DE3739639C2 - - Google Patents

Info

Publication number
DE3739639C2
DE3739639C2 DE3739639A DE3739639A DE3739639C2 DE 3739639 C2 DE3739639 C2 DE 3739639C2 DE 3739639 A DE3739639 A DE 3739639A DE 3739639 A DE3739639 A DE 3739639A DE 3739639 C2 DE3739639 C2 DE 3739639C2
Authority
DE
Germany
Prior art keywords
group
elements
gaseous
iii
compound
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE3739639A
Other languages
German (de)
English (en)
Other versions
DE3739639A1 (de
Inventor
Junichi Nishizawa
Toru Kurabayashi
Fumio Sendai Jp Matsumoto
Hitoshi Hachioji Jp Abe
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Japan Science and Technology Agency
Oki Electric Industry Co Ltd
Sanyo Electric Co Ltd
Original Assignee
Oki Electric Industry Co Ltd
Research Development Corp of Japan
Sanyo Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Oki Electric Industry Co Ltd, Research Development Corp of Japan, Sanyo Electric Co Ltd filed Critical Oki Electric Industry Co Ltd
Publication of DE3739639A1 publication Critical patent/DE3739639A1/de
Application granted granted Critical
Publication of DE3739639C2 publication Critical patent/DE3739639C2/de
Granted legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C30—CRYSTAL GROWTH
    • C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
    • C30B25/00—Single-crystal growth by chemical reaction of reactive gases, e.g. chemical vapour-deposition growth
    • C30B25/02—Epitaxial-layer growth
    • C—CHEMISTRY; METALLURGY
    • C30—CRYSTAL GROWTH
    • C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
    • C30B29/00—Single crystals or homogeneous polycrystalline material with defined structure characterised by the material or by their shape
    • C30B29/10—Inorganic compounds or compositions
    • C30B29/40—AIIIBV compounds wherein A is B, Al, Ga, In or Tl and B is N, P, As, Sb or Bi
    • C—CHEMISTRY; METALLURGY
    • C30—CRYSTAL GROWTH
    • C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
    • C30B29/00—Single crystals or homogeneous polycrystalline material with defined structure characterised by the material or by their shape
    • C30B29/60—Single crystals or homogeneous polycrystalline material with defined structure characterised by the material or by their shape characterised by shape
    • C30B29/68—Crystals with laminate structure, e.g. "superlattices"
    • H10P14/24—
    • H10P14/2911—
    • H10P14/3221—
    • H10P14/3251—
    • H10P14/3421—
    • H10P14/3442—
    • H10P14/3444—
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S148/00—Metal treatment
    • Y10S148/025—Deposition multi-step
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S148/00—Metal treatment
    • Y10S148/041—Doping control in crystal growth
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S148/00—Metal treatment
    • Y10S148/048—Energy beam assisted EPI growth
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S148/00—Metal treatment
    • Y10S148/057—Gas flow control
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S148/00—Metal treatment
    • Y10S148/072—Heterojunctions
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S148/00—Metal treatment
    • Y10S148/094—Laser beam treatment of compound devices
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S148/00—Metal treatment
    • Y10S148/11—Metal-organic CVD, ruehrwein type
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S438/00—Semiconductor device manufacturing: process
    • Y10S438/935—Gas flow control

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Inorganic Chemistry (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Junction Field-Effect Transistors (AREA)
  • Crystals, And After-Treatments Of Crystals (AREA)
DE19873739639 1986-11-22 1987-11-23 Verfahren des epitaxialen wachstums von verbindungshalbleitern Granted DE3739639A1 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP61277829A JP2587623B2 (ja) 1986-11-22 1986-11-22 化合物半導体のエピタキシヤル結晶成長方法

Publications (2)

Publication Number Publication Date
DE3739639A1 DE3739639A1 (de) 1988-06-01
DE3739639C2 true DE3739639C2 (enExample) 1990-08-16

Family

ID=17588846

Family Applications (1)

Application Number Title Priority Date Filing Date
DE19873739639 Granted DE3739639A1 (de) 1986-11-22 1987-11-23 Verfahren des epitaxialen wachstums von verbindungshalbleitern

Country Status (5)

Country Link
US (1) US4859625A (enExample)
JP (1) JP2587623B2 (enExample)
DE (1) DE3739639A1 (enExample)
FR (1) FR2607322B1 (enExample)
GB (1) GB2198454B (enExample)

Families Citing this family (54)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0766906B2 (ja) * 1984-07-26 1995-07-19 新技術事業団 ＧａＡｓエピタキシャル成長方法
US5871811A (en) * 1986-12-19 1999-02-16 Applied Materials, Inc. Method for protecting against deposition on a selected region of a substrate
US5204284A (en) * 1989-01-19 1993-04-20 Hewlett-Packard Company Method of making a high band-gap opto-electronic device
JPH02260417A (ja) * 1989-03-30 1990-10-23 Mitsubishi Electric Corp 半導体薄膜の結晶成長方法及びその装置
JPH03218621A (ja) * 1989-11-30 1991-09-26 Toshiba Corp 薄膜の選択成長方法及び薄膜の選択成長装置
US5213654A (en) * 1990-05-18 1993-05-25 Kabushiki Kaisha Toshiba Vapor-phase epitaxial growth method for semiconductor crystal layers
US5225366A (en) * 1990-06-22 1993-07-06 The United States Of America As Represented By The Secretary Of The Navy Apparatus for and a method of growing thin films of elemental semiconductors
US5123995A (en) * 1990-10-04 1992-06-23 Aerodyne Research, Inc. Low-temperature, photo-induced epitaxy
US5270247A (en) * 1991-07-12 1993-12-14 Fujitsu Limited Atomic layer epitaxy of compound semiconductor
JPH081955B2 (ja) * 1991-08-21 1996-01-10 ヒューズ・エアクラフト・カンパニー 反転変調ドープされたヘテロ構造の製造方法
JPH06295862A (ja) * 1992-11-20 1994-10-21 Mitsubishi Electric Corp 化合物半導体製造装置及び有機金属材料容器
US6010937A (en) * 1995-09-05 2000-01-04 Spire Corporation Reduction of dislocations in a heteroepitaxial semiconductor structure
US6316098B1 (en) 1998-03-27 2001-11-13 Yissum Research Development Company Of The Hebrew University Of Jerusalem Molecular layer epitaxy method and compositions
US6783849B2 (en) * 1998-03-27 2004-08-31 Yissum Research Development Company Of The Hebrew University Of Jerusalem Molecular layer epitaxy method and compositions
US5997589A (en) * 1998-07-09 1999-12-07 Winbond Electronics Corp. Adjustment pumping plate design for the chamber of semiconductor equipment
US6576053B1 (en) 1999-10-06 2003-06-10 Samsung Electronics Co., Ltd. Method of forming thin film using atomic layer deposition method
TW515032B (en) * 1999-10-06 2002-12-21 Samsung Electronics Co Ltd Method of forming thin film using atomic layer deposition method
US6620723B1 (en) 2000-06-27 2003-09-16 Applied Materials, Inc. Formation of boride barrier layers using chemisorption techniques
US7101795B1 (en) 2000-06-28 2006-09-05 Applied Materials, Inc. Method and apparatus for depositing refractory metal layers employing sequential deposition techniques to form a nucleation layer
US6551929B1 (en) 2000-06-28 2003-04-22 Applied Materials, Inc. Bifurcated deposition process for depositing refractory metal layers employing atomic layer deposition and chemical vapor deposition techniques
US7405158B2 (en) 2000-06-28 2008-07-29 Applied Materials, Inc. Methods for depositing tungsten layers employing atomic layer deposition techniques
US7964505B2 (en) 2005-01-19 2011-06-21 Applied Materials, Inc. Atomic layer deposition of tungsten materials
US7732327B2 (en) 2000-06-28 2010-06-08 Applied Materials, Inc. Vapor deposition of tungsten materials
AU2002232844A1 (en) * 2000-12-06 2002-06-18 Angstron Systems, Inc. System and method for modulated ion-induced atomic layer deposition (mii-ald)
US6765178B2 (en) * 2000-12-29 2004-07-20 Applied Materials, Inc. Chamber for uniform substrate heating
US6825447B2 (en) * 2000-12-29 2004-11-30 Applied Materials, Inc. Apparatus and method for uniform substrate heating and contaminate collection
US20020083897A1 (en) * 2000-12-29 2002-07-04 Applied Materials, Inc. Full glass substrate deposition in plasma enhanced chemical vapor deposition
US6998579B2 (en) 2000-12-29 2006-02-14 Applied Materials, Inc. Chamber for uniform substrate heating
US6951804B2 (en) 2001-02-02 2005-10-04 Applied Materials, Inc. Formation of a tantalum-nitride layer
KR100384558B1 (ko) * 2001-02-22 2003-05-22 삼성전자주식회사 반도체 장치의 유전체층 형성방법 및 이를 이용한캐패시터 형성방법
US6878206B2 (en) 2001-07-16 2005-04-12 Applied Materials, Inc. Lid assembly for a processing system to facilitate sequential deposition techniques
US6660126B2 (en) 2001-03-02 2003-12-09 Applied Materials, Inc. Lid assembly for a processing system to facilitate sequential deposition techniques
US6734020B2 (en) 2001-03-07 2004-05-11 Applied Materials, Inc. Valve control system for atomic layer deposition chamber
US6936906B2 (en) 2001-09-26 2005-08-30 Applied Materials, Inc. Integration of barrier layer and seed layer
US7049226B2 (en) 2001-09-26 2006-05-23 Applied Materials, Inc. Integration of ALD tantalum nitride for copper metallization
US6916398B2 (en) 2001-10-26 2005-07-12 Applied Materials, Inc. Gas delivery apparatus and method for atomic layer deposition
US6729824B2 (en) 2001-12-14 2004-05-04 Applied Materials, Inc. Dual robot processing system
US6620670B2 (en) 2002-01-18 2003-09-16 Applied Materials, Inc. Process conditions and precursors for atomic layer deposition (ALD) of AL2O3
US6911391B2 (en) 2002-01-26 2005-06-28 Applied Materials, Inc. Integration of titanium and titanium nitride layers
US6827978B2 (en) 2002-02-11 2004-12-07 Applied Materials, Inc. Deposition of tungsten films
US6833161B2 (en) 2002-02-26 2004-12-21 Applied Materials, Inc. Cyclical deposition of tungsten nitride for metal oxide gate electrode
US7439191B2 (en) 2002-04-05 2008-10-21 Applied Materials, Inc. Deposition of silicon layers for active matrix liquid crystal display (AMLCD) applications
US6846516B2 (en) 2002-04-08 2005-01-25 Applied Materials, Inc. Multiple precursor cyclical deposition system
US6720027B2 (en) 2002-04-08 2004-04-13 Applied Materials, Inc. Cyclical deposition of a variable content titanium silicon nitride layer
US6875271B2 (en) 2002-04-09 2005-04-05 Applied Materials, Inc. Simultaneous cyclical deposition in different processing regions
US6869838B2 (en) * 2002-04-09 2005-03-22 Applied Materials, Inc. Deposition of passivation layers for active matrix liquid crystal display (AMLCD) applications
US20030194825A1 (en) * 2002-04-10 2003-10-16 Kam Law Deposition of gate metallization for active matrix liquid crystal display (AMLCD) applications
US7022605B2 (en) * 2002-11-12 2006-04-04 Micron Technology, Inc. Atomic layer deposition methods
US20040142558A1 (en) * 2002-12-05 2004-07-22 Granneman Ernst H. A. Apparatus and method for atomic layer deposition on substrates
DE20305093U1 (de) * 2003-03-29 2003-09-11 Heske, Norbert F., 82288 Kottgeisering Koaxialkanüle mit Dichtelement
JP4972995B2 (ja) * 2006-05-17 2012-07-11 富士通株式会社 量子ドット半導体装置
WO2008140022A1 (ja) * 2007-05-08 2008-11-20 Tokyo Electron Limited 化合物半導体の熱処理方法及びその装置
JP5668602B2 (ja) * 2011-05-30 2015-02-12 日立金属株式会社 半絶縁性窒化物半導体層の成長方法及び成長装置
JP5943345B2 (ja) * 2012-07-27 2016-07-05 東京エレクトロン株式会社 ＺｎＯ膜の製造装置及び製造方法

Family Cites Families (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3626257A (en) * 1969-04-01 1971-12-07 Ibm Semiconductor device with superlattice region
US3721583A (en) * 1970-12-08 1973-03-20 Ibm Vapor phase epitaxial deposition process for forming superlattice structure
JPS5129880B2 (enExample) * 1973-03-15 1976-08-27
FR2320774A1 (fr) * 1974-01-10 1977-03-11 Radiotechnique Compelec Procede et dispositif de depot de materiau dope
SE393967B (sv) * 1974-11-29 1977-05-31 Sateko Oy Forfarande och for utforande av stroleggning mellan lagren i ett virkespaket
FI57975C (fi) * 1979-02-28 1980-11-10 Lohja Ab Oy Foerfarande och anordning vid uppbyggande av tunna foereningshinnor
US4504331A (en) * 1983-12-08 1985-03-12 International Business Machines Corporation Silicon dopant source in intermetallic semiconductor growth operations
JPH0782991B2 (ja) * 1984-07-26 1995-09-06 新技術事業団 化合物半導体単結晶薄膜の成長法
JPH0766910B2 (ja) * 1984-07-26 1995-07-19 新技術事業団 半導体単結晶成長装置
JPH0766909B2 (ja) * 1984-07-26 1995-07-19 新技術事業団 元素半導体単結晶薄膜の成長法
GB2162862B (en) * 1984-07-26 1988-10-19 Japan Res Dev Corp A method of growing a thin film single crystalline semiconductor
US4767494A (en) * 1986-07-04 1988-08-30 Nippon Telegraph & Telephone Corporation Preparation process of compound semiconductor

Also Published As

Publication number Publication date
JP2587623B2 (ja) 1997-03-05
GB2198454B (en) 1991-06-26
DE3739639A1 (de) 1988-06-01
GB2198454A (en) 1988-06-15
JPS63132421A (ja) 1988-06-04
FR2607322B1 (fr) 1991-10-11
FR2607322A1 (fr) 1988-05-27
GB8727278D0 (en) 1987-12-23
US4859625A (en) 1989-08-22

Similar Documents

Publication Publication Date Title
DE3739639C2 (enExample)
DE3526844C2 (enExample)
DE3823249C2 (enExample)
DE3875992T2 (de) Verfahren zur herstellung einer epitaxieschicht eines iii-v-verbindungshalbleiters.
DE68918135T2 (de) Methode zur Erzeugung einer halbleitenden Dünnschicht.
DE68917021T2 (de) Herstellung eines Halbleiterplättchens, das eine III-V-Gruppen-Halbleiterverbindungsschicht auf einem Siliziumsubstrat aufweist.
DE69024246T2 (de) Verfahren zur Herstellung einer Dünnschichthalbleiterlegierung
DE69029340T2 (de) Halbleiterlaser mit fünfelementigem Verbindungshalbleiter
DE69012727T2 (de) Verfahren zur herstellung eines polykristallinen filmes mittels chemischen dampfniederschlags.
DE69203736T3 (de) Kristallzuchtverfahren für Halbleiter auf Galliumnitrid-Basis.
DE2429634A1 (de) Verfahren zum herstellen eines halbleiterbauelements im molekularstrahl-epitaxieverfahren
DE3526825C2 (enExample)
DE69430524T2 (de) Verfahren zur Herstellung eines p-leitenden ohmschen Kontakts mit variabler Zusammensetzung für p-Typ II-VI Halbleiter
DE3873283T2 (de) Verfahren, um eine halbleitervorrichtung mit einem ungeordneten uebergitter herzustellen.
DE3526824C2 (enExample)
DE112012001626T5 (de) Lichtempfangselement und Verfahren zum Herstellen desselben
DE69633460T2 (de) Herstellungsverfahren für iii-v/ii-vi-halbleiter-grenzfläche
DE68921607T2 (de) Verfahren zum Züchten einer kristallinen halbleitenden Dünnschicht und Vorrichtung dafür.
DE10196361T5 (de) Verfahren zur Herstellung eines Gruppe-III-Nitrid-Halbleiterkristalls, Verfahren zur Herstellung eines Verbindungshalbleiters auf Basis von Galliumnitrid, ein Verbindungshalbleiter auf Basis von Galliumnitrid, ein lichtemittierendes Bauelement aus einem Verbindungshalbleiter auf Basis von Galliumnitrid und eine Lichtquelle, die das lichtemittierende Halbleiterbauelement verwendet
DE3720413A1 (de) Verfahren zur herstellung von halbleitermaterial der gruppen ii und vi des periodischen systems durch chemische dampfablagerung metallorganischer verbindungen
DE3211051A1 (de) Vorrichtung und verfahren fuer molekularstrahlniederschlag auf einer vielzahl substrate
DE2529747B2 (de) Verfahren zur Erzeugung von epitaktischen Aufwachsungen aus der flüssigen Phase
DE68901735T2 (de) Verfahren zur herstellung von halbleitenden einkristallen.
DE69228631T2 (de) Verfahren zur Kristallzüchtung eines III-V Verbindungshalbleiters
DE3688028T2 (de) Verfahren zum wachstum einer duennen schicht fuer einen zusammengesetzten halbleiter.

Legal Events

Date Code Title Description
OP8 Request for examination as to paragraph 44 patent law
8181 Inventor (new situation)

Free format text: NISHIZAWA, JUNICHI KURABAYASHI, TORU MATSUMOTO, FUMIO, SENDAI, JP ABE, HITOSHI, HACHIOJI, JP

D2 Grant after examination
8363 Opposition against the patent
8365 Fully valid after opposition proceedings