DE3854114D1 - Photovoltaisches PIN-Bauelement mit einer P- oder N-Halbleiterschicht aus nicht einkristallinem Stoff, welches Zn, Se, Te, H in einer Menge von 1 bis 4 Atom % und ein Dotierelement enthält und eine I-Halbleiterschicht aus nicht einkristallinem Si(H,F). - Google Patents

Photovoltaisches PIN-Bauelement mit einer P- oder N-Halbleiterschicht aus nicht einkristallinem Stoff, welches Zn, Se, Te, H in einer Menge von 1 bis 4 Atom % und ein Dotierelement enthält und eine I-Halbleiterschicht aus nicht einkristallinem Si(H,F).

Info

Publication number
DE3854114D1
DE3854114D1 DE3854114T DE3854114T DE3854114D1 DE 3854114 D1 DE3854114 D1 DE 3854114D1 DE 3854114 T DE3854114 T DE 3854114T DE 3854114 T DE3854114 T DE 3854114T DE 3854114 D1 DE3854114 D1 DE 3854114D1
Authority
DE
Germany
Prior art keywords
semiconductor layer
layer made
type semiconductor
amount
crystal
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE3854114T
Other languages
English (en)
Other versions
DE3854114T2 (de
Inventor
Katsumi Nakagawa
Shunichi Ishihara
Masahiro Kanai
Tsutomu Murakami
Kozo Arao
Yasushi Fujioka
Akira Sakai
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Inc
Original Assignee
Canon Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Canon Inc filed Critical Canon Inc
Publication of DE3854114D1 publication Critical patent/DE3854114D1/de
Application granted granted Critical
Publication of DE3854114T2 publication Critical patent/DE3854114T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
    • H01L31/04—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof adapted as photovoltaic [PV] conversion devices
    • H01L31/06—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof adapted as photovoltaic [PV] conversion devices characterised by potential barriers
    • H01L31/075—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof adapted as photovoltaic [PV] conversion devices characterised by potential barriers the potential barriers being only of the PIN type, e.g. amorphous silicon PIN solar cells
    • H01L31/076—Multiple junction or tandem solar cells
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
    • H01L31/0248—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by their semiconductor bodies
    • H01L31/0256—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by their semiconductor bodies characterised by the material
    • H01L31/0264—Inorganic materials
    • H01L31/0296—Inorganic materials including, apart from doping material or other impurities, only AIIBVI compounds, e.g. CdS, ZnS, HgCdTe
    • H01L31/02963—Inorganic materials including, apart from doping material or other impurities, only AIIBVI compounds, e.g. CdS, ZnS, HgCdTe characterised by the doping material
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
    • H01L31/0248—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by their semiconductor bodies
    • H01L31/0256—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by their semiconductor bodies characterised by the material
    • H01L31/0264—Inorganic materials
    • H01L31/0296—Inorganic materials including, apart from doping material or other impurities, only AIIBVI compounds, e.g. CdS, ZnS, HgCdTe
    • H01L31/02966—Inorganic materials including, apart from doping material or other impurities, only AIIBVI compounds, e.g. CdS, ZnS, HgCdTe including ternary compounds, e.g. HgCdTe
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
    • H01L31/0248—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by their semiconductor bodies
    • H01L31/036—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by their semiconductor bodies characterised by their crystalline structure or particular orientation of the crystalline planes
    • H01L31/0392—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by their semiconductor bodies characterised by their crystalline structure or particular orientation of the crystalline planes including thin films deposited on metallic or insulating substrates ; characterised by specific substrate materials or substrate features or by the presence of intermediate layers, e.g. barrier layers, on the substrate
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
    • H01L31/0248—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by their semiconductor bodies
    • H01L31/036—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by their semiconductor bodies characterised by their crystalline structure or particular orientation of the crystalline planes
    • H01L31/0392—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by their semiconductor bodies characterised by their crystalline structure or particular orientation of the crystalline planes including thin films deposited on metallic or insulating substrates ; characterised by specific substrate materials or substrate features or by the presence of intermediate layers, e.g. barrier layers, on the substrate
    • H01L31/03925—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by their semiconductor bodies characterised by their crystalline structure or particular orientation of the crystalline planes including thin films deposited on metallic or insulating substrates ; characterised by specific substrate materials or substrate features or by the presence of intermediate layers, e.g. barrier layers, on the substrate including AIIBVI compound materials, e.g. CdTe, CdS
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
    • H01L31/04—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof adapted as photovoltaic [PV] conversion devices
    • H01L31/06—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof adapted as photovoltaic [PV] conversion devices characterised by potential barriers
    • H01L31/075—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof adapted as photovoltaic [PV] conversion devices characterised by potential barriers the potential barriers being only of the PIN type, e.g. amorphous silicon PIN solar cells
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
    • H01L31/18—Processes or apparatus specially adapted for the manufacture or treatment of these devices or of parts thereof
    • H01L31/1828—Processes or apparatus specially adapted for the manufacture or treatment of these devices or of parts thereof the active layers comprising only AIIBVI compounds, e.g. CdS, ZnS, CdTe
    • H01L31/1832—Processes or apparatus specially adapted for the manufacture or treatment of these devices or of parts thereof the active layers comprising only AIIBVI compounds, e.g. CdS, ZnS, CdTe comprising ternary compounds, e.g. Hg Cd Te
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
    • Y02E10/00—Energy generation through renewable energy sources
    • Y02E10/50—Photovoltaic [PV] energy
    • Y02E10/548—Amorphous silicon PV cells

Landscapes

  • Engineering & Computer Science (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Electromagnetism (AREA)
  • General Physics & Mathematics (AREA)
  • Computer Hardware Design (AREA)
  • Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Inorganic Chemistry (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Sustainable Development (AREA)
  • Sustainable Energy (AREA)
  • Manufacturing & Machinery (AREA)
  • Photovoltaic Devices (AREA)
DE3854114T 1987-11-20 1988-11-18 Photovoltaisches PIN-Bauelement mit einer P- oder N-Halbleiterschicht aus nicht einkristallinem Stoff, welches Zn, Se, Te, H in einer Menge von 1 bis 4 Atom % und ein Dotierelement enthält und eine I-Halbleiterschicht aus nicht einkristallinem Si(H,F). Expired - Fee Related DE3854114T2 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP29168487 1987-11-20

Publications (2)

Publication Number Publication Date
DE3854114D1 true DE3854114D1 (de) 1995-08-10
DE3854114T2 DE3854114T2 (de) 1995-11-16

Family

ID=17772074

Family Applications (1)

Application Number Title Priority Date Filing Date
DE3854114T Expired - Fee Related DE3854114T2 (de) 1987-11-20 1988-11-18 Photovoltaisches PIN-Bauelement mit einer P- oder N-Halbleiterschicht aus nicht einkristallinem Stoff, welches Zn, Se, Te, H in einer Menge von 1 bis 4 Atom % und ein Dotierelement enthält und eine I-Halbleiterschicht aus nicht einkristallinem Si(H,F).

Country Status (7)

Country Link
US (1) US5008726A (de)
EP (1) EP0317343B1 (de)
AT (1) ATE124805T1 (de)
AU (1) AU629187B2 (de)
CA (1) CA1298639C (de)
DE (1) DE3854114T2 (de)
ES (1) ES2073406T3 (de)

Families Citing this family (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5510644A (en) * 1992-03-23 1996-04-23 Martin Marietta Corporation CDTE x-ray detector for use at room temperature
US5665640A (en) * 1994-06-03 1997-09-09 Sony Corporation Method for producing titanium-containing thin films by low temperature plasma-enhanced chemical vapor deposition using a rotating susceptor reactor
WO1995034092A1 (en) * 1994-06-03 1995-12-14 Materials Research Corporation A method of nitridization of titanium thin films
US5628829A (en) * 1994-06-03 1997-05-13 Materials Research Corporation Method and apparatus for low temperature deposition of CVD and PECVD films
US5975912A (en) * 1994-06-03 1999-11-02 Materials Research Corporation Low temperature plasma-enhanced formation of integrated circuits
US6147391A (en) * 1996-05-07 2000-11-14 The Regents Of The University Of California Semiconductor hetero-interface photodetector
US6074892A (en) 1996-05-07 2000-06-13 Ciena Corporation Semiconductor hetero-interface photodetector
JP4171428B2 (ja) * 2003-03-20 2008-10-22 三洋電機株式会社 光起電力装置
EP1780800A3 (de) * 2005-11-01 2007-07-11 Fujifilm Corporation Strahlungsbildtafel bildende Fotoleiterschicht und Strahlungsbildtafel
US8927852B2 (en) * 2008-08-21 2015-01-06 Seagate Technology Llc Photovoltaic device with an up-converting quantum dot layer and absorber
US20100044675A1 (en) * 2008-08-21 2010-02-25 Seagate Technology Llc Photovoltaic Device With an Up-Converting Quantum Dot Layer
US8742531B2 (en) * 2008-12-08 2014-06-03 Arizona Board Of Regents, Acting For And On Behalf Of Arizona State University Electrical devices including dendritic metal electrodes
US8840799B2 (en) 2011-12-01 2014-09-23 Toyota Motor Engineering & Manufacturing North America, Inc. Binary thermoelectric material containing nanoparticles and process for producing the same

Family Cites Families (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6047752B2 (ja) * 1975-08-20 1985-10-23 松下電器産業株式会社 擦像管タ−ゲット
US4105478A (en) * 1977-01-06 1978-08-08 Honeywell, Inc. Doping hgcdte with li
US4105477A (en) * 1977-01-06 1978-08-08 Honeywell, Inc. Doping of (hg,cd)te with a group va element
US4087293A (en) * 1977-01-06 1978-05-02 Honeywell Inc. Silicon as donor dopant in Hg1-x Cdx Te
US4217374A (en) * 1978-03-08 1980-08-12 Energy Conversion Devices, Inc. Amorphous semiconductors equivalent to crystalline semiconductors
US4345107A (en) * 1979-06-18 1982-08-17 Ametek, Inc. Cadmium telluride photovoltaic cells
JPS56137684A (en) * 1980-03-31 1981-10-27 Ricoh Co Ltd Photoelectric transducing element
JPS6037076B2 (ja) * 1980-06-11 1985-08-23 潤一 西澤 ３−６族化合物半導体の温度液相成長法
JPS5752176A (en) * 1980-09-16 1982-03-27 Semiconductor Energy Lab Co Ltd Semiconductor device
US4525687A (en) * 1983-02-28 1985-06-25 At&T Bell Laboratories High speed light modulator using multiple quantum well structures
JPS61120480A (ja) * 1984-11-16 1986-06-07 Hitachi Ltd 光電変換装置
JPS6424468A (en) * 1987-07-21 1989-01-26 Canon Kk Functional deposited film
CA1303194C (en) * 1987-07-21 1992-06-09 Katsumi Nakagawa Photovoltaic element with a semiconductor layer comprising non-single crystal material containing at least zn, se and h in an amount of 1 to40 atomic %
US4888062A (en) * 1987-08-31 1989-12-19 Canon Kabushiki Kaisha Pin junction photovoltaic element having I-type semiconductor layer comprising non-single crystal material containing at least Zn, Se and H in an amount of 1 to 4 atomic %

Also Published As

Publication number Publication date
EP0317343A3 (en) 1990-07-11
CA1298639C (en) 1992-04-07
US5008726A (en) 1991-04-16
EP0317343A2 (de) 1989-05-24
DE3854114T2 (de) 1995-11-16
AU629187B2 (en) 1992-10-01
AU2578688A (en) 1989-05-25
EP0317343B1 (de) 1995-07-05
ATE124805T1 (de) 1995-07-15
ES2073406T3 (es) 1995-08-16

Similar Documents

Publication Publication Date Title
DE3855119T2 (de) Photovoltaisches Bauelement mit einer Halbleiterschicht aus nichteinkristallinem Stoff, welches zumindest Zn,Se und H in einer Menge von 1 bis 4 Atom % enthält
ATE135497T1 (de) Photovoltaisches pin-bauelement mit einer i- halbleiterschicht aus znse oder znsete die wasserstoff in einer menge von 1 bis 4 atom-
DE3854114D1 (de) Photovoltaisches PIN-Bauelement mit einer P- oder N-Halbleiterschicht aus nicht einkristallinem Stoff, welches Zn, Se, Te, H in einer Menge von 1 bis 4 Atom % und ein Dotierelement enthält und eine I-Halbleiterschicht aus nicht einkristallinem Si(H,F).
EP0317350A3 (en) Pin junction photovoltaic element with p or n-type semiconductor layer comprising non-single crystal material containing zn, se, h in an amount of 1 to 4 atomic % and a dopant and i-type semiconductor layer comprising non-single crystal si(h,f) material
JPS55127561A (en) Image forming member for electrophotography
ATE178432T1 (de) Photovoltaische vorrichtung mit einem pin- übergang bestehend aus einer i(asi-ge)-schicht mit einem maximalen punkt für den ge-gehalt
EP0300798A3 (de) Zweckmässige ZnSe:H-niedergeschlagene Schicht
ES8302361A1 (es) Metodo para preparar una aleacion amorfa fotosensible mejo- rada
ATE149701T1 (de) Lichtempfindliches element mit einer amorphen silicium-photoleitfähigen schicht, die fluoratome in einer menge von 1 bis 95 atom-ppm enthält
FR2390015A1 (de)
ES8302363A1 (es) Metodo para preparar una aleacion amorfa fotosensible mejo- rada
EP0301903A3 (de) Funktionelle niedergeschlagene ZnSe1-xTeX: H-Schicht
CHIANG et al. Polyacetylene,(CH) sub x: n-type and P-type doping and compensation[Interim Technical Report]
Smestad Photoelectronic properties of semiconductors: by Richard H. Bube (Cambridge University Press, Cambridge, 1992). ISBN 0-521-40491-6 (hbk.), ISBN 0-521-40681-1 (pbk.); 318 pages; price US $69.95 hbk, $32.95 pbk.
JPS6486569A (en) Light emitting element material
JPS6448469A (en) Photovoltaic cell
Ibanez et al. Electrical and optical properties of the ternary V-VI-VII or marternary IV-V-VI-VII systems.).
JPS53111290A (en) Production of visible light semiconductor light emitting element
JPS5591888A (en) Germanium light recieving element
Gorbik et al. Short-wave photodetectors based on pCu (2-y) S-nZn (x) Cd (1-x) S thin-film heterojunctions
JPS6448468A (en) Photovoltaic cell
Bevz et al. Production of Uniformly Doped Silicon Single Crystals by Neutron Activation
YU et al. Investigation of optical and electrical properties of wide band gap materials[Final Report, Jun. 1972- Dec. 1975]
GB967439A (en) Improvements in or relating to opto-electronic circuit elements
JPS57125332A (en) Infrared rays detector

Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee