DE2821500C2 - Verfahren zum Entfernen der Oberflächenklebrigkeit von einer gehärteten, photopolymerisierten Harzmasse - Google Patents
Verfahren zum Entfernen der Oberflächenklebrigkeit von einer gehärteten, photopolymerisierten HarzmasseInfo
- Publication number
- DE2821500C2 DE2821500C2 DE2821500A DE2821500A DE2821500C2 DE 2821500 C2 DE2821500 C2 DE 2821500C2 DE 2821500 A DE2821500 A DE 2821500A DE 2821500 A DE2821500 A DE 2821500A DE 2821500 C2 DE2821500 C2 DE 2821500C2
- Authority
- DE
- Germany
- Prior art keywords
- resin composition
- group
- printing
- actinic light
- cured
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
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- 239000011342 resin composition Substances 0.000 title claims description 47
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- -1 alkyl radicals Chemical class 0.000 claims description 20
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- 125000004435 hydrogen atom Chemical group [H]* 0.000 claims description 12
- 125000005843 halogen group Chemical group 0.000 claims description 8
- 125000002887 hydroxy group Chemical group [H]O* 0.000 claims description 7
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 claims description 7
- 239000002344 surface layer Substances 0.000 claims description 7
- 125000000449 nitro group Chemical group [O-][N+](*)=O 0.000 claims description 6
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- 229910052799 carbon Inorganic materials 0.000 claims description 4
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- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 description 3
- FRASJONUBLZVQX-UHFFFAOYSA-N 1,4-naphthoquinone Chemical compound C1=CC=C2C(=O)C=CC(=O)C2=C1 FRASJONUBLZVQX-UHFFFAOYSA-N 0.000 description 2
- MYKLQMNSFPAPLZ-UHFFFAOYSA-N 2,5-dimethylcyclohexa-2,5-diene-1,4-dione Chemical compound CC1=CC(=O)C(C)=CC1=O MYKLQMNSFPAPLZ-UHFFFAOYSA-N 0.000 description 2
- XFCMNSHQOZQILR-UHFFFAOYSA-N 2-[2-(2-methylprop-2-enoyloxy)ethoxy]ethyl 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OCCOCCOC(=O)C(C)=C XFCMNSHQOZQILR-UHFFFAOYSA-N 0.000 description 2
- VTSDGYDTWADUJQ-UHFFFAOYSA-N 2-bromoanthracene-9,10-dione Chemical compound C1=CC=C2C(=O)C3=CC(Br)=CC=C3C(=O)C2=C1 VTSDGYDTWADUJQ-UHFFFAOYSA-N 0.000 description 2
- VHSHLMUCYSAUQU-UHFFFAOYSA-N 2-hydroxypropyl methacrylate Chemical compound CC(O)COC(=O)C(C)=C VHSHLMUCYSAUQU-UHFFFAOYSA-N 0.000 description 2
- BQZJOQXSCSZQPS-UHFFFAOYSA-N 2-methoxy-1,2-diphenylethanone Chemical compound C=1C=CC=CC=1C(OC)C(=O)C1=CC=CC=C1 BQZJOQXSCSZQPS-UHFFFAOYSA-N 0.000 description 2
- NJWGQARXZDRHCD-UHFFFAOYSA-N 2-methylanthraquinone Chemical compound C1=CC=C2C(=O)C3=CC(C)=CC=C3C(=O)C2=C1 NJWGQARXZDRHCD-UHFFFAOYSA-N 0.000 description 2
- TXFPEBPIARQUIG-UHFFFAOYSA-N 4'-hydroxyacetophenone Chemical compound CC(=O)C1=CC=C(O)C=C1 TXFPEBPIARQUIG-UHFFFAOYSA-N 0.000 description 2
- NPFYZDNDJHZQKY-UHFFFAOYSA-N 4-Hydroxybenzophenone Chemical compound C1=CC(O)=CC=C1C(=O)C1=CC=CC=C1 NPFYZDNDJHZQKY-UHFFFAOYSA-N 0.000 description 2
- NTPLXRHDUXRPNE-UHFFFAOYSA-N 4-methoxyacetophenone Chemical compound COC1=CC=C(C(C)=O)C=C1 NTPLXRHDUXRPNE-UHFFFAOYSA-N 0.000 description 2
- RZVHIXYEVGDQDX-UHFFFAOYSA-N 9,10-anthraquinone Chemical compound C1=CC=C2C(=O)C3=CC=CC=C3C(=O)C2=C1 RZVHIXYEVGDQDX-UHFFFAOYSA-N 0.000 description 2
- 229940076442 9,10-anthraquinone Drugs 0.000 description 2
- VZCYOOQTPOCHFL-OWOJBTEDSA-N Fumaric acid Chemical compound OC(=O)\C=C\C(O)=O VZCYOOQTPOCHFL-OWOJBTEDSA-N 0.000 description 2
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 description 2
- UKLDJPRMSDWDSL-UHFFFAOYSA-L [dibutyl(dodecanoyloxy)stannyl] dodecanoate Chemical compound CCCCCCCCCCCC(=O)O[Sn](CCCC)(CCCC)OC(=O)CCCCCCCCCCC UKLDJPRMSDWDSL-UHFFFAOYSA-L 0.000 description 2
- 238000010521 absorption reaction Methods 0.000 description 2
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- 125000003545 alkoxy group Chemical group 0.000 description 2
- 125000000217 alkyl group Chemical group 0.000 description 2
- PYKYMHQGRFAEBM-UHFFFAOYSA-N anthraquinone Natural products CCC(=O)c1c(O)c2C(=O)C3C(C=CC=C3O)C(=O)c2cc1CC(=O)OC PYKYMHQGRFAEBM-UHFFFAOYSA-N 0.000 description 2
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- VABRJGOVVLYNCR-UHFFFAOYSA-N (3,5-dihydroxyphenyl)-phenylmethanone Chemical compound OC1=CC(O)=CC(C(=O)C=2C=CC=CC=2)=C1 VABRJGOVVLYNCR-UHFFFAOYSA-N 0.000 description 1
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- 238000002386 leaching Methods 0.000 description 1
- 238000007644 letterpress printing Methods 0.000 description 1
- 238000012423 maintenance Methods 0.000 description 1
- 238000000465 moulding Methods 0.000 description 1
- CXAYOCVHDCXPAI-UHFFFAOYSA-N naphthalen-1-yl(phenyl)methanone Chemical compound C=1C=CC2=CC=CC=C2C=1C(=O)C1=CC=CC=C1 CXAYOCVHDCXPAI-UHFFFAOYSA-N 0.000 description 1
- 239000012299 nitrogen atmosphere Substances 0.000 description 1
- HMZGPNHSPWNGEP-UHFFFAOYSA-N octadecyl 2-methylprop-2-enoate Chemical compound CCCCCCCCCCCCCCCCCCOC(=O)C(C)=C HMZGPNHSPWNGEP-UHFFFAOYSA-N 0.000 description 1
- JRZJOMJEPLMPRA-UHFFFAOYSA-N olefin Natural products CCCCCCCC=C JRZJOMJEPLMPRA-UHFFFAOYSA-N 0.000 description 1
- 230000003647 oxidation Effects 0.000 description 1
- 238000007254 oxidation reaction Methods 0.000 description 1
- 238000010525 oxidative degradation reaction Methods 0.000 description 1
- IMACFCSSMIZSPP-UHFFFAOYSA-N phenacyl chloride Chemical compound ClCC(=O)C1=CC=CC=C1 IMACFCSSMIZSPP-UHFFFAOYSA-N 0.000 description 1
- LYXOWKPVTCPORE-UHFFFAOYSA-N phenyl-(4-phenylphenyl)methanone Chemical compound C=1C=C(C=2C=CC=CC=2)C=CC=1C(=O)C1=CC=CC=C1 LYXOWKPVTCPORE-UHFFFAOYSA-N 0.000 description 1
- 238000000016 photochemical curing Methods 0.000 description 1
- 238000006552 photochemical reaction Methods 0.000 description 1
- 231100000614 poison Toxicity 0.000 description 1
- 229920002589 poly(vinylethylene) polymer Polymers 0.000 description 1
- 229920000058 polyacrylate Polymers 0.000 description 1
- 229920006122 polyamide resin Polymers 0.000 description 1
- 229920002857 polybutadiene Polymers 0.000 description 1
- 229920000570 polyether Polymers 0.000 description 1
- 229920000193 polymethacrylate Polymers 0.000 description 1
