DE3576813D1 - Quarzglas. - Google Patents

Quarzglas.

Info

Publication number
DE3576813D1
DE3576813D1 DE8585905522T DE3576813T DE3576813D1 DE 3576813 D1 DE3576813 D1 DE 3576813D1 DE 8585905522 T DE8585905522 T DE 8585905522T DE 3576813 T DE3576813 T DE 3576813T DE 3576813 D1 DE3576813 D1 DE 3576813D1
Authority
DE
Germany
Prior art keywords
quartz glass
quartz
glass
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE8585905522T
Other languages
English (en)
Inventor
Alexander Ellesmere Winterburn
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Saint Gobain Quartz Ltd
Original Assignee
TSL Group PLC
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by TSL Group PLC filed Critical TSL Group PLC
Application granted granted Critical
Publication of DE3576813D1 publication Critical patent/DE3576813D1/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B32/00—Thermal after-treatment of glass products not provided for in groups C03B19/00, C03B25/00 - C03B31/00 or C03B37/00, e.g. crystallisation, eliminating gas inclusions or other impurities; Hot-pressing vitrified, non-porous, shaped glass products
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B19/00—Other methods of shaping glass
    • C03B19/09—Other methods of shaping glass by fusing powdered glass in a shaping mould
    • C03B19/095—Other methods of shaping glass by fusing powdered glass in a shaping mould by centrifuging, e.g. arc discharge in rotating mould
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B5/00—Melting in furnaces; Furnaces so far as specially adapted for glass manufacture
    • C03B5/06—Melting in furnaces; Furnaces so far as specially adapted for glass manufacture in pot furnaces
    • C03B5/08—Glass-melting pots
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C23/00—Other surface treatment of glass not in the form of fibres or filaments
    • C03C23/009—Poling glass
    • C—CHEMISTRY; METALLURGY
    • C30—CRYSTAL GROWTH
    • C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
    • C30B15/00—Single-crystal growth by pulling from a melt, e.g. Czochralski method
    • C30B15/10—Crucibles or containers for supporting the melt
    • C—CHEMISTRY; METALLURGY
    • C30—CRYSTAL GROWTH
    • C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
    • C30B15/00—Single-crystal growth by pulling from a melt, e.g. Czochralski method
    • C30B15/14—Heating of the melt or the crystallised materials
    • C30B15/18—Heating of the melt or the crystallised materials using direct resistance heating in addition to other methods of heating, e.g. using Peltier heat
DE8585905522T 1984-11-05 1985-11-04 Quarzglas. Expired - Fee Related DE3576813D1 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
GB848427915A GB8427915D0 (en) 1984-11-05 1984-11-05 Vitreous silica products
PCT/GB1985/000499 WO1986002919A1 (en) 1984-11-05 1985-11-04 Vitreous silica

Publications (1)

Publication Number Publication Date
DE3576813D1 true DE3576813D1 (de) 1990-05-03

Family

ID=10569253

Family Applications (1)

Application Number Title Priority Date Filing Date
DE8585905522T Expired - Fee Related DE3576813D1 (de) 1984-11-05 1985-11-04 Quarzglas.

Country Status (6)

Country Link
US (2) US4759787A (de)
EP (1) EP0199787B1 (de)
JP (1) JPH0784328B2 (de)
DE (1) DE3576813D1 (de)
GB (2) GB8427915D0 (de)
WO (1) WO1986002919A1 (de)

Families Citing this family (34)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB8427915D0 (en) * 1984-11-05 1984-12-12 Tsl Thermal Syndicate Plc Vitreous silica products
JPH06104577B2 (ja) * 1987-07-14 1994-12-21 東芝セラミックス株式会社 電解装置
JP2577587B2 (ja) * 1987-12-15 1997-02-05 東芝セラミックス株式会社 石英ガラスルツボ製造装置
DE3815974C1 (de) * 1988-05-10 1989-08-24 Heraeus Quarzschmelze
GB8819693D0 (en) * 1988-08-18 1988-09-21 Tsl Group Plc Improved vitreous silica articles
DE3836934A1 (de) * 1988-10-29 1990-05-03 Heraeus Schott Quarzschmelze Verfahren zum reinigen von teilchenfoermigem siliziumdioxid
US5076902A (en) * 1989-01-12 1991-12-31 Toshiba Ceramics Co., Ltd. Electrolysis apparatus
US5055958A (en) * 1989-03-31 1991-10-08 Tdk Corporation Surface-reinforced glass and magnetic head having surface-reinforced glass
GB8911441D0 (en) * 1989-05-18 1989-07-05 Tetronics Res & Dev Co Ltd A process for the treatment of molten materials
JP2866115B2 (ja) * 1989-09-25 1999-03-08 東芝セラミックス株式会社 石英ガラス容器の製造装置
US5201927A (en) * 1990-10-26 1993-04-13 Matsushita Electric Industrial Co., Ltd. Method of producing the optical element
JP2830987B2 (ja) * 1994-07-19 1998-12-02 信越石英株式会社 石英ガラスルツボ及びその製造方法
DE69724939T2 (de) * 1996-03-18 2004-07-15 Dynelec Corp., Columbus Verfahren zur herstellung von glas
US6182237B1 (en) 1998-08-31 2001-01-30 International Business Machines Corporation System and method for detecting phase errors in asics with multiple clock frequencies
US6632277B2 (en) 1999-07-14 2003-10-14 Seh America, Inc. Optimized silicon wafer gettering for advanced semiconductor devices
US6454852B2 (en) 1999-07-14 2002-09-24 Seh America, Inc. High efficiency silicon wafer optimized for advanced semiconductor devices
US6395085B2 (en) 1999-07-14 2002-05-28 Seh America, Inc. Purity silicon wafer for use in advanced semiconductor devices
US6228165B1 (en) * 1999-07-28 2001-05-08 Seh America, Inc. Method of manufacturing crystal of silicon using an electric potential
DE19943103A1 (de) 1999-09-09 2001-03-15 Wacker Chemie Gmbh Hochgefüllte SiO2-Dispersion, Verfahren zu ihrer Herstellung und Verwendung
US6510707B2 (en) 2001-03-15 2003-01-28 Heraeus Shin-Etsu America, Inc. Methods for making silica crucibles
DE10117818C2 (de) * 2001-04-10 2003-03-20 Schott Glas Verfahren zur Verminderung der Verklebungsneigung bei der Heißformgebung von Glas
WO2004016556A1 (ja) * 2002-08-12 2004-02-26 Sumitomo Electric Industries, Ltd. ガラス体の高純度化方法及び、高純度ガラス体ならびに、ガラス管の製造方法及び装置
JP4339003B2 (ja) 2003-04-02 2009-10-07 ジャパンスーパークォーツ株式会社 石英ガラスルツボの製造方法
DE10319300B4 (de) * 2003-04-29 2006-03-30 Wacker Chemie Ag Verfahren zur Herstellung eines Formkörpers aus Kieselglas
JP4526311B2 (ja) * 2004-06-30 2010-08-18 ジャパンスーパークォーツ株式会社 石英ガラスルツボの製造方法
JP5213356B2 (ja) * 2007-05-31 2013-06-19 信越石英株式会社 シリコン単結晶引上用石英ガラスルツボおよびその製造方法
US8196430B2 (en) 2007-11-30 2012-06-12 Japan Super Quartz Corporation Method and apparatus for manufacturing vitreous silica crucible
US20100000465A1 (en) * 2008-07-07 2010-01-07 Japan Super Quartz Corporation Method for producing vitreous silica crucible
JP5142912B2 (ja) * 2008-09-22 2013-02-13 ジャパンスーパークォーツ株式会社 アーク放電方法、アーク放電装置、石英ガラスルツボ製造装置
JP5397857B2 (ja) * 2009-10-20 2014-01-22 株式会社Ｓｕｍｃｏ 石英ガラスルツボの製造方法および製造装置
US8713966B2 (en) 2011-11-30 2014-05-06 Corning Incorporated Refractory vessels and methods for forming same
US10604451B2 (en) 2014-12-11 2020-03-31 Corning Incorporated Method of treating a ceramic body
CN106587071B (zh) * 2016-12-30 2018-09-04 大连理工大学 一种横向凝固叠加电场提高多晶硅提纯得率的设备和方法
CN112341006B (zh) * 2020-10-13 2022-12-23 江苏太平洋石英股份有限公司 石英管/棒的高纯度化方法、装置、石英管/棒及用途

Family Cites Families (19)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US1910017A (en) * 1927-12-21 1933-05-23 Alais & Froges & Camarque Cie Electrolytio extraction of light metals contained in alloys
BE545590A (de) * 1955-03-05
DE1047390B (de) * 1957-08-02 1958-12-24 Dr Joachim Lietz Verfahren zur Verbesserung von handelsueblichem, durch kurzwellige Strahlung verfaerbbarem Quarzglas
US3051915A (en) * 1958-11-17 1962-08-28 Corning Glass Works Ultrasonic delay line
US3058915A (en) * 1960-01-18 1962-10-16 Westinghouse Electric Corp Crystal growing process
FR1363233A (fr) * 1963-04-16 1964-06-12 Corning Glass Works Procédé de fabrication de masses pleines, notamment de verres et céramiques, et appareil de mise en oeuvre
JPS4929430A (de) * 1972-07-17 1974-03-15
US3811855A (en) * 1972-10-10 1974-05-21 Rca Corp Method of treating a glass body to provide an ion-depleted region therein
US4014772A (en) * 1975-04-24 1977-03-29 Rca Corporation Method of radiation hardening semiconductor devices
GB1490809A (en) * 1975-12-18 1977-11-02 Standard Telephones Cables Ltd Optical waveguide structures
JPS6025363B2 (ja) * 1978-05-08 1985-06-18 昭和電工株式会社 炭素成型体の精製方法
DE3014311C2 (de) * 1980-04-15 1982-06-16 Heraeus Quarzschmelze Gmbh, 6450 Hanau Verfahren zur Herstellung von Quarzglastiegeln und Vorrichtung zur Durchführung dieses Verfahrens
JPH0229528B2 (ja) * 1981-09-16 1990-06-29 Toyota Motor Co Ltd Enjinshijisochi
JPS5888129A (ja) * 1981-11-19 1983-05-26 Toshiba Ceramics Co Ltd 石英ガラス容器類の製造方法
JPS5934659A (ja) * 1982-08-20 1984-02-25 Toshiba Corp 固体撮像装置
JPS59129421A (ja) * 1983-01-14 1984-07-25 Toshiba Ceramics Co Ltd 半導体熱処理用部材
JPS59169956A (ja) * 1983-03-17 1984-09-26 Seiko Epson Corp ガラス体精製法
US4466820A (en) * 1983-07-18 1984-08-21 Rockwell International Corporation Electrolysis treatment for drawing ions out of a ceramic
GB8427915D0 (en) * 1984-11-05 1984-12-12 Tsl Thermal Syndicate Plc Vitreous silica products

Also Published As

Publication number Publication date
GB8427915D0 (en) 1984-12-12
WO1986002919A1 (en) 1986-05-22
GB8527116D0 (en) 1985-12-11
JPH0784328B2 (ja) 1995-09-13
GB2166434B (en) 1989-06-01
US4874417A (en) 1989-10-17
EP0199787A1 (de) 1986-11-05
JPS62501067A (ja) 1987-04-30
EP0199787B1 (de) 1990-03-28
GB2166434A (en) 1986-05-08
US4759787A (en) 1988-07-26

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee