DE3787679D1 - Target aus Kobalt-Basis für Kathodenzerstäubung und Verfahren zu seiner Herstellung. - Google Patents
Target aus Kobalt-Basis für Kathodenzerstäubung und Verfahren zu seiner Herstellung.Info
- Publication number
- DE3787679D1 DE3787679D1 DE87109731T DE3787679T DE3787679D1 DE 3787679 D1 DE3787679 D1 DE 3787679D1 DE 87109731 T DE87109731 T DE 87109731T DE 3787679 T DE3787679 T DE 3787679T DE 3787679 D1 DE3787679 D1 DE 3787679D1
- Authority
- DE
- Germany
- Prior art keywords
- sputtering
- cobalt
- manufacture
- based target
- target
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Revoked
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
- C23C14/3407—Cathode assembly for sputtering apparatus, e.g. Target
- C23C14/3414—Metallurgical or chemical aspects of target preparation, e.g. casting, powder metallurgy
-
- C—CHEMISTRY; METALLURGY
- C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
- C22F—CHANGING THE PHYSICAL STRUCTURE OF NON-FERROUS METALS AND NON-FERROUS ALLOYS
- C22F1/00—Changing the physical structure of non-ferrous metals or alloys by heat treatment or by hot or cold working
- C22F1/10—Changing the physical structure of non-ferrous metals or alloys by heat treatment or by hot or cold working of nickel or cobalt or alloys based thereon
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Physics & Mathematics (AREA)
- Thermal Sciences (AREA)
- Crystallography & Structural Chemistry (AREA)
- Physical Vapour Deposition (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP61158755A JPS6314864A (ja) | 1986-07-08 | 1986-07-08 | Co基合金スパツタタ−ゲツトおよびその製造法 |
Publications (2)
Publication Number | Publication Date |
---|---|
DE3787679D1 true DE3787679D1 (de) | 1993-11-11 |
DE3787679T2 DE3787679T2 (de) | 1994-05-05 |
Family
ID=15678630
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE87109731T Revoked DE3787679T2 (de) | 1986-07-08 | 1987-07-06 | Target aus Kobalt-Basis für Kathodenzerstäubung und Verfahren zu seiner Herstellung. |
Country Status (4)
Country | Link |
---|---|
US (1) | US4832810A (de) |
EP (1) | EP0252478B1 (de) |
JP (1) | JPS6314864A (de) |
DE (1) | DE3787679T2 (de) |
Families Citing this family (21)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE3819906C1 (de) * | 1988-06-11 | 1989-08-03 | Degussa Ag, 6000 Frankfurt, De | |
US5282946A (en) * | 1991-08-30 | 1994-02-01 | Mitsubishi Materials Corporation | Platinum-cobalt alloy sputtering target and method for manufacturing same |
WO1993023586A1 (en) * | 1992-05-11 | 1993-11-25 | Sumitomo Electric Industries, Ltd. | Vapor deposition material and production method thereof |
EP0659901B1 (de) * | 1993-12-20 | 1998-04-15 | LEYBOLD MATERIALS GmbH | Target für Magnetron-Kathodenzerstäubungsanlage aus einer Kobalt-Basislegierung |
DE19508535A1 (de) | 1995-03-10 | 1996-09-12 | Leybold Materials Gmbh | Sputtertarget aus einer Kobalt-Basislegierung mit hohem Magnetfelddurchgriff |
JPH09272970A (ja) * | 1996-04-05 | 1997-10-21 | Japan Energy Corp | 高純度コバルトスパッタリングターゲット及びその製造方法 |
US6391172B2 (en) | 1997-08-26 | 2002-05-21 | The Alta Group, Inc. | High purity cobalt sputter target and process of manufacturing the same |
US6086725A (en) * | 1998-04-02 | 2000-07-11 | Applied Materials, Inc. | Target for use in magnetron sputtering of nickel for forming metallization films having consistent uniformity through life |
US6190516B1 (en) * | 1999-10-06 | 2001-02-20 | Praxair S.T. Technology, Inc. | High magnetic flux sputter targets with varied magnetic permeability in selected regions |
US6176944B1 (en) | 1999-11-01 | 2001-01-23 | Praxair S.T. Technology, Inc. | Method of making low magnetic permeability cobalt sputter targets |
US6514358B1 (en) | 2000-04-05 | 2003-02-04 | Heraeus, Inc. | Stretching of magnetic materials to increase pass-through-flux (PTF) |
AU2001266950A1 (en) | 2000-06-30 | 2002-01-14 | Honeywell International, Inc. | Method and apparatus for processing metals, and the metals so produced |
US7041204B1 (en) | 2000-10-27 | 2006-05-09 | Honeywell International Inc. | Physical vapor deposition components and methods of formation |
US6472867B1 (en) | 2001-02-21 | 2002-10-29 | Applied Materials, Inc. | Target for use in magnetron sputtering of nickel for forming metallization films having consistent uniformity through life |
US20040129559A1 (en) * | 2002-04-12 | 2004-07-08 | Misner Josh W. | Diffusion bonded assemblies and fabrication methods |
AU2003277063A1 (en) * | 2002-10-08 | 2004-05-04 | Honeywell International Inc. | Homogenous solid solution alloys for sputter-deposited thin films |
CN100552080C (zh) * | 2004-03-26 | 2009-10-21 | 日矿金属株式会社 | Co-Cr-Pt-B类合金溅射靶 |
CN101001973B (zh) * | 2004-08-10 | 2010-07-14 | 日矿金属株式会社 | 柔性铜衬底用阻挡膜和用于形成阻挡膜的溅射靶 |
EP1959024A4 (de) * | 2005-12-05 | 2009-12-23 | Japan Science & Tech Agency | Legierung auf kobaltbasis und herstellungsverfahren dafür |
JP5204460B2 (ja) * | 2007-10-24 | 2013-06-05 | 三井金属鉱業株式会社 | 磁気記録膜用スパッタリングターゲットおよびその製造方法 |
US20100108503A1 (en) * | 2008-10-31 | 2010-05-06 | Applied Quantum Technology, Llc | Chalcogenide alloy sputter targets for photovoltaic applications and methods of manufacturing the same |
Family Cites Families (11)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3390443A (en) * | 1964-10-20 | 1968-07-02 | Bell Telephone Labor Inc | Magnetic material and devices utilizing same |
US3356542A (en) * | 1967-04-10 | 1967-12-05 | Du Pont | Cobalt-nickel base alloys containing chromium and molybdenum |
US3494807A (en) * | 1968-06-11 | 1970-02-10 | Fansteel Inc | Dispersion hardened cobalt alloy sheet and production thereof |
CA892488A (en) * | 1968-11-15 | 1972-02-08 | W. Kushnir Bud | Two-phase cobalt-iron alloys prepared by powder metallurgy |
US3695944A (en) * | 1970-06-17 | 1972-10-03 | Allegheny Ludlum Ind Inc | Iron cobalt vanadium alloy |
US3755796A (en) * | 1971-06-30 | 1973-08-28 | Ibm | Cobalt-platinum group alloys whose anisotrophy is greater than their demagnetizable field for use as cylindrical memory elements |
JPS57100627A (en) * | 1980-12-12 | 1982-06-22 | Teijin Ltd | Manufacture of vertical magnetic recording medium |
US4414087A (en) * | 1983-01-31 | 1983-11-08 | Meckel Benjamin B | Magnetically-assisted sputtering method for producing vertical recording media |
JPS606219A (ja) * | 1983-06-24 | 1985-01-12 | Mitsui Mining & Smelting Co Ltd | 蒸着用Co合金タ−ゲツトの加工法 |
JPS61113759A (ja) * | 1984-11-09 | 1986-05-31 | Matsushita Electric Ind Co Ltd | スパツタリング用タ−ゲツト |
JPS61257473A (ja) * | 1985-05-08 | 1986-11-14 | Sumitomo Special Metals Co Ltd | スパツタリング用タ−ゲツト材 |
-
1986
- 1986-07-08 JP JP61158755A patent/JPS6314864A/ja active Granted
-
1987
- 1987-07-06 EP EP87109731A patent/EP0252478B1/de not_active Revoked
- 1987-07-06 DE DE87109731T patent/DE3787679T2/de not_active Revoked
- 1987-07-07 US US07/070,441 patent/US4832810A/en not_active Expired - Lifetime
Also Published As
Publication number | Publication date |
---|---|
EP0252478B1 (de) | 1993-10-06 |
EP0252478A3 (en) | 1988-08-24 |
JPH0249384B2 (de) | 1990-10-30 |
US4832810A (en) | 1989-05-23 |
EP0252478A2 (de) | 1988-01-13 |
JPS6314864A (ja) | 1988-01-22 |
DE3787679T2 (de) | 1994-05-05 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
8363 | Opposition against the patent | ||
8331 | Complete revocation |