- 229920005749 polyurethane resin Polymers 0.000 description 1
- 238000012545 processing Methods 0.000 description 1
- 108090000623 proteins and genes Proteins 0.000 description 1
- 150000004053 quinones Chemical class 0.000 description 1
- 230000005855 radiation Effects 0.000 description 1
- 238000010526 radical polymerization reaction Methods 0.000 description 1
- 239000011541 reaction mixture Substances 0.000 description 1
- 238000010992 reflux Methods 0.000 description 1
- 238000007789 sealing Methods 0.000 description 1
- 239000003381 stabilizer Substances 0.000 description 1
- 238000003756 stirring Methods 0.000 description 1
- 125000001424 substituent group Chemical group 0.000 description 1
- 239000004094 surface-active agent Substances 0.000 description 1
- 239000006188 syrup Substances 0.000 description 1
- 235000020357 syrup Nutrition 0.000 description 1
- VZCYOOQTPOCHFL-UHFFFAOYSA-N trans-butenedioic acid Natural products OC(=O)C=CC(O)=O VZCYOOQTPOCHFL-UHFFFAOYSA-N 0.000 description 1
- 238000009423 ventilation Methods 0.000 description 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
- G03F7/2022—Multi-step exposure, e.g. hybrid; backside exposure; blanket exposure, e.g. for image reversal; edge exposure, e.g. for edge bead removal; corrective exposure
- G03F7/2024—Multi-step exposure, e.g. hybrid; backside exposure; blanket exposure, e.g. for image reversal; edge exposure, e.g. for edge bead removal; corrective exposure of the already developed image
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
- Treatments Of Macromolecular Shaped Articles (AREA)
- Polymerisation Methods In General (AREA)
- Macromonomer-Based Addition Polymer (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP5879977A JPS53143669A (en) | 1977-05-23 | 1977-05-23 | Elimination of surface tuckiness of radically-polymerizable resin cured product |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| DE2821500A1 DE2821500A1 (de) | 1978-11-30 |
| DE2821500C2 true DE2821500C2 (de) | 1984-12-20 |
Family
ID=13094626
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| DE2821500A Expired DE2821500C2 (de) | 1977-05-23 | 1978-05-17 | Verfahren zum Entfernen der Oberflächenklebrigkeit von einer gehärteten, photopolymerisierten Harzmasse |
Country Status (5)
| Country | Link |
|---|---|
| US (1) | US4202696A (enFirst) |
| JP (1) | JPS53143669A (enFirst) |
| DE (1) | DE2821500C2 (enFirst) |
| FR (1) | FR2392411A1 (enFirst) |
| GB (1) | GB1582425A (enFirst) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE3704067A1 (de) * | 1986-02-10 | 1987-08-13 | Photopoly Ohka Co | Verfahren zum nicht-klebrigmachen der oberflaeche einer harzplatte |
Families Citing this family (29)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5836421B2 (ja) * | 1978-11-20 | 1983-08-09 | 松下電器産業株式会社 | テ−プレコ−ダの操作装置 |
| JPS55135838A (en) * | 1979-04-12 | 1980-10-23 | Asahi Chem Ind Co Ltd | Surface treating method for photosensitive elastomer printing plate |
| EP0112798B1 (de) * | 1982-11-25 | 1987-05-13 | Ciba-Geigy Ag | Zu Kondensations- oder Additionsreaktionen befähigte lichtempfindliche und gegebenenfalls vernetzbare Stoffgemische, daraus herstellbare Reaktionsprodukte und deren Verwendung |
| US4603058A (en) * | 1984-10-05 | 1986-07-29 | Macdermid, Incorporated | Post-treatment of cured, radiation sensitive, polymerizable resins to eliminate surface tack |
| US4595635A (en) * | 1985-05-02 | 1986-06-17 | Raychem Corporation | Organopolysiloxane materials having decreased surface tack |
| JPS6261906A (ja) * | 1985-09-11 | 1987-03-18 | G C Dental Ind Corp | 歯科修復用光重合性組成物 |
| US5288571A (en) * | 1986-10-02 | 1994-02-22 | Asahi Kasei Kogyo Kabushiki Kaisha | Photoresin printing plate for use in printing a corrugated board |
| JPH07113767B2 (ja) * | 1986-10-02 | 1995-12-06 | 旭化成工業株式会社 | 段ボ−ル印刷用感光性樹脂印刷版 |
| US4806506A (en) * | 1987-09-14 | 1989-02-21 | E. I. Du Pont De Nemours And Company | Process for detackifying photopolymer flexographic printing plates |
| DE3742275A1 (de) * | 1987-12-12 | 1989-06-22 | Hoechst Ag | Verfahren zur nachbehandlung von entwickelten reliefdruckformen fuer den flexodruck |
| DE3908059A1 (de) * | 1989-03-13 | 1990-09-27 | Basf Ag | Verfahren zur herstellung einer reliefdruckplatte mit klebfreier druckender oberflaeche |
| JP2944164B2 (ja) * | 1990-08-08 | 1999-08-30 | 旭化成工業株式会社 | フレキソ印刷版用液状感光性樹脂組成物 |
| DE4300856A1 (de) * | 1993-01-15 | 1994-07-21 | Basf Lacke & Farben | Lichtempfindliches Aufzeichnungselement und Verfahren zur Herstellung einer Reliefdruckplatte |
| AU1165495A (en) * | 1994-02-18 | 1995-09-28 | Polyfibron Technologies, Inc. | Polymeric composition and method for surface detackification |
| EP0691357A1 (en) | 1994-06-17 | 1996-01-10 | Polyfibron Technologies, Inc. | Liquid polyurethane (meth)acrylate photopolymer useful for flexographic printing plate |
| CA2207591A1 (en) | 1994-12-13 | 1996-06-20 | Douglas R. Leach | Photosensitive compositions and clean running photopolymer printing plates therefrom |
| JPH08220737A (ja) | 1994-12-13 | 1996-08-30 | Hercules Inc | フレキソ印刷用の軟質レリーフ感光性ポリマー版面 |
| ES2157494T3 (es) * | 1996-02-20 | 2001-08-16 | Asahi Chemical Ind | Procedimiento para la fabricacion de placas de imprimir de resina fotosensible. |
| US6403284B1 (en) | 1996-12-06 | 2002-06-11 | Asahi Kasei Kogyo Kabushiki Kaisha | Process for producing photosensitive resin printing plate and treating solution |
| US6500601B1 (en) * | 1999-08-18 | 2002-12-31 | M&R Marking Systems, Inc. | Method of manufacturing photopolymer plates |
| EP1251403A4 (en) | 2000-10-13 | 2004-03-24 | Asahi Chemical Ind | METHOD AND DEVICE FOR DEVELOPING PHOTO-SENSITIVE RELIEF RESIN PLATES |
| US6627309B2 (en) * | 2001-05-08 | 2003-09-30 | 3M Innovative Properties Company | Adhesive detackification |
| EP1408071A4 (en) * | 2001-06-28 | 2008-09-03 | Hitoshi Kanazawa | METHOD OF MODIFYING POLYMERIC MATERIALS AND USE OF SAID MATERIALS |
| US8445180B2 (en) | 2003-12-26 | 2013-05-21 | Asahi Kasei Chemicals Corporation | Water-developable photopolymer plate for letterpress printing |
| WO2006030537A1 (ja) * | 2004-09-13 | 2006-03-23 | Asahi Kasei Chemicals Corporation | 感光性樹脂硬化物の製造方法 |
| US7247344B2 (en) * | 2004-11-16 | 2007-07-24 | Timothy Gotsick | Method and apparatus for applying surface treatments to photosensitive printing elements during thermal development |
| EP3184568A1 (en) | 2015-12-21 | 2017-06-28 | Evonik Degussa GmbH | Acrylate-terminated urethane polybutadienes from low-monomer 1:1 monoadductes from reactive olefinic compounds and diisocyanates and hydroxy-terminated polybutadienes for liquid optically clear adhesives (locas) |
| EP3184567A1 (de) | 2015-12-21 | 2017-06-28 | Evonik Degussa GmbH | Acrylatterminierte urethanpolybutadiene aus monomerarmen 1:1 monoaddukten aus reaktiven olfinischen verbindungen und diisocyanaten und hydroxyterminierten polybutadienen |
| JP7550543B2 (ja) * | 2020-06-10 | 2024-09-13 | 日東シンコー株式会社 | 硬化性組成物 |
Family Cites Families (12)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| BE560986A (enFirst) * | 1956-09-21 | |||
| BE627820A (enFirst) * | 1962-02-01 | |||
| US3506440A (en) * | 1965-03-22 | 1970-04-14 | Mitsui Mining & Smelting Co | Method of reinforcing photosensitive resists formed on photoengraving plates |
| NL6914613A (enFirst) * | 1968-10-25 | 1970-04-28 | ||
| US3861911A (en) * | 1972-09-28 | 1975-01-21 | Xerox Corp | Image fixing method |
| JPS5223281B2 (enFirst) * | 1972-12-15 | 1977-06-23 | ||
| US3865597A (en) * | 1973-03-26 | 1975-02-11 | Western Electric Co | Additives to negative photoresists which increase the sensitivity thereof |
| JPS502070A (enFirst) * | 1973-05-09 | 1975-01-10 | ||
| US3981583A (en) * | 1973-08-23 | 1976-09-21 | Nippon Paint Co., Ltd. | Apparatus for automatically processing photopolymer plates |
| JPS50130505A (enFirst) * | 1974-04-05 | 1975-10-15 | ||
| US3997344A (en) * | 1974-07-05 | 1976-12-14 | American Can Company | Dry positive photopolymer imaging process involving heating and application of toner |
| SU542167A1 (ru) * | 1974-11-19 | 1977-01-05 | Украинский Научно-Исследовательский Институт Полиграфической Промышленности | Способ изготовлени фотополимерных печатных форм |
-
1977
- 1977-05-23 JP JP5879977A patent/JPS53143669A/ja active Granted
-
1978
- 1978-05-05 GB GB17993/78A patent/GB1582425A/en not_active Expired
- 1978-05-16 US US05/906,890 patent/US4202696A/en not_active Expired - Lifetime
- 1978-05-17 DE DE2821500A patent/DE2821500C2/de not_active Expired
- 1978-05-22 FR FR7815094A patent/FR2392411A1/fr active Granted
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE3704067A1 (de) * | 1986-02-10 | 1987-08-13 | Photopoly Ohka Co | Verfahren zum nicht-klebrigmachen der oberflaeche einer harzplatte |
Also Published As
| Publication number | Publication date |
|---|---|
| FR2392411A1 (fr) | 1978-12-22 |
| JPS53143669A (en) | 1978-12-14 |
| FR2392411B1 (enFirst) | 1983-08-12 |
| JPS5616182B2 (enFirst) | 1981-04-15 |
| US4202696A (en) | 1980-05-13 |
| DE2821500A1 (de) | 1978-11-30 |
| GB1582425A (en) | 1981-01-07 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| OAP | Request for examination filed | ||
| OD | Request for examination | ||
| D2 | Grant after examination | ||
| 8364 | No opposition during term of opposition |