DE50012452D1 - Projektionsobjektiv mit benachbart angeordneten asphärischen linsenoberflächen - Google Patents

Projektionsobjektiv mit benachbart angeordneten asphärischen linsenoberflächen

Info

Publication number
DE50012452D1
DE50012452D1 DE50012452T DE50012452T DE50012452D1 DE 50012452 D1 DE50012452 D1 DE 50012452D1 DE 50012452 T DE50012452 T DE 50012452T DE 50012452 T DE50012452 T DE 50012452T DE 50012452 D1 DE50012452 D1 DE 50012452D1
Authority
DE
Germany
Prior art keywords
lens
aspharic
adjustable
projection lens
projection
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE50012452T
Other languages
German (de)
English (en)
Inventor
R Shafer
Karl-Heinz Schuster
Helmut Beierl
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Carl Zeiss SMT GmbH
Original Assignee
Carl Zeiss SMT GmbH
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from DE2000102626 external-priority patent/DE10002626A1/de
Application filed by Carl Zeiss SMT GmbH filed Critical Carl Zeiss SMT GmbH
Priority to DE50012452T priority Critical patent/DE50012452D1/de
Application granted granted Critical
Publication of DE50012452D1 publication Critical patent/DE50012452D1/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B17/00—Systems with reflecting surfaces, with or without refracting elements
    • G02B17/08—Catadioptric systems
    • G02B17/0892—Catadioptric systems specially adapted for the UV
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B13/00—Optical objectives specially designed for the purposes specified below
    • G02B13/14—Optical objectives specially designed for the purposes specified below for use with infrared or ultraviolet radiation
    • G02B13/143—Optical objectives specially designed for the purposes specified below for use with infrared or ultraviolet radiation for use with ultraviolet radiation
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B13/00—Optical objectives specially designed for the purposes specified below
    • G02B13/18—Optical objectives specially designed for the purposes specified below with lenses having one or more non-spherical faces, e.g. for reducing geometrical aberration
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B17/00—Systems with reflecting surfaces, with or without refracting elements
    • G02B17/08—Catadioptric systems
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B3/00—Simple or compound lenses
    • G02B3/12—Fluid-filled or evacuated lenses
    • G02B3/14—Fluid-filled or evacuated lenses of variable focal length
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70225—Optical aspects of catadioptric systems, i.e. comprising reflective and refractive elements
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70241—Optical aspects of refractive lens systems, i.e. comprising only refractive elements
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70858—Environment aspects, e.g. pressure of beam-path gas, temperature
    • G03F7/70883—Environment aspects, e.g. pressure of beam-path gas, temperature of optical system
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70908—Hygiene, e.g. preventing apparatus pollution, mitigating effect of pollution or removing pollutants from apparatus
    • G03F7/70933—Purge, e.g. exchanging fluid or gas to remove pollutants
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/7095—Materials, e.g. materials for housing, stage or other support having particular properties, e.g. weight, strength, conductivity, thermal expansion coefficient
    • G03F7/70958—Optical materials or coatings, e.g. with particular transmittance, reflectance or anti-reflection properties
    • G03F7/70966—Birefringence

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Health & Medical Sciences (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Engineering & Computer Science (AREA)
  • Toxicology (AREA)
  • Environmental & Geological Engineering (AREA)
  • Atmospheric Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Lenses (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
DE50012452T 1999-12-29 2000-12-22 Projektionsobjektiv mit benachbart angeordneten asphärischen linsenoberflächen Expired - Fee Related DE50012452D1 (de)

Priority Applications (1)

Application Number Priority Date Filing Date Title
DE50012452T DE50012452D1 (de) 1999-12-29 2000-12-22 Projektionsobjektiv mit benachbart angeordneten asphärischen linsenoberflächen

Applications Claiming Priority (5)

Application Number Priority Date Filing Date Title
US17352399P 1999-12-29 1999-12-29
DE2000102626 DE10002626A1 (de) 2000-01-22 2000-01-22 Katadioptrisches Objektiv mit Asphären
DE10021739 2000-05-04
PCT/EP2000/013148 WO2001050171A1 (de) 1999-12-29 2000-12-22 Projektionsobjektiv mit benachbart angeordneten asphärischen linsenoberflächen
DE50012452T DE50012452D1 (de) 1999-12-29 2000-12-22 Projektionsobjektiv mit benachbart angeordneten asphärischen linsenoberflächen

Publications (1)

Publication Number Publication Date
DE50012452D1 true DE50012452D1 (de) 2006-05-11

Family

ID=27213593

Family Applications (1)

Application Number Title Priority Date Filing Date
DE50012452T Expired - Fee Related DE50012452D1 (de) 1999-12-29 2000-12-22 Projektionsobjektiv mit benachbart angeordneten asphärischen linsenoberflächen

Country Status (6)

Country Link
US (3) US6646718B2 (https=)
EP (1) EP1242843B1 (https=)
JP (1) JP2003535356A (https=)
KR (1) KR100854052B1 (https=)
DE (1) DE50012452D1 (https=)
WO (1) WO2001050171A1 (https=)

Families Citing this family (39)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE19939088A1 (de) * 1998-08-18 2000-02-24 Nikon Corp Belichtungsvorrichtung und -verfahren
EP1094350A3 (en) * 1999-10-21 2001-08-16 Carl Zeiss Optical projection lens system
WO2001050171A1 (de) * 1999-12-29 2001-07-12 Carl Zeiss Projektionsobjektiv mit benachbart angeordneten asphärischen linsenoberflächen
WO2002052303A2 (de) * 2000-12-22 2002-07-04 Carl Zeiss Smt Ag Projektionsobjektiv
KR20030072568A (ko) * 2000-12-22 2003-09-15 칼-짜이스-스티프퉁 트레이딩 에즈 칼 짜이스 하나 이상의 비구면 렌즈를 갖는 대물렌즈
JP2002244034A (ja) 2001-02-21 2002-08-28 Nikon Corp 投影光学系および該投影光学系を備えた露光装置
JP2002323652A (ja) 2001-02-23 2002-11-08 Nikon Corp 投影光学系，該投影光学系を備えた投影露光装置および投影露光方法
US7239447B2 (en) 2001-05-15 2007-07-03 Carl Zeiss Smt Ag Objective with crystal lenses
KR20040015251A (ko) 2001-05-15 2004-02-18 칼 짜이스 에스엠티 아게 불화물 결정 렌즈들을 포함하는 렌즈 시스템
DE10123725A1 (de) 2001-05-15 2002-11-21 Zeiss Carl Projektionsbelichtungsanlage der Mikrolithographie, Optisches System und Herstellverfahren
DE10151309A1 (de) * 2001-10-17 2003-05-08 Carl Zeiss Semiconductor Mfg S Projektionsbelichtungsanlage der Mikrolithographie für Lambda <200 nm
DE10162796B4 (de) * 2001-12-20 2007-10-31 Carl Zeiss Smt Ag Verfahren zur Optimierung der Abbildungseigenschaften von mindestens zwei optischen Elementen sowie photolithographisches Fertigungsverfahren
US7190527B2 (en) 2002-03-01 2007-03-13 Carl Zeiss Smt Ag Refractive projection objective
EP1483626A2 (de) * 2002-03-01 2004-12-08 Carl Zeiss SMT AG Refraktives projektionsobjektiv
US20050094268A1 (en) * 2002-03-14 2005-05-05 Carl Zeiss Smt Ag Optical system with birefringent optical elements
US7292388B2 (en) 2002-05-08 2007-11-06 Carl Zeiss Smt Ag Lens made of a crystalline material
EP1523692A2 (en) * 2002-07-18 2005-04-20 Carl Zeiss SMT AG Catadioptric projection objective
WO2004023184A1 (en) * 2002-09-03 2004-03-18 Carl Zeiss Smt Ag Objective with birefringent lenses
AU2003298405A1 (en) 2002-09-03 2004-03-29 Carl Zeiss Smt Ag Optimization method for an objective with fluoride crystal lenses and objective with fluoride crystal lenses
EP1537449A1 (de) * 2002-09-09 2005-06-08 Carl Zeiss SMT AG Katadioptrisches projektionsobjektiv sowie verfahren zur kompensation der intrinsischen doppelbrechung in einem solchen
TWI305872B (en) 2003-03-17 2009-02-01 Nikon Corp Optical projection system, light-exposure apparatus and light-exposure method
JP2005017734A (ja) * 2003-06-26 2005-01-20 Nikon Corp 投影光学系、露光装置、およびデバイス製造方法
US7085075B2 (en) * 2003-08-12 2006-08-01 Carl Zeiss Smt Ag Projection objectives including a plurality of mirrors with lenses ahead of mirror M3
WO2005033800A1 (de) 2003-09-09 2005-04-14 Carl Zeiss Smt Ag Lithographie-objektiv und projektionsbelichtungsanlage mit mindestens einem solchen lithographie-objektiv
US8208198B2 (en) 2004-01-14 2012-06-26 Carl Zeiss Smt Gmbh Catadioptric projection objective
US7177087B2 (en) * 2003-10-28 2007-02-13 Leupold & Stevens, Inc. Compound asperic ocular for riflescope
JP2007516613A (ja) 2003-12-15 2007-06-21 カール・ツアイス・エスエムテイ・アーゲー 少なくとも１つの液体レンズを備えるマイクロリソグラフィー投影対物レンズとしての対物レンズ
US20080151364A1 (en) 2004-01-14 2008-06-26 Carl Zeiss Smt Ag Catadioptric projection objective
CN100592210C (zh) 2004-02-13 2010-02-24 卡尔蔡司Smt股份公司 微平版印刷投影曝光装置的投影物镜
KR101376931B1 (ko) 2004-05-17 2014-03-25 칼 짜이스 에스엠티 게엠베하 중간이미지를 갖는 카타디옵트릭 투사 대물렌즈
US7511798B2 (en) 2004-07-30 2009-03-31 Asml Holding N.V. Off-axis catadioptric projection optical system for lithography
US7301707B2 (en) * 2004-09-03 2007-11-27 Carl Zeiss Smt Ag Projection optical system and method
US20080123074A1 (en) * 2004-11-10 2008-05-29 Nikon Corporation Projection Optical System, Exposure Equipment and Exposure Method
TWI454731B (zh) * 2005-05-27 2014-10-01 卡爾蔡司Ｓｍｔ有限公司 用於改進投影物鏡的成像性質之方法以及該投影物鏡
EP1746463A2 (de) * 2005-07-01 2007-01-24 Carl Zeiss SMT AG Verfahren zum Korrigieren eines lithographischen Projektionsobjektivs und derartiges Projektionsobjektiv
TWI305107B (en) * 2005-09-29 2009-01-01 Young Optics Inc Optical projection apparatus
DE102008015775A1 (de) 2007-04-16 2008-12-18 Carl Zeiss Smt Ag Chromatisch korrigiertes Lithographieobjektiv
US7929115B2 (en) * 2007-06-01 2011-04-19 Carl Zeiss Smt Gmbh Projection objective and projection exposure apparatus for microlithography
WO2011141046A1 (en) * 2010-04-23 2011-11-17 Carl Zeiss Smt Gmbh Process of operating a lithographic system comprising a manipulation of an optical element of the lithographic system

Family Cites Families (33)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4871237A (en) 1983-07-27 1989-10-03 Nikon Corporation Method and apparatus for adjusting imaging performance of projection optical apparatus
US4861148A (en) * 1986-03-12 1989-08-29 Matsushita Electric Industrial Co., Inc. Projection optical system for use in precise copy
US4757354A (en) * 1986-05-02 1988-07-12 Matsushita Electrical Industrial Co., Ltd. Projection optical system
EP0332201B1 (en) * 1988-03-11 1994-06-29 Matsushita Electric Industrial Co., Ltd. Optical projection system
SU1587461A1 (ru) 1988-08-03 1990-08-23 Предприятие П/Я Р-6495 Проекционный объектив с увеличением -1/5 @
JP2548359B2 (ja) * 1989-03-01 1996-10-30 松下電器産業株式会社 投影レンズとそれを用いたプロジェクションテレビ
US4963007A (en) * 1989-09-05 1990-10-16 U.S. Precision Lens, Inc. Color corrected projection lens
JP3041939B2 (ja) 1990-10-22 2000-05-15 株式会社ニコン 投影レンズ系
JP3454390B2 (ja) * 1995-01-06 2003-10-06 株式会社ニコン 投影光学系、投影露光装置及び投影露光方法
US5724121A (en) * 1995-05-12 1998-03-03 Hughes Danbury Optical Systems, Inc. Mounting member method and apparatus with variable length supports
JPH103039A (ja) * 1996-06-14 1998-01-06 Nikon Corp 反射屈折光学系
JP4192279B2 (ja) * 1996-09-27 2008-12-10 株式会社ニコン 投影光学系の製造方法、該製造方法によって製造された投影光学系、投影露光装置および方法、並びに半導体装置の製造方法
DE69728126T2 (de) * 1996-12-28 2005-01-20 Canon K.K. Projektionsbelichtungsapparat und Verfahren zur Herstellung einer Vorrichtung
JPH10197791A (ja) * 1997-01-13 1998-07-31 Canon Inc 投影レンズ
US5999331A (en) * 1997-02-07 1999-12-07 Minolta Co., Ltd. Zoom lens system
DE19818444A1 (de) * 1997-04-25 1998-10-29 Nikon Corp Abbildungsoptik, Projektionsoptikvorrichtung und Projektionsbelichtungsverfahren
JPH10325922A (ja) * 1997-05-26 1998-12-08 Nikon Corp 投影光学系
US5990926A (en) * 1997-07-16 1999-11-23 Nikon Corporation Projection lens systems for excimer laser exposure lithography
JPH1195098A (ja) 1997-09-16 1999-04-09 Nitto Kogaku Kk 投写用ズームレンズおよびプロジェクタ装置
JP4083856B2 (ja) * 1998-02-18 2008-04-30 リコー光学株式会社 投射用ズームレンズ
US6166864A (en) * 1998-03-10 2000-12-26 Canon Kabushiki Kaisha Zoom lens and optical apparatus using the same
EP1079253A4 (en) * 1998-04-07 2004-09-01 Nikon Corp DEVICE AND PROCESS FOR PROJECTION EXPOSURE, AND OPTICAL SYSTEM WITH REFLECTION AND REFRACTION
JP2000195772A (ja) * 1998-12-25 2000-07-14 Nikon Corp 投影露光装置
JPH11307443A (ja) * 1998-04-24 1999-11-05 Canon Inc 投影露光装置及びそれを用いたデバイスの製造方法
DE19939088A1 (de) 1998-08-18 2000-02-24 Nikon Corp Belichtungsvorrichtung und -verfahren
JP4345232B2 (ja) * 1998-12-25 2009-10-14 株式会社ニコン 反射屈折結像光学系および該光学系を備えた投影露光装置
JP3423644B2 (ja) * 1999-06-14 2003-07-07 キヤノン株式会社 投影光学系及びそれを用いた投影露光装置
JP3359302B2 (ja) * 1999-06-14 2002-12-24 キヤノン株式会社 投影露光装置
US6867922B1 (en) * 1999-06-14 2005-03-15 Canon Kabushiki Kaisha Projection optical system and projection exposure apparatus using the same
JP4717974B2 (ja) * 1999-07-13 2011-07-06 株式会社ニコン 反射屈折光学系及び該光学系を備える投影露光装置
EP1094350A3 (en) * 1999-10-21 2001-08-16 Carl Zeiss Optical projection lens system
WO2001050171A1 (de) * 1999-12-29 2001-07-12 Carl Zeiss Projektionsobjektiv mit benachbart angeordneten asphärischen linsenoberflächen
US6542723B1 (en) * 2000-02-11 2003-04-01 Lucent Technologies Inc. Optoelectronic phase locked loop with balanced photodetection for clock recovery in high-speed optical time division multiplexed systems

Also Published As

Publication number Publication date
US20050157400A1 (en) 2005-07-21
US20040233409A1 (en) 2004-11-25
KR20020064364A (ko) 2002-08-07
US6903802B2 (en) 2005-06-07
WO2001050171A1 (de) 2001-07-12
US6646718B2 (en) 2003-11-11
KR100854052B1 (ko) 2008-08-26
JP2003535356A (ja) 2003-11-25
EP1242843A1 (de) 2002-09-25
US7154678B2 (en) 2006-12-26
US20030179356A1 (en) 2003-09-25
EP1242843B1 (de) 2006-03-22

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