DE3854714D1 - Bilderzeugungsmaterial und Verfahren. - Google Patents

Bilderzeugungsmaterial und Verfahren.

Info

Publication number
DE3854714D1
DE3854714D1 DE3854714T DE3854714T DE3854714D1 DE 3854714 D1 DE3854714 D1 DE 3854714D1 DE 3854714 T DE3854714 T DE 3854714T DE 3854714 T DE3854714 T DE 3854714T DE 3854714 D1 DE3854714 D1 DE 3854714D1
Authority
DE
Germany
Prior art keywords
imaging material
imaging
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE3854714T
Other languages
English (en)
Other versions
DE3854714T2 (de
Inventor
Naohiro Muramoto
Katsutoshi Mine
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
DuPont Toray Specialty Materials KK
Original Assignee
Toray Silicone Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toray Silicone Co Ltd filed Critical Toray Silicone Co Ltd
Application granted granted Critical
Publication of DE3854714D1 publication Critical patent/DE3854714D1/de
Publication of DE3854714T2 publication Critical patent/DE3854714T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/075—Silicon-containing compounds
    • G03F7/0757—Macromolecular compounds containing Si-O, Si-C or Si-N bonds

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Silicon Polymers (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
DE3854714T 1987-11-09 1988-11-08 Bilderzeugungsmaterial und Verfahren. Expired - Fee Related DE3854714T2 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP62282638A JP2608429B2 (ja) 1987-11-09 1987-11-09 パターン形成用材料およびパターン形成方法

Publications (2)

Publication Number Publication Date
DE3854714D1 true DE3854714D1 (de) 1996-01-04
DE3854714T2 DE3854714T2 (de) 1996-05-09

Family

ID=17655122

Family Applications (1)

Application Number Title Priority Date Filing Date
DE3854714T Expired - Fee Related DE3854714T2 (de) 1987-11-09 1988-11-08 Bilderzeugungsmaterial und Verfahren.

Country Status (8)

Country Link
US (1) US4985342A (de)
EP (1) EP0315954B1 (de)
JP (1) JP2608429B2 (de)
KR (1) KR890702081A (de)
AU (1) AU611220B2 (de)
CA (1) CA1335542C (de)
DE (1) DE3854714T2 (de)
WO (1) WO1989004507A1 (de)

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EP0345534A1 (de) * 1988-05-25 1989-12-13 Toray Silicone Company, Limited Chloromethylgruppen enthaltende Polyorganosiloxane
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US5098816A (en) * 1989-10-10 1992-03-24 International Business Machines Corporation Method for forming a pattern of a photoresist
US5110711A (en) * 1989-10-10 1992-05-05 International Business Machines Corporation Method for forming a pattern
EP0464614B1 (de) * 1990-06-25 1999-09-29 Matsushita Electronics Corporation Licht- oder strahlungsempfindliche Zusammensetzung
EP0466025B1 (de) * 1990-07-06 1999-03-10 Nippon Telegraph And Telephone Corporation Resistmaterial, Methode zu seiner Herstellung und Verfahren zum Herstellen von Resistbildern mit diesem Material
US5457003A (en) * 1990-07-06 1995-10-10 Nippon Telegraph And Telephone Corporation Negative working resist material, method for the production of the same and process of forming resist patterns using the same
US5273805A (en) * 1991-08-05 1993-12-28 Minnesota Mining And Manufacturing Company Structured flexible carrier web with recess areas bearing a layer of silicone on predetermined surfaces
US5683540A (en) * 1995-06-26 1997-11-04 Boeing North American, Inc. Method and system for enhancing the surface of a material for cleaning, material removal or as preparation for adhesive bonding or etching
US5932231A (en) * 1997-07-11 1999-08-03 Pcr, Inc. High purity branched alkylsilsesquioxane fluids
US6524675B1 (en) 1999-05-13 2003-02-25 3M Innovative Properties Company Adhesive-back articles
JP4430618B2 (ja) * 2003-02-06 2010-03-10 積水化学工業株式会社 プロトン伝導性膜、その製造方法及びそれを用いた燃料電池
US7811637B2 (en) * 2003-07-29 2010-10-12 Toagosei Co., Ltd. Silicon-containing polymer, process for producing the same, heat-resistant resin composition, and heat-resistant film
JP4539120B2 (ja) * 2004-02-27 2010-09-08 セイコーエプソン株式会社 エッチング方法、基板、電子部品、電子部品の製造方法および電子機器
US20100184940A1 (en) * 2005-03-02 2010-07-22 Eastman Chemical Company Polyester Compositions Which Comprise Cyclobutanediol and Certain Thermal Stabilizers, and/or Reaction Products Thereof
US7902320B2 (en) 2005-06-17 2011-03-08 Eastman Chemical Company Graphic art films comprising polyester compositions formed from 2,2,4,4-tetramethyl-1,3-cyclobutanediol and 1,4-cyclohexanedimethanol
US7704605B2 (en) * 2006-03-28 2010-04-27 Eastman Chemical Company Thermoplastic articles comprising cyclobutanediol having a decorative material embedded therein
US20110144266A1 (en) * 2005-06-17 2011-06-16 Eastman Chemical Company Thermoplastic Articles Comprising Cyclobutanediol Having a Decorative Material Embedded Therein
JP2007086476A (ja) * 2005-09-22 2007-04-05 Asahi Kasei Electronics Co Ltd 有機無機感光性積層絶縁膜
US20070100122A1 (en) * 2005-10-28 2007-05-03 Crawford Emmett D Polyester compositions containing cyclobutanediol and articles made therefrom
CA2625846A1 (en) * 2005-10-28 2007-05-10 Eastman Chemical Company Polyester compositions which comprise cyclobutanediol and at least one phosphorus compound
US8586701B2 (en) * 2005-10-28 2013-11-19 Eastman Chemical Company Process for the preparation of copolyesters based on 2,2,4,4-tetramethyl-1,3-cyclobutanediol and 1,4-cyclohexanedimethanol
EP2156935A3 (de) * 2005-10-28 2010-07-28 Eastman Chemical Company Aus 2,2,4,4-tetramethyl-1,3-Cyclobutandiol und 1,4-Cyclohexandimethanol gebildete Polyesterzusammensetzungen umfassendes Restaurantgeschirr
US8193302B2 (en) 2005-10-28 2012-06-05 Eastman Chemical Company Polyester compositions which comprise cyclobutanediol and certain phosphate thermal stabilizers, and/or reaction products thereof
