DE3400139A1 - Galvanisches bad fuer die schnellabscheidung von palladium und ein verfahren zur galvanischen schnellabscheidung von palladium - Google Patents
Galvanisches bad fuer die schnellabscheidung von palladium und ein verfahren zur galvanischen schnellabscheidung von palladiumInfo
- Publication number
- DE3400139A1 DE3400139A1 DE19843400139 DE3400139A DE3400139A1 DE 3400139 A1 DE3400139 A1 DE 3400139A1 DE 19843400139 DE19843400139 DE 19843400139 DE 3400139 A DE3400139 A DE 3400139A DE 3400139 A1 DE3400139 A1 DE 3400139A1
- Authority
- DE
- Germany
- Prior art keywords
- bath
- palladium
- galvanic
- alkali metal
- pyrophosphate
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- KDLHZDBZIXYQEI-UHFFFAOYSA-N Palladium Chemical compound [Pd] KDLHZDBZIXYQEI-UHFFFAOYSA-N 0.000 title claims description 82
- 229910052763 palladium Inorganic materials 0.000 title claims description 42
- 238000000034 method Methods 0.000 title claims description 17
- -1 palladium amine Chemical class 0.000 claims description 20
- 229910052751 metal Inorganic materials 0.000 claims description 16
- 239000002184 metal Substances 0.000 claims description 16
- 230000008021 deposition Effects 0.000 claims description 12
- 229910052783 alkali metal Inorganic materials 0.000 claims description 10
- 239000000758 substrate Substances 0.000 claims description 9
- 239000000080 wetting agent Substances 0.000 claims description 9
- 235000011180 diphosphates Nutrition 0.000 claims description 8
- 239000010949 copper Substances 0.000 claims description 7
- VEXZGXHMUGYJMC-UHFFFAOYSA-M Chloride anion Chemical compound [Cl-] VEXZGXHMUGYJMC-UHFFFAOYSA-M 0.000 claims description 6
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 claims description 6
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 claims description 6
- 229910052802 copper Inorganic materials 0.000 claims description 6
- BFNBIHQBYMNNAN-UHFFFAOYSA-N ammonium sulfate Chemical compound N.N.OS(O)(=O)=O BFNBIHQBYMNNAN-UHFFFAOYSA-N 0.000 claims description 5
- 229910052921 ammonium sulfate Inorganic materials 0.000 claims description 5
- 235000011130 ammonium sulphate Nutrition 0.000 claims description 5
- SHHKMWMIKILKQW-UHFFFAOYSA-N 2-formylbenzenesulfonic acid Chemical compound OS(=O)(=O)C1=CC=CC=C1C=O SHHKMWMIKILKQW-UHFFFAOYSA-N 0.000 claims description 4
- NLXLAEXVIDQMFP-UHFFFAOYSA-N Ammonia chloride Chemical compound [NH4+].[Cl-] NLXLAEXVIDQMFP-UHFFFAOYSA-N 0.000 claims description 4
- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 claims description 4
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 claims description 4
- 230000015572 biosynthetic process Effects 0.000 claims description 4
- 238000005520 cutting process Methods 0.000 claims description 4
- 239000011737 fluorine Substances 0.000 claims description 4
- 229910052731 fluorine Inorganic materials 0.000 claims description 4
- 229910052739 hydrogen Inorganic materials 0.000 claims description 4
- 239000001257 hydrogen Substances 0.000 claims description 4
- 239000002253 acid Substances 0.000 claims description 3
- 125000000129 anionic group Chemical group 0.000 claims description 3
- 229910052759 nickel Inorganic materials 0.000 claims description 3
- 239000011148 porous material Substances 0.000 claims description 3
- 210000002435 tendon Anatomy 0.000 claims description 3
- RYCLIXPGLDDLTM-UHFFFAOYSA-J tetrapotassium;phosphonato phosphate Chemical compound [K+].[K+].[K+].[K+].[O-]P([O-])(=O)OP([O-])([O-])=O RYCLIXPGLDDLTM-UHFFFAOYSA-J 0.000 claims description 3
- 229910001369 Brass Inorganic materials 0.000 claims description 2
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 claims description 2
- IOVCWXUNBOPUCH-UHFFFAOYSA-M Nitrite anion Chemical compound [O-]N=O IOVCWXUNBOPUCH-UHFFFAOYSA-M 0.000 claims description 2
- 235000019270 ammonium chloride Nutrition 0.000 claims description 2
- 239000007864 aqueous solution Substances 0.000 claims description 2
- SRSXLGNVWSONIS-UHFFFAOYSA-N benzenesulfonic acid Chemical compound OS(=O)(=O)C1=CC=CC=C1 SRSXLGNVWSONIS-UHFFFAOYSA-N 0.000 claims description 2
- 239000010951 brass Substances 0.000 claims description 2
- 239000003795 chemical substances by application Substances 0.000 claims description 2
- XPPKVPWEQAFLFU-UHFFFAOYSA-J diphosphate(4-) Chemical compound [O-]P([O-])(=O)OP([O-])([O-])=O XPPKVPWEQAFLFU-UHFFFAOYSA-J 0.000 claims description 2
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 claims description 2
- 229910052737 gold Inorganic materials 0.000 claims description 2
- 239000010931 gold Substances 0.000 claims description 2
- 229910052742 iron Inorganic materials 0.000 claims description 2
- BDHFUVZGWQCTTF-UHFFFAOYSA-M sulfonate Chemical compound [O-]S(=O)=O BDHFUVZGWQCTTF-UHFFFAOYSA-M 0.000 claims description 2
- 150000001340 alkali metals Chemical class 0.000 claims 2
- 150000008107 benzenesulfonic acids Chemical class 0.000 claims 2
- 241001137307 Cyprinodon variegatus Species 0.000 claims 1
- 239000000956 alloy Substances 0.000 claims 1
- 229910045601 alloy Inorganic materials 0.000 claims 1
- 229940092714 benzenesulfonic acid Drugs 0.000 claims 1
- 125000005010 perfluoroalkyl group Chemical group 0.000 claims 1
- 238000000576 coating method Methods 0.000 description 14
- 239000011248 coating agent Substances 0.000 description 11
- 238000000151 deposition Methods 0.000 description 8
- 238000009713 electroplating Methods 0.000 description 8
- 238000007747 plating Methods 0.000 description 5
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 description 4
- 239000000243 solution Substances 0.000 description 4
- 238000002474 experimental method Methods 0.000 description 3
- 239000000203 mixture Substances 0.000 description 3
- 229910052700 potassium Inorganic materials 0.000 description 3
- 239000011591 potassium Substances 0.000 description 3
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 3
- 229910002651 NO3 Inorganic materials 0.000 description 2
- NHNBFGGVMKEFGY-UHFFFAOYSA-N Nitrate Chemical compound [O-][N+]([O-])=O NHNBFGGVMKEFGY-UHFFFAOYSA-N 0.000 description 2
- QAOWNCQODCNURD-UHFFFAOYSA-L Sulfate Chemical compound [O-]S([O-])(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-L 0.000 description 2
- 238000005452 bending Methods 0.000 description 2
- 238000004070 electrodeposition Methods 0.000 description 2
- 238000005516 engineering process Methods 0.000 description 2
- 239000011888 foil Substances 0.000 description 2
- 150000002431 hydrogen Chemical class 0.000 description 2
- 239000004615 ingredient Substances 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 229910052697 platinum Inorganic materials 0.000 description 2
- 238000000926 separation method Methods 0.000 description 2
- 229910000906 Bronze Inorganic materials 0.000 description 1
- KRHYYFGTRYWZRS-UHFFFAOYSA-M Fluoride anion Chemical compound [F-] KRHYYFGTRYWZRS-UHFFFAOYSA-M 0.000 description 1
- 229910001252 Pd alloy Inorganic materials 0.000 description 1
- ZLMJMSJWJFRBEC-UHFFFAOYSA-N Potassium Chemical compound [K] ZLMJMSJWJFRBEC-UHFFFAOYSA-N 0.000 description 1
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 description 1
- 229910000831 Steel Inorganic materials 0.000 description 1
- 230000002378 acidificating effect Effects 0.000 description 1
- 150000001412 amines Chemical class 0.000 description 1
- SWLVFNYSXGMGBS-UHFFFAOYSA-N ammonium bromide Chemical compound [NH4+].[Br-] SWLVFNYSXGMGBS-UHFFFAOYSA-N 0.000 description 1
- 239000010974 bronze Substances 0.000 description 1
- JGEMYUOFGVHXKV-UHFFFAOYSA-N but-2-enedial Chemical compound O=CC=CC=O JGEMYUOFGVHXKV-UHFFFAOYSA-N 0.000 description 1
- KUNSUQLRTQLHQQ-UHFFFAOYSA-N copper tin Chemical compound [Cu].[Sn] KUNSUQLRTQLHQQ-UHFFFAOYSA-N 0.000 description 1
- 230000005518 electrochemistry Effects 0.000 description 1
- 239000003792 electrolyte Substances 0.000 description 1
- 239000006260 foam Substances 0.000 description 1
- 238000009472 formulation Methods 0.000 description 1
- 238000005246 galvanizing Methods 0.000 description 1
- 150000004820 halides Chemical class 0.000 description 1
- 239000012535 impurity Substances 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- 238000005065 mining Methods 0.000 description 1
- 229910052758 niobium Inorganic materials 0.000 description 1
- 239000010955 niobium Substances 0.000 description 1
- GUCVJGMIXFAOAE-UHFFFAOYSA-N niobium atom Chemical compound [Nb] GUCVJGMIXFAOAE-UHFFFAOYSA-N 0.000 description 1
- 231100000989 no adverse effect Toxicity 0.000 description 1
- 230000001590 oxidative effect Effects 0.000 description 1
- 150000002940 palladium Chemical class 0.000 description 1
- 101150101567 pat-2 gene Proteins 0.000 description 1
- 239000010970 precious metal Substances 0.000 description 1
- CVHZOJJKTDOEJC-UHFFFAOYSA-N saccharin Chemical compound C1=CC=C2C(=O)NS(=O)(=O)C2=C1 CVHZOJJKTDOEJC-UHFFFAOYSA-N 0.000 description 1
- 229940081974 saccharin Drugs 0.000 description 1
- 235000019204 saccharin Nutrition 0.000 description 1
- 239000000901 saccharin and its Na,K and Ca salt Substances 0.000 description 1
- 150000003839 salts Chemical class 0.000 description 1
- 229910052709 silver Inorganic materials 0.000 description 1
- 239000004332 silver Substances 0.000 description 1
- FQENQNTWSFEDLI-UHFFFAOYSA-J sodium diphosphate Chemical compound [Na+].[Na+].[Na+].[Na+].[O-]P([O-])(=O)OP([O-])([O-])=O FQENQNTWSFEDLI-UHFFFAOYSA-J 0.000 description 1
- 239000010959 steel Substances 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 238000006467 substitution reaction Methods 0.000 description 1
- IIACRCGMVDHOTQ-UHFFFAOYSA-M sulfamate Chemical compound NS([O-])(=O)=O IIACRCGMVDHOTQ-UHFFFAOYSA-M 0.000 description 1
- 229910052715 tantalum Inorganic materials 0.000 description 1
- GUVRBAGPIYLISA-UHFFFAOYSA-N tantalum atom Chemical compound [Ta] GUVRBAGPIYLISA-UHFFFAOYSA-N 0.000 description 1
- VKFFEYLSKIYTSJ-UHFFFAOYSA-N tetraazanium;phosphonato phosphate Chemical compound [NH4+].[NH4+].[NH4+].[NH4+].[O-]P([O-])(=O)OP([O-])([O-])=O VKFFEYLSKIYTSJ-UHFFFAOYSA-N 0.000 description 1
- 235000019818 tetrasodium diphosphate Nutrition 0.000 description 1
- 150000004684 trihydrates Chemical class 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D3/00—Electroplating: Baths therefor
- C25D3/02—Electroplating: Baths therefor from solutions
- C25D3/50—Electroplating: Baths therefor from solutions of platinum group metals
- C25D3/52—Electroplating: Baths therefor from solutions of platinum group metals characterised by the organic bath constituents used
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Electrochemistry (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Electroplating And Plating Baths Therefor (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US45576183A | 1983-01-07 | 1983-01-07 |
Publications (2)
Publication Number | Publication Date |
---|---|
DE3400139A1 true DE3400139A1 (de) | 1984-07-12 |
DE3400139C2 DE3400139C2 (enrdf_load_stackoverflow) | 1989-01-19 |
Family
ID=23810181
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE19843400139 Granted DE3400139A1 (de) | 1983-01-07 | 1984-01-04 | Galvanisches bad fuer die schnellabscheidung von palladium und ein verfahren zur galvanischen schnellabscheidung von palladium |
Country Status (8)
Country | Link |
---|---|
JP (1) | JPS59133394A (enrdf_load_stackoverflow) |
CA (1) | CA1244374A (enrdf_load_stackoverflow) |
DE (1) | DE3400139A1 (enrdf_load_stackoverflow) |
FR (1) | FR2539145B1 (enrdf_load_stackoverflow) |
GB (1) | GB2133041B (enrdf_load_stackoverflow) |
HK (1) | HK100086A (enrdf_load_stackoverflow) |
NL (1) | NL8400049A (enrdf_load_stackoverflow) |
SG (1) | SG66786G (enrdf_load_stackoverflow) |
Families Citing this family (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4676751A (en) * | 1985-01-11 | 1987-06-30 | Itzhak Shoher | A Metal composite foil, coping, and grown for a ceramo-metal dental restoration |
GB2171721B (en) * | 1985-01-25 | 1989-06-07 | Omi Int Corp | Palladium and palladium alloy plating |
KR880010160A (ko) * | 1987-02-24 | 1988-10-07 | 로버트 에스.알렉산더 | 팔라듐 전기도금조 및 도금 방법 |
US5415685A (en) * | 1993-08-16 | 1995-05-16 | Enthone-Omi Inc. | Electroplating bath and process for white palladium |
Citations (19)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US330149A (en) * | 1885-11-10 | Gaston pilbt and clement cabby | ||
US1921941A (en) * | 1931-03-12 | 1933-08-08 | Johnson Matthey Co Ltd | Electrodeposition of palladium |
US1993623A (en) * | 1931-07-11 | 1935-03-05 | Int Nickel Co | Electrodeposition of platinum metals |
US2207358A (en) * | 1939-07-29 | 1940-07-09 | Crown Stove Works | Cooking stove oven |
US2451340A (en) * | 1948-03-06 | 1948-10-12 | Westinghouse Electric Corp | Electroplating |
US2519983A (en) * | 1948-11-29 | 1950-08-22 | Minnesota Mining & Mfg | Electrochemical process of making fluorine-containing carbon compounds |
US2750334A (en) * | 1953-01-29 | 1956-06-12 | Udylite Res Corp | Electrodeposition of chromium |
US3150065A (en) * | 1961-02-27 | 1964-09-22 | Ibm | Method for plating palladium |
US3206382A (en) * | 1959-09-30 | 1965-09-14 | Johnson Matthey Co Ltd | Electrodeposition of platinum or palladium |
DE1239159B (de) * | 1964-06-12 | 1967-04-20 | Johnson | Bad und Verfahren zum galvanischen Abscheiden von Palladiumueberzuegen |
US3458409A (en) * | 1964-10-12 | 1969-07-29 | Shinichi Hayashi | Method and electrolyte for thick,brilliant plating of palladium |
US3480523A (en) * | 1964-03-04 | 1969-11-25 | Int Nickel Co | Deposition of platinum-group metals |
US3544435A (en) * | 1965-03-09 | 1970-12-01 | Hamish Carmichael Angus | Electrodeposition of palladium |
US3580820A (en) * | 1967-01-11 | 1971-05-25 | Suwa Seikosha Kk | Palladium-nickel alloy plating bath |
US3933602A (en) * | 1973-04-27 | 1976-01-20 | Oxy Metal Industries Corporation | Palladium electroplating bath, process, and preparation |
US4076599A (en) * | 1975-10-30 | 1978-02-28 | International Business Machines Corporation | Method and composition for plating palladium |
US4092225A (en) * | 1976-11-17 | 1978-05-30 | Amp Incorporated | High efficiency palladium electroplating process, bath and composition therefor |
US4098656A (en) * | 1976-03-11 | 1978-07-04 | Oxy Metal Industries Corporation | Bright palladium electroplating baths |
US4144141A (en) * | 1976-12-21 | 1979-03-13 | Siemens Aktiengesellschaft | Ammonia free palladium deposition using aminoacetic acid |
Family Cites Families (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CA1089796A (en) * | 1976-11-17 | 1980-11-18 | Thomas F. Davis | Electroplating palladium |
-
1983
- 1983-12-30 FR FR8321128A patent/FR2539145B1/fr not_active Expired
-
1984
- 1984-01-04 DE DE19843400139 patent/DE3400139A1/de active Granted
- 1984-01-05 CA CA000444727A patent/CA1244374A/en not_active Expired
- 1984-01-06 JP JP124084A patent/JPS59133394A/ja active Pending
- 1984-01-06 NL NL8400049A patent/NL8400049A/nl not_active Application Discontinuation
- 1984-01-06 GB GB08400288A patent/GB2133041B/en not_active Expired
-
1986
- 1986-08-06 SG SG66786A patent/SG66786G/en unknown
- 1986-12-18 HK HK100086A patent/HK100086A/xx unknown
Patent Citations (20)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US330149A (en) * | 1885-11-10 | Gaston pilbt and clement cabby | ||
US1921941A (en) * | 1931-03-12 | 1933-08-08 | Johnson Matthey Co Ltd | Electrodeposition of palladium |
US1993623A (en) * | 1931-07-11 | 1935-03-05 | Int Nickel Co | Electrodeposition of platinum metals |
US2207358A (en) * | 1939-07-29 | 1940-07-09 | Crown Stove Works | Cooking stove oven |
US2451340A (en) * | 1948-03-06 | 1948-10-12 | Westinghouse Electric Corp | Electroplating |
US2519983A (en) * | 1948-11-29 | 1950-08-22 | Minnesota Mining & Mfg | Electrochemical process of making fluorine-containing carbon compounds |
US2750334A (en) * | 1953-01-29 | 1956-06-12 | Udylite Res Corp | Electrodeposition of chromium |
US3206382A (en) * | 1959-09-30 | 1965-09-14 | Johnson Matthey Co Ltd | Electrodeposition of platinum or palladium |
US3150065A (en) * | 1961-02-27 | 1964-09-22 | Ibm | Method for plating palladium |
US3480523A (en) * | 1964-03-04 | 1969-11-25 | Int Nickel Co | Deposition of platinum-group metals |
US3530050A (en) * | 1964-06-12 | 1970-09-22 | Johnson Matthey Co Ltd | Electrodeposition of palladium |
DE1239159B (de) * | 1964-06-12 | 1967-04-20 | Johnson | Bad und Verfahren zum galvanischen Abscheiden von Palladiumueberzuegen |
US3458409A (en) * | 1964-10-12 | 1969-07-29 | Shinichi Hayashi | Method and electrolyte for thick,brilliant plating of palladium |
US3544435A (en) * | 1965-03-09 | 1970-12-01 | Hamish Carmichael Angus | Electrodeposition of palladium |
US3580820A (en) * | 1967-01-11 | 1971-05-25 | Suwa Seikosha Kk | Palladium-nickel alloy plating bath |
US3933602A (en) * | 1973-04-27 | 1976-01-20 | Oxy Metal Industries Corporation | Palladium electroplating bath, process, and preparation |
US4076599A (en) * | 1975-10-30 | 1978-02-28 | International Business Machines Corporation | Method and composition for plating palladium |
US4098656A (en) * | 1976-03-11 | 1978-07-04 | Oxy Metal Industries Corporation | Bright palladium electroplating baths |
US4092225A (en) * | 1976-11-17 | 1978-05-30 | Amp Incorporated | High efficiency palladium electroplating process, bath and composition therefor |
US4144141A (en) * | 1976-12-21 | 1979-03-13 | Siemens Aktiengesellschaft | Ammonia free palladium deposition using aminoacetic acid |
Also Published As
Publication number | Publication date |
---|---|
HK100086A (en) | 1986-12-24 |
JPS59133394A (ja) | 1984-07-31 |
NL8400049A (nl) | 1984-08-01 |
CA1244374A (en) | 1988-11-08 |
SG66786G (en) | 1987-02-27 |
GB2133041A (en) | 1984-07-18 |
GB8400288D0 (en) | 1984-02-08 |
FR2539145B1 (fr) | 1986-08-29 |
GB2133041B (en) | 1986-01-22 |
FR2539145A1 (fr) | 1984-07-13 |
DE3400139C2 (enrdf_load_stackoverflow) | 1989-01-19 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
8110 | Request for examination paragraph 44 | ||
D2 | Grant after examination | ||
8364 | No opposition during term of opposition | ||
8339 | Ceased/non-payment of the annual fee |