DE3856099D1 - Verfahren zur Herstellung von wenig dielektrischen Polyimiden - Google Patents
Verfahren zur Herstellung von wenig dielektrischen PolyimidenInfo
- Publication number
- DE3856099D1 DE3856099D1 DE3856099T DE3856099T DE3856099D1 DE 3856099 D1 DE3856099 D1 DE 3856099D1 DE 3856099 T DE3856099 T DE 3856099T DE 3856099 T DE3856099 T DE 3856099T DE 3856099 D1 DE3856099 D1 DE 3856099D1
- Authority
- DE
- Germany
- Prior art keywords
- production
- low dielectric
- dielectric polyimides
- polyimides
- low
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G73/00—Macromolecular compounds obtained by reactions forming a linkage containing nitrogen with or without oxygen or carbon in the main chain of the macromolecule, not provided for in groups C08G12/00 - C08G71/00
- C08G73/06—Polycondensates having nitrogen-containing heterocyclic rings in the main chain of the macromolecule
- C08G73/10—Polyimides; Polyester-imides; Polyamide-imides; Polyamide acids or similar polyimide precursors
- C08G73/1003—Preparatory processes
- C08G73/1007—Preparatory processes from tetracarboxylic acids or derivatives and diamines
Landscapes
- Chemical & Material Sciences (AREA)
- Health & Medical Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- Organic Chemistry (AREA)
- Macromolecular Compounds Obtained By Forming Nitrogen-Containing Linkages In General (AREA)
- Polymers With Sulfur, Phosphorus Or Metals In The Main Chain (AREA)
- Organic Insulating Materials (AREA)
- Paints Or Removers (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US7354287A | 1987-07-15 | 1987-07-15 |
Publications (2)
Publication Number | Publication Date |
---|---|
DE3856099D1 true DE3856099D1 (de) | 1998-02-12 |
DE3856099T2 DE3856099T2 (de) | 1998-09-03 |
Family
ID=22114322
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE19883856099 Expired - Lifetime DE3856099T2 (de) | 1987-07-15 | 1988-07-12 | Verfahren zur Herstellung von wenig dielektrischen Polyimiden |
Country Status (5)
Country | Link |
---|---|
EP (1) | EP0299865B1 (de) |
JP (1) | JPH01118527A (de) |
AU (1) | AU610606B2 (de) |
CA (1) | CA1312990C (de) |
DE (1) | DE3856099T2 (de) |
Families Citing this family (26)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4895972A (en) * | 1988-09-01 | 1990-01-23 | The United States Of American As Represented By The Administrator Of The National Aeronautics And Space Administration | Process for lowering the dielectric constant of polyimides using diamic acid additives |
JP2677911B2 (ja) * | 1990-05-29 | 1997-11-17 | 日立化成工業株式会社 | 含フツ素ポリイミド、含フツ素ポリアミド酸及びポリイミド系樹脂の製造法 |
DE69127137T2 (de) * | 1990-06-01 | 1998-02-26 | Mitsui Toatsu Chemicals | Leicht zu verarbeitende Polyimide und deren Herstellung |
JP2851019B2 (ja) * | 1990-09-28 | 1999-01-27 | 日本電信電話株式会社 | 全フッ素化ポリイミド,全フッ素化ポリアミド酸およびそれらの製造方法 |
JP2748995B2 (ja) * | 1990-11-26 | 1998-05-13 | 三井東圧化学株式会社 | 溶融成形用ポリイミドおよびその製造方法ならびにその樹脂組成物 |
US5354839A (en) * | 1992-04-07 | 1994-10-11 | Mitsui Toatsu Chemicals, Incorporated | Polyimide and preparation process of same |
US5470943A (en) * | 1994-01-07 | 1995-11-28 | Mitsui Toatsu Chemicals, Inc. | Polyimide |
US5578697A (en) * | 1994-03-29 | 1996-11-26 | Kabushiki Kaisha Toshiba | Polyimide precursor, bismaleimide-based cured resin precursor and electronic parts having insulating members made from these precursors |
KR0126792B1 (ko) * | 1994-04-11 | 1998-04-01 | 김광호 | 폴리이미드(Polyimide) 표면 처리방법 |
KR100594866B1 (ko) * | 2000-02-03 | 2006-07-03 | 엘지.필립스 엘시디 주식회사 | 저 유전물질 제조방법 |
JP4831385B2 (ja) * | 2001-05-11 | 2011-12-07 | 日立化成工業株式会社 | フッ素含有ポリイミド共重合体、前駆体、光部品、光部品の屈折率の制御方法 |
KR101149459B1 (ko) * | 2005-10-25 | 2012-05-24 | 히다치 가세고교 가부시끼가이샤 | 가요성 적층판, 그의 제조 방법, 및 가요성 인쇄 배선판 |
TWI435902B (zh) * | 2007-08-20 | 2014-05-01 | Kolon Inc | 聚亞醯胺膜 |
KR101292951B1 (ko) * | 2007-09-06 | 2013-08-05 | 코오롱인더스트리 주식회사 | 폴리이미드 수지 및 이를 이용한 필름 |
JP5338469B2 (ja) * | 2008-05-14 | 2013-11-13 | 三菱瓦斯化学株式会社 | ポリイミドおよびポリアミック酸 |
KR101248671B1 (ko) * | 2008-09-23 | 2013-03-28 | 코오롱인더스트리 주식회사 | 투명전극 |
JP2013237762A (ja) * | 2012-05-14 | 2013-11-28 | Dexerials Corp | ポリイミド、ポリイミド樹脂組成物及びポリイミドフィルム |
KR102224505B1 (ko) * | 2019-07-05 | 2021-03-09 | 피아이첨단소재 주식회사 | 폴리아믹산 조성물, 폴리아믹산 조성물의 제조 방법, 이를 포함하는 폴리이미드 및 이를 포함하는 피복물 |
KR102224503B1 (ko) * | 2019-07-05 | 2021-03-09 | 피아이첨단소재 주식회사 | 폴리아믹산 조성물, 폴리아믹산 조성물의 제조 방법, 이를 포함하는 폴리이미드 및 이를 포함하는 피복물 |
US11753517B2 (en) | 2019-12-12 | 2023-09-12 | Raytheon Company | Dispensable polyimide aerogel prepolymer, method of making the same, method of using the same, and substrate comprising patterned polyimide aerogel |
CN114230791B (zh) * | 2021-12-29 | 2023-10-24 | 山东华夏神舟新材料有限公司 | 本征型低介电含氟聚酰亚胺薄膜及其制备方法 |
CN115612097B (zh) * | 2022-07-28 | 2023-10-03 | 江西有泽新材料科技有限公司 | 一种低介电和高强度的纳米复合材料及制备方法 |
CN115490854B (zh) * | 2022-09-05 | 2024-01-30 | 江西有泽新材料科技有限公司 | 一种低介电、高耐热、低吸水的高性能聚酰亚胺及其制备方法和应用 |
CN115850699B (zh) * | 2022-09-05 | 2024-04-26 | 江西有泽新材料科技有限公司 | 一种低介电共混聚酰亚胺及制备方法和应用 |
CN115449076B (zh) * | 2022-10-26 | 2024-02-23 | 航天科工(长沙)新材料研究院有限公司 | 一种聚酰亚胺前驱体、前驱体组合物、聚酰亚胺树脂及其制备方法 |
CN116178714A (zh) * | 2023-02-28 | 2023-05-30 | 武汉理工大学 | 一种含氟改性聚酰亚胺及其制备方法和应用 |
Family Cites Families (15)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE2429695C2 (de) * | 1973-06-22 | 1985-09-26 | General Electric Co., Schenectady, N.Y. | Verfahren zum Herstellen von Polyätherimiden |
US4221897A (en) * | 1979-05-09 | 1980-09-09 | General Electric Company | Method for making polyetheramide acid |
JPS57181146A (en) * | 1981-04-30 | 1982-11-08 | Hitachi Ltd | Resin-sealed semiconductor device |
JPS5891430A (ja) * | 1981-11-27 | 1983-05-31 | Hitachi Ltd | 液晶表示素子 |
JPS58180530A (ja) * | 1982-04-19 | 1983-10-22 | Hitachi Ltd | 新規なフツ素含有ポリアミドおよびポリイミド |
US4595548A (en) * | 1984-08-23 | 1986-06-17 | The United States Of America As Represented By The Administrator Of The National Aeronautics And Space Administration | Process for preparing essentially colorless polyimide film containing phenoxy-linked diamines |
JP2610804B2 (ja) * | 1984-10-15 | 1997-05-14 | 三井東圧化学株式会社 | ポリイミドフィルムからなる耐熱性接着剤 |
AU576675B2 (en) * | 1985-06-20 | 1988-09-01 | National Aeronautics And Space Administration - Nasa | Copolyimides |
JPS62108555A (ja) * | 1985-11-06 | 1987-05-19 | Hitachi Ltd | 半導体装置 |
JPS62127827A (ja) * | 1985-11-29 | 1987-06-10 | Hitachi Chem Co Ltd | 液晶配向膜用組成物 |
JP2567375B2 (ja) * | 1986-02-13 | 1996-12-25 | 三井東圧化学株式会社 | 無色ポリイミドフイルム |
JPS62241923A (ja) * | 1986-04-15 | 1987-10-22 | Mitsui Toatsu Chem Inc | ポリイミド |
JPS62231937A (ja) * | 1986-04-01 | 1987-10-12 | Canon Inc | 液晶素子 |
JP2585552B2 (ja) * | 1986-11-19 | 1997-02-26 | 三井東圧化学株式会社 | ポリイミド |
JP2519228B2 (ja) * | 1987-01-08 | 1996-07-31 | 日東電工株式会社 | 無色透明ポリイミド成形体およびその製法 |
-
1988
- 1988-07-12 EP EP19880401812 patent/EP0299865B1/de not_active Expired - Lifetime
- 1988-07-12 AU AU18954/88A patent/AU610606B2/en not_active Ceased
- 1988-07-12 DE DE19883856099 patent/DE3856099T2/de not_active Expired - Lifetime
- 1988-07-14 CA CA000572018A patent/CA1312990C/en not_active Expired - Lifetime
- 1988-07-15 JP JP17684588A patent/JPH01118527A/ja active Pending
Also Published As
Publication number | Publication date |
---|---|
EP0299865A3 (de) | 1991-01-02 |
DE3856099T2 (de) | 1998-09-03 |
AU610606B2 (en) | 1991-05-23 |
EP0299865A2 (de) | 1989-01-18 |
CA1312990C (en) | 1993-01-19 |
EP0299865B1 (de) | 1998-01-07 |
JPH01118527A (ja) | 1989-05-11 |
AU1895488A (en) | 1989-01-19 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
DE3856099D1 (de) | Verfahren zur Herstellung von wenig dielektrischen Polyimiden | |
DE3856483D1 (de) | Verfahren zur Herstellung von Dünnschichten | |
DE68929012D1 (de) | Verfahren zur Herstellung von Mehrschichtschaltungen | |
DE69132176D1 (de) | Verfahren zur Herstellung von Elektroden | |
DE3752333D1 (de) | Verfahren zur Herstellung von elektrisch leitendem Material | |
ATA348285A (de) | Verfahren zur herstellung von suesswaren | |
DE69024909D1 (de) | Verfahren zur Herstellung von Polyimid-Verbundstoffen | |
AT385282B (de) | Verfahren zur kontinuierlichen herstellung von aethanol | |
DE3884367D1 (de) | Verfahren zur Herstellung von Feinstdraht. | |
DE3650547D1 (de) | Verfahren zur Herstellung von Halbleiterlasern | |
DE59206082D1 (de) | Verfahren zur Herstellung von supraleitenden Drähten | |
DE69125588D1 (de) | Verfahren zur Herstellung von Substraten mit dielektrischer Trennung | |
DE3854799D1 (de) | Verfahren zur Herstellung von veränderten Zeolithen | |
DE68928398D1 (de) | Verfahren zur Herstellung von Polybuten | |
DE3855580D1 (de) | Verfahren zur Herstellung von Polyparaphenylensulfiden | |
DE69119552D1 (de) | Verfahren zur Herstellung von Diethern | |
DE69016382D1 (de) | Verfahren zur Herstellung von Polyimiden. | |
DE69213916D1 (de) | Verfahren zur Herstellung von L-Ambrox | |
DE69217346D1 (de) | Verfahren zur Herstellung von Mikroleuchtkörpern | |
DE3851364D1 (de) | Verfahren zur Herstellung von supraleitendem Material. | |
DE3851588D1 (de) | Verfahren zur Herstellung von Chinoloncarbonsäuren. | |
DE69310232D1 (de) | Verfahren zur Herstellung von Organomonochlorsilan | |
DE69024884D1 (de) | Verfahren zur Herstellung von feinem Kupferpulver | |
DE69025446D1 (de) | Verfahren zur Herstellung von Tonern | |
PT77857B (de) | Verfahren zur herstellung von substituierten azabicycloalkanen |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
8364 | No opposition during term of opposition |