DE3485093D1 - Zuechtungsverfahren und vorrichtung zur herstellung von siliciumkristallen mit hohem und kontrolliertem kohlenstoffgehalt. - Google Patents

Zuechtungsverfahren und vorrichtung zur herstellung von siliciumkristallen mit hohem und kontrolliertem kohlenstoffgehalt.

Info

Publication number
DE3485093D1
DE3485093D1 DE8484430048T DE3485093T DE3485093D1 DE 3485093 D1 DE3485093 D1 DE 3485093D1 DE 8484430048 T DE8484430048 T DE 8484430048T DE 3485093 T DE3485093 T DE 3485093T DE 3485093 D1 DE3485093 D1 DE 3485093D1
Authority
DE
Germany
Prior art keywords
carbon content
breeding method
producing silicon
silicon crystals
controlled carbon
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE8484430048T
Other languages
English (en)
Inventor
Jean-Francois Carle
Patrick Philippot
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
International Business Machines Corp
Original Assignee
International Business Machines Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by International Business Machines Corp filed Critical International Business Machines Corp
Application granted granted Critical
Publication of DE3485093D1 publication Critical patent/DE3485093D1/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C30—CRYSTAL GROWTH
    • C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
    • C30B29/00—Single crystals or homogeneous polycrystalline material with defined structure characterised by the material or by their shape
    • C30B29/02—Elements
    • C30B29/06—Silicon
    • C—CHEMISTRY; METALLURGY
    • C30—CRYSTAL GROWTH
    • C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
    • C30B15/00—Single-crystal growth by pulling from a melt, e.g. Czochralski method
    • C30B15/02—Single-crystal growth by pulling from a melt, e.g. Czochralski method adding crystallising materials or reactants forming it in situ to the melt
    • C30B15/04—Single-crystal growth by pulling from a melt, e.g. Czochralski method adding crystallising materials or reactants forming it in situ to the melt adding doping materials, e.g. for n-p-junction
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S117/00—Single-crystal, oriented-crystal, and epitaxy growth processes; non-coating apparatus therefor
    • Y10S117/906—Special atmosphere other than vacuum or inert
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S148/00—Metal treatment
    • Y10S148/041—Doping control in crystal growth

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Crystals, And After-Treatments Of Crystals (AREA)
  • Liquid Deposition Of Substances Of Which Semiconductor Devices Are Composed (AREA)
DE8484430048T 1984-12-28 1984-12-28 Zuechtungsverfahren und vorrichtung zur herstellung von siliciumkristallen mit hohem und kontrolliertem kohlenstoffgehalt. Expired - Fee Related DE3485093D1 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
EP84430048A EP0191111B1 (de) 1984-12-28 1984-12-28 Züchtungsverfahren und Vorrichtung zur Herstellung von Siliciumkristallen mit hohem und kontrolliertem Kohlenstoffgehalt

Publications (1)

Publication Number Publication Date
DE3485093D1 true DE3485093D1 (de) 1991-10-24

Family

ID=8192959

Family Applications (1)

Application Number Title Priority Date Filing Date
DE8484430048T Expired - Fee Related DE3485093D1 (de) 1984-12-28 1984-12-28 Zuechtungsverfahren und vorrichtung zur herstellung von siliciumkristallen mit hohem und kontrolliertem kohlenstoffgehalt.

Country Status (4)

Country Link
US (1) US4705591A (de)
EP (1) EP0191111B1 (de)
JP (1) JPS61158891A (de)
DE (1) DE3485093D1 (de)

Families Citing this family (17)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB8617107D0 (en) * 1986-07-14 1986-08-20 Erba Farmitalia 6-/7-methylenandrosta-1 4-diene-3 17-dione derivatives
GB8805478D0 (en) * 1988-03-08 1988-04-07 Secr Defence Method & apparatus for growing semi-conductor crystalline materials
US5445679A (en) * 1992-12-23 1995-08-29 Memc Electronic Materials, Inc. Cleaning of polycrystalline silicon for charging into a Czochralski growing process
JP2807609B2 (ja) * 1993-01-28 1998-10-08 三菱マテリアルシリコン株式会社 単結晶の引上装置
JP3341378B2 (ja) * 1993-08-25 2002-11-05 富士通株式会社 シリコン結晶中の水素濃度測定方法及びシリコン結晶の製造方法
US5753567A (en) * 1995-08-28 1998-05-19 Memc Electronic Materials, Inc. Cleaning of metallic contaminants from the surface of polycrystalline silicon with a halogen gas or plasma
JP2839018B2 (ja) * 1996-07-31 1998-12-16 日本電気株式会社 半導体装置の製造方法
US5795381A (en) * 1996-09-09 1998-08-18 Memc Electrical Materials, Inc. SIO probe for real-time monitoring and control of oxygen during czochralski growth of single crystal silicon
US6491752B1 (en) * 1999-07-16 2002-12-10 Sumco Oregon Corporation Enhanced n-type silicon material for epitaxial wafer substrate and method of making same
US6344083B1 (en) * 2000-02-14 2002-02-05 Memc Electronic Materials, Inc. Process for producing a silicon melt
US6749683B2 (en) 2000-02-14 2004-06-15 Memc Electronic Materials, Inc. Process for producing a silicon melt
JP2004521057A (ja) * 2000-12-22 2004-07-15 エムイーエムシー・エレクトロニック・マテリアルズ・インコーポレイテッド 半導体成長用の結晶引上機の気体環境をモニタするためのプロセス
US20090120353A1 (en) * 2007-11-13 2009-05-14 Memc Electronic Materials, Inc. Reduction of air pockets in silicon crystals by avoiding the introduction of nearly-insoluble gases into the melt
JP6413970B2 (ja) * 2015-07-29 2018-10-31 信越半導体株式会社 シリコン単結晶の育成方法
JP6390606B2 (ja) * 2015-12-22 2018-09-19 信越半導体株式会社 単結晶製造装置及び単結晶の製造方法
DE102016112049B3 (de) 2016-06-30 2017-08-24 Infineon Technologies Ag Verfahren zum herstellen von cz-siliziumwafern und verfahren zum herstellen einer halbleitervorrichtung
CN115074829B (zh) * 2022-07-13 2024-01-26 西安奕斯伟材料科技股份有限公司 拉晶炉

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS594125Y2 (ja) * 1979-08-07 1984-02-06 阪急鉄工株式会社 腕木取付装置
US4415401A (en) * 1980-03-10 1983-11-15 Mobil Solar Energy Corporation Control of atmosphere surrounding crystal growth zone
US4443411A (en) * 1980-12-15 1984-04-17 Mobil Solar Energy Corporation Apparatus for controlling the atmosphere surrounding a crystal growth zone
US4400232A (en) * 1981-11-09 1983-08-23 Eagle-Picher Industries, Inc. Control of oxygen- and carbon-related crystal defects in silicon processing
JPS5918191A (ja) * 1982-07-16 1984-01-30 Shin Etsu Handotai Co Ltd シリコン単結晶の製造方法
JPS59121193A (ja) * 1982-12-27 1984-07-13 Fujitsu Ltd シリコン結晶
US4591409A (en) * 1984-05-03 1986-05-27 Texas Instruments Incorporated Control of nitrogen and/or oxygen in silicon via nitride oxide pressure during crystal growth

Also Published As

Publication number Publication date
JPS61158891A (ja) 1986-07-18
EP0191111A1 (de) 1986-08-20
US4705591A (en) 1987-11-10
EP0191111B1 (de) 1991-09-18
JPH034515B2 (de) 1991-01-23

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee