DE69232214T2 - Einrichtung zur Oberflächenanalyse mittels Röntgenspektroskopie - Google Patents

Einrichtung zur Oberflächenanalyse mittels Röntgenspektroskopie

Info

Publication number
DE69232214T2
DE69232214T2 DE69232214T DE69232214T DE69232214T2 DE 69232214 T2 DE69232214 T2 DE 69232214T2 DE 69232214 T DE69232214 T DE 69232214T DE 69232214 T DE69232214 T DE 69232214T DE 69232214 T2 DE69232214 T2 DE 69232214T2
Authority
DE
Germany
Prior art keywords
surface analysis
ray spectroscopy
spectroscopy
ray
analysis
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE69232214T
Other languages
English (en)
Other versions
DE69232214D1 (de
Inventor
Toshio Usui
Yuji Aoki
Masayuki Kamei
Tadataka Morishita
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujikura Ltd
International Superconductivity Technology Center
SWCC Corp
Original Assignee
Fujikura Ltd
International Superconductivity Technology Center
Showa Electric Wire and Cable Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from JP3197065A external-priority patent/JP2656681B2/ja
Priority claimed from JP3228723A external-priority patent/JP2670394B2/ja
Priority claimed from JP3228724A external-priority patent/JP2670395B2/ja
Application filed by Fujikura Ltd, International Superconductivity Technology Center, Showa Electric Wire and Cable Co filed Critical Fujikura Ltd
Application granted granted Critical
Publication of DE69232214D1 publication Critical patent/DE69232214D1/de
Publication of DE69232214T2 publication Critical patent/DE69232214T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N23/00—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00
    • G01N23/22—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by measuring secondary emission from the material
    • G01N23/225—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by measuring secondary emission from the material using electron or ion
    • G01N23/2251—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by measuring secondary emission from the material using electron or ion using incident electron beams, e.g. scanning electron microscopy [SEM]
    • G01N23/2252—Measuring emitted X-rays, e.g. electron probe microanalysis [EPMA]
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N23/00—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00
    • G01N23/22—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by measuring secondary emission from the material
    • G01N23/2206—Combination of two or more measurements, at least one measurement being that of secondary emission, e.g. combination of secondary electron [SE] measurement and back-scattered electron [BSE] measurement
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N23/00—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00
    • G01N23/22—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by measuring secondary emission from the material
    • G01N23/2206—Combination of two or more measurements, at least one measurement being that of secondary emission, e.g. combination of secondary electron [SE] measurement and back-scattered electron [BSE] measurement
    • G01N23/2208—Combination of two or more measurements, at least one measurement being that of secondary emission, e.g. combination of secondary electron [SE] measurement and back-scattered electron [BSE] measurement all measurements being of a secondary emission, e.g. combination of SE measurement and characteristic X-ray measurement

Landscapes

  • Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Biochemistry (AREA)
  • General Health & Medical Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Immunology (AREA)
  • Pathology (AREA)
  • Analysing Materials By The Use Of Radiation (AREA)
DE69232214T 1991-07-11 1992-07-10 Einrichtung zur Oberflächenanalyse mittels Röntgenspektroskopie Expired - Fee Related DE69232214T2 (de)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP3197065A JP2656681B2 (ja) 1991-07-11 1991-07-11 表面分析装置
JP3228723A JP2670394B2 (ja) 1991-08-14 1991-08-14 表面分析方法および表面分析装置
JP3228724A JP2670395B2 (ja) 1991-08-14 1991-08-14 表面分析装置

Publications (2)

Publication Number Publication Date
DE69232214D1 DE69232214D1 (de) 2002-01-03
DE69232214T2 true DE69232214T2 (de) 2002-05-08

Family

ID=27327329

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69232214T Expired - Fee Related DE69232214T2 (de) 1991-07-11 1992-07-10 Einrichtung zur Oberflächenanalyse mittels Röntgenspektroskopie

Country Status (3)

Country Link
US (1) US5369275A (de)
EP (1) EP0523566B1 (de)
DE (1) DE69232214T2 (de)