US20070106054A1 (en) * 2005-10-28 2007-05-10 Crawford Emmett D Polyester compositions containing cyclobutanediol having a certain combination of inherent viscosity and high glass transition temperature and articles made therefrom
US9598533B2 (en) 2005-11-22 2017-03-21 Eastman Chemical Company Polyester compositions containing cyclobutanediol having a certain combination of inherent viscosity and moderate glass transition temperature and articles made therefrom
US20070142511A1 (en) * 2005-12-15 2007-06-21 Crawford Emmett D Polyester compositions which comprise cyclobutanediol ethylene glycol, titanium, and phosphorus with improved color and manufacturing processes therefor
US7737246B2 (en) * 2005-12-15 2010-06-15 Eastman Chemical Company Polyester compositions which comprise cyclobutanediol, cyclohexanedimethanol, and ethylene glycol and manufacturing processes therefor
US9169388B2 (en) 2006-03-28 2015-10-27 Eastman Chemical Company Polyester compositions which comprise cyclobutanediol and certain thermal stabilizers, and/or reaction products thereof
US20100300918A1 (en) * 2006-03-28 2010-12-02 Eastman Chemical Company Bottles comprising polyester compositions which comprise cyclobutanediol
US7704670B2 (en) 2006-06-22 2010-04-27 Az Electronic Materials Usa Corp. High silicon-content thin film thermosets
US8026040B2 (en) * 2007-02-20 2011-09-27 Az Electronic Materials Usa Corp. Silicone coating composition
KR20090114476A (ko) * 2007-02-26 2009-11-03 에이제트 일렉트로닉 머트리얼즈 유에스에이 코프. 실록산 중합체의 제조 방법
US8524441B2 (en) 2007-02-27 2013-09-03 Az Electronic Materials Usa Corp. Silicon-based antireflective coating compositions
JP4946787B2 (ja) * 2007-10-22 2012-06-06 Ｊｓｒ株式会社 レジスト下層膜用組成物及びその製造方法
KR101895184B1 (ko) * 2007-11-21 2018-09-04 이스트만 케미칼 컴파니 플라스틱 젖병, 다른 취입 성형된 제품, 및 이들의 제조 방법
US8501287B2 (en) 2007-11-21 2013-08-06 Eastman Chemical Company Plastic baby bottles, other blow molded articles, and processes for their manufacture
US8198371B2 (en) 2008-06-27 2012-06-12 Eastman Chemical Company Blends of polyesters and ABS copolymers
US20100099828A1 (en) * 2008-10-21 2010-04-22 Eastman Chemical Company Clear Binary Blends of Aliphatic Polyesters and Aliphatic-Aromatic Polyesters
JP5136439B2 (ja) * 2008-11-28 2013-02-06 Ｊｓｒ株式会社 多層レジストプロセス用シリコン含有膜形成用組成物及びシリコン含有膜並びにパターン形成方法
US20100159176A1 (en) * 2008-12-18 2010-06-24 Eastman Chemical Company Miscible blends of terephthalate polyesters containing 1,4-cyclohexanedimethanol and 2,2,4,4-tetramethylcyclobutane-1,3-diol
US8895654B2 (en) * 2008-12-18 2014-11-25 Eastman Chemical Company Polyester compositions which comprise spiro-glycol, cyclohexanedimethanol, and terephthalic acid
US8524641B2 (en) * 2010-09-16 2013-09-03 Momentive Performance Materials Inc. Aqueous foaming compositions with high tolerance to hydrocarbons
US8394997B2 (en) 2010-12-09 2013-03-12 Eastman Chemical Company Process for the isomerization of 2,2,4,4-tetraalkylcyclobutane-1,3-diols
US8420868B2 (en) 2010-12-09 2013-04-16 Eastman Chemical Company Process for the preparation of 2,2,4,4-tetraalkylcyclobutane-1,3-diols
US8420869B2 (en) 2010-12-09 2013-04-16 Eastman Chemical Company Process for the preparation of 2,2,4,4-tetraalkylcyclobutane-1,3-diols
DE202011110266U1 (de) * 2011-11-22 2013-03-26 Evonik Degussa Gmbh Besonders VOC-arme Gemische olefinisch funktionalisierter Siloxanoligomere basierend auf Alkoxysilanen
US20130217830A1 (en) 2012-02-16 2013-08-22 Eastman Chemical Company Clear Semi-Crystalline Articles with Improved Heat Resistance
DE102014202858A1 (de) * 2014-02-17 2015-08-20 Wacker Chemie Ag Vernetzbare Mischungen mit alpha-funktionellen Polysiloxanen
JP6681317B2 (ja) * 2016-11-21 2020-04-15 信越化学工業株式会社 紫外線硬化型シリコーン組成物及び硬化皮膜形成方法

