DE3854540D1 - Behandlungsapparat und Verfahren. - Google Patents

Behandlungsapparat und Verfahren.

Info

Publication number
DE3854540D1
DE3854540D1 DE3854540T DE3854540T DE3854540D1 DE 3854540 D1 DE3854540 D1 DE 3854540D1 DE 3854540 T DE3854540 T DE 3854540T DE 3854540 T DE3854540 T DE 3854540T DE 3854540 D1 DE3854540 D1 DE 3854540D1
Authority
DE
Germany
Prior art keywords
procedure
treatment apparatus
treatment
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE3854540T
Other languages
English (en)
Other versions
DE3854540T2 (de
Inventor
Cecil J Davis
Lee M Loewenstein
Robert T Matthews
John I Jones
Rhett B Jucha
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Texas Instruments Inc
Original Assignee
Texas Instruments Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Texas Instruments Inc filed Critical Texas Instruments Inc
Publication of DE3854540D1 publication Critical patent/DE3854540D1/de
Application granted granted Critical
Publication of DE3854540T2 publication Critical patent/DE3854540T2/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70808—Construction details, e.g. housing, load-lock, seals or windows for passing light in or out of apparatus
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/48—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating by irradiation, e.g. photolysis, radiolysis, particle radiation
    • C23C16/482—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating by irradiation, e.g. photolysis, radiolysis, particle radiation using incoherent light, UV to IR, e.g. lamps
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/50—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges
    • C23C16/517—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges using a combination of discharges covered by two or more of groups C23C16/503 - C23C16/515
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/54—Apparatus specially adapted for continuous coating
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70858—Environment aspects, e.g. pressure of beam-path gas, temperature
    • G03F7/70866—Environment aspects, e.g. pressure of beam-path gas, temperature of mask or workpiece

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Epidemiology (AREA)
  • Environmental & Geological Engineering (AREA)
  • Public Health (AREA)
  • General Physics & Mathematics (AREA)
  • Toxicology (AREA)
  • Plasma & Fusion (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Atmospheric Sciences (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
  • Drying Of Semiconductors (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
DE3854540T 1987-07-17 1988-06-23 Behandlungsapparat und Verfahren. Expired - Lifetime DE3854540T2 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US07/075,016 US4842686A (en) 1987-07-17 1987-07-17 Wafer processing apparatus and method

Publications (2)

Publication Number Publication Date
DE3854540D1 true DE3854540D1 (de) 1995-11-09
DE3854540T2 DE3854540T2 (de) 1996-03-07

Family

ID=22123018

Family Applications (1)

Application Number Title Priority Date Filing Date
DE3854540T Expired - Lifetime DE3854540T2 (de) 1987-07-17 1988-06-23 Behandlungsapparat und Verfahren.

Country Status (5)

Country Link
US (1) US4842686A (de)
EP (1) EP0300217B1 (de)
JP (1) JPH02146744A (de)
KR (1) KR970000202B1 (de)
DE (1) DE3854540T2 (de)

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US10231591B2 (en) 2013-12-20 2019-03-19 Aktiebolaget Electrolux Dust container
KR102325130B1 (ko) 2014-07-10 2021-11-12 에이비 엘렉트로룩스 로봇 청소 장치에서 측정 에러를 검출하는 방법
KR102271782B1 (ko) 2014-09-08 2021-06-30 에이비 엘렉트로룩스 로봇 진공 청소기
EP3190939B1 (de) 2014-09-08 2021-07-21 Aktiebolaget Electrolux Roboterstaubsauger
EP3230814B1 (de) 2014-12-10 2021-02-17 Aktiebolaget Electrolux Verwendung eines lasersensors zur bodentypdetektion
EP3229983B1 (de) 2014-12-12 2019-02-20 Aktiebolaget Electrolux Seitenbürste und reinigungsroboter
US10678251B2 (en) 2014-12-16 2020-06-09 Aktiebolaget Electrolux Cleaning method for a robotic cleaning device
EP3234714B1 (de) 2014-12-16 2021-05-12 Aktiebolaget Electrolux Erfahrungsbasierte karte einer robotischen reinigungsvorrichtung
KR102343513B1 (ko) 2015-04-17 2021-12-28 에이비 엘렉트로룩스 로봇 청소 장치 및 로봇 청소 장치의 제어 방법
KR102445064B1 (ko) 2015-09-03 2022-09-19 에이비 엘렉트로룩스 로봇 청소 장치의 시스템
CN108603935A (zh) 2016-03-15 2018-09-28 伊莱克斯公司 机器人清洁设备以及机器人清洁设备进行陡壁检测的方法
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JP7243967B2 (ja) 2017-06-02 2023-03-22 アクチエボラゲット エレクトロルックス ロボット清掃デバイスの前方の表面のレベル差を検出する方法
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Also Published As

Publication number Publication date
KR970000202B1 (ko) 1997-01-06
EP0300217A3 (en) 1989-04-12
EP0300217B1 (de) 1995-10-04
DE3854540T2 (de) 1996-03-07
EP0300217A2 (de) 1989-01-25
US4842686A (en) 1989-06-27
KR890002976A (ko) 1989-04-12
JPH02146744A (ja) 1990-06-05

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