DE3442367C2 - - Google Patents

Info

Publication number
DE3442367C2
DE3442367C2 DE3442367A DE3442367A DE3442367C2 DE 3442367 C2 DE3442367 C2 DE 3442367C2 DE 3442367 A DE3442367 A DE 3442367A DE 3442367 A DE3442367 A DE 3442367A DE 3442367 C2 DE3442367 C2 DE 3442367C2
Authority
DE
Germany
Prior art keywords
photoconductive
photoconductive layer
image converter
electrodes
image
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE3442367A
Other languages
German (de)
English (en)
Other versions
DE3442367A1 (de
Inventor
Katsushi Ikoma Nara Jp Okibayashi
Shohichi Yamatokoriyama Nara Jp Katoh
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Sharp Corp
Original Assignee
Sharp Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sharp Corp filed Critical Sharp Corp
Publication of DE3442367A1 publication Critical patent/DE3442367A1/de
Application granted granted Critical
Publication of DE3442367C2 publication Critical patent/DE3442367C2/de
Granted legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L31/00Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
    • H01L31/0248Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by their semiconductor bodies
    • H01L31/036Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by their semiconductor bodies characterised by their crystalline structure or particular orientation of the crystalline planes
    • H01L31/0384Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by their semiconductor bodies characterised by their crystalline structure or particular orientation of the crystalline planes including other non-monocrystalline materials, e.g. semiconductor particles embedded in an insulating material
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L31/00Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
    • H01L31/08Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof in which radiation controls flow of current through the device, e.g. photoresistors
    • H01L31/09Devices sensitive to infrared, visible or ultraviolet radiation

Landscapes

  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Electromagnetism (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Chemical & Material Sciences (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Solid State Image Pick-Up Elements (AREA)
  • Facsimile Heads (AREA)
DE19843442367 1983-11-22 1984-11-20 Bildwandlerelement Granted DE3442367A1 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP58219881A JPS60111461A (ja) 1983-11-22 1983-11-22 画像読取素子

Publications (2)

Publication Number Publication Date
DE3442367A1 DE3442367A1 (de) 1985-05-30
DE3442367C2 true DE3442367C2 (e) 1990-02-08

Family

ID=16742515

Family Applications (1)

Application Number Title Priority Date Filing Date
DE19843442367 Granted DE3442367A1 (de) 1983-11-22 1984-11-20 Bildwandlerelement

Country Status (4)

Country Link
US (1) US4650985A (e)
JP (1) JPS60111461A (e)
DE (1) DE3442367A1 (e)
GB (1) GB2150351B (e)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE3603265A1 (de) * 1985-02-06 1986-08-07 Sharp K.K., Osaka Herstellung eines photoelektrischen konversionsfilms und bild-sensor vom kontakt-typ
JPS6235564A (ja) * 1985-08-08 1987-02-16 Sharp Corp 光電変換素子の作製方法
DE3825704A1 (de) * 1988-07-28 1990-02-01 Siemens Ag Roentgenstrahlenempfindlicher festkoerperbildwandler
JPH04334056A (ja) * 1991-05-09 1992-11-20 Toshiba Corp 固体撮像装置の製造方法
JP2002080903A (ja) * 2000-09-08 2002-03-22 Japan Science & Technology Corp 分散安定化機能性金族微粒子及び半導体微粒子およびその製造方法

Family Cites Families (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
BE538610A (e) * 1954-06-02
NL267571A (e) * 1959-05-29
GB984371A (en) * 1962-02-09 1965-02-24 Derby Luminescents Ltd Improvements in or relating to photoconductive materials
US3238150A (en) * 1962-09-12 1966-03-01 Xerox Corp Photoconductive cadmium sulfide powder and method for the preparation thereof
US3315080A (en) * 1962-11-20 1967-04-18 Matsushita Electric Ind Co Ltd Solid-state image intensifier with variable contrast ratio
DE1497144A1 (de) * 1964-12-19 1969-06-04 Fuji Photo Film Co Ltd Verfahren zur Herstellung eines lichtempfindlichen Koerpers
GB1148537A (en) * 1965-10-30 1969-04-16 Fuji Photo Film Co Ltd Improvements in and relating to photoconductive insulating material
JPS4813277B1 (e) * 1968-02-02 1973-04-26
GB1330486A (en) * 1970-10-20 1973-09-19 Matsushita Electric Ind Co Ltd Production of photosensitive stannic oxide and devices
JPS52110577A (en) * 1976-03-13 1977-09-16 Konishiroku Photo Ind Co Ltd Photoconductive material
JPS5349981A (en) * 1976-10-18 1978-05-06 Nippon Telegr & Teleph Corp <Ntt> Photoelectric conversion element
US4405915A (en) * 1980-03-28 1983-09-20 Canon Kabushiki Kaisha Photoelectric transducing element
JPS577981A (en) * 1980-06-18 1982-01-16 Matsushita Electric Ind Co Ltd Semiconductor device
JPS5729076A (en) * 1980-07-28 1982-02-16 Minolta Camera Co Ltd Powder image transfer type electrophotographic copying method
JPS5846195B2 (ja) * 1980-09-09 1983-10-14 日本電信電話株式会社 密着形イメ−ジセンサの製造方法
JPS58207766A (ja) * 1982-05-28 1983-12-03 Fuji Xerox Co Ltd イメ−ジセンサ

Also Published As

Publication number Publication date
DE3442367A1 (de) 1985-05-30
GB8429543D0 (en) 1985-01-03
US4650985A (en) 1987-03-17
JPS60111461A (ja) 1985-06-17
GB2150351B (en) 1987-11-25
GB2150351A (en) 1985-06-26
JPH0458699B2 (e) 1992-09-18

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Legal Events

Date Code Title Description
OP8 Request for examination as to paragraph 44 patent law
D2 Grant after examination
8364 No opposition during term of opposition
8328 Change in the person/name/address of the agent

Free format text: PATENTANWAELTE MUELLER & HOFFMANN, 81667 MUENCHEN

8339 Ceased/non-payment of the annual fee