DE3413001C2 - - Google Patents
Info
- Publication number
- DE3413001C2 DE3413001C2 DE3413001A DE3413001A DE3413001C2 DE 3413001 C2 DE3413001 C2 DE 3413001C2 DE 3413001 A DE3413001 A DE 3413001A DE 3413001 A DE3413001 A DE 3413001A DE 3413001 C2 DE3413001 C2 DE 3413001C2
- Authority
- DE
- Germany
- Prior art keywords
- substrate carrier
- cathode
- stations
- sputtering system
- station
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 239000000758 substrate Substances 0.000 claims description 56
- 238000004544 sputter deposition Methods 0.000 claims description 27
- 239000002826 coolant Substances 0.000 claims description 16
- 238000005530 etching Methods 0.000 claims description 11
- 238000000576 coating method Methods 0.000 claims description 10
- 238000001816 cooling Methods 0.000 claims description 9
- 239000011248 coating agent Substances 0.000 claims description 7
- 238000005192 partition Methods 0.000 claims description 4
- 238000000034 method Methods 0.000 description 12
- 238000012864 cross contamination Methods 0.000 description 4
- 238000011068 loading method Methods 0.000 description 3
- 239000000463 material Substances 0.000 description 3
- 238000013517 stratification Methods 0.000 description 3
- GYHNNYVSQQEPJS-UHFFFAOYSA-N Gallium Chemical compound [Ga] GYHNNYVSQQEPJS-UHFFFAOYSA-N 0.000 description 2
- 238000000889 atomisation Methods 0.000 description 2
- 239000000969 carrier Substances 0.000 description 2
- 229910052733 gallium Inorganic materials 0.000 description 2
- 229910052751 metal Inorganic materials 0.000 description 2
- 239000002184 metal Substances 0.000 description 2
- 238000001020 plasma etching Methods 0.000 description 2
- 229910045601 alloy Inorganic materials 0.000 description 1
- 239000000956 alloy Substances 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 150000001875 compounds Chemical class 0.000 description 1
- 239000004020 conductor Substances 0.000 description 1
- 239000000428 dust Substances 0.000 description 1
- 238000010410 dusting Methods 0.000 description 1
- 239000012535 impurity Substances 0.000 description 1
- 229910052738 indium Inorganic materials 0.000 description 1
- APFVFJFRJDLVQX-UHFFFAOYSA-N indium atom Chemical compound [In] APFVFJFRJDLVQX-UHFFFAOYSA-N 0.000 description 1
- 238000002955 isolation Methods 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 238000002844 melting Methods 0.000 description 1
- 230000008018 melting Effects 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- 239000000843 powder Substances 0.000 description 1
- 238000007789 sealing Methods 0.000 description 1
- 229910052709 silver Inorganic materials 0.000 description 1
- 239000004332 silver Substances 0.000 description 1
- 230000008646 thermal stress Effects 0.000 description 1
- 230000007704 transition Effects 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
- C23C14/568—Transferring the substrates through a series of coating stations
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Physics & Mathematics (AREA)
- Plasma & Fusion (AREA)
- Analytical Chemistry (AREA)
- Physical Vapour Deposition (AREA)
Priority Applications (5)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE19843413001 DE3413001A1 (de) | 1984-04-06 | 1984-04-06 | Katodenzerstaeubungsanlage mit nebeneinander angeordneten stationen |
| US06/716,854 US4595483A (en) | 1984-04-06 | 1985-03-28 | Cathode sputtering apparatus with adjacently arranged stations |
| FR8504972A FR2562560B1 (fr) | 1984-04-06 | 1985-04-02 | Installation de pulverisation cathodique a postes juxtaposes |
| GB08508836A GB2156862B (en) | 1984-04-06 | 1985-04-04 | Cathode sputtering unit |
| JP60071289A JPS60230980A (ja) | 1984-04-06 | 1985-04-05 | 陰極スパツタリング装置 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE19843413001 DE3413001A1 (de) | 1984-04-06 | 1984-04-06 | Katodenzerstaeubungsanlage mit nebeneinander angeordneten stationen |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| DE3413001A1 DE3413001A1 (de) | 1985-10-17 |
| DE3413001C2 true DE3413001C2 (OSRAM) | 1991-08-29 |
Family
ID=6232865
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| DE19843413001 Granted DE3413001A1 (de) | 1984-04-06 | 1984-04-06 | Katodenzerstaeubungsanlage mit nebeneinander angeordneten stationen |
Country Status (5)
| Country | Link |
|---|---|
| US (1) | US4595483A (OSRAM) |
| JP (1) | JPS60230980A (OSRAM) |
| DE (1) | DE3413001A1 (OSRAM) |
| FR (1) | FR2562560B1 (OSRAM) |
| GB (1) | GB2156862B (OSRAM) |
Families Citing this family (12)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4701251A (en) * | 1986-02-03 | 1987-10-20 | Bvt Limited | Apparatus for sputter coating discs |
| US5019233A (en) * | 1988-10-31 | 1991-05-28 | Eaton Corporation | Sputtering system |
| DE3912296C2 (de) * | 1989-04-14 | 1996-07-18 | Leybold Ag | Vorrichtung zur Aufnahme und Halterung von Substraten |
| DE3912295C2 (de) * | 1989-04-14 | 1997-05-28 | Leybold Ag | Katodenzerstäubungsanlage |
| DE3912297C2 (de) * | 1989-04-14 | 1996-07-18 | Leybold Ag | Katodenzerstäubungsanlage |
| JP3466607B2 (ja) * | 1989-09-13 | 2003-11-17 | ソニー株式会社 | スパッタリング装置 |
| US5322606A (en) * | 1991-12-26 | 1994-06-21 | Xerox Corporation | Use of rotary solenoid as a shutter actuator on a rotating arm |
| US5482607A (en) * | 1992-09-21 | 1996-01-09 | Nissin Electric Co., Ltd. | Film forming apparatus |
| DE4312014A1 (de) * | 1993-04-13 | 1994-10-20 | Leybold Ag | Vorrichtung zum Beschichten und/oder Ätzen von Substraten in einer Vakuumkammer |
| EP1585999A4 (en) * | 2002-08-02 | 2008-09-17 | E A Fischione Instr Inc | METHOD AND DEVICE FOR PREPARING SAMPLES FOR MICROSCOPY |
| EP3091561B1 (en) * | 2015-05-06 | 2019-09-04 | safematic GmbH | Sputter unit |
| AT519107B1 (de) | 2017-01-23 | 2018-04-15 | Miba Gleitlager Austria Gmbh | Verfahren zur Herstellung eines Mehrschichtgleitlagerelementes |
Family Cites Families (16)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5130764B2 (OSRAM) * | 1971-11-02 | 1976-09-02 | ||
| DE2330710A1 (de) * | 1973-06-16 | 1975-01-09 | Leybold Heraeus Gmbh & Co Kg | Vakuumaufdampfvorrichtung mit mehreren kammern |
| US3981791A (en) * | 1975-03-10 | 1976-09-21 | Signetics Corporation | Vacuum sputtering apparatus |
| JPS53124968A (en) * | 1977-04-08 | 1978-10-31 | Hitachi Ltd | Continuous vapor deposition apparatus |
| DE2932483A1 (de) * | 1979-08-10 | 1981-04-02 | Leybold-Heraeus GmbH, 5000 Köln | Testglashalter mit einer drehbaren platine und mehreren ausnehmungen fuer testglaeser |
| DE2932438C3 (de) * | 1979-08-10 | 1982-03-11 | Aeg-Elotherm Gmbh, 5630 Remscheid | Halbschaleninduktor zur induktiven Oberflächenerwärmung von wellenförmig ausgebildeten Werkstücken |
| JPS5643158U (OSRAM) * | 1979-09-11 | 1981-04-20 | ||
| JPS5730341A (en) * | 1980-07-30 | 1982-02-18 | Anelva Corp | Substrate processing device |
| US4433951A (en) * | 1981-02-13 | 1984-02-28 | Lam Research Corporation | Modular loadlock |
| US4450062A (en) * | 1981-12-22 | 1984-05-22 | Raytheon Company | Sputtering apparatus and methods |
| US4444643A (en) * | 1982-09-03 | 1984-04-24 | Gartek Systems, Inc. | Planar magnetron sputtering device |
| JPH0666298B2 (ja) * | 1983-02-03 | 1994-08-24 | 日電アネルバ株式会社 | ドライエッチング装置 |
| DE3306870A1 (de) * | 1983-02-26 | 1984-08-30 | Leybold-Heraeus GmbH, 5000 Köln | Vorrichtung zum herstellen von schichten mit rotationssymmetrischem dickenprofil durch katodenzerstaeubung |
| US4500407A (en) * | 1983-07-19 | 1985-02-19 | Varian Associates, Inc. | Disk or wafer handling and coating system |
| US4547247A (en) * | 1984-03-09 | 1985-10-15 | Tegal Corporation | Plasma reactor chuck assembly |
| US4548699A (en) * | 1984-05-17 | 1985-10-22 | Varian Associates, Inc. | Transfer plate rotation system |
-
1984
- 1984-04-06 DE DE19843413001 patent/DE3413001A1/de active Granted
-
1985
- 1985-03-28 US US06/716,854 patent/US4595483A/en not_active Expired - Fee Related
- 1985-04-02 FR FR8504972A patent/FR2562560B1/fr not_active Expired
- 1985-04-04 GB GB08508836A patent/GB2156862B/en not_active Expired
- 1985-04-05 JP JP60071289A patent/JPS60230980A/ja active Pending
Also Published As
| Publication number | Publication date |
|---|---|
| FR2562560A1 (fr) | 1985-10-11 |
| GB2156862B (en) | 1986-10-22 |
| FR2562560B1 (fr) | 1989-07-28 |
| GB2156862A (en) | 1985-10-16 |
| US4595483A (en) | 1986-06-17 |
| DE3413001A1 (de) | 1985-10-17 |
| JPS60230980A (ja) | 1985-11-16 |
| GB8508836D0 (en) | 1985-05-09 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| OM8 | Search report available as to paragraph 43 lit. 1 sentence 1 patent law | ||
| 8127 | New person/name/address of the applicant |
Owner name: LEYBOLD AG, 6450 HANAU, DE |
|
| 8110 | Request for examination paragraph 44 | ||
| D2 | Grant after examination | ||
| 8364 | No opposition during term of opposition | ||
| 8339 | Ceased/non-payment of the annual fee |