DE2627987A1 - Ionenimplantationsvorrichtung - Google Patents
IonenimplantationsvorrichtungInfo
- Publication number
- DE2627987A1 DE2627987A1 DE19762627987 DE2627987A DE2627987A1 DE 2627987 A1 DE2627987 A1 DE 2627987A1 DE 19762627987 DE19762627987 DE 19762627987 DE 2627987 A DE2627987 A DE 2627987A DE 2627987 A1 DE2627987 A1 DE 2627987A1
- Authority
- DE
- Germany
- Prior art keywords
- ion
- source electrode
- source
- openings
- beams
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Withdrawn
Links
- 238000005468 ion implantation Methods 0.000 title description 15
- 150000002500 ions Chemical class 0.000 claims description 43
- 238000010884 ion-beam technique Methods 0.000 claims description 28
- 230000005284 excitation Effects 0.000 claims description 2
- 238000010894 electron beam technology Methods 0.000 description 11
- 239000000758 substrate Substances 0.000 description 11
- 238000004377 microelectronic Methods 0.000 description 5
- 230000001133 acceleration Effects 0.000 description 4
- 238000002513 implantation Methods 0.000 description 4
- 238000004519 manufacturing process Methods 0.000 description 4
- 239000011159 matrix material Substances 0.000 description 4
- 230000000694 effects Effects 0.000 description 3
- 238000010438 heat treatment Methods 0.000 description 3
- 239000007943 implant Substances 0.000 description 3
- 230000003287 optical effect Effects 0.000 description 3
- 230000002349 favourable effect Effects 0.000 description 2
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 1
- 238000003491 array Methods 0.000 description 1
- 230000000712 assembly Effects 0.000 description 1
- 238000000429 assembly Methods 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 239000004020 conductor Substances 0.000 description 1
- 229910002804 graphite Inorganic materials 0.000 description 1
- 239000010439 graphite Substances 0.000 description 1
- 230000003760 hair shine Effects 0.000 description 1
- 238000003754 machining Methods 0.000 description 1
- 238000012423 maintenance Methods 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 238000000034 method Methods 0.000 description 1
- 238000006386 neutralization reaction Methods 0.000 description 1
- 239000002245 particle Substances 0.000 description 1
- 238000002360 preparation method Methods 0.000 description 1
- 230000028327 secretion Effects 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 230000032258 transport Effects 0.000 description 1
Classifications
-
- G—PHYSICS
- G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
- G21K—TECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
- G21K1/00—Arrangements for handling particles or ionising radiation, e.g. focusing or moderating
- G21K1/02—Arrangements for handling particles or ionising radiation, e.g. focusing or moderating using diaphragms, collimators
- G21K1/025—Arrangements for handling particles or ionising radiation, e.g. focusing or moderating using diaphragms, collimators using multiple collimators, e.g. Bucky screens; other devices for eliminating undesired or dispersed radiation
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
- H01J37/317—Electron-beam or ion-beam tubes for localised treatment of objects for changing properties of the objects or for applying thin layers thereon, e.g. for ion implantation
- H01J37/3171—Electron-beam or ion-beam tubes for localised treatment of objects for changing properties of the objects or for applying thin layers thereon, e.g. for ion implantation for ion implantation
Landscapes
- Physics & Mathematics (AREA)
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Engineering & Computer Science (AREA)
- General Engineering & Computer Science (AREA)
- High Energy & Nuclear Physics (AREA)
- Physical Vapour Deposition (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US05/592,149 US3999097A (en) | 1975-06-30 | 1975-06-30 | Ion implantation apparatus utilizing multiple aperture source plate and single aperture accel-decel system |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| DE2627987A1 true DE2627987A1 (de) | 1977-01-20 |
Family
ID=24369503
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| DE19762627987 Withdrawn DE2627987A1 (de) | 1975-06-30 | 1976-06-23 | Ionenimplantationsvorrichtung |
Country Status (6)
| Country | Link |
|---|---|
| US (1) | US3999097A (enExample) |
| JP (1) | JPS525263A (enExample) |
| DE (1) | DE2627987A1 (enExample) |
| FR (1) | FR2316724A1 (enExample) |
| GB (1) | GB1492016A (enExample) |
| IT (1) | IT1064307B (enExample) |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP0002472A3 (en) * | 1977-12-08 | 1979-09-05 | International Business Machines Corporation | Device and method for making doped semiconductor layers |
| DE3018623A1 (de) * | 1980-05-16 | 1982-01-28 | Kernforschungsanlage Jülich GmbH, 5170 Jülich | Beschleunigungsgitter |
| EP0135366A1 (en) * | 1983-08-15 | 1985-03-27 | Applied Materials, Inc. | System and method for ion implantation |
Families Citing this family (16)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4371774A (en) * | 1980-11-26 | 1983-02-01 | The United States Of America As Represented By The United States Department Of Energy | High power linear pulsed beam annealer |
| US4465934A (en) * | 1981-01-23 | 1984-08-14 | Veeco Instruments Inc. | Parallel charged particle beam exposure system |
| US4447773A (en) * | 1981-06-22 | 1984-05-08 | California Institute Of Technology | Ion beam accelerator system |
| US4578589A (en) * | 1983-08-15 | 1986-03-25 | Applied Materials, Inc. | Apparatus and methods for ion implantation |
| JPH0744027B2 (ja) * | 1986-04-28 | 1995-05-15 | 日新電機株式会社 | イオン処理装置 |
| JPS63146337A (ja) * | 1986-12-08 | 1988-06-18 | Fuji Electric Co Ltd | イオンビ−ム装置 |
| JP2569613B2 (ja) * | 1987-10-27 | 1997-01-08 | 日新電機株式会社 | イオン注入装置 |
| DE3838947A1 (de) * | 1987-11-20 | 1989-06-01 | Osaka Prefecture | Ionenquelle |
| GB2224752B (en) * | 1988-11-10 | 1992-08-05 | Stc Plc | Film deposition |
| US5023458A (en) * | 1989-01-04 | 1991-06-11 | Eaton Corporation | Ion beam control system |
| US7528391B2 (en) * | 2006-12-22 | 2009-05-05 | Varian Semiconductor Equipment Associates, Inc. | Techniques for reducing contamination during ion implantation |
| US9587292B2 (en) * | 2009-10-01 | 2017-03-07 | Advanced Applied Physics Solutions, Inc. | Method and apparatus for isolating the radioisotope molybdenum-99 |
| CN104091746A (zh) * | 2014-06-30 | 2014-10-08 | 京东方科技集团股份有限公司 | 一种离子注入设备用电极和离子注入设备 |
| CN111033689B (zh) * | 2017-06-27 | 2023-07-28 | 彼得·F·范德莫伊伦 | 用于等离子体沉积和处理的方法及系统 |
| CN111199858B (zh) * | 2018-11-20 | 2023-09-05 | 中国电子科技集团公司第四十八研究所 | 一种成形宽带离子束注入机 |
| WO2021183373A1 (en) | 2020-03-13 | 2021-09-16 | Vandermeulen Peter F | Methods and systems for medical plasma treatment and generation of plasma activated media |
Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3394217A (en) * | 1965-06-11 | 1968-07-23 | Air Reduction | Method and apparatus for controlling plural electron beams |
| US3491236A (en) * | 1967-09-28 | 1970-01-20 | Gen Electric | Electron beam fabrication of microelectronic circuit patterns |
| US3756862A (en) * | 1971-12-21 | 1973-09-04 | Ibm | Proton enhanced diffusion methods |
| US3770934A (en) * | 1971-10-29 | 1973-11-06 | Machlett Lab Inc | Electron beam heating apparatus |
Family Cites Families (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3117022A (en) * | 1960-09-06 | 1964-01-07 | Space Technhology Lab Inc | Deposition arrangement |
| US3406305A (en) * | 1965-07-05 | 1968-10-15 | Lokomotivbau Elektrotechnisch | High power electron gun with electron bombarded apertured cathode having a concave emission surface |
| US3434894A (en) * | 1965-10-06 | 1969-03-25 | Ion Physics Corp | Fabricating solid state devices by ion implantation |
| US3585397A (en) * | 1968-10-04 | 1971-06-15 | Hughes Aircraft Co | Programmed fine ion implantation beam system |
| US3558967A (en) * | 1969-06-16 | 1971-01-26 | Varian Associates | Linear beam tube with plural cathode beamlets providing a convergent electron stream |
| US3748514A (en) * | 1971-08-18 | 1973-07-24 | A Standaart | Multi-beam cathode ray tube character display |
| AT344287B (de) * | 1972-03-30 | 1978-07-10 | Kyoto Electronics Mfg | Verfahren zur bestimmung der dichte einer flüssigkeit in einer schwingröhre |
-
1975
- 1975-06-30 US US05/592,149 patent/US3999097A/en not_active Expired - Lifetime
-
1976
- 1976-05-17 FR FR7615570A patent/FR2316724A1/fr active Granted
- 1976-05-25 JP JP51059726A patent/JPS525263A/ja active Granted
- 1976-06-04 GB GB23290/76A patent/GB1492016A/en not_active Expired
- 1976-06-04 IT IT23938/76A patent/IT1064307B/it active
- 1976-06-23 DE DE19762627987 patent/DE2627987A1/de not_active Withdrawn
Patent Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3394217A (en) * | 1965-06-11 | 1968-07-23 | Air Reduction | Method and apparatus for controlling plural electron beams |
| US3491236A (en) * | 1967-09-28 | 1970-01-20 | Gen Electric | Electron beam fabrication of microelectronic circuit patterns |
| US3770934A (en) * | 1971-10-29 | 1973-11-06 | Machlett Lab Inc | Electron beam heating apparatus |
| US3756862A (en) * | 1971-12-21 | 1973-09-04 | Ibm | Proton enhanced diffusion methods |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP0002472A3 (en) * | 1977-12-08 | 1979-09-05 | International Business Machines Corporation | Device and method for making doped semiconductor layers |
| DE3018623A1 (de) * | 1980-05-16 | 1982-01-28 | Kernforschungsanlage Jülich GmbH, 5170 Jülich | Beschleunigungsgitter |
| EP0135366A1 (en) * | 1983-08-15 | 1985-03-27 | Applied Materials, Inc. | System and method for ion implantation |
Also Published As
| Publication number | Publication date |
|---|---|
| US3999097A (en) | 1976-12-21 |
| JPS541627B2 (enExample) | 1979-01-26 |
| FR2316724A1 (fr) | 1977-01-28 |
| FR2316724B1 (enExample) | 1978-11-17 |
| JPS525263A (en) | 1977-01-14 |
| GB1492016A (en) | 1977-11-16 |
| IT1064307B (it) | 1985-02-18 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| 8110 | Request for examination paragraph 44 | ||
| 8139 | Disposal/non-payment of the annual fee |