DE3613012C2 - - Google Patents
Info
- Publication number
- DE3613012C2 DE3613012C2 DE3613012A DE3613012A DE3613012C2 DE 3613012 C2 DE3613012 C2 DE 3613012C2 DE 3613012 A DE3613012 A DE 3613012A DE 3613012 A DE3613012 A DE 3613012A DE 3613012 C2 DE3613012 C2 DE 3613012C2
- Authority
- DE
- Germany
- Prior art keywords
- single crystal
- sic
- sic single
- substrate
- silicon carbide
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B25/00—Single-crystal growth by chemical reaction of reactive gases, e.g. chemical vapour-deposition growth
- C30B25/02—Epitaxial-layer growth
-
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B29/00—Single crystals or homogeneous polycrystalline material with defined structure characterised by the material or by their shape
- C30B29/10—Inorganic compounds or compositions
- C30B29/36—Carbides
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Crystallography & Structural Chemistry (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Chemical & Material Sciences (AREA)
- Inorganic Chemistry (AREA)
- Crystals, And After-Treatments Of Crystals (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP60084237A JPS61243000A (ja) | 1985-04-18 | 1985-04-18 | 炭化珪素単結晶基板の製造方法 |
Publications (2)
Publication Number | Publication Date |
---|---|
DE3613012A1 DE3613012A1 (de) | 1986-11-06 |
DE3613012C2 true DE3613012C2 (ja) | 1991-01-10 |
Family
ID=13824861
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE19863613012 Granted DE3613012A1 (de) | 1985-04-18 | 1986-04-17 | Verfahren zur herstellung eines sic-einkristall-substrats |
Country Status (2)
Country | Link |
---|---|
JP (1) | JPS61243000A (ja) |
DE (1) | DE3613012A1 (ja) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE4208172A1 (de) * | 1991-03-15 | 1992-09-17 | Cree Research Inc | Hochempfindliche fotodiode zur feststellung von uv-strahlung |
DE4121798A1 (de) * | 1991-07-02 | 1993-01-14 | Daimler Benz Ag | Mehrschichtige, monokristallines siliziumkarbid enthaltene zusammensetzung |
Families Citing this family (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE3915053C2 (de) * | 1989-05-08 | 1995-03-30 | Siemens Ag | Verfahren zum Herstellen von einkristallinem Siliziumkarbid SiC |
DE4109005C1 (ja) * | 1991-03-19 | 1992-09-10 | Cs Halbleiter- Und Solartechnologie Gmbh, 8000 Muenchen, De | |
DE4234508C2 (de) * | 1992-10-13 | 1994-12-22 | Cs Halbleiter Solartech | Verfahren zur Herstellung eines Wafers mit einer monokristallinen Siliciumcarbidschicht |
US5492752A (en) * | 1992-12-07 | 1996-02-20 | Oregon Graduate Institute Of Science And Technology | Substrates for the growth of 3C-silicon carbide |
US6110279A (en) * | 1996-03-29 | 2000-08-29 | Denso Corporation | Method of producing single-crystal silicon carbide |
CN103628140B (zh) * | 2013-10-09 | 2016-08-17 | 东莞市天域半导体科技有限公司 | 一种超高温双层水冷石英管真空室用双密封结构 |
JP6488607B2 (ja) * | 2014-09-22 | 2019-03-27 | 株式会社Sumco | 単結晶SiCウェーハの製造方法 |
Family Cites Families (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3577285A (en) * | 1968-03-28 | 1971-05-04 | Ibm | Method for epitaxially growing silicon carbide onto a crystalline substrate |
JPS5443200A (en) * | 1977-09-13 | 1979-04-05 | Sharp Corp | Production of silicon carbide substrate |
JPS59203799A (ja) * | 1983-04-28 | 1984-11-17 | Sharp Corp | 炭化珪素単結晶基板の製造方法 |
JPS60145992A (ja) * | 1983-12-29 | 1985-08-01 | Sharp Corp | 炭化珪素単結晶基板の製造方法 |
-
1985
- 1985-04-18 JP JP60084237A patent/JPS61243000A/ja active Pending
-
1986
- 1986-04-17 DE DE19863613012 patent/DE3613012A1/de active Granted
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE4208172A1 (de) * | 1991-03-15 | 1992-09-17 | Cree Research Inc | Hochempfindliche fotodiode zur feststellung von uv-strahlung |
DE4208172B4 (de) * | 1991-03-15 | 2006-05-11 | Cree, Inc. | Hochempfindliche Fotodiode zur Feststellung von UV-Strahlung |
DE4121798A1 (de) * | 1991-07-02 | 1993-01-14 | Daimler Benz Ag | Mehrschichtige, monokristallines siliziumkarbid enthaltene zusammensetzung |
Also Published As
Publication number | Publication date |
---|---|
JPS61243000A (ja) | 1986-10-29 |
DE3613012A1 (de) | 1986-11-06 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
OP8 | Request for examination as to paragraph 44 patent law | ||
D2 | Grant after examination | ||
8364 | No opposition during term of opposition | ||
8339 | Ceased/non-payment of the annual fee |