JPS54874A - Etching monitor system - Google Patents
Etching monitor systemInfo
- Publication number
- JPS54874A JPS54874A JP6545277A JP6545277A JPS54874A JP S54874 A JPS54874 A JP S54874A JP 6545277 A JP6545277 A JP 6545277A JP 6545277 A JP6545277 A JP 6545277A JP S54874 A JPS54874 A JP S54874A
- Authority
- JP
- Japan
- Prior art keywords
- monitor system
- etching monitor
- thin film
- etching
- seucre
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Landscapes
- Drying Of Semiconductors (AREA)
- Weting (AREA)
Abstract
PURPOSE: To seucre a high-accuracy decision for the etching end point of the Si3N4 thin film by utilizing the optical properties of the thin film.
COPYRIGHT: (C)1979,JPO&Japio
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP6545277A JPS54874A (en) | 1977-06-03 | 1977-06-03 | Etching monitor system |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP6545277A JPS54874A (en) | 1977-06-03 | 1977-06-03 | Etching monitor system |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS54874A true JPS54874A (en) | 1979-01-06 |
JPS5637696B2 JPS5637696B2 (en) | 1981-09-02 |
Family
ID=13287538
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP6545277A Granted JPS54874A (en) | 1977-06-03 | 1977-06-03 | Etching monitor system |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS54874A (en) |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS61179291U (en) * | 1985-04-30 | 1986-11-08 |
-
1977
- 1977-06-03 JP JP6545277A patent/JPS54874A/en active Granted
Also Published As
Publication number | Publication date |
---|---|
JPS5637696B2 (en) | 1981-09-02 |
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