DE3126575C2 - Vorrichtung zur Erfassung der Sekundärelektronen in einem Rasterelektronenmikroskop - Google Patents

Vorrichtung zur Erfassung der Sekundärelektronen in einem Rasterelektronenmikroskop

Info

Publication number
DE3126575C2
DE3126575C2 DE3126575A DE3126575A DE3126575C2 DE 3126575 C2 DE3126575 C2 DE 3126575C2 DE 3126575 A DE3126575 A DE 3126575A DE 3126575 A DE3126575 A DE 3126575A DE 3126575 C2 DE3126575 C2 DE 3126575C2
Authority
DE
Germany
Prior art keywords
sample
secondary electrons
electrode
electron beam
objective lens
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
DE3126575A
Other languages
German (de)
English (en)
Other versions
DE3126575A1 (de
Inventor
Susumu Akishima Tokyo Takashima
Nobuaki Tamura
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Jeol Ltd
Original Assignee
Nihon Denshi KK
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nihon Denshi KK filed Critical Nihon Denshi KK
Publication of DE3126575A1 publication Critical patent/DE3126575A1/de
Application granted granted Critical
Publication of DE3126575C2 publication Critical patent/DE3126575C2/de
Expired legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/244—Detectors; Associated components or circuits therefor
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07D—HETEROCYCLIC COMPOUNDS
    • C07D319/00—Heterocyclic compounds containing six-membered rings having two oxygen atoms as the only ring hetero atoms
    • C07D319/10—1,4-Dioxanes; Hydrogenated 1,4-dioxanes
    • C07D319/14—1,4-Dioxanes; Hydrogenated 1,4-dioxanes condensed with carbocyclic rings or ring systems
    • C07D319/16—1,4-Dioxanes; Hydrogenated 1,4-dioxanes condensed with carbocyclic rings or ring systems condensed with one six-membered ring
    • C07D319/18—Ethylenedioxybenzenes, not substituted on the hetero ring
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N23/00—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00
    • G01N23/22—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by measuring secondary emission from the material
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/26—Electron or ion microscopes; Electron or ion diffraction tubes
    • H01J37/261—Details
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N2223/00—Investigating materials by wave or particle radiation
    • G01N2223/07—Investigating materials by wave or particle radiation secondary emission
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N2223/00—Investigating materials by wave or particle radiation
    • G01N2223/40—Imaging
    • G01N2223/418—Imaging electron microscope
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N2223/00—Investigating materials by wave or particle radiation
    • G01N2223/50—Detectors
    • G01N2223/505—Detectors scintillation
    • G01N2223/5055—Detectors scintillation scintillation crystal coupled to PMT
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/244—Detection characterized by the detecting means
    • H01J2237/2443—Scintillation detectors
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/244—Detection characterized by the detecting means
    • H01J2237/2445—Photon detectors for X-rays, light, e.g. photomultipliers
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/244—Detection characterized by the detecting means
    • H01J2237/2448—Secondary particle detectors
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/244—Detection characterized by the detecting means
    • H01J2237/2449—Detector devices with moving charges in electric or magnetic fields
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/245—Detection characterised by the variable being measured
    • H01J2237/24507—Intensity, dose or other characteristics of particle beams or electromagnetic radiation

Landscapes

  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Biochemistry (AREA)
  • General Health & Medical Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Immunology (AREA)
  • Pathology (AREA)
  • Analysing Materials By The Use Of Radiation (AREA)
DE3126575A 1979-06-28 1981-07-06 Vorrichtung zur Erfassung der Sekundärelektronen in einem Rasterelektronenmikroskop Expired DE3126575C2 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
AU48510/79A AU521225B2 (en) 1977-04-19 1979-06-28 Alkylenedioxy phenyl derivatives
JP10551680A JPS5730253A (en) 1979-06-28 1980-07-31 Secondary electron detector for scan type electron microscope

Publications (2)

Publication Number Publication Date
DE3126575A1 DE3126575A1 (de) 1982-04-22
DE3126575C2 true DE3126575C2 (de) 1984-07-26

Family

ID=25628249

Family Applications (1)

Application Number Title Priority Date Filing Date
DE3126575A Expired DE3126575C2 (de) 1979-06-28 1981-07-06 Vorrichtung zur Erfassung der Sekundärelektronen in einem Rasterelektronenmikroskop

Country Status (5)

Country Link
JP (1) JPS5730253A (Direct)
AU (1) AU521225B2 (Direct)
DE (1) DE3126575C2 (Direct)
FR (1) FR2488044A1 (Direct)
GB (1) GB2081501B (Direct)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE19729526A1 (de) * 1997-07-10 1999-01-14 Frank Siegelin Vorrichtung zur in-situ Abbildung in Rasterelektronenmikroskopen bei hohen Temperaturen

Families Citing this family (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS58161235A (ja) * 1982-03-19 1983-09-24 Internatl Precision Inc 走査型電子線装置
JPS58148867U (ja) * 1982-03-30 1983-10-06 株式会社島津製作所 ２次電子検出装置
GB8327737D0 (en) * 1983-10-17 1983-11-16 Texas Instruments Ltd Electron detector
JPS60154416A (ja) * 1984-01-23 1985-08-14 昭和電線電纜株式会社 高発泡ポリエチレン絶縁電線の製造方法
JPS60212953A (ja) * 1984-04-06 1985-10-25 Hitachi Ltd 電子線装置
JPH0452888Y2 (Direct) * 1985-08-23 1992-12-11
EP0274622B1 (de) * 1986-12-12 1990-11-07 ICT Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik mbH Detektoranordnung mit einem Detektorobjektiv für Korpuskularstrahlgeräte
JP2620370B2 (ja) * 1989-05-01 1997-06-11 住友電気工業株式会社 絶縁電線とその製造方法並びに同軸の絶縁電線
JPH0755990B2 (ja) * 1989-11-02 1995-06-14 宇部興産株式会社 電線被覆用の発泡性ポリオレフィン樹脂組成物
JP3081393B2 (ja) * 1992-10-15 2000-08-28 株式会社日立製作所 走査電子顕微鏡
ES2224747T3 (es) 1998-09-03 2005-03-01 Kyowa Hakko Kogyo Co., Ltd. Compuestos heterociclicos que contienen oxigeno.
GB2367686B (en) * 2000-08-10 2002-12-11 Leo Electron Microscopy Ltd Improvements in or relating to particle detectors
GB2442027B (en) * 2006-09-23 2009-08-26 Zeiss Carl Smt Ltd Charged particle beam instrument and method of detecting charged particles
CN115662866B (zh) * 2022-11-29 2023-03-14 北京中科科仪股份有限公司 一种二次电子探测装置

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB1128107A (en) * 1965-06-23 1968-09-25 Hitachi Ltd Scanning electron microscope
GB1304344A (Direct) * 1969-02-01 1973-01-24
JPS4936496B1 (Direct) * 1970-04-18 1974-10-01

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE19729526A1 (de) * 1997-07-10 1999-01-14 Frank Siegelin Vorrichtung zur in-situ Abbildung in Rasterelektronenmikroskopen bei hohen Temperaturen
DE19729526C2 (de) * 1997-07-10 1999-07-22 Frank Siegelin Beheizbarer Probentisch zur in-situ Abbildung in Rasterelektronenmikroskopen bei hihen Temperaturen

Also Published As

Publication number Publication date
FR2488044A1 (fr) 1982-02-05
FR2488044B1 (Direct) 1985-01-04
AU521225B2 (en) 1982-03-25
AU4851079A (en) 1979-10-25
GB2081501B (en) 1984-05-31
GB2081501A (en) 1982-02-17
DE3126575A1 (de) 1982-04-22
JPS5730253A (en) 1982-02-18

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Legal Events

Date Code Title Description
OP8 Request for examination as to paragraph 44 patent law
8128 New person/name/address of the agent

Representative=s name: LIEDL, G., DIPL.-PHYS. NOETH, H., DIPL.-PHYS., PAT

D2 Grant after examination
8364 No opposition during term of opposition
8328 Change in the person/name/address of the agent

Free format text: LIEDL, G., DIPL.-PHYS., PAT.-ANW., 8000 MUENCHEN

8339 Ceased/non-payment of the annual fee