DE3502339A1 - Belichtungsvorrichtung - Google Patents
BelichtungsvorrichtungInfo
- Publication number
- DE3502339A1 DE3502339A1 DE19853502339 DE3502339A DE3502339A1 DE 3502339 A1 DE3502339 A1 DE 3502339A1 DE 19853502339 DE19853502339 DE 19853502339 DE 3502339 A DE3502339 A DE 3502339A DE 3502339 A1 DE3502339 A1 DE 3502339A1
- Authority
- DE
- Germany
- Prior art keywords
- exposure
- wafer
- mask
- light source
- light
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000000539 dimer Substances 0.000 claims abstract description 4
- 230000005284 excitation Effects 0.000 claims abstract description 3
- 230000003287 optical effect Effects 0.000 claims description 3
- 238000000034 method Methods 0.000 claims description 2
- 230000008569 process Effects 0.000 claims description 2
- 235000012431 wafers Nutrition 0.000 abstract description 51
- 230000000284 resting effect Effects 0.000 description 4
- 239000004065 semiconductor Substances 0.000 description 4
- 238000004519 manufacturing process Methods 0.000 description 3
- 230000007246 mechanism Effects 0.000 description 3
- 230000007935 neutral effect Effects 0.000 description 3
- 238000012545 processing Methods 0.000 description 3
- 239000004020 conductor Substances 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 230000008859 change Effects 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 238000001514 detection method Methods 0.000 description 1
- 238000005265 energy consumption Methods 0.000 description 1
- 238000005286 illumination Methods 0.000 description 1
- 238000003384 imaging method Methods 0.000 description 1
- 230000010354 integration Effects 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 238000012634 optical imaging Methods 0.000 description 1
- 229920002120 photoresistant polymer Polymers 0.000 description 1
- 230000001902 propagating effect Effects 0.000 description 1
- 230000009467 reduction Effects 0.000 description 1
- 230000004044 response Effects 0.000 description 1
- 239000000523 sample Substances 0.000 description 1
- 230000006641 stabilisation Effects 0.000 description 1
- 238000011105 stabilization Methods 0.000 description 1
- 230000001360 synchronised effect Effects 0.000 description 1
- 238000012546 transfer Methods 0.000 description 1
- 230000003245 working effect Effects 0.000 description 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
- G03F7/70491—Information management, e.g. software; Active and passive control, e.g. details of controlling exposure processes or exposure tool monitoring processes
- G03F7/70525—Controlling normal operating mode, e.g. matching different apparatus, remote control or prediction of failure
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
- G03F7/70991—Connection with other apparatus, e.g. multiple exposure stations, particular arrangement of exposure apparatus and pre-exposure and/or post-exposure apparatus; Shared apparatus, e.g. having shared radiation source, shared mask or workpiece stage, shared base-plate; Utilities, e.g. cable, pipe or wireless arrangements for data, power, fluids or vacuum
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Computer Networks & Wireless Communication (AREA)
- Health & Medical Sciences (AREA)
- Environmental & Geological Engineering (AREA)
- Epidemiology (AREA)
- Public Health (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP59010544A JPS60154527A (ja) | 1984-01-24 | 1984-01-24 | 露光装置 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| DE3502339A1 true DE3502339A1 (de) | 1985-08-14 |
Family
ID=11753198
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| DE19853502339 Granted DE3502339A1 (de) | 1984-01-24 | 1985-01-24 | Belichtungsvorrichtung |
Country Status (2)
| Country | Link |
|---|---|
| JP (1) | JPS60154527A (enExample) |
| DE (1) | DE3502339A1 (enExample) |
Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6781672B2 (en) | 1999-03-08 | 2004-08-24 | Nikon Corporation | Exposure apparatus and illumination apparatus |
| DE19819775B4 (de) * | 1997-05-03 | 2005-05-19 | Boe-Hydis Technology Co., Ltd. | Vorrichtung und Verfahren zur optischen Ausrichtung |
| DE102004013886A1 (de) * | 2004-03-16 | 2005-10-06 | Carl Zeiss Smt Ag | Verfahren zur Mehrfachbelichtung, Mikrolithografie-Projektionsbelichtungsanlage und Projektionssystem |
| CN105467779A (zh) * | 2016-01-04 | 2016-04-06 | 京东方科技集团股份有限公司 | 一种曝光机及曝光方法 |
| WO2017005912A3 (de) * | 2015-07-09 | 2017-03-02 | Carl Zeiss Smt Gmbh | Verfahren zur steuerung einer strahlführungsvorrichtung und strahlführungsvorrichtung |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2611682B2 (ja) * | 1995-02-10 | 1997-05-21 | 株式会社ニコン | 半導体製造装置 |
| JP2002299221A (ja) | 2001-04-02 | 2002-10-11 | Canon Inc | Ｘ線露光装置 |
Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3732796A (en) * | 1970-07-09 | 1973-05-15 | Thomson Csf | Line tracing systems using laser energy for exposing photo-sensitive substrates |
Family Cites Families (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5583232A (en) * | 1978-12-20 | 1980-06-23 | Chiyou Lsi Gijutsu Kenkyu Kumiai | Method and apparatus for x ray exposure |
| JPS57169242A (en) * | 1981-04-13 | 1982-10-18 | Hitachi Ltd | X-ray transferring device |
| JPS607723A (ja) * | 1983-06-28 | 1985-01-16 | Nippon Telegr & Teleph Corp <Ntt> | プラズマｘ線露光装置 |
| DE3330806A1 (de) * | 1983-08-26 | 1985-03-14 | Feinfocus Röntgensysteme GmbH, 3050 Wunstorf | Roentgenlithographiegeraet |
-
1984
- 1984-01-24 JP JP59010544A patent/JPS60154527A/ja active Granted
-
1985
- 1985-01-24 DE DE19853502339 patent/DE3502339A1/de active Granted
Patent Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3732796A (en) * | 1970-07-09 | 1973-05-15 | Thomson Csf | Line tracing systems using laser energy for exposing photo-sensitive substrates |
Non-Patent Citations (1)
| Title |
|---|
| US-Z.: IEEE, Vol. EDL-3, Nr. 3, S. 53-55 * |
Cited By (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE19819775B4 (de) * | 1997-05-03 | 2005-05-19 | Boe-Hydis Technology Co., Ltd. | Vorrichtung und Verfahren zur optischen Ausrichtung |
| US6781672B2 (en) | 1999-03-08 | 2004-08-24 | Nikon Corporation | Exposure apparatus and illumination apparatus |
| DE102004013886A1 (de) * | 2004-03-16 | 2005-10-06 | Carl Zeiss Smt Ag | Verfahren zur Mehrfachbelichtung, Mikrolithografie-Projektionsbelichtungsanlage und Projektionssystem |
| US7561253B2 (en) | 2004-03-16 | 2009-07-14 | Carl Zeiss Smt Ag | Method for a multiple exposure, microlithography projection exposure installation and a projection system |
| US7875418B2 (en) | 2004-03-16 | 2011-01-25 | Carl Zeiss Smt Ag | Method for a multiple exposure, microlithography projection exposure installation and a projection system |
| US8634060B2 (en) | 2004-03-16 | 2014-01-21 | Carl Zeiss Smt Gmbh | Method for a multiple exposure, microlithography projection exposure installation and a projection system |
| WO2017005912A3 (de) * | 2015-07-09 | 2017-03-02 | Carl Zeiss Smt Gmbh | Verfahren zur steuerung einer strahlführungsvorrichtung und strahlführungsvorrichtung |
| CN105467779A (zh) * | 2016-01-04 | 2016-04-06 | 京东方科技集团股份有限公司 | 一种曝光机及曝光方法 |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS60154527A (ja) | 1985-08-14 |
| JPH0542806B2 (enExample) | 1993-06-29 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| 8110 | Request for examination paragraph 44 | ||
| D2 | Grant after examination | ||
| 8364 | No opposition during term of opposition | ||
| 8339 | Ceased/non-payment of the annual fee |