DE2721589A1 - Verfahren zum gleichzeitigen messen der dicke zweier metall-duennschichten - Google Patents
Verfahren zum gleichzeitigen messen der dicke zweier metall-duennschichtenInfo
- Publication number
- DE2721589A1 DE2721589A1 DE19772721589 DE2721589A DE2721589A1 DE 2721589 A1 DE2721589 A1 DE 2721589A1 DE 19772721589 DE19772721589 DE 19772721589 DE 2721589 A DE2721589 A DE 2721589A DE 2721589 A1 DE2721589 A1 DE 2721589A1
- Authority
- DE
- Germany
- Prior art keywords
- thickness
- sample
- measured
- layer
- line
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Ceased
Links
- 238000000034 method Methods 0.000 title claims description 30
- 239000010409 thin film Substances 0.000 title claims description 9
- PXHVJJICTQNCMI-UHFFFAOYSA-N nickel Substances [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 claims description 42
- 239000000758 substrate Substances 0.000 claims description 36
- 239000010931 gold Substances 0.000 claims description 33
- 230000005284 excitation Effects 0.000 claims description 25
- 229910052737 gold Inorganic materials 0.000 claims description 25
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 claims description 23
- 229910052751 metal Inorganic materials 0.000 claims description 22
- 239000002184 metal Substances 0.000 claims description 22
- 229910052759 nickel Inorganic materials 0.000 claims description 20
- 229910052802 copper Inorganic materials 0.000 claims description 16
- 239000010949 copper Substances 0.000 claims description 16
- 230000005855 radiation Effects 0.000 claims description 15
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 claims description 14
- 238000005259 measurement Methods 0.000 claims description 13
- 238000004876 x-ray fluorescence Methods 0.000 claims description 9
- 230000000694 effects Effects 0.000 claims description 8
- 238000013016 damping Methods 0.000 claims description 6
- 150000002739 metals Chemical class 0.000 claims description 6
- 230000004044 response Effects 0.000 claims description 6
- 239000010408 film Substances 0.000 claims description 4
- 238000004519 manufacturing process Methods 0.000 claims description 2
- 230000001678 irradiating effect Effects 0.000 claims 2
- 229910018054 Ni-Cu Inorganic materials 0.000 description 4
- 229910018481 Ni—Cu Inorganic materials 0.000 description 4
- 238000000576 coating method Methods 0.000 description 3
- 238000001514 detection method Methods 0.000 description 3
- 238000012545 processing Methods 0.000 description 3
- 229910000831 Steel Inorganic materials 0.000 description 2
- 229910052790 beryllium Inorganic materials 0.000 description 2
- ATBAMAFKBVZNFJ-UHFFFAOYSA-N beryllium atom Chemical compound [Be] ATBAMAFKBVZNFJ-UHFFFAOYSA-N 0.000 description 2
- 230000003993 interaction Effects 0.000 description 2
- 238000004377 microelectronic Methods 0.000 description 2
- 238000007747 plating Methods 0.000 description 2
- 239000010959 steel Substances 0.000 description 2
- 229910016523 CuKa Inorganic materials 0.000 description 1
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 description 1
- 238000010521 absorption reaction Methods 0.000 description 1
- 230000005540 biological transmission Effects 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 230000008878 coupling Effects 0.000 description 1
- 238000010168 coupling process Methods 0.000 description 1
- 238000005859 coupling reaction Methods 0.000 description 1
- 239000011888 foil Substances 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- -1 gold Chemical class 0.000 description 1
- 229910052734 helium Inorganic materials 0.000 description 1
- 239000001307 helium Substances 0.000 description 1
- SWQJXJOGLNCZEY-UHFFFAOYSA-N helium atom Chemical compound [He] SWQJXJOGLNCZEY-UHFFFAOYSA-N 0.000 description 1
- 229910052738 indium Inorganic materials 0.000 description 1
- APFVFJFRJDLVQX-UHFFFAOYSA-N indium atom Chemical compound [In] APFVFJFRJDLVQX-UHFFFAOYSA-N 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 230000008569 process Effects 0.000 description 1
- 229910052702 rhenium Inorganic materials 0.000 description 1
- WUAPFZMCVAUBPE-UHFFFAOYSA-N rhenium atom Chemical compound [Re] WUAPFZMCVAUBPE-UHFFFAOYSA-N 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- 238000012360 testing method Methods 0.000 description 1
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 description 1
- 229910052721 tungsten Inorganic materials 0.000 description 1
- 239000010937 tungsten Substances 0.000 description 1
- 230000000007 visual effect Effects 0.000 description 1
Classifications
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N23/00—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00
- G01N23/22—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by measuring secondary emission from the material
- G01N23/223—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by measuring secondary emission from the material by irradiating the sample with X-rays or gamma-rays and by measuring X-ray fluorescence
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N2223/00—Investigating materials by wave or particle radiation
- G01N2223/07—Investigating materials by wave or particle radiation secondary emission
- G01N2223/076—X-ray fluorescence
Landscapes
- Physics & Mathematics (AREA)
- Health & Medical Sciences (AREA)
- Life Sciences & Earth Sciences (AREA)
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Biochemistry (AREA)
- General Health & Medical Sciences (AREA)
- General Physics & Mathematics (AREA)
- Immunology (AREA)
- Pathology (AREA)
- Length-Measuring Devices Using Wave Or Particle Radiation (AREA)
- Analysing Materials By The Use Of Radiation (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US68746276A | 1976-05-18 | 1976-05-18 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| DE2721589A1 true DE2721589A1 (de) | 1977-12-01 |
Family
ID=24760542
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| DE19772721589 Ceased DE2721589A1 (de) | 1976-05-18 | 1977-05-13 | Verfahren zum gleichzeitigen messen der dicke zweier metall-duennschichten |
Country Status (6)
| Country | Link |
|---|---|
| JP (1) | JPS52140355A (enExample) |
| CA (1) | CA1086870A (enExample) |
| DE (1) | DE2721589A1 (enExample) |
| FR (1) | FR2393266A1 (enExample) |
| GB (1) | GB1561313A (enExample) |
| NL (1) | NL185306C (enExample) |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE2946567A1 (de) * | 1978-11-21 | 1980-06-04 | Enso Gutzeit Oy | Verfahren zum messen von belagmengen |
| EP0070974A1 (de) * | 1981-07-23 | 1983-02-09 | Hoesch Aktiengesellschaft | Verfahren und Vorrichtung zur zerstörungsfreien Bestimmung der Dicke der Eisen-Zinn-Zwischenschicht an elektrolytisch verzinntem Blech |
| DE3826917A1 (de) * | 1987-11-20 | 1989-06-01 | Mikroelektronik Friedrich Enge | Verfahren zur phosphorgehaltsbestimmung in stromlos abgeschiedenen metallueberzuegen |
Families Citing this family (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5758300U (enExample) * | 1980-09-22 | 1982-04-06 | ||
| JPS60140105A (ja) * | 1983-12-27 | 1985-07-25 | Shimadzu Corp | 多層膜分析装置 |
| JPS60142205A (ja) * | 1983-12-29 | 1985-07-27 | Shimadzu Corp | 多層膜分析装置 |
| JP3706989B2 (ja) * | 1999-04-07 | 2005-10-19 | 富士通株式会社 | 蛍光ｘ線を用いた膜厚測定方法 |
| JP4966160B2 (ja) * | 2007-10-26 | 2012-07-04 | シャープ株式会社 | 膜厚測定方法 |
| JP5494322B2 (ja) * | 2009-12-28 | 2014-05-14 | 株式会社デンソー | Ｃｎｔワイヤの製造方法 |
Family Cites Families (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5146631B2 (enExample) * | 1971-12-29 | 1976-12-10 | ||
| JPS4919222A (enExample) * | 1972-06-15 | 1974-02-20 |
-
1977
- 1977-04-27 CA CA277,086A patent/CA1086870A/en not_active Expired
- 1977-05-13 DE DE19772721589 patent/DE2721589A1/de not_active Ceased
- 1977-05-17 FR FR7715153A patent/FR2393266A1/fr active Granted
- 1977-05-17 NL NL7705443A patent/NL185306C/xx not_active IP Right Cessation
- 1977-05-18 GB GB2084877A patent/GB1561313A/en not_active Expired
- 1977-05-18 JP JP5651677A patent/JPS52140355A/ja active Granted
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE2946567A1 (de) * | 1978-11-21 | 1980-06-04 | Enso Gutzeit Oy | Verfahren zum messen von belagmengen |
| EP0070974A1 (de) * | 1981-07-23 | 1983-02-09 | Hoesch Aktiengesellschaft | Verfahren und Vorrichtung zur zerstörungsfreien Bestimmung der Dicke der Eisen-Zinn-Zwischenschicht an elektrolytisch verzinntem Blech |
| DE3826917A1 (de) * | 1987-11-20 | 1989-06-01 | Mikroelektronik Friedrich Enge | Verfahren zur phosphorgehaltsbestimmung in stromlos abgeschiedenen metallueberzuegen |
Also Published As
| Publication number | Publication date |
|---|---|
| FR2393266A1 (fr) | 1978-12-29 |
| FR2393266B1 (enExample) | 1982-03-19 |
| NL185306B (nl) | 1989-10-02 |
| GB1561313A (en) | 1980-02-20 |
| JPS52140355A (en) | 1977-11-22 |
| CA1086870A (en) | 1980-09-30 |
| JPS5735768B2 (enExample) | 1982-07-30 |
| NL185306C (nl) | 1990-03-01 |
| NL7705443A (nl) | 1977-11-22 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| DE19739321C2 (de) | Verfahren und Einrichtung zum Bestimmen der Meßunsicherheit bei Röntgenfluoreszenz-Schichtdickenmessungen | |
| DE112015003094B4 (de) | Röntgenfluoreszenzspektrometer und Röntgenfluoreszenzanalyseverfahren | |
| DE3137186C2 (enExample) | ||
| DE19710420C2 (de) | Verfahren und Vorrichtung zum Messen der Dicken dünner Schichten mittels Röntgenfluoreszenz | |
| DE112021004828T5 (de) | System und verfahren unter verwendung von röntgenstrahlen für tiefenauflösende messtechnik und analyse | |
| DE69026748T2 (de) | Verfahren zur Messung der Plattierungsrate und der Zusammensetzung einer Plattierungsschicht eines plattierten Stahlbleches und Vorrichtung für diesen Zweck | |
| WO2001002842A2 (de) | Vorrichtung zur röntgenfluoreszenzanalyse | |
| DE2054084A1 (de) | Verfahren und Gerat zur Unter druckung von Interferenzfehlern bei Zweistrahl Infrarotmessungen | |
| DE3134552A1 (de) | Roentgendiffraktometer | |
| DE68928315T2 (de) | Methode zur messung der dicke eines überzugs auf einem substrat | |
| DE2721589A1 (de) | Verfahren zum gleichzeitigen messen der dicke zweier metall-duennschichten | |
| DE2832151C2 (de) | Verfahren zum Prüfen eines Musters aus einem elektrisch leitfähigen Film | |
| DE3050497C2 (enExample) | ||
| EP0372278A2 (de) | Verfahren und Anordung zur Untersuchung von Proben nach der Methode der Röntgenfluoreszenzanalyse | |
| DE3628015A1 (de) | Verfahren und vorrichtung zum entwickeln eines musters | |
| DE3887880T2 (de) | Verfahren und Vorrichtung zur gleichzeitigen Messung der Dicke und Zusammensetzung einer dünnen Schicht. | |
| DE69325140T2 (de) | Elektronenspektroskopie-Analysator und Verfahren zum Korrigieren der Verschiebung einer Spektrallinie in der Elektronenspektroskopie | |
| DE4200493A1 (de) | Vorrichtung zur duennschichtbildung | |
| EP1183526B1 (de) | Einrichtung und verfahren zur analyse atomarer und/oder molekularer elemente mittels wellenlängendispersiver, röntgenspektrometrischer einrichtungen | |
| DE69431148T2 (de) | Methode zur Analyse von Oberflächen verunreinigungen auf Halbleitersubstraten | |
| DE69608949T2 (de) | Verfahren und vorrichtung zur bestimmung wenigstens eines charakteristischen parameters eines körpers | |
| DE10125454A1 (de) | Gerät zur Röntgenanalyse mit einem Mehrschichtspiegel und einem Ausgangskollimator | |
| DE102004010363A1 (de) | Verfahren und Meßgerät zur Bestimmung einer örtlichen Variation des Reflektions- oder Transmissionsverhaltens über die Oberfläche einer Maske | |
| DE102009019166B3 (de) | Verfahren zur Herstellung eines Referenzkörpers für Röntgenfluoreszenzuntersuchungen an Substraten und mit dem Verfahren hergestellter Referenzkörper | |
| DE102014108130B4 (de) | Verfahren und Vorrichtung zum Messen des Biegens eines Einkristallsubstrats |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| OD | Request for examination | ||
| 8131 | Rejection |