DE60013934D1 - Laservorrichtung - Google Patents

Laservorrichtung

Info

Publication number
DE60013934D1
DE60013934D1 DE60013934T DE60013934T DE60013934D1 DE 60013934 D1 DE60013934 D1 DE 60013934D1 DE 60013934 T DE60013934 T DE 60013934T DE 60013934 T DE60013934 T DE 60013934T DE 60013934 D1 DE60013934 D1 DE 60013934D1
Authority
DE
Germany
Prior art keywords
laser device
laser
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE60013934T
Other languages
English (en)
Other versions
DE60013934T2 (de
Inventor
Tadahiro Ohmi
Nobumasa Suzuki
Toshikuni Shinohara
Hiroshi Ohsawa
Masaki Hirayama
Nobuyoshi Tanaka
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Inc
Original Assignee
Canon Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Canon Inc filed Critical Canon Inc
Application granted granted Critical
Publication of DE60013934D1 publication Critical patent/DE60013934D1/de
Publication of DE60013934T2 publication Critical patent/DE60013934T2/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70008—Production of exposure light, i.e. light sources
    • G03F7/70025—Production of exposure light, i.e. light sources by lasers
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/02—Constructional details
    • H01S3/03—Constructional details of gas laser discharge tubes
    • H01S3/0315—Waveguide lasers
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/09—Processes or apparatus for excitation, e.g. pumping
    • H01S3/097—Processes or apparatus for excitation, e.g. pumping by gas discharge of a gas laser
    • H01S3/0975—Processes or apparatus for excitation, e.g. pumping by gas discharge of a gas laser using inductive or capacitive excitation
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/14—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range characterised by the material used as the active medium
    • H01S3/22—Gases
    • H01S3/223—Gases the active gas being polyatomic, i.e. containing two or more atoms
    • H01S3/225—Gases the active gas being polyatomic, i.e. containing two or more atoms comprising an excimer or exciplex

Landscapes

  • Physics & Mathematics (AREA)
  • Electromagnetism (AREA)
  • Engineering & Computer Science (AREA)
  • Optics & Photonics (AREA)
  • Plasma & Fusion (AREA)
  • General Physics & Mathematics (AREA)
  • Lasers (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
DE60013934T 1999-02-26 2000-02-25 Laservorrichtung Expired - Lifetime DE60013934T2 (de)

Applications Claiming Priority (6)

Application Number Priority Date Filing Date Title
JP5181099 1999-02-26
JP5181199 1999-02-26
JP5181199 1999-02-26
JP5181099 1999-02-26
JP2000001979 2000-01-07
JP2000001979A JP2000312045A (ja) 1999-02-26 2000-01-07 レーザ発振装置、露光装置及びデバイスの製造方法

Publications (2)

Publication Number Publication Date
DE60013934D1 true DE60013934D1 (de) 2004-10-28
DE60013934T2 DE60013934T2 (de) 2005-09-22

Family

ID=27294445

Family Applications (1)

Application Number Title Priority Date Filing Date
DE60013934T Expired - Lifetime DE60013934T2 (de) 1999-02-26 2000-02-25 Laservorrichtung

Country Status (4)

Country Link
US (1) US6744802B1 (de)
EP (1) EP1032097B1 (de)
JP (1) JP2000312045A (de)
DE (1) DE60013934T2 (de)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3619141B2 (ja) 2000-11-10 2005-02-09 キヤノン株式会社 投影露光装置及びデバイス製造方法
JP4173679B2 (ja) 2002-04-09 2008-10-29 エム・イー・エス・アフティ株式会社 Ｅｃｒプラズマ源およびｅｃｒプラズマ装置
TW200532060A (en) * 2004-03-19 2005-10-01 Adv Lcd Tech Dev Ct Co Ltd Plasma treatment apparatus and plasma treatment
JP4703371B2 (ja) 2005-11-04 2011-06-15 国立大学法人東北大学 プラズマ処理装置
JP4850592B2 (ja) * 2006-06-14 2012-01-11 東京エレクトロン株式会社 プラズマ処理装置およびプラズマ処理方法
US7518092B2 (en) * 2007-03-15 2009-04-14 Capital Technologies, Inc. Processing apparatus with an electromagnetic launch
JP6288624B2 (ja) * 2016-06-20 2018-03-07 東京エレクトロン株式会社 マイクロ波供給装置、プラズマ処理装置、及び、プラズマ処理方法

Family Cites Families (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE263648C (de)
US5171965A (en) * 1984-02-01 1992-12-15 Canon Kabushiki Kaisha Exposure method and apparatus
DD263648B5 (de) * 1987-08-31 1996-01-25 Buck Werke Gmbh Einrichtung zur erzeugungs eines Mikrowellenplasmas mit grosser Ausdehnung und Homogenitaet
US4884282A (en) * 1988-06-27 1989-11-28 California Institute Of Technology Coupled waveguide laser array
DE3912568A1 (de) * 1989-04-17 1990-10-18 Siemens Ag Gas-laser, insbesondere co(pfeil abwaerts)2(pfeil abwaerts)-laser
DE3937491C2 (de) * 1989-11-10 1996-02-15 Deutsche Forsch Luft Raumfahrt Wellenleiterlaser mit Mikrowellenanregung
US5255282A (en) * 1991-11-25 1993-10-19 Quantametrics Inc. Open waveguide excimer laser
JP3382314B2 (ja) 1993-08-24 2003-03-04 キヤノン株式会社 通信装置及び通信装置の制御方法
US5698036A (en) * 1995-05-26 1997-12-16 Tokyo Electron Limited Plasma processing apparatus
JPH0987851A (ja) * 1995-09-21 1997-03-31 Canon Inc マイクロ波プラズマ処理装置及び処理方法
US6331994B1 (en) 1996-07-19 2001-12-18 Canon Kabushiki Kaisha Excimer laser oscillation apparatus and method, excimer laser exposure apparatus, and laser tube
US6204606B1 (en) * 1998-10-01 2001-03-20 The University Of Tennessee Research Corporation Slotted waveguide structure for generating plasma discharges

Also Published As

Publication number Publication date
EP1032097A3 (de) 2001-09-12
JP2000312045A (ja) 2000-11-07
DE60013934T2 (de) 2005-09-22
EP1032097B1 (de) 2004-09-22
US6744802B1 (en) 2004-06-01
EP1032097A2 (de) 2000-08-30

Similar Documents

Publication Publication Date Title
DE69941179D1 (de) Laserbearbeitungsvorrichtung
DE60024818T2 (de) Strammvorrichtung
NO2010019I2 (no) 6-per-deoksy-6-per-(2-karboksetyl)tio-y-cyklodextrin
ATE274334T1 (de) Mikrochirurgisches gerät
DE60101190D1 (de) Laservorrichtung
DE60130237D1 (de) Lasertherapiegerät
ATA206799A (de) Leuchtdioden-signalgeberoptik
DE60042024D1 (de) Haltevorrichtung
DE50101940D1 (de) Laservorrichtung
DE60019864D1 (de) Lasertherapiegerät
DE60009615D1 (de) Laservorrichtung
DE60006631D1 (de) Mikrospiegelvorrichtung
DE59808159D1 (de) Laservorrichtung
DE50002091D1 (de) Festkörperlaser
DE69908232D1 (de) Laserbehandlungsvorrichtung
DE60041742D1 (de) Halbleiterlaser
DE60040256D1 (de) Excimer-Laservorrichtung
DE60017076D1 (de) Lasersystem
DE69730872D1 (de) Laservorrichtung
DE60003114D1 (de) Laserbehandlungsvorrichtung
DE10196557T1 (de) Laserstrahlvorrichtung
DE60013934D1 (de) Laservorrichtung
DE60003372D1 (de) Halbleiterlaservorrichtung
DE60000538D1 (de) Stauchvorrichtung
DE60011322D1 (de) Laservorrichtung

Legal Events

Date Code Title Description
8364 No opposition during term of opposition