DE3785295D1 - Verfahren zur herstellung eines films aus ultrafeinen teilchen. - Google Patents

Verfahren zur herstellung eines films aus ultrafeinen teilchen.

Info

Publication number
DE3785295D1
DE3785295D1 DE8787115669T DE3785295T DE3785295D1 DE 3785295 D1 DE3785295 D1 DE 3785295D1 DE 8787115669 T DE8787115669 T DE 8787115669T DE 3785295 T DE3785295 T DE 3785295T DE 3785295 D1 DE3785295 D1 DE 3785295D1
Authority
DE
Germany
Prior art keywords
producing
film
ultrafine particles
ultrafine
particles
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE8787115669T
Other languages
English (en)
Other versions
DE3785295T2 (de
Inventor
Takeshi Araya
Akira Matsunawa
Seiji Katayama
Susumu Hioki
Mitsuaki Haneda
Ryoji Tsukuba Hausu - Okada
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Publication of DE3785295D1 publication Critical patent/DE3785295D1/de
Application granted granted Critical
Publication of DE3785295T2 publication Critical patent/DE3785295T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C23C14/28—Vacuum evaporation by wave energy or particle radiation
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N—ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N60/00—Superconducting devices
    • H10N60/01—Manufacture or treatment
    • H10N60/0268—Manufacture or treatment of devices comprising copper oxide
    • H10N60/0296—Processes for depositing or forming copper oxide superconductor layers
    • H10N60/0521—Processes for depositing or forming copper oxide superconductor layers by pulsed laser deposition, e.g. laser sputtering

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Toxicology (AREA)
  • Optics & Photonics (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
  • Oxygen, Ozone, And Oxides In General (AREA)
  • Physical Or Chemical Processes And Apparatus (AREA)
DE8787115669T 1986-10-27 1987-10-26 Verfahren zur herstellung eines films aus ultrafeinen teilchen. Expired - Fee Related DE3785295T2 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP25381786 1986-10-27

Publications (2)

Publication Number Publication Date
DE3785295D1 true DE3785295D1 (de) 1993-05-13
DE3785295T2 DE3785295T2 (de) 1993-07-22

Family

ID=17256546

Family Applications (1)

Application Number Title Priority Date Filing Date
DE8787115669T Expired - Fee Related DE3785295T2 (de) 1986-10-27 1987-10-26 Verfahren zur herstellung eines films aus ultrafeinen teilchen.

Country Status (3)

Country Link
EP (1) EP0265886B1 (de)
JP (1) JPS63227766A (de)
DE (1) DE3785295T2 (de)

Families Citing this family (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH01224298A (ja) * 1988-01-27 1989-09-07 Siemens Ag 金属酸化物超伝導材料層の製造方法
US4966887A (en) * 1988-06-24 1990-10-30 The Research Foundation Of State University Of Ny Method for the production of oxide superconducting films by laser assisted molecular beam epitaxy
US5075281A (en) * 1989-01-03 1991-12-24 Testardi Louis R Methods of making a high dielectric constant, resistive phase of YBA2 CU3 OX and methods of using the same
DE3921127A1 (de) * 1989-06-28 1991-01-03 Leybold Ag Verfahren fuer die herstellung supraleitender keramiken
DE4000690A1 (de) * 1990-01-12 1991-07-18 Philips Patentverwaltung Verfahren zum herstellen von ultrafeinen partikeln und deren verwendung
JPH0532493A (ja) * 1991-07-29 1993-02-09 Sumitomo Electric Ind Ltd 複合酸化物超電導薄膜の成膜方法
JPH06302897A (ja) * 1993-04-19 1994-10-28 Sumitomo Electric Ind Ltd レーザ装置、その運転方法およびその応用
DE4322533A1 (de) * 1993-07-07 1995-01-12 Leybold Durferrit Gmbh Verfahren zur Herstellung supraleitender Keramiken und die Kermiken selbst
US6017630A (en) * 1996-05-22 2000-01-25 Research Development Corporation Ultrafine particle and production method thereof, production method of ultrafine particle bonded body, and fullerene and production method thereof
AUPR026100A0 (en) * 2000-09-20 2000-10-12 Tamanyan, Astghik Deposition of thin films by laser ablation
CA2599157A1 (en) * 2005-02-23 2006-08-31 Picodeon Ltd Oy Pulsed laser deposition method
CN109759708A (zh) * 2019-01-25 2019-05-17 大连理工大学 热弧与激光复合热源蒸发金属/碳纳米粉体连续生产方法

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5339274A (en) * 1976-09-22 1978-04-11 Hitachi Ltd Vacuum evaporating method for forming aluminum oxide film by means of laser as heat source
JPS5348088A (en) * 1976-10-15 1978-05-01 Hitachi Ltd Preparation of evaporation source for laser evaporation
US4281030A (en) * 1980-05-12 1981-07-28 Bell Telephone Laboratories, Incorporated Implantation of vaporized material on melted substrates
JPS5846198B2 (ja) * 1980-07-25 1983-10-14 日本電信電話株式会社 酸化物超伝導体ジョセフソン素子の製造方法
JPS59116373A (ja) * 1982-12-22 1984-07-05 Agency Of Ind Science & Technol レ−ザ蒸着装置
JPS60194066A (ja) * 1984-03-16 1985-10-02 Agency Of Ind Science & Technol 硬質膜被覆材料の製造方法
JPS6179765A (ja) * 1984-09-28 1986-04-23 Mitsubishi Heavy Ind Ltd レ−ザ蒸着装置

Also Published As

Publication number Publication date
JPH0524988B2 (de) 1993-04-09
JPS63227766A (ja) 1988-09-22
EP0265886A2 (de) 1988-05-04
EP0265886B1 (de) 1993-04-07
EP0265886A3 (en) 1990-10-03
DE3785295T2 (de) 1993-07-22

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee