DE3750573D1 - Dünnschicht-Transistoranordnung für Anzeigetafel aus Flüssigkristallen. - Google Patents

Dünnschicht-Transistoranordnung für Anzeigetafel aus Flüssigkristallen.

Info

Publication number
DE3750573D1
DE3750573D1 DE3750573T DE3750573T DE3750573D1 DE 3750573 D1 DE3750573 D1 DE 3750573D1 DE 3750573 T DE3750573 T DE 3750573T DE 3750573 T DE3750573 T DE 3750573T DE 3750573 D1 DE3750573 D1 DE 3750573D1
Authority
DE
Germany
Prior art keywords
liquid crystal
thin film
crystal display
display panel
film transistor
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE3750573T
Other languages
English (en)
Other versions
DE3750573T2 (de
Inventor
Kesao C O Nec Corporat Noguchi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NEC Electronics Corp
Original Assignee
NEC Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by NEC Corp filed Critical NEC Corp
Publication of DE3750573D1 publication Critical patent/DE3750573D1/de
Application granted granted Critical
Publication of DE3750573T2 publication Critical patent/DE3750573T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L27/00Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
    • H01L27/02Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers
    • H01L27/12Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being other than a semiconductor body, e.g. an insulating body
    • GPHYSICS
    • G02OPTICS
    • G02FOPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/136Liquid crystal cells structurally associated with a semi-conducting layer or substrate, e.g. cells forming part of an integrated circuit
    • G02F1/1362Active matrix addressed cells
    • G02F1/1368Active matrix addressed cells in which the switching element is a three-electrode device
    • GPHYSICS
    • G02OPTICS
    • G02FOPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333Constructional arrangements; Manufacturing methods
    • G02F1/1335Structural association of cells with optical devices, e.g. polarisers or reflectors
    • G02F1/133509Filters, e.g. light shielding masks
    • G02F1/133512Light shielding layers, e.g. black matrix
    • GPHYSICS
    • G02OPTICS
    • G02FOPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/136Liquid crystal cells structurally associated with a semi-conducting layer or substrate, e.g. cells forming part of an integrated circuit
    • G02F1/1362Active matrix addressed cells
    • G02F1/136259Repairing; Defects
    • G02F1/136263Line defects
    • GPHYSICS
    • G02OPTICS
    • G02FOPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/136Liquid crystal cells structurally associated with a semi-conducting layer or substrate, e.g. cells forming part of an integrated circuit
    • G02F1/1362Active matrix addressed cells
    • G02F1/136286Wiring, e.g. gate line, drain line
    • G02F1/13629Multilayer wirings
    • GPHYSICS
    • G02OPTICS
    • G02FOPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F2202/00Materials and properties
    • G02F2202/10Materials and properties semiconductor
    • G02F2202/103Materials and properties semiconductor a-Si
    • GPHYSICS
    • G02OPTICS
    • G02FOPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F2202/00Materials and properties
    • G02F2202/10Materials and properties semiconductor
    • G02F2202/104Materials and properties semiconductor poly-Si

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Nonlinear Science (AREA)
  • General Physics & Mathematics (AREA)
  • Power Engineering (AREA)
  • Chemical & Material Sciences (AREA)
  • Mathematical Physics (AREA)
  • Computer Hardware Design (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Optics & Photonics (AREA)
  • Liquid Crystal (AREA)
  • Thin Film Transistor (AREA)
  • Devices For Indicating Variable Information By Combining Individual Elements (AREA)
  • Solid State Image Pick-Up Elements (AREA)
DE3750573T 1986-11-27 1987-11-27 Dünnschicht-Transistoranordnung für Anzeigetafel aus Flüssigkristallen. Expired - Fee Related DE3750573T2 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP61283320A JPH0691252B2 (ja) 1986-11-27 1986-11-27 薄膜トランジスタアレイ

Publications (2)

Publication Number Publication Date
DE3750573D1 true DE3750573D1 (de) 1994-10-27
DE3750573T2 DE3750573T2 (de) 1995-05-11

Family

ID=17663937

Family Applications (1)

Application Number Title Priority Date Filing Date
DE3750573T Expired - Fee Related DE3750573T2 (de) 1986-11-27 1987-11-27 Dünnschicht-Transistoranordnung für Anzeigetafel aus Flüssigkristallen.

Country Status (4)

Country Link
US (1) US4821092A (de)
EP (1) EP0269123B1 (de)
JP (1) JPH0691252B2 (de)
DE (1) DE3750573T2 (de)

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US5327001A (en) * 1987-09-09 1994-07-05 Casio Computer Co., Ltd. Thin film transistor array having single light shield layer over transistors and gate and drain lines
US5229644A (en) * 1987-09-09 1993-07-20 Casio Computer Co., Ltd. Thin film transistor having a transparent electrode and substrate
US5032883A (en) * 1987-09-09 1991-07-16 Casio Computer Co., Ltd. Thin film transistor and method of manufacturing the same
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US5231039A (en) * 1988-02-25 1993-07-27 Sharp Kabushiki Kaisha Method of fabricating a liquid crystal display device
JPH01217325A (ja) * 1988-02-25 1989-08-30 Sharp Corp 液晶表示装置
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JPH01219824A (ja) * 1988-02-29 1989-09-01 Seikosha Co Ltd 非晶質シリコン薄膜トランジスタアレイ基板
JPH0797602B2 (ja) * 1988-05-06 1995-10-18 日本電気株式会社 半導体集積回路装置
FR2631743A1 (fr) * 1988-05-23 1989-11-24 Gen Electric Structure a electrodes non coplanaires pour affichage matriciel a cristaux liquides a transistors en couches minces de silicium amorphe et procede de fabrication
JP2771820B2 (ja) * 1988-07-08 1998-07-02 株式会社日立製作所 アクティブマトリクスパネル及びその製造方法
US5202572A (en) * 1988-09-21 1993-04-13 Fuji Xerox Co., Ltd. Thin film transistor
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US5196912A (en) * 1988-10-28 1993-03-23 Casio Computer Co., Ltd. Thin film transistor having memory function and method for using thin film transistor as memory element
US5060034A (en) * 1988-11-01 1991-10-22 Casio Computer Co., Ltd. Memory device using thin film transistors having an insulation film with si/n composition ratio of 0.85 to 1.1
US5042918A (en) * 1988-11-15 1991-08-27 Kabushiki Kaisha Toshiba Liquid crystal display device
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JP2575052B2 (ja) * 1988-12-07 1997-01-22 ホシデン株式会社 液晶表示素子
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JP2600929B2 (ja) * 1989-01-27 1997-04-16 松下電器産業株式会社 液晶画像表示装置およびその製造方法
DE4090273C1 (de) * 1989-03-01 1996-09-26 Mitsubishi Electric Corp Dünnfilmtransistor
JP2952887B2 (ja) * 1989-05-20 1999-09-27 富士通株式会社 半導体装置およびその製造方法
US5225364A (en) * 1989-06-26 1993-07-06 Oki Electric Industry Co., Ltd. Method of fabricating a thin-film transistor matrix for an active matrix display panel
JP2558351B2 (ja) * 1989-06-29 1996-11-27 沖電気工業株式会社 アクティブマトリクス表示パネル
US5153754A (en) * 1989-06-30 1992-10-06 General Electric Company Multi-layer address lines for amorphous silicon liquid crystal display devices
US5212574A (en) * 1989-07-05 1993-05-18 Sharp Kabushiki Kaisha Active matrix board having double-layer scan lines and capacity lines with discontinuous lower scan lines and lower capacity lines
US5057885A (en) * 1989-07-28 1991-10-15 Casio Computer Co., Ltd. Memory cell system with first and second gates
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JP3009438B2 (ja) * 1989-08-14 2000-02-14 株式会社日立製作所 液晶表示装置
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JP2976483B2 (ja) * 1990-04-24 1999-11-10 日本電気株式会社 液晶表示素子用薄膜トランジスタの製造方法
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JPH0824193B2 (ja) * 1990-10-16 1996-03-06 工業技術院長 平板型光弁駆動用半導体装置の製造方法
US5402254B1 (en) * 1990-10-17 1998-09-22 Hitachi Ltd Liquid crystal display device with tfts in which pixel electrodes are formed in the same plane as the gate electrodes with anodized oxide films before the deposition of silicon
US5162931A (en) * 1990-11-06 1992-11-10 Honeywell, Inc. Method of manufacturing flat panel backplanes including redundant gate lines and displays made thereby
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JP3716580B2 (ja) * 1997-02-27 2005-11-16 セイコーエプソン株式会社 液晶装置及びその製造方法、並びに投写型表示装置
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KR101080356B1 (ko) * 2003-10-13 2011-11-04 삼성전자주식회사 박막 트랜지스터, 박막 트랜지스터 표시판 및 표시 장치
JP2009076722A (ja) * 2007-09-21 2009-04-09 Sony Corp 回路基板、表示装置及び回路基板のリペア方法
US9568794B2 (en) * 2010-12-20 2017-02-14 Semiconductor Energy Laboratory Co., Ltd. Display device
US9939706B2 (en) 2013-03-26 2018-04-10 Clearink Displays, Inc. Displaced porous electrode for frustrating TIR and returning light through exit pupil
US9280029B2 (en) 2013-05-13 2016-03-08 Clearink Displays, Inc. Registered reflective element for a brightness enhanced TIR display
US10203436B2 (en) 2013-05-22 2019-02-12 Clearink Displays, Inc. Method and apparatus for improved color filter saturation
US10705404B2 (en) 2013-07-08 2020-07-07 Concord (Hk) International Education Limited TIR-modulated wide viewing angle display
CN105474085A (zh) 2013-07-08 2016-04-06 清墨显示股份有限公司 Tir调制宽视角显示器
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CN105579900B (zh) 2013-09-30 2019-09-20 清墨显示股份有限责任公司 用于前光半后向反射显示器的方法和装置
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Also Published As

Publication number Publication date
US4821092A (en) 1989-04-11
EP0269123A3 (en) 1990-10-10
JPS63136571A (ja) 1988-06-08
EP0269123A2 (de) 1988-06-01
DE3750573T2 (de) 1995-05-11
JPH0691252B2 (ja) 1994-11-14
EP0269123B1 (de) 1994-09-21

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8327 Change in the person/name/address of the patent owner

Owner name: NEC ELECTRONICS CORP., KAWASAKI, KANAGAWA, JP

8339 Ceased/non-payment of the annual fee