DE3507337A1 - Vorrichtung zur durchfuehrung von prozessen im vakuum - Google Patents

Vorrichtung zur durchfuehrung von prozessen im vakuum

Info

Publication number
DE3507337A1
DE3507337A1 DE19853507337 DE3507337A DE3507337A1 DE 3507337 A1 DE3507337 A1 DE 3507337A1 DE 19853507337 DE19853507337 DE 19853507337 DE 3507337 A DE3507337 A DE 3507337A DE 3507337 A1 DE3507337 A1 DE 3507337A1
Authority
DE
Germany
Prior art keywords
vacuum
container
exclusively
substrate
intended
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
DE19853507337
Other languages
German (de)
English (en)
Other versions
DE3507337C2 (enExample
Inventor
Yasutomo Kawasaki Kanagawa Fujiyama
Osamu Machida Tokio/Tokyo Kamiya
Takashi Ueno Mie Kurokawa
Kyosuke Tokio/Tokyo Ogawa
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Inc
Original Assignee
Canon Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Canon Inc filed Critical Canon Inc
Publication of DE3507337A1 publication Critical patent/DE3507337A1/de
Application granted granted Critical
Publication of DE3507337C2 publication Critical patent/DE3507337C2/de
Granted legal-status Critical Current

Links

Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J3/00—Processes of utilising sub-atmospheric or super-atmospheric pressure to effect chemical or physical change of matter; Apparatus therefor
    • B01J3/006—Processes utilising sub-atmospheric pressure; Apparatus therefor
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/54—Apparatus specially adapted for continuous coating
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/18—Vacuum locks ; Means for obtaining or maintaining the desired pressure within the vessel

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Analytical Chemistry (AREA)
  • Chemical Vapour Deposition (AREA)
  • ing And Chemical Polishing (AREA)
  • Photoreceptors In Electrophotography (AREA)
  • Physical Vapour Deposition (AREA)
DE19853507337 1984-03-02 1985-03-01 Vorrichtung zur durchfuehrung von prozessen im vakuum Granted DE3507337A1 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP59039896A JPS60184678A (ja) 1984-03-02 1984-03-02 真空処理装置

Publications (2)

Publication Number Publication Date
DE3507337A1 true DE3507337A1 (de) 1985-09-05
DE3507337C2 DE3507337C2 (enExample) 1992-06-04

Family

ID=12565721

Family Applications (1)

Application Number Title Priority Date Filing Date
DE19853507337 Granted DE3507337A1 (de) 1984-03-02 1985-03-01 Vorrichtung zur durchfuehrung von prozessen im vakuum

Country Status (5)

Country Link
US (1) US4637342A (enExample)
JP (1) JPS60184678A (enExample)
DE (1) DE3507337A1 (enExample)
FR (1) FR2560528B1 (enExample)
GB (1) GB2156859B (enExample)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE3827343A1 (de) * 1988-08-12 1990-02-15 Leybold Ag Vorrichtung nach dem karussel-prinzip zum beschichten von substraten
DE29801261U1 (de) 1998-01-27 1998-03-19 Ackermann, Peter, 76703 Kraichtal Vorrichtung zur Behandlung von stückigen Gütern mit mindestens einem Prozeßmedium
DE19720349A1 (de) * 1997-05-15 1998-11-19 Huels Chemische Werke Ag Vakuumbehandlungsvorrichtung
DE19816221A1 (de) * 1998-04-09 1999-10-21 Siemens Ag Verfahren und Vorrichtung zum Behandeln von Gegenständen, vorzugsweise Wafern

Families Citing this family (21)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2511845B2 (ja) * 1984-07-25 1996-07-03 東芝機械株式会社 気相成長などの処理装置
JP2839830B2 (ja) * 1985-10-24 1998-12-16 テキサス インスツルメンツ インコーポレイテツド 集積回路の製造方法
JPS6328047A (ja) * 1986-07-22 1988-02-05 Tdk Corp クリ−ン搬送方法
JP2577562B2 (ja) * 1987-05-26 1997-02-05 京セラ株式会社 グロ−放電分解装置
US5085410A (en) * 1989-12-14 1992-02-04 Jersey Nuclear-Avco Isotopes, Inc. Modular processing system
US5185757A (en) * 1989-12-14 1993-02-09 Jersey Nuclear-Avco Isotopes, Inc. Modularized replaceable vaporizer and extractor apparatus
US5032052A (en) * 1989-12-27 1991-07-16 Xerox Corporation Modular apparatus for cleaning, coating and curing photoreceptors in a dual planetary array
US5090350A (en) * 1989-12-27 1992-02-25 Xerox Corporation Method and apparatus for cleaning, coating and curing receptor substrates in an enclosed planetary array
US5038707A (en) * 1989-12-27 1991-08-13 Xerox Corporation Modular apparatus for cleaning, coating and curing photoreceptors in an enclosed planetary array
DE4005956C1 (enExample) * 1990-02-26 1991-06-06 Siegfried Dipl.-Ing. Dr. 5135 Selfkant De Straemke
JP2525284B2 (ja) * 1990-10-22 1996-08-14 ティーディーケイ株式会社 クリ―ン搬送方法及び装置
KR100281004B1 (ko) * 1992-12-14 2001-03-02 마에다 시게루 기판 반송 시스템
DE4322467C1 (de) * 1993-07-06 1995-03-02 Fresenius Ag Verfahren zum mehrstufigen Behandeln von stückigen Produkten mittels Prozeßmedien und Vorrichtung zur Durchführung des Verfahrens
RU2209663C2 (ru) * 1993-08-12 2003-08-10 Максимов Лев Николаевич Способ шлюзования разнообразных предметов и веществ при высоких и сверхвысоких давлениях
KR100382292B1 (ko) * 1995-02-15 2003-07-22 가부시끼가이샤 히다치 세이사꾸쇼 반도체장치의제조방법및반도체제조장치
US6273955B1 (en) * 1995-08-28 2001-08-14 Canon Kabushiki Kaisha Film forming apparatus
JP3769802B2 (ja) * 1996-02-09 2006-04-26 株式会社日立製作所 半導体装置の製造方法
JP3624113B2 (ja) 1998-03-13 2005-03-02 キヤノン株式会社 プラズマ処理方法
NL1010531C2 (nl) * 1998-11-11 2000-05-15 Vacumetal B V Inrichting en werkwijze voor het door middel van opdampen (PVD) op voorwerpen aanbrengen van een laag.
RU2206382C1 (ru) * 2002-02-01 2003-06-20 Максимов Лев Николаевич Устройство для контейнерного шлюзования разнообразных веществ в зоны высокого давления (варианты)
US7410542B2 (en) * 2006-10-10 2008-08-12 Paul Terrance Nolan Variable environment, scale-able, roll to roll system and method for manufacturing thin film electronics on flexible substrates

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3915117A (en) * 1973-11-22 1975-10-28 Balzers Patent Beteilig Ag Vacuum coating apparatus

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2212965A5 (enExample) * 1972-12-29 1974-07-26 Ibm
US4411575A (en) * 1981-05-01 1983-10-25 The Perkin-Elmer Corporation Sample transfer vessel
JPS58197262A (ja) * 1982-05-13 1983-11-16 Canon Inc 量産型真空成膜装置及び真空成膜法

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3915117A (en) * 1973-11-22 1975-10-28 Balzers Patent Beteilig Ag Vacuum coating apparatus

Non-Patent Citations (1)

* Cited by examiner, † Cited by third party
Title
JP-Patent Abstract Nr. 71, Vol. 5, v. 13.05.81, betreffend JP-OS 56-21 637 *

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4969790A (en) * 1987-08-12 1990-11-13 Leybold Aktiengesellschaft Apparatus on the carousel principle for the coating of substrates
DE3827343A1 (de) * 1988-08-12 1990-02-15 Leybold Ag Vorrichtung nach dem karussel-prinzip zum beschichten von substraten
DE19720349A1 (de) * 1997-05-15 1998-11-19 Huels Chemische Werke Ag Vakuumbehandlungsvorrichtung
DE29801261U1 (de) 1998-01-27 1998-03-19 Ackermann, Peter, 76703 Kraichtal Vorrichtung zur Behandlung von stückigen Gütern mit mindestens einem Prozeßmedium
DE19816221A1 (de) * 1998-04-09 1999-10-21 Siemens Ag Verfahren und Vorrichtung zum Behandeln von Gegenständen, vorzugsweise Wafern
US6293291B1 (en) 1998-04-09 2001-09-25 Siemens Aktiengesellschaft Method and apparatus for the treatment of objects, preferably wafers

Also Published As

Publication number Publication date
GB8505143D0 (en) 1985-04-03
FR2560528A1 (fr) 1985-09-06
FR2560528B1 (fr) 1990-11-02
GB2156859B (en) 1987-01-28
GB2156859A (en) 1985-10-16
JPS60184678A (ja) 1985-09-20
US4637342A (en) 1987-01-20
JPS6312138B2 (enExample) 1988-03-17
DE3507337C2 (enExample) 1992-06-04

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Legal Events

Date Code Title Description
8110 Request for examination paragraph 44
D2 Grant after examination
8364 No opposition during term of opposition