DE3249203C2 - - Google Patents
Info
- Publication number
- DE3249203C2 DE3249203C2 DE3249203T DE3249203T DE3249203C2 DE 3249203 C2 DE3249203 C2 DE 3249203C2 DE 3249203 T DE3249203 T DE 3249203T DE 3249203 T DE3249203 T DE 3249203T DE 3249203 C2 DE3249203 C2 DE 3249203C2
- Authority
- DE
- Germany
- Prior art keywords
- silicon
- reaction
- coating
- gas
- coatings
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 238000000576 coating method Methods 0.000 claims description 51
- 239000011521 glass Substances 0.000 claims description 28
- 238000006243 chemical reaction Methods 0.000 claims description 26
- 238000000034 method Methods 0.000 claims description 26
- 239000011248 coating agent Substances 0.000 claims description 24
- 239000000203 mixture Substances 0.000 claims description 21
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims description 20
- 229910052710 silicon Inorganic materials 0.000 claims description 18
- 239000010703 silicon Substances 0.000 claims description 18
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 7
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 claims description 7
- 150000001875 compounds Chemical class 0.000 claims description 6
- 239000000758 substrate Substances 0.000 claims description 6
- 229910052814 silicon oxide Inorganic materials 0.000 claims description 4
- 125000000217 alkyl group Chemical group 0.000 claims description 2
- 230000008021 deposition Effects 0.000 claims description 2
- 239000002210 silicon-based material Substances 0.000 claims 5
- 239000007800 oxidant agent Substances 0.000 claims 1
- 239000010410 layer Substances 0.000 description 17
- 239000007789 gas Substances 0.000 description 15
- 239000000463 material Substances 0.000 description 11
- 229910001887 tin oxide Inorganic materials 0.000 description 9
- 239000011541 reaction mixture Substances 0.000 description 8
- XOLBLPGZBRYERU-UHFFFAOYSA-N tin dioxide Chemical compound O=[Sn]=O XOLBLPGZBRYERU-UHFFFAOYSA-N 0.000 description 8
- VXKWYPOMXBVZSJ-UHFFFAOYSA-N tetramethyltin Chemical compound C[Sn](C)(C)C VXKWYPOMXBVZSJ-UHFFFAOYSA-N 0.000 description 7
- 238000004519 manufacturing process Methods 0.000 description 6
- 230000003647 oxidation Effects 0.000 description 6
- 238000007254 oxidation reaction Methods 0.000 description 6
- 239000000126 substance Substances 0.000 description 6
- 150000004756 silanes Chemical class 0.000 description 5
- -1 SiH4 Chemical class 0.000 description 4
- 230000015572 biosynthetic process Effects 0.000 description 4
- 125000000956 methoxy group Chemical group [H]C([H])([H])O* 0.000 description 4
- 230000003287 optical effect Effects 0.000 description 4
- BLRPTPMANUNPDV-UHFFFAOYSA-N Silane Chemical compound [SiH4] BLRPTPMANUNPDV-UHFFFAOYSA-N 0.000 description 3
- DWZFNULJNZJRLM-UHFFFAOYSA-N methoxy-dimethyl-trimethylsilylsilane Chemical compound CO[Si](C)(C)[Si](C)(C)C DWZFNULJNZJRLM-UHFFFAOYSA-N 0.000 description 3
- 239000001301 oxygen Substances 0.000 description 3
- 229910052760 oxygen Inorganic materials 0.000 description 3
- 239000000843 powder Substances 0.000 description 3
- 230000009257 reactivity Effects 0.000 description 3
- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 description 2
- 230000002411 adverse Effects 0.000 description 2
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 2
- RJCQBQGAPKAMLL-UHFFFAOYSA-N bromotrifluoromethane Chemical compound FC(F)(F)Br RJCQBQGAPKAMLL-UHFFFAOYSA-N 0.000 description 2
- 238000001816 cooling Methods 0.000 description 2
- 238000009826 distribution Methods 0.000 description 2
- 238000001704 evaporation Methods 0.000 description 2
- 230000008020 evaporation Effects 0.000 description 2
- 229910052731 fluorine Inorganic materials 0.000 description 2
- 239000011737 fluorine Substances 0.000 description 2
- 238000002360 preparation method Methods 0.000 description 2
- 230000005855 radiation Effects 0.000 description 2
- 238000007086 side reaction Methods 0.000 description 2
- 235000012239 silicon dioxide Nutrition 0.000 description 2
- 239000000377 silicon dioxide Substances 0.000 description 2
- 238000007740 vapor deposition Methods 0.000 description 2
- 229910000681 Silicon-tin Inorganic materials 0.000 description 1
- HMDDXIMCDZRSNE-UHFFFAOYSA-N [C].[Si] Chemical class [C].[Si] HMDDXIMCDZRSNE-UHFFFAOYSA-N 0.000 description 1
- 125000003545 alkoxy group Chemical group 0.000 description 1
- 238000009835 boiling Methods 0.000 description 1
- 239000012159 carrier gas Substances 0.000 description 1
- 238000005229 chemical vapour deposition Methods 0.000 description 1
- 229910052681 coesite Inorganic materials 0.000 description 1
- 229910052906 cristobalite Inorganic materials 0.000 description 1
- 230000001419 dependent effect Effects 0.000 description 1
- 238000000151 deposition Methods 0.000 description 1
- 238000013461 design Methods 0.000 description 1
- 238000011161 development Methods 0.000 description 1
- 230000018109 developmental process Effects 0.000 description 1
- 238000010790 dilution Methods 0.000 description 1
- 239000012895 dilution Substances 0.000 description 1
- BQLQQEHXQQLKEV-UHFFFAOYSA-N dimethoxy-methyl-trimethylsilylsilane Chemical compound CO[Si](C)(OC)[Si](C)(C)C BQLQQEHXQQLKEV-UHFFFAOYSA-N 0.000 description 1
- PZPGRFITIJYNEJ-UHFFFAOYSA-N disilane Chemical compound [SiH3][SiH3] PZPGRFITIJYNEJ-UHFFFAOYSA-N 0.000 description 1
- 239000011229 interlayer Substances 0.000 description 1
- 229910052741 iridium Inorganic materials 0.000 description 1
- GKOZUEZYRPOHIO-UHFFFAOYSA-N iridium atom Chemical compound [Ir] GKOZUEZYRPOHIO-UHFFFAOYSA-N 0.000 description 1
- 238000003973 irrigation Methods 0.000 description 1
- 230000002262 irrigation Effects 0.000 description 1
- 238000012886 linear function Methods 0.000 description 1
- 230000007774 longterm Effects 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 238000002156 mixing Methods 0.000 description 1
- DOVLZBWRSUUIJA-UHFFFAOYSA-N oxotin;silicon Chemical compound [Si].[Sn]=O DOVLZBWRSUUIJA-UHFFFAOYSA-N 0.000 description 1
- 238000001556 precipitation Methods 0.000 description 1
- 239000000376 reactant Substances 0.000 description 1
- 230000035484 reaction time Effects 0.000 description 1
- 238000002310 reflectometry Methods 0.000 description 1
- 238000011160 research Methods 0.000 description 1
- 230000035945 sensitivity Effects 0.000 description 1
- 229910000077 silane Inorganic materials 0.000 description 1
- 229920005573 silicon-containing polymer Polymers 0.000 description 1
- 239000000243 solution Substances 0.000 description 1
- 229910052682 stishovite Inorganic materials 0.000 description 1
- 238000003860 storage Methods 0.000 description 1
- 230000001629 suppression Effects 0.000 description 1
- 238000003786 synthesis reaction Methods 0.000 description 1
- RWWNQEOPUOCKGR-UHFFFAOYSA-N tetraethyltin Chemical compound CC[Sn](CC)(CC)CC RWWNQEOPUOCKGR-UHFFFAOYSA-N 0.000 description 1
- 150000003606 tin compounds Chemical class 0.000 description 1
- 238000012549 training Methods 0.000 description 1
- 229910052905 tridymite Inorganic materials 0.000 description 1
- 239000012808 vapor phase Substances 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/22—Surface treatment of glass, not in the form of fibres or filaments, by coating with other inorganic material
- C03C17/23—Oxides
- C03C17/245—Oxides by deposition from the vapour phase
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
- C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
- C23C16/40—Oxides
- C23C16/401—Oxides containing silicon
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
- C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
- C23C16/40—Oxides
- C23C16/401—Oxides containing silicon
- C23C16/402—Silicon dioxide
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2217/00—Coatings on glass
- C03C2217/20—Materials for coating a single layer on glass
- C03C2217/21—Oxides
- C03C2217/213—SiO2
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2217/00—Coatings on glass
- C03C2217/20—Materials for coating a single layer on glass
- C03C2217/21—Oxides
- C03C2217/23—Mixtures
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2218/00—Methods for coating glass
- C03C2218/10—Deposition methods
- C03C2218/15—Deposition methods from the vapour phase
- C03C2218/152—Deposition methods from the vapour phase by cvd
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- General Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Inorganic Chemistry (AREA)
- Geochemistry & Mineralogy (AREA)
- Life Sciences & Earth Sciences (AREA)
- Surface Treatment Of Glass (AREA)
- Silicon Polymers (AREA)
- Chemical Vapour Deposition (AREA)
- Glass Compositions (AREA)
- Silicon Compounds (AREA)
- Catalysts (AREA)
- Laminated Bodies (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US06/323,249 US4386117A (en) | 1981-11-20 | 1981-11-20 | Coating process using alkoxy substituted silicon-bearing reactant |
| PCT/US1982/001529 WO1983001750A1 (en) | 1981-11-20 | 1982-10-25 | Coating process using alkoxy substituted silicon-bearing reactant |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| DE3249203T1 DE3249203T1 (de) | 1983-12-01 |
| DE3249203C2 true DE3249203C2 (en, 2012) | 1991-04-18 |
Family
ID=23258350
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| DE823249203T Granted DE3249203T1 (de) | 1981-11-20 | 1982-10-25 | Verfahren zum aufdampfen von ueberzuegen |
Country Status (16)
| Country | Link |
|---|---|
| US (1) | US4386117A (en, 2012) |
| JP (1) | JPS58501946A (en, 2012) |
| AU (1) | AU553492B2 (en, 2012) |
| BE (1) | BE895069A (en, 2012) |
| BR (1) | BR8207989A (en, 2012) |
| CA (1) | CA1200444A (en, 2012) |
| CH (1) | CH655675B (en, 2012) |
| DE (1) | DE3249203T1 (en, 2012) |
| ES (1) | ES8401918A1 (en, 2012) |
| FR (1) | FR2516815B1 (en, 2012) |
| GB (1) | GB2122596B (en, 2012) |
| IT (1) | IT1153087B (en, 2012) |
| MX (1) | MX162142A (en, 2012) |
| NL (1) | NL8220464A (en, 2012) |
| SE (1) | SE442861B (en, 2012) |
| WO (1) | WO1983001750A1 (en, 2012) |
Families Citing this family (22)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5926942A (ja) * | 1982-08-02 | 1984-02-13 | Nippon Sheet Glass Co Ltd | 金属酸化物被覆ガラスの製造方法 |
| US4792460A (en) * | 1986-07-15 | 1988-12-20 | Electric Power Research Institute, Inc. | Method for production of polysilanes and polygermanes, and deposition of hydrogenated amorphous silicon, alloys thereof, or hydrogenated amorphous germanium |
| US5173452A (en) * | 1989-02-15 | 1992-12-22 | Dobuzinsky David M | Process for the vapor deposition of polysilanes photoresists |
| US5221352A (en) * | 1989-06-19 | 1993-06-22 | Glaverbel | Apparatus for pyrolytically forming an oxide coating on a hot glass substrate |
| RU2118302C1 (ru) * | 1991-12-26 | 1998-08-27 | ЕЛФ Атокем Норт Америка, Инк. | Способ получения покрытия на стеклянной подложке (варианты) |
| MX9207592A (es) * | 1991-12-26 | 1994-06-30 | Atochem North America Elf | Composicion de revestimiento para vidrio. |
| US5863337A (en) * | 1993-02-16 | 1999-01-26 | Ppg Industries, Inc. | Apparatus for coating a moving glass substrate |
| US5356718A (en) * | 1993-02-16 | 1994-10-18 | Ppg Industries, Inc. | Coating apparatus, method of coating glass, compounds and compositions for coating glasss and coated glass substrates |
| US5599387A (en) * | 1993-02-16 | 1997-02-04 | Ppg Industries, Inc. | Compounds and compositions for coating glass with silicon oxide |
| US5395698A (en) * | 1993-06-04 | 1995-03-07 | Ppg Industries, Inc. | Neutral, low emissivity coated glass articles and method for making |
| CH690511A5 (de) * | 1994-09-01 | 2000-09-29 | Balzers Hochvakuum | Optisches Bauteil und Verfahren zum Herstellen eines solchen. |
| DE4433206A1 (de) * | 1994-09-17 | 1996-03-21 | Goldschmidt Ag Th | Verfahren zur pyrolytischen Beschichtung von Glas-, Glaskeramik- und Emailprodukten |
| US5744215A (en) * | 1996-01-04 | 1998-04-28 | Ppg Industries, Inc. | Reduction of haze in transparent coatings |
| WO2002027063A2 (en) * | 2000-09-28 | 2002-04-04 | President And Fellows Of Harward College | Vapor deposition of oxides, silicates and phosphates |
| EP1490529A1 (en) * | 2002-03-28 | 2004-12-29 | President And Fellows Of Harvard College | Vapor deposition of silicon dioxide nanolaminates |
| US7372610B2 (en) | 2005-02-23 | 2008-05-13 | Sage Electrochromics, Inc. | Electrochromic devices and methods |
| US20080032064A1 (en) * | 2006-07-10 | 2008-02-07 | President And Fellows Of Harvard College | Selective sealing of porous dielectric materials |
| WO2014014542A2 (en) | 2012-04-27 | 2014-01-23 | Burning Bush Group | High performance silicon based coating compositions |
| WO2013170124A1 (en) | 2012-05-10 | 2013-11-14 | Burning Bush Group | High performance silicon based thermal coating compositions |
| CN107236453B (zh) | 2012-07-03 | 2019-06-11 | 伯宁布什集团有限公司 | 硅基高性能涂料组合物 |
| US9006355B1 (en) | 2013-10-04 | 2015-04-14 | Burning Bush Group, Llc | High performance silicon-based compositions |
| GB201507330D0 (en) | 2015-04-29 | 2015-06-10 | Pilkington Group Ltd | Splash screen |
Family Cites Families (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3242007A (en) * | 1961-11-15 | 1966-03-22 | Texas Instruments Inc | Pyrolytic deposition of protective coatings of semiconductor surfaces |
| NL7202331A (en, 2012) * | 1972-01-24 | 1973-07-26 | ||
| US4187336A (en) * | 1977-04-04 | 1980-02-05 | Gordon Roy G | Non-iridescent glass structures |
| US4206252A (en) * | 1977-04-04 | 1980-06-03 | Gordon Roy G | Deposition method for coating glass and the like |
| CA1134214A (en) * | 1978-03-08 | 1982-10-26 | Roy G. Gordon | Deposition method |
| US4261650A (en) * | 1978-12-18 | 1981-04-14 | International Business Machines Corporation | Method for producing uniform parallel alignment in liquid crystal cells |
| DE3016010C2 (de) * | 1980-04-25 | 1985-01-10 | Degussa Ag, 6000 Frankfurt | Verfahren zur pyrogenen Herstellung von Kieselsäure |
-
1981
- 1981-11-20 US US06/323,249 patent/US4386117A/en not_active Expired - Lifetime
-
1982
- 1982-10-25 DE DE823249203T patent/DE3249203T1/de active Granted
- 1982-10-25 WO PCT/US1982/001529 patent/WO1983001750A1/en active Application Filing
- 1982-10-25 CH CH401183A patent/CH655675B/fr unknown
- 1982-10-25 NL NL8220464A patent/NL8220464A/nl unknown
- 1982-10-25 BR BR8207989A patent/BR8207989A/pt not_active IP Right Cessation
- 1982-10-25 GB GB08318227A patent/GB2122596B/en not_active Expired
- 1982-10-25 JP JP58500143A patent/JPS58501946A/ja active Pending
- 1982-10-28 AU AU89873/82A patent/AU553492B2/en not_active Ceased
- 1982-11-18 MX MX195237A patent/MX162142A/es unknown
- 1982-11-18 FR FR8219332A patent/FR2516815B1/fr not_active Expired
- 1982-11-19 ES ES517489A patent/ES8401918A1/es not_active Expired
- 1982-11-19 IT IT24336/82A patent/IT1153087B/it active
- 1982-11-19 CA CA000415942A patent/CA1200444A/en not_active Expired
- 1982-11-19 BE BE0/209516A patent/BE895069A/fr not_active IP Right Cessation
-
1983
- 1983-07-20 SE SE8304070A patent/SE442861B/sv not_active IP Right Cessation
Also Published As
| Publication number | Publication date |
|---|---|
| BE895069A (fr) | 1983-05-19 |
| ES517489A0 (es) | 1984-01-01 |
| AU553492B2 (en) | 1986-07-17 |
| FR2516815A1 (fr) | 1983-05-27 |
| SE8304070D0 (sv) | 1983-07-20 |
| IT8224336A0 (it) | 1982-11-19 |
| WO1983001750A1 (en) | 1983-05-26 |
| SE442861B (sv) | 1986-02-03 |
| GB8318227D0 (en) | 1983-08-03 |
| DE3249203T1 (de) | 1983-12-01 |
| IT8224336A1 (it) | 1984-05-19 |
| IT1153087B (it) | 1987-01-14 |
| SE8304070L (sv) | 1983-07-20 |
| CA1200444A (en) | 1986-02-11 |
| BR8207989A (pt) | 1983-10-04 |
| FR2516815B1 (fr) | 1987-03-20 |
| GB2122596A (en) | 1984-01-18 |
| CH655675B (en, 2012) | 1986-05-15 |
| NL8220464A (nl) | 1983-10-03 |
| US4386117A (en) | 1983-05-31 |
| ES8401918A1 (es) | 1984-01-01 |
| JPS58501946A (ja) | 1983-11-17 |
| MX162142A (es) | 1991-04-02 |
| GB2122596B (en) | 1986-05-08 |
| AU8987382A (en) | 1983-05-26 |
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