JPS5583232A - Method and apparatus for x ray exposure - Google Patents
Method and apparatus for x ray exposureInfo
- Publication number
- JPS5583232A JPS5583232A JP15891278A JP15891278A JPS5583232A JP S5583232 A JPS5583232 A JP S5583232A JP 15891278 A JP15891278 A JP 15891278A JP 15891278 A JP15891278 A JP 15891278A JP S5583232 A JPS5583232 A JP S5583232A
- Authority
- JP
- Japan
- Prior art keywords
- opening
- outside
- ray
- container
- shutter
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
Abstract
PURPOSE: To operate X ray exposure in a simple manner while preventing it from leaking outside by a method wherein X ray exposure mask is made in contact with object being exposed and both are used to close the opening of an X ray exposure atmosphere container.
CONSTITUTION: Blind plate is mounted on the outer wall of the exposure atmosphere container 21 to close the opening 21a from the outside. X ray shutter 23, holes 21b, 21c are manipulated to fill the container with He gas about +0.05atm., shutter 23 and hole 21c are closed, and the blind plate is removed to complete preparation. Parts member 24 which includes mask is clamped on the wall of the container 21 so that the member 24 covers the opening 21a. On the outside of the member 24, object being exposed 25 is attached. After the shutter 23 has been operated to perform X ray radiation, the member 24 and the object 25 are removed. The opening 21a is always closed either from the outside or inside, so exposure operation can be repeated thereafter. To prevent air from coming in, a small amount of He gas is perpetually sent through the hole 21c to the external area.
COPYRIGHT: (C)1980,JPO&Japio
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP15891278A JPS5583232A (en) | 1978-12-20 | 1978-12-20 | Method and apparatus for x ray exposure |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP15891278A JPS5583232A (en) | 1978-12-20 | 1978-12-20 | Method and apparatus for x ray exposure |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS5583232A true JPS5583232A (en) | 1980-06-23 |
Family
ID=15682054
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP15891278A Pending JPS5583232A (en) | 1978-12-20 | 1978-12-20 | Method and apparatus for x ray exposure |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5583232A (en) |
Cited By (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5767927A (en) * | 1980-10-15 | 1982-04-24 | Nec Corp | X-ray exposure device |
JPS60154527A (en) * | 1984-01-24 | 1985-08-14 | Canon Inc | Exposing device |
JPS61161718A (en) * | 1985-01-11 | 1986-07-22 | Canon Inc | Exposure apparatus |
JPS61161719A (en) * | 1985-01-11 | 1986-07-22 | Canon Inc | Exposure apparatus |
JPS62237727A (en) * | 1986-04-09 | 1987-10-17 | Hitachi Ltd | Mask for x-ray exposure |
-
1978
- 1978-12-20 JP JP15891278A patent/JPS5583232A/en active Pending
Cited By (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5767927A (en) * | 1980-10-15 | 1982-04-24 | Nec Corp | X-ray exposure device |
JPS60154527A (en) * | 1984-01-24 | 1985-08-14 | Canon Inc | Exposing device |
JPH0542806B2 (en) * | 1984-01-24 | 1993-06-29 | Canon Kk | |
JPS61161718A (en) * | 1985-01-11 | 1986-07-22 | Canon Inc | Exposure apparatus |
JPS61161719A (en) * | 1985-01-11 | 1986-07-22 | Canon Inc | Exposure apparatus |
JPH0543170B2 (en) * | 1985-01-11 | 1993-06-30 | Canon Kk | |
JPS62237727A (en) * | 1986-04-09 | 1987-10-17 | Hitachi Ltd | Mask for x-ray exposure |
JPH0588534B2 (en) * | 1986-04-09 | 1993-12-22 | Hitachi Ltd |
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