DE3108467C2 - Verwendung eines Acetylenamins und/oder eines Aminoalkohols in einem Bad zur galvanischen Abscheidung einer Palladium/Nickel-Legierung - Google Patents
Verwendung eines Acetylenamins und/oder eines Aminoalkohols in einem Bad zur galvanischen Abscheidung einer Palladium/Nickel-LegierungInfo
- Publication number
- DE3108467C2 DE3108467C2 DE3108467A DE3108467A DE3108467C2 DE 3108467 C2 DE3108467 C2 DE 3108467C2 DE 3108467 A DE3108467 A DE 3108467A DE 3108467 A DE3108467 A DE 3108467A DE 3108467 C2 DE3108467 C2 DE 3108467C2
- Authority
- DE
- Germany
- Prior art keywords
- palladium
- nickel
- bath
- content
- acetyleneamine
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- KDLHZDBZIXYQEI-UHFFFAOYSA-N Palladium Chemical compound [Pd] KDLHZDBZIXYQEI-UHFFFAOYSA-N 0.000 title claims abstract description 48
- VXAWCKIQYKXJMD-UHFFFAOYSA-N ethynamine Chemical compound NC#C VXAWCKIQYKXJMD-UHFFFAOYSA-N 0.000 title claims abstract description 9
- 150000001414 amino alcohols Chemical class 0.000 title abstract description 4
- 229910000990 Ni alloy Inorganic materials 0.000 title abstract description 3
- 229910001252 Pd alloy Inorganic materials 0.000 title abstract description 3
- 238000004070 electrodeposition Methods 0.000 title description 4
- PXHVJJICTQNCMI-UHFFFAOYSA-N nickel Substances [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 claims abstract description 34
- 229910052763 palladium Inorganic materials 0.000 claims abstract description 20
- 229910052759 nickel Inorganic materials 0.000 claims abstract description 19
- 238000000576 coating method Methods 0.000 claims abstract description 7
- 239000013078 crystal Substances 0.000 claims abstract description 7
- 229910045601 alloy Inorganic materials 0.000 claims abstract description 5
- 239000000956 alloy Substances 0.000 claims abstract description 5
- -1 nickel amine Chemical class 0.000 claims abstract description 5
- 239000007864 aqueous solution Substances 0.000 claims abstract description 4
- 230000008021 deposition Effects 0.000 claims abstract description 4
- 150000003839 salts Chemical class 0.000 claims description 9
- 239000000654 additive Substances 0.000 claims description 2
- 230000000996 additive effect Effects 0.000 claims description 2
- 230000015572 biosynthetic process Effects 0.000 abstract description 5
- 230000007797 corrosion Effects 0.000 description 5
- 238000005260 corrosion Methods 0.000 description 5
- 239000003792 electrolyte Substances 0.000 description 5
- GRYLNZFGIOXLOG-UHFFFAOYSA-N Nitric acid Chemical compound O[N+]([O-])=O GRYLNZFGIOXLOG-UHFFFAOYSA-N 0.000 description 4
- 229910017604 nitric acid Inorganic materials 0.000 description 4
- 150000003460 sulfonic acids Chemical class 0.000 description 3
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 3
- 229910001369 Brass Inorganic materials 0.000 description 2
- 239000010951 brass Substances 0.000 description 2
- 238000000151 deposition Methods 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 230000005764 inhibitory process Effects 0.000 description 2
- 239000000203 mixture Substances 0.000 description 2
- CVHZOJJKTDOEJC-UHFFFAOYSA-N saccharin Chemical compound C1=CC=C2C(=O)NS(=O)(=O)C2=C1 CVHZOJJKTDOEJC-UHFFFAOYSA-N 0.000 description 2
- 150000003863 ammonium salts Chemical class 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 230000007812 deficiency Effects 0.000 description 1
- YGSZNSDQUQYJCY-UHFFFAOYSA-L disodium;naphthalene-1,5-disulfonate Chemical compound [Na+].[Na+].C1=CC=C2C(S(=O)(=O)[O-])=CC=CC2=C1S([O-])(=O)=O YGSZNSDQUQYJCY-UHFFFAOYSA-L 0.000 description 1
- 238000002474 experimental method Methods 0.000 description 1
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 1
- 229910052737 gold Inorganic materials 0.000 description 1
- 239000010931 gold Substances 0.000 description 1
- 150000007522 mineralic acids Chemical class 0.000 description 1
- PSZYNBSKGUBXEH-UHFFFAOYSA-N naphthalene-1-sulfonic acid Chemical class C1=CC=C2C(S(=O)(=O)O)=CC=CC2=C1 PSZYNBSKGUBXEH-UHFFFAOYSA-N 0.000 description 1
- 150000007524 organic acids Chemical class 0.000 description 1
- 229940081974 saccharin Drugs 0.000 description 1
- 235000019204 saccharin Nutrition 0.000 description 1
- 239000000901 saccharin and its Na,K and Ca salt Substances 0.000 description 1
- 159000000000 sodium salts Chemical class 0.000 description 1
- 239000006104 solid solution Substances 0.000 description 1
- 229940124530 sulfonamide Drugs 0.000 description 1
- LMYRWZFENFIFIT-UHFFFAOYSA-N toluene-4-sulfonamide Chemical compound CC1=CC=C(S(N)(=O)=O)C=C1 LMYRWZFENFIFIT-UHFFFAOYSA-N 0.000 description 1
- NJPKYOIXTSGVAN-UHFFFAOYSA-K trisodium;naphthalene-1,3,6-trisulfonate Chemical compound [Na+].[Na+].[Na+].[O-]S(=O)(=O)C1=CC(S([O-])(=O)=O)=CC2=CC(S(=O)(=O)[O-])=CC=C21 NJPKYOIXTSGVAN-UHFFFAOYSA-K 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D3/00—Electroplating: Baths therefor
- C25D3/02—Electroplating: Baths therefor from solutions
- C25D3/56—Electroplating: Baths therefor from solutions of alloys
- C25D3/562—Electroplating: Baths therefor from solutions of alloys containing more than 50% by weight of iron or nickel or cobalt
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D3/00—Electroplating: Baths therefor
- C25D3/02—Electroplating: Baths therefor from solutions
- C25D3/56—Electroplating: Baths therefor from solutions of alloys
- C25D3/567—Electroplating: Baths therefor from solutions of alloys containing more than 50% by weight of platinum group metals
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Electrochemistry (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Electroplating And Plating Baths Therefor (AREA)
Priority Applications (13)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE3108467A DE3108467C2 (de) | 1981-03-06 | 1981-03-06 | Verwendung eines Acetylenamins und/oder eines Aminoalkohols in einem Bad zur galvanischen Abscheidung einer Palladium/Nickel-Legierung |
| GB8205450A GB2094348B (en) | 1981-03-06 | 1982-02-24 | Electrolytic deposition of palladium nickel alloy |
| ZA821368A ZA821368B (en) | 1981-03-06 | 1982-03-02 | A bath for the electrolytic deposition of a palladium-nickel alloy |
| AU81047/82A AU535304B2 (en) | 1981-03-06 | 1982-03-02 | Palladium-nickel alloy electrodeposition bath |
| SE8201298A SE8201298L (sv) | 1981-03-06 | 1982-03-03 | Bad for galvanisk utfellning av en palladium/nickel-legering |
| BE2/59610A BE892343A (fr) | 1981-03-06 | 1982-03-03 | Bain de depot galvanoplastique d'alliages nickel-palladium, procede d'utilisation de ce bain |
| AT0082282A AT377014B (de) | 1981-03-06 | 1982-03-03 | Verfahren zur galvanischen abscheidung einer ueberzugsschicht aus palladium/-nickel-mischkristallen |
| JP57032482A JPS5816088A (ja) | 1981-03-06 | 1982-03-03 | パラジウム／ニッケル合金を電気的に析出する浴 |
| FR8203612A FR2501242A1 (fr) | 1981-03-06 | 1982-03-04 | Bain de depot galvanoplastique d'alliages nickel-palladium, procede d'utilisation de ce bain |
| IT19990/82A IT1150625B (it) | 1981-03-06 | 1982-03-05 | Bagno per la deposizione galvanica di una lega palladio/nichel |
| US06/355,246 US4416740A (en) | 1981-03-06 | 1982-03-05 | Method and bath for the electrodeposition of palladium/nickel alloys |
| NL8200907A NL8200907A (nl) | 1981-03-06 | 1982-03-05 | Bad voor de galvanische afscheiding van een palladium/nikkellegering. |
| BR8201173A BR8201173A (pt) | 1981-03-06 | 1982-03-05 | Emprego de uma amina de acetileno e/ou de um ou varios aminoalcoois |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE3108467A DE3108467C2 (de) | 1981-03-06 | 1981-03-06 | Verwendung eines Acetylenamins und/oder eines Aminoalkohols in einem Bad zur galvanischen Abscheidung einer Palladium/Nickel-Legierung |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| DE3108467A1 DE3108467A1 (de) | 1982-09-16 |
| DE3108467C2 true DE3108467C2 (de) | 1983-05-26 |
Family
ID=6126474
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| DE3108467A Expired DE3108467C2 (de) | 1981-03-06 | 1981-03-06 | Verwendung eines Acetylenamins und/oder eines Aminoalkohols in einem Bad zur galvanischen Abscheidung einer Palladium/Nickel-Legierung |
Country Status (13)
| Country | Link |
|---|---|
| US (1) | US4416740A (OSRAM) |
| JP (1) | JPS5816088A (OSRAM) |
| AT (1) | AT377014B (OSRAM) |
| AU (1) | AU535304B2 (OSRAM) |
| BE (1) | BE892343A (OSRAM) |
| BR (1) | BR8201173A (OSRAM) |
| DE (1) | DE3108467C2 (OSRAM) |
| FR (1) | FR2501242A1 (OSRAM) |
| GB (1) | GB2094348B (OSRAM) |
| IT (1) | IT1150625B (OSRAM) |
| NL (1) | NL8200907A (OSRAM) |
| SE (1) | SE8201298L (OSRAM) |
| ZA (1) | ZA821368B (OSRAM) |
Families Citing this family (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4564426A (en) * | 1985-04-15 | 1986-01-14 | International Business Machines Corporation | Process for the deposition of palladium-nickel alloy |
| US4628165A (en) * | 1985-09-11 | 1986-12-09 | Learonal, Inc. | Electrical contacts and methods of making contacts by electrodeposition |
| US5034190A (en) * | 1986-01-31 | 1991-07-23 | Westinghouse Electric Corp. | Apparatus for conducting accelerated corrosion testing of nickel alloys |
| US4778574A (en) * | 1987-09-14 | 1988-10-18 | American Chemical & Refining Company, Inc. | Amine-containing bath for electroplating palladium |
| ES2185616T3 (es) * | 1990-06-22 | 2003-05-01 | Caschem Inc | Composicion grasa para cables y articulos que la incorporan. |
| WO2020129095A1 (en) * | 2018-12-20 | 2020-06-25 | Top Finish 2002 S.R.L. | Galvanic bath for making a corrosion- and oxidation-resistant palladium and nickel alloy-based plating, preparation and use thereof |
Family Cites Families (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US2781306A (en) * | 1956-04-27 | 1957-02-12 | Udylite Res Corp | Electrodeposition of nickel |
| US3002903A (en) * | 1958-09-26 | 1961-10-03 | Hanson Van Winkle Munning Co | Electrodeposition of nickel |
| US3133006A (en) * | 1962-05-28 | 1964-05-12 | Barnet D Ostrow | Acid nickel plating bath |
| US3186926A (en) * | 1962-08-13 | 1965-06-01 | Hofmann Hans | Electroplating solution containing a diester of selenious acid |
| JPS4733176B1 (OSRAM) * | 1967-01-11 | 1972-08-23 | ||
| GB1485665A (en) * | 1975-03-27 | 1977-09-14 | Permalite Chem Ltd | Nickel electroplating |
| US4077855A (en) * | 1976-05-04 | 1978-03-07 | Francine Popescu | Bright nickel electroplating bath and process |
| DE2825966A1 (de) * | 1978-06-14 | 1980-01-03 | Basf Ag | Saures galvanisches nickelbad, das sulfobetaine als glanz- und einebnungsmittel enthaelt |
| DE2943028A1 (de) * | 1978-11-01 | 1980-05-08 | M & T Chemicals Inc | Galvanisches nickelbad |
-
1981
- 1981-03-06 DE DE3108467A patent/DE3108467C2/de not_active Expired
-
1982
- 1982-02-24 GB GB8205450A patent/GB2094348B/en not_active Expired
- 1982-03-02 ZA ZA821368A patent/ZA821368B/xx unknown
- 1982-03-02 AU AU81047/82A patent/AU535304B2/en not_active Ceased
- 1982-03-03 AT AT0082282A patent/AT377014B/de not_active IP Right Cessation
- 1982-03-03 SE SE8201298A patent/SE8201298L/ not_active Application Discontinuation
- 1982-03-03 BE BE2/59610A patent/BE892343A/fr not_active IP Right Cessation
- 1982-03-03 JP JP57032482A patent/JPS5816088A/ja active Pending
- 1982-03-04 FR FR8203612A patent/FR2501242A1/fr active Granted
- 1982-03-05 IT IT19990/82A patent/IT1150625B/it active
- 1982-03-05 US US06/355,246 patent/US4416740A/en not_active Expired - Fee Related
- 1982-03-05 NL NL8200907A patent/NL8200907A/nl not_active Application Discontinuation
- 1982-03-05 BR BR8201173A patent/BR8201173A/pt unknown
Non-Patent Citations (1)
| Title |
|---|
| NICHTS-ERMITTELT |
Also Published As
| Publication number | Publication date |
|---|---|
| DE3108467A1 (de) | 1982-09-16 |
| ATA82282A (de) | 1984-06-15 |
| AT377014B (de) | 1985-01-25 |
| AU8104782A (en) | 1982-09-09 |
| AU535304B2 (en) | 1984-03-15 |
| NL8200907A (nl) | 1982-10-01 |
| JPS5816088A (ja) | 1983-01-29 |
| BR8201173A (pt) | 1982-11-23 |
| IT8219990A0 (it) | 1982-03-05 |
| IT1150625B (it) | 1986-12-17 |
| SE8201298L (sv) | 1982-09-07 |
| FR2501242B1 (OSRAM) | 1985-04-12 |
| FR2501242A1 (fr) | 1982-09-10 |
| GB2094348A (en) | 1982-09-15 |
| ZA821368B (en) | 1983-01-26 |
| GB2094348B (en) | 1985-08-07 |
| US4416740A (en) | 1983-11-22 |
| BE892343A (fr) | 1982-07-01 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| OP8 | Request for examination as to paragraph 44 patent law | ||
| D2 | Grant after examination | ||
| 8364 | No opposition during term of opposition | ||
| 8327 | Change in the person/name/address of the patent owner |
Owner name: LPW-CHEMIE GMBH, 4040 NEUSS, DE |
|
| 8339 | Ceased/non-payment of the annual fee |