GB2224752B - Film deposition - Google Patents
Film depositionInfo
- Publication number
- GB2224752B GB2224752B GB8826312A GB8826312A GB2224752B GB 2224752 B GB2224752 B GB 2224752B GB 8826312 A GB8826312 A GB 8826312A GB 8826312 A GB8826312 A GB 8826312A GB 2224752 B GB2224752 B GB 2224752B
- Authority
- GB
- United Kingdom
- Prior art keywords
- film deposition
- deposition
- film
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
- C23C14/3407—Cathode assembly for sputtering apparatus, e.g. Target
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/04—Coating on selected surface areas, e.g. using masks
- C23C14/048—Coating on selected surface areas, e.g. using masks using irradiation by energy or particles
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
- C23C14/46—Sputtering by ion beam produced by an external ion source
Landscapes
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Health & Medical Sciences (AREA)
- Toxicology (AREA)
- Physical Vapour Deposition (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
GB8826312A GB2224752B (en) | 1988-11-10 | 1988-11-10 | Film deposition |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
GB8826312A GB2224752B (en) | 1988-11-10 | 1988-11-10 | Film deposition |
Publications (3)
Publication Number | Publication Date |
---|---|
GB8826312D0 GB8826312D0 (en) | 1988-12-14 |
GB2224752A GB2224752A (en) | 1990-05-16 |
GB2224752B true GB2224752B (en) | 1992-08-05 |
Family
ID=10646641
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
GB8826312A Expired - Lifetime GB2224752B (en) | 1988-11-10 | 1988-11-10 | Film deposition |
Country Status (1)
Country | Link |
---|---|
GB (1) | GB2224752B (en) |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
ITPD20130328A1 (en) * | 2013-11-28 | 2015-05-29 | Spazzolificio Piave Spa | PROCEDURE FOR THE BRUSH CUTTING HEADS |
Citations (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
GB1201743A (en) * | 1968-02-12 | 1970-08-12 | Siemens Ag | Improvements in or relating to the deposition of a layer of solid material on a substrate by cathode sputtering |
GB1265834A (en) * | 1969-10-13 | 1972-03-08 | ||
GB1402998A (en) * | 1972-06-30 | 1975-08-13 | Atomic Energy Research Inst | Apparatus and process for forming p-n junction semiconductor units |
GB1492016A (en) * | 1975-06-30 | 1977-11-16 | Ibm | Ion implantation apparatus |
GB1600218A (en) * | 1977-06-06 | 1981-10-14 | King W J | Ion beam intplantation |
US4523971A (en) * | 1984-06-28 | 1985-06-18 | International Business Machines Corporation | Programmable ion beam patterning system |
-
1988
- 1988-11-10 GB GB8826312A patent/GB2224752B/en not_active Expired - Lifetime
Patent Citations (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
GB1201743A (en) * | 1968-02-12 | 1970-08-12 | Siemens Ag | Improvements in or relating to the deposition of a layer of solid material on a substrate by cathode sputtering |
GB1265834A (en) * | 1969-10-13 | 1972-03-08 | ||
GB1402998A (en) * | 1972-06-30 | 1975-08-13 | Atomic Energy Research Inst | Apparatus and process for forming p-n junction semiconductor units |
GB1492016A (en) * | 1975-06-30 | 1977-11-16 | Ibm | Ion implantation apparatus |
GB1600218A (en) * | 1977-06-06 | 1981-10-14 | King W J | Ion beam intplantation |
US4523971A (en) * | 1984-06-28 | 1985-06-18 | International Business Machines Corporation | Programmable ion beam patterning system |
Also Published As
Publication number | Publication date |
---|---|
GB2224752A (en) | 1990-05-16 |
GB8826312D0 (en) | 1988-12-14 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
732E | Amendments to the register in respect of changes of name or changes affecting rights (sect. 32/1977) | ||
732E | Amendments to the register in respect of changes of name or changes affecting rights (sect. 32/1977) | ||
732E | Amendments to the register in respect of changes of name or changes affecting rights (sect. 32/1977) | ||
PCNP | Patent ceased through non-payment of renewal fee |
Effective date: 20031110 |