JPS549584A - X-ray exposure device - Google Patents

X-ray exposure device

Info

Publication number
JPS549584A
JPS549584A JP7530977A JP7530977A JPS549584A JP S549584 A JPS549584 A JP S549584A JP 7530977 A JP7530977 A JP 7530977A JP 7530977 A JP7530977 A JP 7530977A JP S549584 A JPS549584 A JP S549584A
Authority
JP
Japan
Prior art keywords
exposure device
hood
ray exposure
ray
filling
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP7530977A
Other languages
Japanese (ja)
Other versions
JPS5424267B2 (en
Inventor
Koji Mizusawa
Toa Hayasaka
Yasunao Saito
Satoru Nakayama
Shosuke Igarashi
Hideo Mito
Kiyoshi Sugibuchi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Anelva Corp
NEC Corp
Nippon Telegraph and Telephone Corp
Original Assignee
NEC Corp
Nippon Telegraph and Telephone Corp
Nippon Electric Co Ltd
Anelva Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by NEC Corp, Nippon Telegraph and Telephone Corp, Nippon Electric Co Ltd, Anelva Corp filed Critical NEC Corp
Priority to JP7530977A priority Critical patent/JPS549584A/en
Publication of JPS549584A publication Critical patent/JPS549584A/en
Publication of JPS5424267B2 publication Critical patent/JPS5424267B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70808—Construction details, e.g. housing, load-lock, seals or windows for passing light in or out of apparatus

Landscapes

  • Health & Medical Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Environmental & Geological Engineering (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)

Abstract

PURPOSE: To obtain an X-ray exposure device by coupling the X-ray absorber window and the mask matching mechanism via a flexible and airtight hood and then decompressing inside the hood or filling up the hood with the gas substance featuring a smaller X-ray absorption coefficient than the air.
COPYRIGHT: (C)1979,JPO&Japio
JP7530977A 1977-06-23 1977-06-23 X-ray exposure device Granted JPS549584A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP7530977A JPS549584A (en) 1977-06-23 1977-06-23 X-ray exposure device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP7530977A JPS549584A (en) 1977-06-23 1977-06-23 X-ray exposure device

Publications (2)

Publication Number Publication Date
JPS549584A true JPS549584A (en) 1979-01-24
JPS5424267B2 JPS5424267B2 (en) 1979-08-20

Family

ID=13572516

Family Applications (1)

Application Number Title Priority Date Filing Date
JP7530977A Granted JPS549584A (en) 1977-06-23 1977-06-23 X-ray exposure device

Country Status (1)

Country Link
JP (1) JPS549584A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0786156A (en) * 1993-07-21 1995-03-31 Canon Inc Processing system and fabrication of device employing

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5347666A (en) * 1976-10-08 1978-04-28 Hitachi Zosen Corp Method of minimizing fluctuation of crane

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5347666A (en) * 1976-10-08 1978-04-28 Hitachi Zosen Corp Method of minimizing fluctuation of crane

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0786156A (en) * 1993-07-21 1995-03-31 Canon Inc Processing system and fabrication of device employing

Also Published As

Publication number Publication date
JPS5424267B2 (en) 1979-08-20

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