DE3230590C2 - Verfahren zur Herstellung von Trichlorsilan und Siliciumtetrachlorid aus Silicium und Chlorwasserstoff - Google Patents

Verfahren zur Herstellung von Trichlorsilan und Siliciumtetrachlorid aus Silicium und Chlorwasserstoff

Info

Publication number
DE3230590C2
DE3230590C2 DE3230590A DE3230590A DE3230590C2 DE 3230590 C2 DE3230590 C2 DE 3230590C2 DE 3230590 A DE3230590 A DE 3230590A DE 3230590 A DE3230590 A DE 3230590A DE 3230590 C2 DE3230590 C2 DE 3230590C2
Authority
DE
Germany
Prior art keywords
silicon
reactor
hydrogen chloride
reaction
metallic silicon
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
DE3230590A
Other languages
German (de)
English (en)
Other versions
DE3230590A1 (de
Inventor
Hidetaka Yokkaichi Mie Hori
Tadao Ito
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nippon Aerosil Co Ltd
Original Assignee
Nippon Aerosil Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nippon Aerosil Co Ltd filed Critical Nippon Aerosil Co Ltd
Publication of DE3230590A1 publication Critical patent/DE3230590A1/de
Application granted granted Critical
Publication of DE3230590C2 publication Critical patent/DE3230590C2/de
Expired legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B33/00—Silicon; Compounds thereof
    • C01B33/08—Compounds containing halogen
    • C01B33/107—Halogenated silanes
    • C01B33/1071—Tetrachloride, trichlorosilane or silicochloroform, dichlorosilane, monochlorosilane or mixtures thereof
    • C01B33/10742—Tetrachloride, trichlorosilane or silicochloroform, dichlorosilane, monochlorosilane or mixtures thereof prepared by hydrochlorination of silicon or of a silicon-containing material
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J8/00—Chemical or physical processes in general, conducted in the presence of fluids and solid particles; Apparatus for such processes
    • B01J8/08—Chemical or physical processes in general, conducted in the presence of fluids and solid particles; Apparatus for such processes with moving particles
    • B01J8/087—Heating or cooling the reactor
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J8/00—Chemical or physical processes in general, conducted in the presence of fluids and solid particles; Apparatus for such processes
    • B01J8/08—Chemical or physical processes in general, conducted in the presence of fluids and solid particles; Apparatus for such processes with moving particles
    • B01J8/10—Chemical or physical processes in general, conducted in the presence of fluids and solid particles; Apparatus for such processes with moving particles moved by stirrers or by rotary drums or rotary receptacles or endless belts
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J2208/00—Processes carried out in the presence of solid particles; Reactors therefor
    • B01J2208/00008—Controlling the process
    • B01J2208/00017—Controlling the temperature
    • B01J2208/00106—Controlling the temperature by indirect heat exchange
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J2208/00—Processes carried out in the presence of solid particles; Reactors therefor
    • B01J2208/00008—Controlling the process
    • B01J2208/00017—Controlling the temperature
    • B01J2208/00106—Controlling the temperature by indirect heat exchange
    • B01J2208/00168—Controlling the temperature by indirect heat exchange with heat exchange elements outside the bed of solid particles

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Inorganic Chemistry (AREA)
  • Silicon Compounds (AREA)
DE3230590A 1981-08-17 1982-08-17 Verfahren zur Herstellung von Trichlorsilan und Siliciumtetrachlorid aus Silicium und Chlorwasserstoff Expired DE3230590C2 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP56127834A JPS5832011A (ja) 1981-08-17 1981-08-17 珪素と塩化水素からトリクロルシランと四塩化珪素を製造する方法

Publications (2)

Publication Number Publication Date
DE3230590A1 DE3230590A1 (de) 1983-03-10
DE3230590C2 true DE3230590C2 (de) 1985-03-21

Family

ID=14969807

Family Applications (1)

Application Number Title Priority Date Filing Date
DE3230590A Expired DE3230590C2 (de) 1981-08-17 1982-08-17 Verfahren zur Herstellung von Trichlorsilan und Siliciumtetrachlorid aus Silicium und Chlorwasserstoff

Country Status (3)

Country Link
US (1) US4424198A (enExample)
JP (1) JPS5832011A (enExample)
DE (1) DE3230590C2 (enExample)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE3828344C1 (enExample) * 1988-08-20 1989-07-06 Huels Ag, 4370 Marl, De
DE3938897A1 (de) * 1988-12-08 1990-06-13 Elkem As Verfahren zur herstellung von trichlormonosilan

