DE59802304D1 - Reduktives Ni-Bad - Google Patents
Reduktives Ni-BadInfo
- Publication number
- DE59802304D1 DE59802304D1 DE59802304T DE59802304T DE59802304D1 DE 59802304 D1 DE59802304 D1 DE 59802304D1 DE 59802304 T DE59802304 T DE 59802304T DE 59802304 T DE59802304 T DE 59802304T DE 59802304 D1 DE59802304 D1 DE 59802304D1
- Authority
- DE
- Germany
- Prior art keywords
- nickel
- bath
- reductive
- acid
- complexant
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/16—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
- C23C18/31—Coating with metals
- C23C18/32—Coating with nickel, cobalt or mixtures thereof with phosphorus or boron
- C23C18/34—Coating with nickel, cobalt or mixtures thereof with phosphorus or boron using reducing agents
- C23C18/36—Coating with nickel, cobalt or mixtures thereof with phosphorus or boron using reducing agents using hypophosphites
Landscapes
- Chemical & Material Sciences (AREA)
- General Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Chemically Coating (AREA)
- Manufacture And Refinement Of Metals (AREA)
- Catalysts (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE19733991A DE19733991A1 (de) | 1997-08-06 | 1997-08-06 | Reduktives Ni-Bad |
Publications (1)
Publication Number | Publication Date |
---|---|
DE59802304D1 true DE59802304D1 (de) | 2002-01-17 |
Family
ID=7838137
Family Applications (2)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE19733991A Withdrawn DE19733991A1 (de) | 1997-08-06 | 1997-08-06 | Reduktives Ni-Bad |
DE59802304T Expired - Fee Related DE59802304D1 (de) | 1997-08-06 | 1998-07-31 | Reduktives Ni-Bad |
Family Applications Before (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE19733991A Withdrawn DE19733991A1 (de) | 1997-08-06 | 1997-08-06 | Reduktives Ni-Bad |
Country Status (3)
Country | Link |
---|---|
EP (1) | EP0897998B1 (de) |
AT (1) | ATE210207T1 (de) |
DE (2) | DE19733991A1 (de) |
Families Citing this family (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE19908755A1 (de) * | 1999-02-19 | 2000-08-24 | Atotech Deutschland Gmbh | Verfahren zum elektrolytischen Abscheiden einer Metallschicht auf elektrisch nichtleitenden Oberflächen |
US7803457B2 (en) | 2003-12-29 | 2010-09-28 | General Electric Company | Composite coatings for groundwall insulation, method of manufacture thereof and articles derived therefrom |
CN100590751C (zh) * | 2004-09-02 | 2010-02-17 | 积水化学工业株式会社 | 导电性微粒以及各向异性导电材料 |
CN103422079B (zh) | 2012-05-22 | 2016-04-13 | 比亚迪股份有限公司 | 一种化学镀铜液及其制备方法 |
Family Cites Families (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3489576A (en) * | 1966-08-04 | 1970-01-13 | Gen Motors Corp | Chemical nickel plating |
US4483711A (en) * | 1983-06-17 | 1984-11-20 | Omi International Corporation | Aqueous electroless nickel plating bath and process |
US4983428A (en) * | 1988-06-09 | 1991-01-08 | United Technologies Corporation | Ethylenethiourea wear resistant electroless nickel-boron coating compositions |
KR960005765A (ko) * | 1994-07-14 | 1996-02-23 | 모리시다 요이치 | 반도체 장치의 배선형성에 이용하는 무전해 도금욕 및 반도체 장치의 배선성형방법 |
TW390915B (en) * | 1995-10-23 | 2000-05-21 | Uyemura C & Co Ltd | Electroless nickel plating solution and method |
-
1997
- 1997-08-06 DE DE19733991A patent/DE19733991A1/de not_active Withdrawn
-
1998
- 1998-07-31 AT AT98114391T patent/ATE210207T1/de not_active IP Right Cessation
- 1998-07-31 DE DE59802304T patent/DE59802304D1/de not_active Expired - Fee Related
- 1998-07-31 EP EP98114391A patent/EP0897998B1/de not_active Expired - Lifetime
Also Published As
Publication number | Publication date |
---|---|
DE19733991A1 (de) | 1999-02-11 |
ATE210207T1 (de) | 2001-12-15 |
EP0897998B1 (de) | 2001-12-05 |
EP0897998A3 (de) | 1999-05-12 |
EP0897998A2 (de) | 1999-02-24 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
8364 | No opposition during term of opposition | ||
8339 | Ceased/non-payment of the annual fee |