US3458409A - Method and electrolyte for thick,brilliant plating of palladium - Google Patents

Method and electrolyte for thick,brilliant plating of palladium Download PDF

Info

Publication number
US3458409A
US3458409A US493248A US3458409DA US3458409A US 3458409 A US3458409 A US 3458409A US 493248 A US493248 A US 493248A US 3458409D A US3458409D A US 3458409DA US 3458409 A US3458409 A US 3458409A
Authority
US
United States
Prior art keywords
plating
palladium
bath
pyridine
lead
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
US493248A
Inventor
Shinichi Hayashi
Masao Yamamoto
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Suwa Seikosha KK
Original Assignee
Suwa Seikosha KK
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Suwa Seikosha KK filed Critical Suwa Seikosha KK
Application granted granted Critical
Publication of US3458409A publication Critical patent/US3458409A/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25DPROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D3/00Electroplating: Baths therefor
    • C25D3/02Electroplating: Baths therefor from solutions
    • C25D3/50Electroplating: Baths therefor from solutions of platinum group metals
    • C25D3/52Electroplating: Baths therefor from solutions of platinum group metals characterised by the organic bath constituents used

Definitions

  • the aqueous electrolyte comprises ammonia; a palladium salt and an amount of pyridine, pyridine carboxylic acid, or pyridine carboxylic acid amine sufiicient to give a bright deposit.
  • a lead salt may also be present in solution to assist in providing a bright deposit.
  • This invention relates to a plating bath composition for electroplating palladium on metal surfaces.
  • palladium plating is inferior to silver plating in electric properties, e.g. it has a large electric resistance, superior in corrosion resistance and anti-weathering property, and it proves better quality under severe circumstances or after long term usage. Moreover it gives a beautiful color which is durable and different from that of silver or nickel.
  • the object of the present invention is to provide a bath for electroplating palladium, which can give a plating layer of practically sufficient thickness and brilliance without sacrificing the easiness of operation and the beneficial properties of resultant plating layers.
  • the plating solution of this invention contains one of various palladium salts dissolved in ammonium hydroxide, and also EDTA-Pb if required.
  • Aforesaid objects of this invention are achieved when the bath is controlled so that the concentration of palladium salt as metal is 1-50 g./ 1., concentration of pyridine more than 0.01 mol./l., concentration of EDTA-Pb as Pb 0.05- 1 g./l., alkalinity of the solution more than pH 9.5, temperature 1050 C., and cathode current density 0.1-l0 A./dm.
  • Palladium concentration of this bath is between 1 g./l. and 50 g./l. considering the purpose of lating and economical requirements, provided that low cathode current density be used for low palladium concentration. Palladium concentration of more than 15 g./l. is usually necessary for cathode current density of 1 A./dm.
  • Dichlorodiaminepalladium Pd(NH Cl is the most suitable source of palladium, because this material is easily prepared and purified, and also because this material is rapidly dissolved in ammonium hydroxide. As palladium salts are dissolved in ammonium hydroxide, palladium exists in the solution as an ammonium complex salt whatever the kind of original salt might have been.
  • Ammonium solution of palladium salt is defined as solution in which palladium exists dissolved as ammonium complex salt.
  • Pyridine is an important ingredient of this bath, but it is inconvenient to use this material because of its offensive odor. So we tried to use derivatives of pyridine. Pyridine 3-carboxylic-acid and pyridine 4-carboxylic-acid brought satisfactory results. Position of the carboxyl radical in the pyridine nucleus has no effect on plating. Nicotinamide UCONH:
  • the plating layer becomes an alby which contains 1-2% of lead, and accordingly amount of lead in the bath gradually decreases. Then lead must be replenished as EDTA-Pb.
  • the primary cause of brilliance is the presence of lead in the bath. Concentration of lead should be kept within a definite range determined by strength of complicating agent.
  • the plating bath is made alkaline by means of the addition of ammonia. Generally a pH of above 9.5 is desirable.
  • Plating is nearly mirror-brilliant at the thickness of 3 l0 cm., and at 5 l0 cm. presents slight milk white blur which can easily be buffed ofi.
  • Addition of EDTA-Pb is necessary for brilliant plating thicker than 5 10 cm. It is able to give brilliance to the plating at lease as thick as 10 10' cm.
  • Anode should be metal palladium plate or black lead electrode. As palladium concentration in the bath decreases, palladium salt such as dichlorodiaminepalladium Pd(NH Cl should be added.
  • Proper pH of the bath should be maintained by adding concentrated ammonium hydroxide.
  • Various inorganic or organic salts may be added to the bath to raise electric conductivity.
  • Preparatory treatment on the metal to be plated is processed in the same way as usual. There are no restriction as to the kind of the metals on which palladium is lated.
  • a method for obtaining a thick, brilliant palladium plating comprising electroplating a metal in a diphragrnless electroplating cell which contains an aqueous ammoniacal solution maintained at a pH of above 9.5, comprising ammonia, a palladium salt in an amount sufficient to supply a concentration of palladium metal of from 1 to 50 grams per liter, and a brightening agent for brightening the palladium plating selected from the group consisting of pyridine, pyridine carboxylic acid, and pyridine carboxylic acid amides, said agent being present in the bath in an amount of from about 0.01 to 2 mols per liter, maintaining the current density in said bath during said lating, at from 0.5 to 1 A./dm. and maintaining the bath at a temperature of about 35 C. during said plating.
  • said bath contains a lead complex consisting of lead chelated with an organic chelating agent, said complex being present to provide lead in an amount of from about 0.05 gram to 1 gram per liter.
  • An electroplating bath comprising an aqueous ammonaical solution containing a palladium salt, said salt being present in an amount sufficient to provide palladium metal in a concentration of from about 1 to 50 grams per liter, a brightening agent selected from the group consisting of pyridine, pyridine carboxylic acid, and pyridine carboxylic acid amide, said agent being present in the bath in an amount of about 0.01 to 2. mols per liter, and a lead complex consisting of lead chelated with an organic chelating agent, said complex being present to provide lead in an amount of from about 0.05 gram to 1 gram per liter.

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Electrochemistry (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Electroplating And Plating Baths Therefor (AREA)

Description

United States Patent US. Cl. 204-43 3 Claims ABSTRACT OF THE DISCLOSURE Palladium is electroplated to give a thick, bright deposit. The aqueous electrolyte comprises ammonia; a palladium salt and an amount of pyridine, pyridine carboxylic acid, or pyridine carboxylic acid amine sufiicient to give a bright deposit. A lead salt may also be present in solution to assist in providing a bright deposit.
This invention relates to a plating bath composition for electroplating palladium on metal surfaces.
At present white colored plating on the component parts of weak electric apparatus, jewelry, etc., is usually of silver or nickel. Plating procedures for plating silver and nickel were developed many years ago and nowadays they are popularly adopted for industrial uses. The plated surfaces resulting from utilizing these methods of plating resulted in some drawbacks with respect to corrosion resistance, anti-weathering property, wear resistance, electric properties, color, etc. Many measures had to be taken to counter them. In spite of such inconveniences silver plating and nickel plating are widely adopted because there are no alternatives.
Recently the need for higher quality electroplated apparatus and jewelry has developed. This high quality cannot be obtained by conventional plating procedures. Therefore the need for better plating procedures is getting more and more urgent. We have succeeded in electroplating palladium to eliminate the drawbacks of the surfaces plated by the conventional methods. Palladium plating is superior to the conventional ones in respects of corrosion resistance, anti-weathering property and wear resistance. So it can satisfy the practical necessity of todays requirements.
Although palladium plating is inferior to silver plating in electric properties, e.g. it has a large electric resistance, superior in corrosion resistance and anti-weathering property, and it proves better quality under severe circumstances or after long term usage. Moreover it gives a beautiful color which is durable and different from that of silver or nickel.
There are several kinds of baths introduced since l930s, though they were seldom used practically. Those baths are largely classified according to the composition as follows:
(1) Those which contain ammonium solution of Pd(NH (NO as a principal ingredient: Ex. Keitel, Trans. Electrochem. Soc., 59, 275 (1931).
(2) Those which contain aqueous solution of K Pd (N0 as a principal ingredient: Ex. Wise, U.S.P. 1,970,950 (1934); Raper, U.S.P. 1,993,627 (1935).
(3) Those which contain aqueous solution of K PdCl as a principal ingredient: Ex. Wise U.S.P. 2,335,821 (1943); 2,457,021 (1948).
(4) Those which contain aqueous solution of Pd(NH (NO as a principal ingredient: Ex. Laister, Metel Ind, 85, 428, (1944); Philpott, Platinun Metals Rev., 4, 12, 1960) We thoroughly investigated and experimented on above listed baths. As a result it was found that none of those baths could giv satisfactory brilliant plating, i.e. with those baths we could not get brilliant surfaces when the thickness of plating was more than 0.5 1O' cm. As the thickness of the plate exceeded this value, plating gradually became dull greyish black. Such a color is very undesirable as to good appearance. Generally, brilliance is indispensable when we plate a merchandise to raise its value. On the other hand sufiicient properties of corrosion resistance, anti-weathering, wearing resistance, etc. usually cannot be obtained on the palladium plated surfaces when the thickness of plating layer is only 0.5 X 10 cm., the upper limit of thickness which gives brilliance. Here we fall into a dilemma. Buffing may be considered to improve brilliance, but it is not only expensive but also impossible on many weak electric apparatus parts and jewelry.
Thus we had to conclude that the plating baths commonly employed were not practical. So we started developing a new bath suitable for thick brilliant plating. Accordingly the object of the present invention is to provide a bath for electroplating palladium, which can give a plating layer of practically sufficient thickness and brilliance without sacrificing the easiness of operation and the beneficial properties of resultant plating layers.
(a) We composed many baths, each having ammonia solution of one of the various palladium salts as a principal ingredient, to make experiments on the effects of plating. During these experiments we found that we could improve brilliance by adding pyridine. The plated surface had brilliance until the plating grew as thick as about 3X 10* cm. At 5 X 10" cm. the surface showed slight milkwhite blur, which could easily be mirror polished by buffing. Conventional baths cannot give such plating. The resulting plating of this bath fully satisfies the present practical requirements. We also found that brilliance was maintained until the plating grew as thick as at least 10 10 em, if EDTA-Pb (chelate compound made from ethylenediaminetetraacetic acid and lead iron) was added to this bath.
This knowledge constitutes the essential part of this invention. Accordingly the plating solution of this invention contains one of various palladium salts dissolved in ammonium hydroxide, and also EDTA-Pb if required. Aforesaid objects of this invention are achieved when the bath is controlled so that the concentration of palladium salt as metal is 1-50 g./ 1., concentration of pyridine more than 0.01 mol./l., concentration of EDTA-Pb as Pb 0.05- 1 g./l., alkalinity of the solution more than pH 9.5, temperature 1050 C., and cathode current density 0.1-l0 A./dm.
(b) Palladium concentration of this bath is between 1 g./l. and 50 g./l. considering the purpose of lating and economical requirements, provided that low cathode current density be used for low palladium concentration. Palladium concentration of more than 15 g./l. is usually necessary for cathode current density of 1 A./dm.
Dichlorodiaminepalladium Pd(NH Cl is the most suitable source of palladium, because this material is easily prepared and purified, and also because this material is rapidly dissolved in ammonium hydroxide. As palladium salts are dissolved in ammonium hydroxide, palladium exists in the solution as an ammonium complex salt whatever the kind of original salt might have been.
Ammonium solution of palladium salt is defined as solution in which palladium exists dissolved as ammonium complex salt.
(c) Pyridine is an important ingredient of this bath, but it is inconvenient to use this material because of its offensive odor. So we tried to use derivatives of pyridine. Pyridine 3-carboxylic-acid and pyridine 4-carboxylic-acid brought satisfactory results. Position of the carboxyl radical in the pyridine nucleus has no effect on plating. Nicotinamide UCONH:
and N-diethyl-3-pyridine-carboxylic-acid-amide CON also produced good results.
These materials are oxidized by the anode to change into corresponding pyridine-carboxylic-acids during electroplating process. Then it is understood that the effects provided by these materials are brought because of their pyridine nucleus and that the sort and the position of substituent have no bearing in the process. Of course such derivatives are not suitable that have substituents which are not chemically stable in electrolyzing process. For example 4-pyridine-carboxylic-acid-hydrazide OoNHNHr did not bring good result. The lowest efiective concentration of these materials is 0.01 mol./l. and there are no undesirable results even if the concentration is raised higher than this, for example 2 mol./l.
Anyway, plated surfaces produced from the baths which contain pyridine, pyridine-carboxylic-acid, or pyridine-carboxylic-acid-amide are evidently superior to those from conventional baths.
(d) When brilliant plating thicker than 5 X cm. is required, good results are obtained by adding EDTA-Pb to the bath. Concentration of EDTA-Pb in the bath should strictly be maintained within 0.05-1 g./l. as Pb. Otherwise EDTA-Pb has no etfect or even causes bad results.
As EDTA-Pb is added the plating layer becomes an alby which contains 1-2% of lead, and accordingly amount of lead in the bath gradually decreases. Then lead must be replenished as EDTA-Pb.
Although it is not explained how EDTA-Pb operates to give brilliance, the concentration of lead in the bath is supposed to have significant influence. We made experiments on the baths to which ions of lead nitrate, lead chloride, etc., or weak organic complex salt such as lead acetate, lead citrate, etc., was added instead of EDTA-Pb. Such baths also gave brilliant plating. But lead concentration in the baths had to be kept very low, i.e., 1-5 mg./l., and as a natural result they did not bring constant effects. So those baths cannot be .expected to be practically useful.
On the other hand the baths to which strong chelate compounds such as CyDTA-Pb(l-2-cyclohexylenedinitrilo-tetraacetic lead) and DTPA-Pb (diethylenetriaminepentaacetic lead) were added constantly gave the same brilliant plating as we got from the bath which contains EDTA-Pb when the lead concentration was within 0.05-1 g./l.
Summarizing the above, the primary cause of brilliance is the presence of lead in the bath. Concentration of lead should be kept within a definite range determined by strength of complicating agent.
(e) When the bath of the present invention is utilized, there is interrelation between palladium concentration, temperature of the bath and cathode current density. Cathode current density should be lowered as palladium concentration decreases and bath temperature becomes low. The bath usually gives a good result at palladium concentration of more than 15 g./l., temperature of 30- 40 C. and cathode current density of l A./dm.
The plating bath is made alkaline by means of the addition of ammonia. Generally a pH of above 9.5 is desirable.
Plating is nearly mirror-brilliant at the thickness of 3 l0 cm., and at 5 l0 cm. presents slight milk white blur which can easily be buffed ofi. Addition of EDTA-Pb is necessary for brilliant plating thicker than 5 10 cm. It is able to give brilliance to the plating at lease as thick as 10 10' cm.
Current efliciency is always -95 and troubles which may be caused by hydrogen absorbed, i.e., embrittlement caused by hydrogen, do not arise on the plated surface.
Anode should be metal palladium plate or black lead electrode. As palladium concentration in the bath decreases, palladium salt such as dichlorodiaminepalladium Pd(NH Cl should be added.
Proper pH of the bath should be maintained by adding concentrated ammonium hydroxide. Various inorganic or organic salts may be added to the bath to raise electric conductivity.
Preparatory treatment on the metal to be plated is processed in the same way as usual. There are no restriction as to the kind of the metals on which palladium is lated.
Execution 1 Dichlorodiaminepalladium g./l 40 Pyridine g l 5 Ammonium hydroxide (the amount which makes pH of the bath 10) percent 25 Cathode current density A./dm. 1 Temperature C 35 Without agitation.
Under these conditions plating was brilliant until it grew as thick as 3 10- cm. At the thickness of 5 X10 cm. slight milk white blur appeared, but it was easily butfed off. There was no cracking, and plating well adhered to the base. Current efficiency was Without agitation.
Same results as Execution 1 were obtained. The bath which contained pyridine 4-carboxylic-acid instead of pyridine 3-carboxy1ic-acid also resulted same plating.
Execution 4 Dichlorodiaminepalladium g./l 40 Nicotinamide g/l 5 Ammonium hydroxide (the amount which makes pH of the bath perccnt Cathode current density A./dm. 1 Temperature C Without agitation.
Same results as Execution 1 were obtained. The same results were also obtained when more nicotinamide was used to make its concentration 150- g./l.
Execution 5 Dichlorodiaminepalladium g./l Nicotinamide g/l 5 EDTA (Na salt) g./l Ammonium hydroxide (the amount which makes pH of the bath 10) "percent" 25 EDTA-Pb (as Pb) mg 400 Cathode current density A./dm. 1 Temperature C 35 Without agitation.
With above bath composition and plating conditions, plating was performed until layer grew as thick as 15X l0- cm. Mirror-like brilliance resulted and no cracking took place. Plating layer well adhered to the base. Current efiiciency was Same results were obtained when potassium chloride was added to the bath in the proportion of 50 g./l. to raise electric conductivity.
We claim:
1. A method for obtaining a thick, brilliant palladium plating comprising electroplating a metal in a diphragrnless electroplating cell which contains an aqueous ammoniacal solution maintained at a pH of above 9.5, comprising ammonia, a palladium salt in an amount sufficient to supply a concentration of palladium metal of from 1 to 50 grams per liter, and a brightening agent for brightening the palladium plating selected from the group consisting of pyridine, pyridine carboxylic acid, and pyridine carboxylic acid amides, said agent being present in the bath in an amount of from about 0.01 to 2 mols per liter, maintaining the current density in said bath during said lating, at from 0.5 to 1 A./dm. and maintaining the bath at a temperature of about 35 C. during said plating.
2. The method in accordance with claim 1 wherein said bath contains a lead complex consisting of lead chelated with an organic chelating agent, said complex being present to provide lead in an amount of from about 0.05 gram to 1 gram per liter.
3. An electroplating bath comprising an aqueous ammonaical solution containing a palladium salt, said salt being present in an amount sufficient to provide palladium metal in a concentration of from about 1 to 50 grams per liter, a brightening agent selected from the group consisting of pyridine, pyridine carboxylic acid, and pyridine carboxylic acid amide, said agent being present in the bath in an amount of about 0.01 to 2. mols per liter, and a lead complex consisting of lead chelated with an organic chelating agent, said complex being present to provide lead in an amount of from about 0.05 gram to 1 gram per liter.
References Cited UNITED STATES PATENTS 1,921,941 8/1933 POWCll et al. 204*47 1,981,715 11/1934 Atkinson 204-43 2,335,821 11/1943 Wise et al. 20447 2,452,308 10/1948 Lamhros 204-47 JOHN H. MACK, Primary Examiner G. L. KAPLAN, Assistant Examiner US. Cl. X.R.
US493248A 1964-10-12 1965-10-05 Method and electrolyte for thick,brilliant plating of palladium Expired - Lifetime US3458409A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP5781064 1964-10-12

Publications (1)

Publication Number Publication Date
US3458409A true US3458409A (en) 1969-07-29

Family

ID=13066262

Family Applications (1)

Application Number Title Priority Date Filing Date
US493248A Expired - Lifetime US3458409A (en) 1964-10-12 1965-10-05 Method and electrolyte for thick,brilliant plating of palladium

Country Status (1)

Country Link
US (1) US3458409A (en)

Cited By (21)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
USB450499I5 (en) * 1974-03-12 1975-01-28
US3933602A (en) * 1973-04-27 1976-01-20 Oxy Metal Industries Corporation Palladium electroplating bath, process, and preparation
US3972787A (en) * 1974-06-14 1976-08-03 Lea-Ronal, Inc. Palladium electrolyte baths utilizing quaternized pyridine compounds as brighteners
DE2607306A1 (en) * 1975-06-13 1976-12-23 Lea Ronal Inc Aqueous, ELECTROLYTIC PALLADIUM-PLATED BATH
US4242180A (en) * 1976-12-21 1980-12-30 Siemens Aktiengesellschaft Ammonia free palladium electroplating bath using aminoacetic acid
US4284482A (en) * 1980-09-22 1981-08-18 Bell Telephone Laboratories, Incorporated Palladium treatment procedure
US4299670A (en) * 1980-09-22 1981-11-10 Bell Telephone Laboratories, Incorporated Palladium plating procedure and bath
US4316779A (en) * 1980-09-26 1982-02-23 Bell Telephone Laboratories, Incorporated Process for electroplating palladium on articles comprising copper
US4392921A (en) * 1980-12-17 1983-07-12 Occidental Chemical Corporation Composition and process for electroplating white palladium
US4406755A (en) * 1982-03-08 1983-09-27 Technic Inc. Bright palladium electrodeposition
DE3400139A1 (en) * 1983-01-07 1984-07-12 Omi International Corp., Warren, Mich. GALVANIC BATH FOR THE QUICK DEPOSIT OF PALLADIUM AND A METHOD FOR THE GALVANIC QUICK DEPOSIT OF PALLADIUM
US4487665A (en) * 1980-12-17 1984-12-11 Omi International Corporation Electroplating bath and process for white palladium
US4491507A (en) * 1983-05-13 1985-01-01 W. C. Heraeus Gmbh Galvanic depositing of palladium coatings
EP0225422A1 (en) * 1985-12-12 1987-06-16 LeaRonal, Inc. Alkaline baths and methods for electrodeposition of palladium and palladium alloys
US4741818A (en) * 1985-12-12 1988-05-03 Learonal, Inc. Alkaline baths and methods for electrodeposition of palladium and palladium alloys
US4778574A (en) * 1987-09-14 1988-10-18 American Chemical & Refining Company, Inc. Amine-containing bath for electroplating palladium
US5415685A (en) * 1993-08-16 1995-05-16 Enthone-Omi Inc. Electroplating bath and process for white palladium
US20090038950A1 (en) * 2007-07-20 2009-02-12 Rohm And Haas Electronic Materials Llc High speed method for plating palladium and palladium alloys
US20090130477A1 (en) * 2004-01-09 2009-05-21 Bp P.L.C. Metal palladium composite membrane or alloy palladium composite membrane and their preparation methods
US20110147225A1 (en) * 2007-07-20 2011-06-23 Rohm And Haas Electronic Materials Llc High speed method for plating palladium and palladium alloys
EP3964610A1 (en) 2020-09-08 2022-03-09 IWG Ing. W. Garhöfer Gesellschaft m. b. H. Electroplating bath for palladium ruthenium coatings

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US1921941A (en) * 1931-03-12 1933-08-08 Johnson Matthey Co Ltd Electrodeposition of palladium
US1981715A (en) * 1931-07-11 1934-11-20 Int Nickel Co Electrodeposition of metals
US2335821A (en) * 1940-05-20 1943-11-30 Int Nickel Co Palladium plating bath
US2452308A (en) * 1946-02-28 1948-10-26 George C Lambros Process of plating palladium and plating bath therefor

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US1921941A (en) * 1931-03-12 1933-08-08 Johnson Matthey Co Ltd Electrodeposition of palladium
US1981715A (en) * 1931-07-11 1934-11-20 Int Nickel Co Electrodeposition of metals
US2335821A (en) * 1940-05-20 1943-11-30 Int Nickel Co Palladium plating bath
US2452308A (en) * 1946-02-28 1948-10-26 George C Lambros Process of plating palladium and plating bath therefor

Cited By (24)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3933602A (en) * 1973-04-27 1976-01-20 Oxy Metal Industries Corporation Palladium electroplating bath, process, and preparation
USB450499I5 (en) * 1974-03-12 1975-01-28
US3920526A (en) * 1974-03-12 1975-11-18 Ibm Process for the electrodeposition of ductile palladium and electroplating bath useful therefor
US3972787A (en) * 1974-06-14 1976-08-03 Lea-Ronal, Inc. Palladium electrolyte baths utilizing quaternized pyridine compounds as brighteners
DE2607306A1 (en) * 1975-06-13 1976-12-23 Lea Ronal Inc Aqueous, ELECTROLYTIC PALLADIUM-PLATED BATH
US4242180A (en) * 1976-12-21 1980-12-30 Siemens Aktiengesellschaft Ammonia free palladium electroplating bath using aminoacetic acid
US4284482A (en) * 1980-09-22 1981-08-18 Bell Telephone Laboratories, Incorporated Palladium treatment procedure
US4299670A (en) * 1980-09-22 1981-11-10 Bell Telephone Laboratories, Incorporated Palladium plating procedure and bath
US4316779A (en) * 1980-09-26 1982-02-23 Bell Telephone Laboratories, Incorporated Process for electroplating palladium on articles comprising copper
US4487665A (en) * 1980-12-17 1984-12-11 Omi International Corporation Electroplating bath and process for white palladium
US4392921A (en) * 1980-12-17 1983-07-12 Occidental Chemical Corporation Composition and process for electroplating white palladium
US4406755A (en) * 1982-03-08 1983-09-27 Technic Inc. Bright palladium electrodeposition
DE3400139A1 (en) * 1983-01-07 1984-07-12 Omi International Corp., Warren, Mich. GALVANIC BATH FOR THE QUICK DEPOSIT OF PALLADIUM AND A METHOD FOR THE GALVANIC QUICK DEPOSIT OF PALLADIUM
US4491507A (en) * 1983-05-13 1985-01-01 W. C. Heraeus Gmbh Galvanic depositing of palladium coatings
EP0225422A1 (en) * 1985-12-12 1987-06-16 LeaRonal, Inc. Alkaline baths and methods for electrodeposition of palladium and palladium alloys
US4741818A (en) * 1985-12-12 1988-05-03 Learonal, Inc. Alkaline baths and methods for electrodeposition of palladium and palladium alloys
US4778574A (en) * 1987-09-14 1988-10-18 American Chemical & Refining Company, Inc. Amine-containing bath for electroplating palladium
US5415685A (en) * 1993-08-16 1995-05-16 Enthone-Omi Inc. Electroplating bath and process for white palladium
US20090130477A1 (en) * 2004-01-09 2009-05-21 Bp P.L.C. Metal palladium composite membrane or alloy palladium composite membrane and their preparation methods
US8052775B2 (en) * 2004-01-09 2011-11-08 Bp P.L.C. Process for the preparation of a two-layer metal palladium or palladium alloy composite membrane
US20090038950A1 (en) * 2007-07-20 2009-02-12 Rohm And Haas Electronic Materials Llc High speed method for plating palladium and palladium alloys
US20110147225A1 (en) * 2007-07-20 2011-06-23 Rohm And Haas Electronic Materials Llc High speed method for plating palladium and palladium alloys
US9435046B2 (en) 2007-07-20 2016-09-06 Rohm And Haas Electronics Llc High speed method for plating palladium and palladium alloys
EP3964610A1 (en) 2020-09-08 2022-03-09 IWG Ing. W. Garhöfer Gesellschaft m. b. H. Electroplating bath for palladium ruthenium coatings

Similar Documents

Publication Publication Date Title
US3458409A (en) Method and electrolyte for thick,brilliant plating of palladium
US3475292A (en) Gold plating bath and process
CN102037162B (en) Pd and Pd-Ni electrolyte baths
US2905601A (en) Electroplating bright gold
KR19990045291A (en) Palladium alloy electroplating composition and electroplating method using the same
US2660554A (en) Bright gold and gold alloy plating baths
US2822326A (en) Bright chromium alloy plating
US3149058A (en) Bright gold plating process
JPH0338351B2 (en)
US3902977A (en) Gold plating solutions and method
JP3674887B2 (en) Pyrophosphate bath for copper-tin alloy plating
US4184929A (en) Trivalent chromium plating bath composition and process
US4462874A (en) Cyanide-free copper plating process
US3149057A (en) Acid gold plating
US4767507A (en) Gold electroplating bath
US2990343A (en) Chromium alloy plating
US4159926A (en) Nickel plating
US4048023A (en) Electrodeposition of gold-palladium alloys
JPS6141999B2 (en)
US4521282A (en) Cyanide-free copper electrolyte and process
JPH06316786A (en) Water-soluble iridium plating bath and plating method using the same
US4297179A (en) Palladium electroplating bath and process
US3475290A (en) Bright gold plating solution and process
US2814590A (en) Electrodeposition of copper
US2859159A (en) Bright copper plating bath containing mixtures of metal compounds