DE4035073C1 - - Google Patents

Info

Publication number
DE4035073C1
DE4035073C1 DE19904035073 DE4035073A DE4035073C1 DE 4035073 C1 DE4035073 C1 DE 4035073C1 DE 19904035073 DE19904035073 DE 19904035073 DE 4035073 A DE4035073 A DE 4035073A DE 4035073 C1 DE4035073 C1 DE 4035073C1
Authority
DE
Germany
Prior art keywords
substrate
gas
particles
gas pulses
pulses
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE19904035073
Other languages
German (de)
English (en)
Inventor
Herbert Dr. 6200 Wiesbaden De Stafast
Werner Dr. 6370 Oberursel De Reiland
Marco 6300 Giessen De Diegel
Erik Von Der 6246 Glashuetten De Burg
Wolfgang Prof. Dr. 6240 Koenigstein De Grill
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Battelle-Institut
Original Assignee
Battelle-Institut
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Battelle-Institut filed Critical Battelle-Institut
Priority to DE19904035073 priority Critical patent/DE4035073C1/de
Priority to EP19910118473 priority patent/EP0484809A3/de
Priority to JP31329191A priority patent/JPH05230635A/ja
Application granted granted Critical
Publication of DE4035073C1 publication Critical patent/DE4035073C1/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C23C14/32—Vacuum evaporation by explosion; by evaporation and subsequent ionisation of the vapours, e.g. ion-plating
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/0021—Reactive sputtering or evaporation
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C23C14/28—Vacuum evaporation by wave energy or particle radiation

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Health & Medical Sciences (AREA)
  • Toxicology (AREA)
  • Physical Vapour Deposition (AREA)
  • Inorganic Compounds Of Heavy Metals (AREA)
  • Superconductor Devices And Manufacturing Methods Thereof (AREA)
  • Inorganic Insulating Materials (AREA)
DE19904035073 1990-11-05 1990-11-05 Expired - Lifetime DE4035073C1 (enExample)

Priority Applications (3)

Application Number Priority Date Filing Date Title
DE19904035073 DE4035073C1 (enExample) 1990-11-05 1990-11-05
EP19910118473 EP0484809A3 (en) 1990-11-05 1991-10-30 Process for obtaining a coating by deposition, in particular by laser or pseudo-spark ablation
JP31329191A JPH05230635A (ja) 1990-11-05 1991-11-01 レーザーまたは擬閃光剥離による膜の形成方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE19904035073 DE4035073C1 (enExample) 1990-11-05 1990-11-05

Publications (1)

Publication Number Publication Date
DE4035073C1 true DE4035073C1 (enExample) 1992-03-05

Family

ID=6417634

Family Applications (1)

Application Number Title Priority Date Filing Date
DE19904035073 Expired - Lifetime DE4035073C1 (enExample) 1990-11-05 1990-11-05

Country Status (3)

Country Link
EP (1) EP0484809A3 (enExample)
JP (1) JPH05230635A (enExample)
DE (1) DE4035073C1 (enExample)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE4340752A1 (de) * 1992-11-30 1994-06-01 Mitsubishi Electric Corp Vorrichtung zur Ausbildung einer Dünnschicht unter Verwendung eines Lasers
AT402945B (de) * 1995-07-03 1997-09-25 Joanneum Research Forschungsge Verfahren und vorrichtung zur beschichtung der oberfläche eines substrats

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
AU8070294A (en) * 1993-07-15 1995-02-13 President And Fellows Of Harvard College Extended nitride material comprising beta -c3n4
GB9519546D0 (en) * 1995-09-25 1995-11-29 Gec Marconi Avionics Holdings Depositing optical coatings

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4428812A (en) * 1983-04-04 1984-01-31 Borg-Warner Corporation Rapid rate reactive sputtering of metallic compounds
DE3834402C1 (enExample) * 1988-10-10 1989-05-03 Kernforschungszentrum Karlsruhe Gmbh, 7500 Karlsruhe, De
DE3737142A1 (de) * 1987-11-02 1989-05-11 Christiansen Jens Erzeugung von (duennen) schichten aus hochschmelzender bzw. sublimierender materie (leitender, halbleitender und nichtleitender) und gemischen davon mit pseudofunkenelektronenstrahlen

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE3610294A1 (de) * 1985-03-26 1986-10-02 Canon Kk Verfahren zum steuern der temperatur eines stroms feiner partikel
WO1988002790A1 (en) * 1986-10-15 1988-04-21 Hughes Aircraft Company Process and apparatus for film deposition utilizing volatile clusters

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4428812A (en) * 1983-04-04 1984-01-31 Borg-Warner Corporation Rapid rate reactive sputtering of metallic compounds
DE3737142A1 (de) * 1987-11-02 1989-05-11 Christiansen Jens Erzeugung von (duennen) schichten aus hochschmelzender bzw. sublimierender materie (leitender, halbleitender und nichtleitender) und gemischen davon mit pseudofunkenelektronenstrahlen
DE3834402C1 (enExample) * 1988-10-10 1989-05-03 Kernforschungszentrum Karlsruhe Gmbh, 7500 Karlsruhe, De

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE4340752A1 (de) * 1992-11-30 1994-06-01 Mitsubishi Electric Corp Vorrichtung zur Ausbildung einer Dünnschicht unter Verwendung eines Lasers
US5622567A (en) * 1992-11-30 1997-04-22 Mitsubishi Denki Kabushiki Kaisha Thin film forming apparatus using laser
US5760366A (en) * 1992-11-30 1998-06-02 Mitsubishi Denki Kabushiki Kaisha Thin film forming apparatus using laser and magnetic field
US6033741A (en) * 1992-11-30 2000-03-07 Mitsubishi Denki Kabushiki Kaisha Thin film forming apparatus using laser
US6110291A (en) * 1992-11-30 2000-08-29 Mitsubishi Denki Kabushiki Kaisha Thin film forming apparatus using laser
AT402945B (de) * 1995-07-03 1997-09-25 Joanneum Research Forschungsge Verfahren und vorrichtung zur beschichtung der oberfläche eines substrats

Also Published As

Publication number Publication date
EP0484809A3 (en) 1992-08-05
JPH05230635A (ja) 1993-09-07
EP0484809A2 (de) 1992-05-13

Similar Documents

Publication Publication Date Title
EP0275018B1 (de) Verfahren und Vorrichtung zum Beschichten elektrisch leitender Gegenstände mittels Glimmentladung
EP0442163B1 (de) Verfahren zum Herstellen von ultrafeinen Partikeln und deren Verwendung
DE3816192C2 (enExample)
DE68915012T2 (de) Anlage zur Erzeugung von Dünnschichten und Ionenquelle unter Anwendung von Plasmazerstäubung.
DE3852912T2 (de) Verfahren und Gerät zur Kathodenzerstäubung.
DE4340752C2 (de) Vorrichtung zur Herstellung einer gleichförmigen Dünnschicht auf einer großen Substratfläche unter Verwendung eines Lasers
EP0285745B1 (de) Verfahren und Vorrichtungen zum Vakuumbeschichten mittels einer elektrischen Bogenentladung
DE4217450C2 (de) Ionenbedampfungsverfahren und -vorrichtung
DE69312307T2 (de) Verfahren zum herstellen von dünnschichten durch gepulste excimerlaser-verdampfung
WO1989009293A2 (en) Device and process for producing a thin layer on a substrate
DE2547552B2 (de) Schichtaufdampfverfahren und -einrichtung
DE3027572A1 (de) Verfahren zum herstellen eines berylliumoxid-filmes und nach diesem verfahren hergestellter berylliumoxid- film
EP0363554B1 (de) Verfahren und Vorrichtung zur Erzeugung epitaktisch und/oder hochtexturiert gewachsener, fremdphasenarmer Filme von Hoch-Tc-Oxidsupraleitern auf Substraten
DE4142103C2 (de) Vorrichtung zur ionenclusterstrahl-bedampfung
DE3901401C2 (de) Verfahren zur Steuerung einer Vakuum-Lichtbogenentladung
EP0484809A2 (de) Verfahren zur Schichtherstellung mittels Abscheidung, insbesondere aus Laser- oder Pseudofunken-Ablation
DE4102380C1 (en) High temp. superconductor film mfr. - by heating substrate with laser beam
DE3925085C1 (enExample)
DE4000739A1 (de) Verfahren zum herstellen von mehrkomponentigen materialien
EP1161570B1 (de) Verfahren zur beschichtung eines trägerkörpers mit einem hartmagnetischen se-fe-b-material mittels plasmaspritzens
EP0389506B1 (de) Verfahren zum erzeugen dünner schichten aus hochschmelzendem oder bei hoher temperatur sublimierendem material welches aus unterschiedlichen chemischen verbindungen zusammengesetzt ist auf einem substrat
DE19538110A1 (de) Verfahren und Vorrichtung zum Erzeugen dünner Schichten aus diamantartigem Kohlenstoff auf einem Substrat nach Beschluß eines Targets mit gepulsten Elektronenstrahlen (Pseudofunkenelektronenstrahlen)
DE19500882C1 (de) Verfahren zur Herstellung von verschleißfesten farbigen Schichten
DE19631101C2 (de) Beschichtungsapparatur für oxidische Materialien
DE69205645T2 (de) Verfahren zur Herstellung einer supraleitenden Dünnschicht aus Oxydverbindungen.

Legal Events

Date Code Title Description
8100 Publication of the examined application without publication of unexamined application
D1 Grant (no unexamined application published) patent law 81
8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee