DE3682959D1 - Bipolarer transistor mit heterouebergang und verfahren zu seiner herstellung. - Google Patents
Bipolarer transistor mit heterouebergang und verfahren zu seiner herstellung.Info
- Publication number
- DE3682959D1 DE3682959D1 DE8686304785T DE3682959T DE3682959D1 DE 3682959 D1 DE3682959 D1 DE 3682959D1 DE 8686304785 T DE8686304785 T DE 8686304785T DE 3682959 T DE3682959 T DE 3682959T DE 3682959 D1 DE3682959 D1 DE 3682959D1
- Authority
- DE
- Germany
- Prior art keywords
- heterouition
- production
- bipolar transistor
- bipolar
- transistor
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L29/00—Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
- H01L29/66—Types of semiconductor device ; Multistep manufacturing processes therefor
- H01L29/66007—Multistep manufacturing processes
- H01L29/66075—Multistep manufacturing processes of devices having semiconductor bodies comprising group 14 or group 13/15 materials
- H01L29/66227—Multistep manufacturing processes of devices having semiconductor bodies comprising group 14 or group 13/15 materials the devices being controllable only by the electric current supplied or the electric potential applied, to an electrode which does not carry the current to be rectified, amplified or switched, e.g. three-terminal devices
- H01L29/66234—Bipolar junction transistors [BJT]
- H01L29/6631—Bipolar junction transistors [BJT] with an active layer made of a group 13/15 material
- H01L29/66318—Heterojunction transistors
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L29/00—Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
- H01L29/66—Types of semiconductor device ; Multistep manufacturing processes therefor
- H01L29/68—Types of semiconductor device ; Multistep manufacturing processes therefor controllable by only the electric current supplied, or only the electric potential applied, to an electrode which does not carry the current to be rectified, amplified or switched
- H01L29/70—Bipolar devices
- H01L29/72—Transistor-type devices, i.e. able to continuously respond to applied control signals
- H01L29/73—Bipolar junction transistors
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L29/00—Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
- H01L29/66—Types of semiconductor device ; Multistep manufacturing processes therefor
- H01L29/68—Types of semiconductor device ; Multistep manufacturing processes therefor controllable by only the electric current supplied, or only the electric potential applied, to an electrode which does not carry the current to be rectified, amplified or switched
- H01L29/70—Bipolar devices
- H01L29/72—Transistor-type devices, i.e. able to continuously respond to applied control signals
- H01L29/73—Bipolar junction transistors
- H01L29/737—Hetero-junction transistors
- H01L29/7371—Vertical transistors
Landscapes
- Engineering & Computer Science (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Physics & Mathematics (AREA)
- Ceramic Engineering (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Computer Hardware Design (AREA)
- Manufacturing & Machinery (AREA)
- Bipolar Transistors (AREA)
Applications Claiming Priority (4)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP13640285A JPS61294857A (ja) | 1985-06-21 | 1985-06-21 | バイポ−ラトランジスタの製造方法 |
JP13640985A JPS61294860A (ja) | 1985-06-21 | 1985-06-21 | バイポ−ラトランジスタの製造方法 |
JP13640585A JPS61294858A (ja) | 1985-06-21 | 1985-06-21 | バイポ−ラトランジスタの製造方法 |
JP13726185A JPS61294862A (ja) | 1985-06-24 | 1985-06-24 | バイポ−ラトランジスタの製造方法 |
Publications (1)
Publication Number | Publication Date |
---|---|
DE3682959D1 true DE3682959D1 (de) | 1992-01-30 |
Family
ID=27471995
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE8686304785T Expired - Lifetime DE3682959D1 (de) | 1985-06-21 | 1986-06-20 | Bipolarer transistor mit heterouebergang und verfahren zu seiner herstellung. |
Country Status (3)
Country | Link |
---|---|
US (1) | US4746626A (de) |
EP (1) | EP0206787B1 (de) |
DE (1) | DE3682959D1 (de) |
Families Citing this family (20)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS6381855A (ja) * | 1986-09-25 | 1988-04-12 | Mitsubishi Electric Corp | ヘテロ接合バイポ−ラトランジスタの製造方法 |
CA1299771C (en) * | 1987-02-06 | 1992-04-28 | Tadao Ishibashi | Heterojunction bipolar transistor with collector buffer layer |
US5140399A (en) * | 1987-04-30 | 1992-08-18 | Sony Corporation | Heterojunction bipolar transistor and the manufacturing method thereof |
JP2619407B2 (ja) * | 1987-08-24 | 1997-06-11 | 株式会社日立製作所 | 半導体装置の製造方法 |
US5159423A (en) * | 1988-11-02 | 1992-10-27 | Hughes Aircraft Company | Self-aligned, planar heterojunction bipolar transistor |
GB2243716B (en) * | 1988-11-02 | 1993-05-05 | Hughes Aircraft Co | Self-aligned,planar heterojunction bipolar transistor and method of forming the same |
US4956689A (en) * | 1989-04-12 | 1990-09-11 | Texas Instruments Incorporated | High speed gallium arsenide transistor and method |
US5053346A (en) * | 1990-01-12 | 1991-10-01 | Texas Instruments Incorporated | Method for making a high speed gallium arsenide transistor |
JPH0831409B2 (ja) * | 1990-02-14 | 1996-03-27 | 株式会社東芝 | 化合物半導体装置およびその製造方法 |
EP0478923B1 (de) * | 1990-08-31 | 1997-11-05 | Texas Instruments Incorporated | Verfahren zum Herstellen selbst-ausrichtender bipolarer Transistoren mit Heteroübergang |
US5234848A (en) * | 1991-11-05 | 1993-08-10 | Texas Instruments Incorporated | Method for fabricating lateral resonant tunneling transistor with heterojunction barriers |
US5311055A (en) * | 1991-11-22 | 1994-05-10 | The United States Of America As Represented By The Secretary Of The Navy | Trenched bipolar transistor structures |
US5298438A (en) * | 1992-08-31 | 1994-03-29 | Texas Instruments Incorporated | Method of reducing extrinsic base-collector capacitance in bipolar transistors |
US5242843A (en) * | 1992-10-28 | 1993-09-07 | Allied-Signal Inc. | Method for making a heterojunction bipolar transistor with improved high frequency response |
US5939738A (en) * | 1995-10-25 | 1999-08-17 | Texas Instruments Incorporated | Low base-resistance bipolar transistor |
US5640025A (en) * | 1995-12-01 | 1997-06-17 | Motorola | High frequency semiconductor transistor |
JP3509682B2 (ja) * | 2000-01-31 | 2004-03-22 | シャープ株式会社 | ヘテロ接合バイポーラトランジスタおよびその製造方法、並びに、通信装置 |
US6773973B2 (en) * | 2001-08-13 | 2004-08-10 | Maxim Integrated Products, Inc. | Semiconductor transistor having a polysilicon emitter and methods of making the same |
US7494887B1 (en) * | 2004-08-17 | 2009-02-24 | Hrl Laboratories, Llc | Method and apparatus for fabricating heterojunction bipolar transistors with simultaneous low base resistance and short base transit time |
JP2006186235A (ja) * | 2004-12-28 | 2006-07-13 | Renesas Technology Corp | 半導体装置及びその製造方法 |
Family Cites Families (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US2569347A (en) * | 1948-06-26 | 1951-09-25 | Bell Telephone Labor Inc | Circuit element utilizing semiconductive material |
US3413533A (en) * | 1966-03-28 | 1968-11-26 | Varian Associates | Heterojunction semiconductor devices employing carrier multiplication in a high gap ratio emitterbase heterojunction |
US3780359A (en) * | 1971-12-20 | 1973-12-18 | Ibm | Bipolar transistor with a heterojunction emitter and a method fabricating the same |
JPS553829A (en) * | 1978-06-26 | 1980-01-11 | Babcock Hitachi Kk | Preventing method of steam leakage from centrifugal separator waste water trough |
US4380774A (en) * | 1980-12-19 | 1983-04-19 | The United States Of America As Represented By The Secretary Of The Navy | High-performance bipolar microwave transistor |
US4617724A (en) * | 1983-06-30 | 1986-10-21 | Fujitsu Limited | Process for fabricating heterojunction bipolar transistor with low base resistance |
JPS6012724A (ja) * | 1983-07-01 | 1985-01-23 | Agency Of Ind Science & Technol | 化合物半導体の成長方法 |
JPS60110188A (ja) * | 1983-11-18 | 1985-06-15 | Sharp Corp | 半導体レ−ザ素子 |
US4575924A (en) * | 1984-07-02 | 1986-03-18 | Texas Instruments Incorporated | Process for fabricating quantum-well devices utilizing etch and refill techniques |
US4593457A (en) * | 1984-12-17 | 1986-06-10 | Motorola, Inc. | Method for making gallium arsenide NPN transistor with self-aligned base enhancement to emitter region and metal contact |
-
1986
- 1986-06-20 EP EP86304785A patent/EP0206787B1/de not_active Expired
- 1986-06-20 DE DE8686304785T patent/DE3682959D1/de not_active Expired - Lifetime
-
1987
- 1987-05-08 US US07/048,470 patent/US4746626A/en not_active Expired - Fee Related
Also Published As
Publication number | Publication date |
---|---|
EP0206787B1 (de) | 1991-12-18 |
EP0206787A2 (de) | 1986-12-30 |
EP0206787A3 (en) | 1987-11-11 |
US4746626A (en) | 1988-05-24 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
DE3686976T2 (de) | Bipolares halbleiterbauelement und verfahren zu seiner herstellung. | |
DE3580206D1 (de) | Bipolarer transistor und verfahren zu seiner herstellung. | |
DE3682021D1 (de) | Polysilizium-mos-transistor und verfahren zu seiner herstellung. | |
DE3581797D1 (de) | Misfet mit niedrigdotiertem drain und verfahren zu seiner herstellung. | |
DE3686792T2 (de) | Amphiphiler polyimid-vorlaeufer und verfahren zu seiner herstellung. | |
DE3688093D1 (de) | Durchsichtiger gegenstand und verfahren zu seiner herstellung. | |
DE3667779D1 (de) | Glasspinnfaden und verfahren zu seiner herstellung. | |
DE3679087D1 (de) | Halbleitervorrichtung und verfahren zu seiner herstellung. | |
DE3784612T2 (de) | Thermistor und verfahren zu seiner herstellung. | |
DE3774651D1 (de) | Zusammengesetzter formkoerper und verfahren zu seiner herstellung. | |
DE68907057T2 (de) | Nährstoffzusammensetzung und verfahren zu deren herstellung. | |
DE3682959D1 (de) | Bipolarer transistor mit heterouebergang und verfahren zu seiner herstellung. | |
DE3581417D1 (de) | Lateraler bipolarer transistor und verfahren zu seiner herstellung. | |
DE3674752D1 (de) | Alpha, alpha-trehalose-derivat und verfahren zur herstellung davon. | |
DE3668254D1 (de) | Chip-widerstand und verfahren zur herstellung. | |
DE3681938D1 (de) | Halbleitersensor und verfahren zu seiner herstellung. | |
DE3686017T2 (de) | Anisotroper gleichrichter und verfahren zu seiner herstellung. | |
DE3683602D1 (de) | Haustierfutter und haustierfutterbestandteil und verfahren zu seiner herstellung. | |
DE3782952T2 (de) | Supraleitende dipolmagnete und verfahren zu deren herstellung. | |
DE3686444T2 (de) | N-fluorpyridiniumsalz und verfahren zur herstellung. | |
DE3676099D1 (de) | Bipolartransistor mit heterouebergang und verfahren zur herstellung desselben. | |
DE3670911D1 (de) | Elektrochemisches geraet und verfahren zu seiner herstellung. | |
DE3687775T2 (de) | Polymerpartikel und verfahren zu seiner herstellung. | |
DE3683265D1 (de) | Polyimidfilm und verfahren zu seiner herstellung. | |
DE3668430D1 (de) | Verbundkoerper und verfahren zu seiner herstellung. |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
8364 | No opposition during term of opposition | ||
8320 | Willingness to grant licences declared (paragraph 23) | ||
8339 | Ceased/non-payment of the annual fee |