Families Citing this family (22)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB9223592D0 (en) * 1992-11-11 1992-12-23 Fisons Plc X-ray analysis apparatus
JP2848751B2 (ja) * 1992-12-04 1999-01-20 株式会社東芝 元素分析方法
DE4304938C2 (de) * 1993-02-18 1996-04-25 Daimler Benz Ag Goniometer mit mehreren Achsen
DE69632614T2 (de) * 1995-03-14 2005-06-09 Nippon Steel Corp. Vorrichtung und Verfahren zum Beurteilen der Reinheit von Metall
JP3165615B2 (ja) * 1995-03-17 2001-05-14 財団法人国際超電導産業技術研究センター 表面元素分析方法及び装置
US6690010B1 (en) * 1998-09-03 2004-02-10 Kla-Tencor Technologies Chemical analysis of defects using electron appearance spectroscopy
DE19908011C2 (de) * 1999-02-25 2001-08-16 Geesthacht Gkss Forschung Anordnung zur Elementanalyse von Proben mittels primärer Strahlung
JP3867524B2 (ja) * 2001-07-05 2007-01-10 株式会社日立製作所 電子線を用いた観察装置及び観察方法
JP2003107022A (ja) * 2001-09-28 2003-04-09 Hitachi Ltd 欠陥検査装置及び検査方法
US6835931B2 (en) * 2002-05-15 2004-12-28 Edax Inc. Chemical prefiltering for phase differentiation via simultaneous energy dispersive spectrometry and electron backscatter diffraction
US6995847B2 (en) * 2002-05-24 2006-02-07 Honeywell International Inc. Methods and systems for substrate surface evaluation
JP3888980B2 (ja) * 2003-03-18 2007-03-07 株式会社日立ハイテクノロジーズ 物質同定システム
WO2005005969A1 (ja) * 2003-07-11 2005-01-20 Waseda University エネルギー分散型エックス線回折・分光装置
US20060026807A1 (en) * 2003-08-07 2006-02-09 Carnevali Jeffrey D Quick release mounting apparatus
GB2447252B (en) * 2007-03-06 2012-03-14 Thermo Fisher Scientific Inc X-ray analysis instrument
DE102011006588A1 (de) * 2011-03-31 2012-10-04 Carl Zeiss Nts Gmbh Teilchenstrahlgerät mit Detektoranordnung
CN102323282A (zh) * 2011-08-23 2012-01-18 上海华碧检测技术有限公司 一种汽车电子中接触端子的失效分析方法
CN102636505B (zh) * 2012-03-20 2013-11-13 中国科学院合肥物质科学研究院 单离子束双路信号同步探测方法
US9244028B2 (en) 2012-11-07 2016-01-26 Tribogenics, Inc. Electron excited x-ray fluorescence device
US20160091613A1 (en) * 2013-05-06 2016-03-31 Fenno-Aurum Oy Semiconductor radiation detector with lowered background noise level
JP7394464B2 (ja) 2018-07-04 2023-12-08 株式会社リガク 蛍光ｘ線分析装置
CN110031493B (zh) * 2019-04-04 2020-07-31 山东大学 基于图像与光谱技术的岩性智能识别系统与方法

Family Cites Families (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3751661A (en) * 1970-06-10 1973-08-07 United Aircraft Corp Engine oil inspection system using x-ray fluorescence
US3861199A (en) * 1971-04-07 1975-01-21 Sarkis Barkhoudarian Acoustic imaging system
US3864570A (en) * 1973-09-24 1975-02-04 William P Zingaro Low energy x-ray detector
JPS583588B2 (ja) * 1978-02-03 1983-01-21 株式会社日立製作所 イオン↓−電子複合分析装置
JPS56103379A (en) * 1980-01-22 1981-08-18 Horiba Ltd Semiconductor x-ray detector
JPH0676975B2 (ja) * 1984-09-26 1994-09-28 新技術事業団 表面原子配列構造の観察方法
DE3583436D1 (de) * 1984-10-05 1991-08-14 Kawasaki Steel Co Verfahren zur bestimmung der dicke und der zusammensetzung eines legierungsfilms.
GB2192091B (en) * 1986-04-04 1990-07-11 Link Analytical Ltd Apparatus for detecting x-rays or electrons in electron microscopes
JPS6435838A (en) * 1987-07-31 1989-02-06 Jeol Ltd Charged particle beam device
JP2742415B2 (ja) * 1987-11-27 1998-04-22 株式会社日立製作所 Ｘ線分析装置
US5093573A (en) * 1990-06-04 1992-03-03 Nobuo Mikoshiba Reflection electron diffractometer and method for observing microscopic surface structure
FR2668262B1 (fr) * 1990-10-23 1994-04-01 Centre Nal Recherc Scientifique Procede d'analyse aux rayons x de pieces monocristallines.

Also Published As

Publication number Publication date
EP0523566A3 (en) 1993-12-15
EP0523566B1 (de) 2001-11-21
US5369275A (en) 1994-11-29
DE69232214D1 (de) 2002-01-03
EP0523566A2 (de) 1993-01-20

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee