DE3348224C2 - - Google Patents

Info

Publication number
DE3348224C2
DE3348224C2 DE3348224A DE3348224A DE3348224C2 DE 3348224 C2 DE3348224 C2 DE 3348224C2 DE 3348224 A DE3348224 A DE 3348224A DE 3348224 A DE3348224 A DE 3348224A DE 3348224 C2 DE3348224 C2 DE 3348224C2
Authority
DE
Germany
Prior art keywords
reticle
pattern
plate
pattern formation
exposed
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE3348224A
Other languages
German (de)
English (en)
Inventor
Akiyoshi Suzuki
Hiroshi Tokyo Jp Sato
Ichiro Kawasaki Kanagawa Jp Ishiyama
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Inc
Original Assignee
Canon Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from JP57210913A external-priority patent/JPS59101829A/ja
Priority claimed from JP58217111A external-priority patent/JPS60110117A/ja
Application filed by Canon Inc filed Critical Canon Inc
Application granted granted Critical
Publication of DE3348224C2 publication Critical patent/DE3348224C2/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7073—Alignment marks and their environment
    • G03F9/7084—Position of mark on substrate, i.e. position in (x, y, z) of mark, e.g. buried or resist covered mark, mark on rearside, at the substrate edge, in the circuit area, latent image mark, marks in plural levels

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
DE3348224A 1982-12-01 1983-11-29 Expired - Lifetime DE3348224C2 (en, 2012)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP57210913A JPS59101829A (ja) 1982-12-01 1982-12-01 アライメントマ−クの配置方法
JP58217111A JPS60110117A (ja) 1983-11-19 1983-11-19 アラインメントマ−クを備えた薄板状物体およびこの物体を使用するアラインメント装置

Publications (1)

Publication Number Publication Date
DE3348224C2 true DE3348224C2 (en, 2012) 1993-05-19

Family

ID=26518334

Family Applications (2)

Application Number Title Priority Date Filing Date
DE3348224A Expired - Lifetime DE3348224C2 (en, 2012) 1982-12-01 1983-11-29
DE19833343206 Granted DE3343206A1 (de) 1982-12-01 1983-11-29 Mit ausrichtungsmarken versehenes blattfoermiges element sowie ausrichtungsvorrichtung fuer dasselbe

Family Applications After (1)

Application Number Title Priority Date Filing Date
DE19833343206 Granted DE3343206A1 (de) 1982-12-01 1983-11-29 Mit ausrichtungsmarken versehenes blattfoermiges element sowie ausrichtungsvorrichtung fuer dasselbe

Country Status (4)

Country Link
US (1) US4620785A (en, 2012)
DE (2) DE3348224C2 (en, 2012)
FR (1) FR2541471B1 (en, 2012)
GB (1) GB2133536B (en, 2012)

Families Citing this family (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS61222128A (ja) * 1985-03-27 1986-10-02 Fujitsu Ltd 投影露光方法
US4702592A (en) * 1986-06-30 1987-10-27 Itt Corporation Reticle assembly, system, and method for using the same
JPH0789536B2 (ja) * 1986-08-28 1995-09-27 株式会社ニコン 投影露光装置
US5140366A (en) * 1987-05-29 1992-08-18 Canon Kabushiki Kaisha Exposure apparatus with a function for controlling alignment by use of latent images
US4769680A (en) * 1987-10-22 1988-09-06 Mrs Technology, Inc. Apparatus and method for making large area electronic devices, such as flat panel displays and the like, using correlated, aligned dual optical systems
USRE33836E (en) * 1987-10-22 1992-03-03 Mrs Technology, Inc. Apparatus and method for making large area electronic devices, such as flat panel displays and the like, using correlated, aligned dual optical systems
JP2862385B2 (ja) * 1991-03-13 1999-03-03 キヤノン株式会社 露光装置
CA2124237C (en) 1994-02-18 2004-11-02 Bernard Cohen Improved nonwoven barrier and method of making the same
US5834386A (en) * 1994-06-27 1998-11-10 Kimberly-Clark Worldwide, Inc. Nonwoven barrier
DE4442596C1 (de) * 1994-11-30 1996-04-04 Heidelberg Instruments Mikrotechnik Gmbh Verfahren zur Korrektur von Positionsmeßfehlern
US6040892A (en) 1997-08-19 2000-03-21 Micron Technology, Inc. Multiple image reticle for forming layers
US6228743B1 (en) * 1998-05-04 2001-05-08 Motorola, Inc. Alignment method for semiconductor device
JP4589606B2 (ja) * 2003-06-02 2010-12-01 住友重機械工業株式会社 半導体装置の製造方法
CN105988303B (zh) * 2015-02-26 2018-03-30 上海微电子装备（集团）股份有限公司 一种掩模版传输装置及传输方法
CN108172527B (zh) * 2017-12-28 2020-05-19 佛山长光智能制造研究院有限公司 一种光学检测系统

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE2431960A1 (de) * 1973-07-27 1975-02-13 Kasper Instruments Verfahren zum herstellen einer teile eines werkstueckes abdeckenden maske mit hilfe einer photomaske und einrichtung zum ausrichten eines werkstueckes mit einer photomaske
JPS58159327A (ja) * 1982-03-18 1983-09-21 Oki Electric Ind Co Ltd ウエ−ハアラインメントマ−クの保存方法

Family Cites Families (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB929576A (en) * 1960-01-11 1963-06-26 Bush And Rank Cintel Ltd Apparatus for deriving television signals from cinematographic film
GB1193297A (en) * 1966-07-01 1970-05-28 Telefunken Patent Device for the Fine Adjustment of Photomasks with respect to Semiconductor Elements
FR1516152A (fr) * 1967-01-25 1968-03-08 Thomson Houston Comp Francaise Perfectionnements aux bancs photographiques répétiteurs
US3544801A (en) * 1969-05-01 1970-12-01 Fairchild Camera Instr Co Mask design for optical alignment systems
GB1328803A (en) * 1969-12-17 1973-09-05 Mullard Ltd Methods of manufacturing semiconductor devices
JPS5952535B2 (ja) * 1977-01-21 1984-12-20 キヤノン株式会社 光学装置
US4200395A (en) * 1977-05-03 1980-04-29 Massachusetts Institute Of Technology Alignment of diffraction gratings
JPS5856402B2 (ja) * 1978-08-30 1983-12-14 大日本スクリ−ン製造株式会社 位置決め用センサ−
DE2910580C3 (de) * 1979-03-17 1982-01-21 Texas Instruments Deutschland Gmbh, 8050 Freising Ausrichtvorrichtung
DE3071052D1 (en) * 1979-04-03 1985-10-10 Eaton Optimetrix Inc Improved step-and-repeat projection alignment and exposure system
DE2931668A1 (de) * 1979-08-04 1981-02-19 Ibm Deutschland Vorrichtung zum ausrichten von masken und halbleiterplaettchen
JPS5658235A (en) * 1979-10-17 1981-05-21 Canon Inc Alignment device
DE3173163D1 (en) * 1980-02-29 1986-01-23 Eaton Optimetrix Inc Alignment apparatus
US4452526A (en) * 1980-02-29 1984-06-05 Optimetrix Corporation Step-and-repeat projection alignment and exposure system with auxiliary optical unit
JPS56130707A (en) * 1980-03-18 1981-10-13 Canon Inc Photo-printing device
US4355892A (en) * 1980-12-18 1982-10-26 Censor Patent- Und Versuchs-Anstalt Method for the projection printing

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE2431960A1 (de) * 1973-07-27 1975-02-13 Kasper Instruments Verfahren zum herstellen einer teile eines werkstueckes abdeckenden maske mit hilfe einer photomaske und einrichtung zum ausrichten eines werkstueckes mit einer photomaske
JPS58159327A (ja) * 1982-03-18 1983-09-21 Oki Electric Ind Co Ltd ウエ−ハアラインメントマ−クの保存方法

Also Published As

Publication number Publication date
GB2133536B (en) 1987-03-04
FR2541471B1 (fr) 1992-04-30
GB8331675D0 (en) 1984-01-04
FR2541471A1 (fr) 1984-08-24
DE3343206A1 (de) 1984-06-07
US4620785A (en) 1986-11-04
DE3343206C2 (en, 2012) 1992-07-23
GB2133536A (en) 1984-07-25

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