JPS5348088A - Preparation of evaporation source for laser evaporation - Google Patents

Preparation of evaporation source for laser evaporation

Info

Publication number
JPS5348088A
JPS5348088A JP12277876A JP12277876A JPS5348088A JP S5348088 A JPS5348088 A JP S5348088A JP 12277876 A JP12277876 A JP 12277876A JP 12277876 A JP12277876 A JP 12277876A JP S5348088 A JPS5348088 A JP S5348088A
Authority
JP
Japan
Prior art keywords
evaporation
laser
preparation
source
compound
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP12277876A
Other languages
Japanese (ja)
Inventor
Takashi Nishida
Kazuyoshi Ueki
Yukiyoshi Harada
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP12277876A priority Critical patent/JPS5348088A/en
Publication of JPS5348088A publication Critical patent/JPS5348088A/en
Pending legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C23C14/28—Vacuum evaporation by wave energy or particle radiation

Abstract

PURPOSE:To form alumina film having few pin hole or granular projection at a uniform heaping rate by irradiation of laser beam under atmospheric pressure on the compound of powder material for evaporation so as to melt at least one portion of the compound, and by use of the molten portion as evaporation source for laser evaporation.
JP12277876A 1976-10-15 1976-10-15 Preparation of evaporation source for laser evaporation Pending JPS5348088A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP12277876A JPS5348088A (en) 1976-10-15 1976-10-15 Preparation of evaporation source for laser evaporation

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP12277876A JPS5348088A (en) 1976-10-15 1976-10-15 Preparation of evaporation source for laser evaporation

Publications (1)

Publication Number Publication Date
JPS5348088A true JPS5348088A (en) 1978-05-01

Family

ID=14844368

Family Applications (1)

Application Number Title Priority Date Filing Date
JP12277876A Pending JPS5348088A (en) 1976-10-15 1976-10-15 Preparation of evaporation source for laser evaporation

Country Status (1)

Country Link
JP (1) JPS5348088A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0265886A2 (en) * 1986-10-27 1988-05-04 Hitachi, Ltd. Process for forming an ultrafine-particle film
JP2019157274A (en) * 2018-03-12 2019-09-19 ソルマテス・ベスローテン・フェンノートシャップＳｏｌｍａｔｅｓ Ｂ．Ｖ． Pulse laser deposition method

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0265886A2 (en) * 1986-10-27 1988-05-04 Hitachi, Ltd. Process for forming an ultrafine-particle film
JP2019157274A (en) * 2018-03-12 2019-09-19 ソルマテス・ベスローテン・フェンノートシャップＳｏｌｍａｔｅｓ Ｂ．Ｖ． Pulse laser deposition method

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