfung von metallen und anderen leitenden oder halbleitenden stoffen
DE3420246A1 (de) * 1984-05-30 1985-12-05 Leybold-Heraeus GmbH, 5000 Köln Verdampfertiegel fuer vakuum-aufdampfanlagen
DE58907191D1 (de) * 1989-02-09 1994-04-14 Balzers Hochvakuum Verfahren zum Zentrieren eines Elektronenstrahles.
DE4305721C1 (de) * 1993-02-25 1994-07-21 Dresden Vakuumtech Gmbh Niedervoltbogenverdampfer mit Nachfütterungseinrichtung und Verfahren zu dessen Verwendung
JPH07220273A (ja) * 1994-01-26 1995-08-18 Sony Corp 磁気記録媒体の製造方法

Also Published As

Publication number Publication date
JP4397979B2 (ja) 2010-01-13
KR19990007237A (ko) 1999-01-25
EP0887435A1 (de) 1998-12-30
JPH1161390A (ja) 1999-03-05
CA2237280A1 (en) 1998-12-23
KR100495647B1 (ko) 2005-09-30
EP0887435B1 (de) 2003-01-15
US5905753A (en) 1999-05-18
CA2237280C (en) 2007-01-02
DE69810704T2 (de) 2003-10-16

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8327 Change in the person/name/address of the patent owner

Owner name: EDWARDS VACCUM.INC. (N. D. GES. D. STAATES DEL, US

8327 Change in the person/name/address of the patent owner

Owner name: FERROTEC (USA) CORP. (N.D. GES. D. STAATES MAS, US

8328 Change in the person/name/address of the agent

Representative=s name: WUESTHOFF & WUESTHOFF PATENT- UND RECHTSANWAELTE,