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JPS5137617B2 (de) * 1971-09-17 1976-10-16
JPS52150103A (en) * 1976-06-07 1977-12-13 Shinetsu Chemical Co Method of producing lithographic printing form and press plate
JPS55105627A (en) * 1978-12-29 1980-08-13 Gen Electric Diaryliodonium salt and hardening composition
GB2057476B (en) * 1979-08-29 1983-06-22 Shinetsu Chemical Co Photocurable organopolysiloxane compositions
US4376210A (en) * 1981-02-02 1983-03-08 Pitney Bowes Inc. Vinyl polysiloxane polymers release compositions and methods
JPS57168247A (en) * 1981-04-09 1982-10-16 Fujitsu Ltd Formation of negative pattern
FR2507608A1 (fr) * 1981-06-15 1982-12-17 Rhone Poulenc Spec Chim Compositions organopolysiloxaniques liquides photopolymerisables pour enduction de materiaux
JPS6049647B2 (ja) * 1981-09-18 1985-11-02 株式会社日立製作所 光又は放射線硬化性ポリオルガノシロキサン組成物
JPS58207041A (ja) * 1982-05-28 1983-12-02 Nec Corp 放射線感応性高分子レジスト
JPS6057833A (ja) * 1983-09-09 1985-04-03 Nippon Telegr & Teleph Corp <Ntt> レジスト材料
JPS60212756A (ja) * 1984-04-06 1985-10-25 Nippon Telegr & Teleph Corp <Ntt> パタン形成材料及びパタン形成方法
CA1259101A (en) * 1984-04-09 1989-09-05 Hiroyuki Fukuda Carbonaceous fuel cell electrode substrate incorporating three-layer separator, and process for preparation thereof
KR900002364B1 (ko) * 1984-05-30 1990-04-12 후지쓰가부시끼가이샤 패턴 형성재의 제조방법
JPS60254036A (ja) * 1984-05-30 1985-12-14 Fujitsu Ltd パタ−ン形成方法
JPS60254035A (ja) * 1984-05-30 1985-12-14 Fujitsu Ltd パタ−ン形成方法
JPS60262151A (ja) * 1984-06-11 1985-12-25 Nippon Telegr & Teleph Corp <Ntt> 三層レジスト用中間層材料及びその利用方法
JPS60262150A (ja) * 1984-06-11 1985-12-25 Nippon Telegr & Teleph Corp <Ntt> 三層レジスト用中間層材料及びそれを用いた三層レジストパタン形成方法
JPS6120032A (ja) * 1984-07-09 1986-01-28 Nippon Telegr & Teleph Corp <Ntt> レジスト材料
US4554296A (en) * 1984-10-26 1985-11-19 Dow Corning Corporation Polyorganosiloxane compositions
US4549003A (en) * 1984-10-26 1985-10-22 Dow Corning Corporation Method for preparing novel fluorinated organosiloxane copolymers
JPS61144639A (ja) * 1984-12-19 1986-07-02 Hitachi Ltd 放射線感応性組成物及びそれを用いたパタ−ン形成法
JPH0641562B2 (ja) * 1985-05-16 1994-06-01 東レ・ダウコーニング・シリコーン株式会社 硬化性オルガノポリシロキサン組成物
JPH067231B2 (ja) * 1985-07-19 1994-01-26 日本原子力研究所 硬質コンタクトレンズの製造法
JPH0710953B2 (ja) * 1985-12-17 1995-02-08 東レ・ダウコーニング・シリコーン株式会社 硬化性オルガノポリシロキサン組成物
JPS62227929A (ja) * 1986-03-31 1987-10-06 Fujitsu Ltd レジスト材料
JPH0684476B2 (ja) * 1986-07-23 1994-10-26 東レ・ダウコ−ニング・シリコ−ン株式会社 硬化性オルガノポリシロキサン組成物
DE3708958A1 (de) * 1987-03-19 1988-09-29 Wacker Chemie Gmbh Durch bestrahlung vernetzbare zusammensetzungen

Also Published As

Publication number Publication date
DE3854714T2 (de) 1996-05-09
EP0315954A2 (de) 1989-05-17
CA1335542C (en) 1995-05-16
WO1989004507A1 (en) 1989-05-18
AU2490088A (en) 1989-05-11
US4985342A (en) 1991-01-15
EP0315954A3 (en) 1990-08-29
JPH01123229A (ja) 1989-05-16
JP2608429B2 (ja) 1997-05-07
EP0315954B1 (de) 1995-11-22
AU611220B2 (en) 1991-06-06
KR890702081A (ko) 1989-12-22

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee