DE3885575D1 - Vorrichtung zur Analyse mittels Röntgenstrahlen. - Google Patents

Vorrichtung zur Analyse mittels Röntgenstrahlen.

Info

Publication number
DE3885575D1
DE3885575D1 DE88119611T DE3885575T DE3885575D1 DE 3885575 D1 DE3885575 D1 DE 3885575D1 DE 88119611 T DE88119611 T DE 88119611T DE 3885575 T DE3885575 T DE 3885575T DE 3885575 D1 DE3885575 D1 DE 3885575D1
Authority
DE
Germany
Prior art keywords
analysis device
ray analysis
ray
analysis
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE88119611T
Other languages
English (en)
Other versions
DE3885575T2 (de
Inventor
Naoki Yamamoto
Yukio Takano
Yoshinori Hosokawa
Kenji Yoshino
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Horiba Ltd
Hitachi Ltd
Original Assignee
Horiba Ltd
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Horiba Ltd, Hitachi Ltd filed Critical Horiba Ltd
Publication of DE3885575D1 publication Critical patent/DE3885575D1/de
Application granted granted Critical
Publication of DE3885575T2 publication Critical patent/DE3885575T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N23/00—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00
    • G01N23/20—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by using diffraction of the radiation by the materials, e.g. for investigating crystal structure; by using scattering of the radiation by the materials, e.g. for investigating non-crystalline materials; by using reflection of the radiation by the materials
    • G01N23/207—Diffractometry using detectors, e.g. using a probe in a central position and one or more displaceable detectors in circumferential positions
    • G01N23/2076—Diffractometry using detectors, e.g. using a probe in a central position and one or more displaceable detectors in circumferential positions for spectrometry, i.e. using an analysing crystal, e.g. for measuring X-ray fluorescence spectrum of a sample with wavelength-dispersion, i.e. WDXFS
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N23/00—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00
    • G01N23/22—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by measuring secondary emission from the material
    • G01N23/2206—Combination of two or more measurements, at least one measurement being that of secondary emission, e.g. combination of secondary electron [SE] measurement and back-scattered electron [BSE] measurement
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N23/00—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00
    • G01N23/22—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by measuring secondary emission from the material
    • G01N23/223—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by measuring secondary emission from the material by irradiating the sample with X-rays or gamma-rays and by measuring X-ray fluorescence

Landscapes

  • Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • General Health & Medical Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Biochemistry (AREA)
  • General Physics & Mathematics (AREA)
  • Immunology (AREA)
  • Pathology (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Dispersion Chemistry (AREA)
  • Analysing Materials By The Use Of Radiation (AREA)
DE3885575T 1987-11-27 1988-11-24 Vorrichtung zur Analyse mittels Röntgenstrahlen. Expired - Fee Related DE3885575T2 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP62297754A JP2742415B2 (ja) 1987-11-27 1987-11-27 Ｘ線分析装置

Publications (2)

Publication Number Publication Date
DE3885575D1 true DE3885575D1 (de) 1993-12-16
DE3885575T2 DE3885575T2 (de) 1994-05-26

Family

ID=17850741

Family Applications (1)

Application Number Title Priority Date Filing Date
DE3885575T Expired - Fee Related DE3885575T2 (de) 1987-11-27 1988-11-24 Vorrichtung zur Analyse mittels Röntgenstrahlen.

Country Status (4)

Country Link
US (1) US4916720A (de)
EP (1) EP0318012B1 (de)
JP (1) JP2742415B2 (de)
DE (1) DE3885575T2 (de)

Families Citing this family (42)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5249216B1 (en) * 1989-10-19 1996-11-05 Sumitomo Electric Industries Total reflection x-ray fluorescence apparatus
US5220591A (en) * 1989-10-19 1993-06-15 Sumitomo Electric Industries, Ltd. Total reflection X-ray fluorescence apparatus
JP2670394B2 (ja) * 1991-08-14 1997-10-29 財団法人国際超電導産業技術研究センター 表面分析方法および表面分析装置
DE69232214T2 (de) * 1991-07-11 2002-05-08 Int Superconductivity Tech Einrichtung zur Oberflächenanalyse mittels Röntgenspektroskopie
DE69403129T2 (de) * 1993-03-25 1997-08-28 Seiko Instr Inc Röntgenstrahlen-Analysegerät
DE4408057B4 (de) * 1994-03-07 2008-12-24 Ifg-Institute For Scientific Instruments Gmbh Vorrichtung zur Röntgenfluoreszenzspektroskopie und deren Verwendung
US5747821A (en) * 1995-08-04 1998-05-05 X-Ray Optical Systems, Inc. Radiation focusing monocapillary with constant inner dimension region and varying inner dimension region
DE19536822A1 (de) * 1995-09-20 1997-04-10 Ifg Inst Fuer Geraetebau Gmbh Verfahren und Vorrichtung zur Röntgenenergiefilterung
WO1997013142A1 (en) * 1995-10-03 1997-04-10 Philips Electronics N.V. Apparatus for simultaneous x-ray diffraction and x-ray fluorescence measurements
DE29517080U1 (de) * 1995-10-30 1997-03-06 Fraunhofer Ges Forschung Vorrichtung für die Röntgenfluoreszenzmikroskopie
JPH09329557A (ja) * 1996-06-11 1997-12-22 Seiko Instr Inc マイクロ蛍光ｘ線分析装置
JP3531098B2 (ja) * 1998-12-28 2004-05-24 理学電機工業株式会社 蛍光ｘ線分析装置
US6345086B1 (en) 1999-09-14 2002-02-05 Veeco Instruments Inc. X-ray fluorescence system and method
US6381303B1 (en) * 1999-09-29 2002-04-30 Jordan Valley Applied Radiation Ltd. X-ray microanalyzer for thin films
US6389102B2 (en) 1999-09-29 2002-05-14 Jordan Valley Applied Radiation Ltd. X-ray array detector
GB9927555D0 (en) * 1999-11-23 2000-01-19 Bede Scient Instr Ltd X-ray fluorescence apparatus
GB0031040D0 (en) * 2000-12-20 2001-01-31 Koninkl Philips Electronics Nv X-ray diffractometer
CN1246858C (zh) * 2001-06-19 2006-03-22 X射线光学系统公司 X射线荧光(xrf)光谱测定系统和方法
GB0201773D0 (en) * 2002-01-25 2002-03-13 Isis Innovation X-ray diffraction method
EP1650558B1 (de) * 2003-07-11 2010-09-08 Waseda University Röntgenbeugungs-/-spektralvorrichtung vom energiedispersionstyp
RU2239178C1 (ru) * 2003-08-22 2004-10-27 Общество с ограниченной ответственностью "Институт рентгеновской оптики" Способ определения наличия упругих деформаций в монокристаллических пластинах и устройство для его осуществления
US7068753B2 (en) * 2004-07-30 2006-06-27 Jordan Valley Applied Radiation Ltd. Enhancement of X-ray reflectometry by measurement of diffuse reflections
US7804934B2 (en) 2004-12-22 2010-09-28 Jordan Valley Semiconductors Ltd. Accurate measurement of layer dimensions using XRF
US7103142B1 (en) * 2005-02-24 2006-09-05 Jordan Valley Applied Radiation Ltd. Material analysis using multiple X-ray reflectometry models
KR101374308B1 (ko) * 2005-12-23 2014-03-14 조르단 밸리 세미컨덕터즈 리미티드 Ｘｒｆ를 사용한 층 치수의 정밀 측정법
US20070274447A1 (en) * 2006-05-15 2007-11-29 Isaac Mazor Automated selection of X-ray reflectometry measurement locations
JP5100063B2 (ja) * 2006-08-29 2012-12-19 エスアイアイ・ナノテクノロジー株式会社 Ｘ線分析装置
IL180482A0 (en) * 2007-01-01 2007-06-03 Jordan Valley Semiconductors Inspection of small features using x - ray fluorescence
GB2447252B (en) * 2007-03-06 2012-03-14 Thermo Fisher Scientific Inc X-ray analysis instrument
US7680243B2 (en) * 2007-09-06 2010-03-16 Jordan Valley Semiconductors Ltd. X-ray measurement of properties of nano-particles
GB2476255B (en) * 2009-12-17 2012-03-07 Thermo Fisher Scient Ecublens Sarl Method and apparatus for performing x-ray analysis of a sample
CN101936929B (zh) * 2010-07-27 2012-05-23 中国石化集团华北石油局 X射线荧光元素分析装置及其录井仪
JP5838109B2 (ja) * 2011-05-13 2015-12-24 株式会社リガク 複合ｘ線分析装置
US9390984B2 (en) 2011-10-11 2016-07-12 Bruker Jv Israel Ltd. X-ray inspection of bumps on a semiconductor substrate
JP5835191B2 (ja) * 2012-11-16 2015-12-24 パルステック工業株式会社 回折環形成装置及び回折環形成システム
RU2524792C1 (ru) * 2013-01-09 2014-08-10 Федеральное государственное бюджетное учреждение науки Институт физики микроструктур Российской академии наук (ИФМ РАН) Устройство для осуществления контроля шероховатости поверхности
JP5967394B2 (ja) * 2013-02-21 2016-08-10 パルステック工業株式会社 回折環形成装置及びｘ線回折測定装置
CN103207197B (zh) * 2013-03-01 2015-03-18 中华人民共和国山东出入境检验检疫局 一种铜矿石中铜含量的x射线荧光光谱分析方法
US9389192B2 (en) 2013-03-24 2016-07-12 Bruker Jv Israel Ltd. Estimation of XRF intensity from an array of micro-bumps
CN103472081B (zh) * 2013-09-27 2016-03-30 四川新先达测控技术有限公司 一种自动化能量色散x荧光分析测试平台
US9632043B2 (en) 2014-05-13 2017-04-25 Bruker Jv Israel Ltd. Method for accurately determining the thickness and/or elemental composition of small features on thin-substrates using micro-XRF
US9829448B2 (en) 2014-10-30 2017-11-28 Bruker Jv Israel Ltd. Measurement of small features using XRF

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3344274A (en) * 1967-09-26 Ray analysis apparatus having both diffraction amd spectrometer tubes mounted on a common housing
US3440419A (en) * 1966-02-03 1969-04-22 California Inst Res Found Dual purpose optical instrument capable of simultaneously acting as spectrometer and diffractometer
GB1247670A (en) * 1967-11-29 1971-09-29 Nat Res Dev Spectrometers
IL41592A (en) * 1973-02-20 1976-02-29 Tech Res & Dev Found Ltd X-ray spectrodiffractometer
US4143275A (en) * 1977-09-28 1979-03-06 Battelle Memorial Institute Applying radiation
US4263510A (en) * 1979-07-30 1981-04-21 General Electric Company Combined x-ray diffraction and fluorescence spectroscopy apparatus with environmentally controllable chamber
JPS57125834A (en) * 1981-01-22 1982-08-05 Le Nauchinoopuroizubuodosutobu Fluorescent x rays spectrometer
JPS57197454A (en) * 1981-05-29 1982-12-03 Rigaku Denki Kogyo Kk X-ray analysing apparatus
JPS62106352A (ja) * 1985-11-01 1987-05-16 Natl Inst For Res In Inorg Mater 走査型ｘ線顕微鏡
DE68907924T2 (de) * 1988-01-20 1993-11-11 Horiba Ltd Röntgenstrahlvorrichtung, ausgestattet mit einem Strahlungsbereich-Monitor.

Also Published As

Publication number Publication date
EP0318012A3 (en) 1990-05-23
JPH01141343A (ja) 1989-06-02
JP2742415B2 (ja) 1998-04-22
EP0318012A2 (de) 1989-05-31
EP0318012B1 (de) 1993-11-10
US4916720A (en) 1990-04-10
DE3885575T2 (de) 1994-05-26

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8328 Change in the person/name/address of the agent

Free format text: PATENTANWAELTE MUELLER & HOFFMANN, 81667 MUENCHEN

8339 Ceased/non-payment of the annual fee