JPS5357762A - Diaphragm for electron beam exposure apparatus - Google Patents
Diaphragm for electron beam exposure apparatusInfo
- Publication number
- JPS5357762A JPS5357762A JP13261676A JP13261676A JPS5357762A JP S5357762 A JPS5357762 A JP S5357762A JP 13261676 A JP13261676 A JP 13261676A JP 13261676 A JP13261676 A JP 13261676A JP S5357762 A JPS5357762 A JP S5357762A
- Authority
- JP
- Japan
- Prior art keywords
- diaphragm
- electron beam
- exposure apparatus
- beam exposure
- single crystal
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Electron Beam Exposure (AREA)
Abstract
PURPOSE: To obtain a diaphragm having opening end parts of superior linearity by making use of the cleavage surfaces of single crystal.
COPYRIGHT: (C)1978,JPO&Japio
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP13261676A JPS5357762A (en) | 1976-11-04 | 1976-11-04 | Diaphragm for electron beam exposure apparatus |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP13261676A JPS5357762A (en) | 1976-11-04 | 1976-11-04 | Diaphragm for electron beam exposure apparatus |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS5357762A true JPS5357762A (en) | 1978-05-25 |
Family
ID=15085484
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP13261676A Pending JPS5357762A (en) | 1976-11-04 | 1976-11-04 | Diaphragm for electron beam exposure apparatus |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5357762A (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5752133A (en) * | 1980-09-16 | 1982-03-27 | Toshiba Corp | Electron beam exposure apparatus |
-
1976
- 1976-11-04 JP JP13261676A patent/JPS5357762A/en active Pending
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5752133A (en) * | 1980-09-16 | 1982-03-27 | Toshiba Corp | Electron beam exposure apparatus |
JPS622454B2 (en) * | 1980-09-16 | 1987-01-20 | Tokyo Shibaura Electric Co |
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