Families Citing this family (19)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE3918718C2 (de) * 1989-06-08 1994-02-17 Nukem Gmbh Vorrichtung zur thermischen Behandlung von organischen und anorganischen Stoffen
DE4033611A1 (de) * 1990-10-23 1992-04-30 Huels Chemische Werke Ag Verfahren zur gewinnung von chloridarmer ofenasche bei der umsetzung von rohsilicium zu chlorsilanen
EP0684070A1 (en) * 1994-05-23 1995-11-29 Hemlock Semiconductor Corporation Fluidized-bed reactor
DE19847786A1 (de) * 1998-10-16 2000-04-20 Degussa Vorrichtung und Verfahren zum Befüllen und Entleeren eines mit brennbarem sowie aggressivem Gas beaufschlagten Behälters
US6300429B1 (en) * 1998-12-31 2001-10-09 Union Carbide Chemicals & Plastics Technology Corporation Method of modifying near-wall temperature in a gas phase polymerization reactor
DE102004017453A1 (de) 2004-04-08 2005-10-27 Wacker-Chemie Gmbh Verfahren zur Herstellung von Trichlormonosilan
DE602007013469D1 (de) * 2007-01-17 2011-05-05 Dow Corning Verschleissfeste materialien im direktverfahren
US7754175B2 (en) * 2007-08-29 2010-07-13 Dynamic Engineering, Inc. Silicon and catalyst material preparation in a process for producing trichlorosilane
EP2055674B1 (en) * 2007-10-23 2016-09-14 Mitsubishi Materials Corporation Apparatus for producing trichlorosilane and method for producing thrichlorosilane
US20100264362A1 (en) * 2008-07-01 2010-10-21 Yongchae Chee Method of producing trichlorosilane (TCS) rich Chlorosilane product stably from a fluidized gas phase reactor (FBR) and the structure of the reactor
US8178051B2 (en) * 2008-11-05 2012-05-15 Stephen Michael Lord Apparatus and process for hydrogenation of a silicon tetrahalide and silicon to the trihalosilane
US20100124525A1 (en) * 2008-11-19 2010-05-20 Kuyen Li ZERO-HEAT-BURDEN FLUIDIZED BED REACTOR FOR HYDRO-CHLORINATION OF SiCl4 and M.G.-Si
KR101687833B1 (ko) 2009-01-20 2016-12-19 미쓰비시 마테리알 가부시키가이샤 트리클로로실란 제조 장치 및 트리클로로실란 제조 방법
SG174957A1 (en) * 2009-03-30 2011-11-28 Denki Kagaku Kogyo Kk Method for collection of hexachlorodisilane and plant for the method
US8778292B2 (en) * 2009-05-12 2014-07-15 Procedyne Corporation Fluidized bed process for synthesizing trichlorosilane and a trichlorosilane synthesizer
US8298490B2 (en) * 2009-11-06 2012-10-30 Gtat Corporation Systems and methods of producing trichlorosilane
DE102010044108A1 (de) * 2010-11-18 2012-05-24 Evonik Degussa Gmbh Herstellung von Chlorsilanen aus kleinstteiligem Reinstsilicium
CN104760959B (zh) * 2015-04-08 2017-01-04 湖北晶星科技股份有限公司 一种反歧化法制备三氯氢硅的工艺
US20220064009A1 (en) * 2018-12-27 2022-03-03 Tokuyama Corporation Chlorosilane Manufacturing Method

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CA504581A (en) 1954-07-27 B. Hatcher David Production of silicochloroform
US3148035A (en) 1960-03-10 1964-09-08 Wacker Chemie Gmbh Apparatus for the continuous production of silicon chloroform and/or silicon tetrachloride
NL6506163A (enExample) 1964-05-23 1965-11-24
DE2630542C3 (de) * 1976-07-07 1981-04-02 Dynamit Nobel Ag, 5210 Troisdorf Verfahren zur Herstellung von Trichlorsilan und Siliciumtetrahlorid

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE3828344C1 (enExample) * 1988-08-20 1989-07-06 Huels Ag, 4370 Marl, De
DE3938897A1 (de) * 1988-12-08 1990-06-13 Elkem As Verfahren zur herstellung von trichlormonosilan

Also Published As

Publication number Publication date
DE3230590A1 (de) 1983-03-10
JPS6121166B2 (enExample) 1986-05-26
JPS5832011A (ja) 1983-02-24
US4424198A (en) 1984-01-03

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Legal Events

Date Code Title Description
OP8 Request for examination as to paragraph 44 patent law
D2 Grant after examination
8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee