DE2609218A1 - Kathodenstrahlenempfindliche materialien - Google Patents

Kathodenstrahlenempfindliche materialien

Info

Publication number
DE2609218A1
DE2609218A1 DE19762609218 DE2609218A DE2609218A1 DE 2609218 A1 DE2609218 A1 DE 2609218A1 DE 19762609218 DE19762609218 DE 19762609218 DE 2609218 A DE2609218 A DE 2609218A DE 2609218 A1 DE2609218 A1 DE 2609218A1
Authority
DE
Germany
Prior art keywords
methacrylate
copolymer
cathode ray
polymer
vinyl monomer
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
DE19762609218
Other languages
German (de)
English (en)
Inventor
Yoshio Hatano
Saburo Nonogaki
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Publication of DE2609218A1 publication Critical patent/DE2609218A1/de
Pending legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/039—Macromolecular compounds which are photodegradable, e.g. positive electron resists

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
DE19762609218 1975-03-07 1976-03-05 Kathodenstrahlenempfindliche materialien Pending DE2609218A1 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2711875A JPS51105353A (ja) 1975-03-07 1975-03-07 Denshisenkannoseikobunshisoseibutsu

Publications (1)

Publication Number Publication Date
DE2609218A1 true DE2609218A1 (de) 1976-09-09

Family

ID=12212138

Family Applications (1)

Application Number Title Priority Date Filing Date
DE19762609218 Pending DE2609218A1 (de) 1975-03-07 1976-03-05 Kathodenstrahlenempfindliche materialien

Country Status (3)

Country Link
JP (1) JPS51105353A (ja)
DE (1) DE2609218A1 (ja)
NL (1) NL7602429A (ja)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0090089A2 (en) * 1981-12-19 1983-10-05 Daikin Kogyo Co., Ltd. Resist material and process for forming fine resist pattern
DE3524633A1 (de) * 1984-07-11 1986-01-16 Asahi Kasei Kogyo K.K., Osaka Gegen energiereiche strahlung empfindliches bilderzeugendes material
EP0574939A1 (en) * 1992-06-19 1993-12-22 Nippon Paint Co., Ltd. Resist composition
US5587274A (en) * 1992-06-19 1996-12-24 Nippon Paint Co., Ltd. Resist composition

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5359367A (en) * 1976-11-10 1978-05-29 Hitachi Ltd Formation of electron beam resist image
JPS5466776A (en) * 1977-11-07 1979-05-29 Fujitsu Ltd Fine pattern forming method
JPS54118776A (en) * 1978-03-08 1979-09-14 Fujitsu Ltd Pattern forming method
JPS55117239A (en) * 1979-03-02 1980-09-09 Fujitsu Ltd Making method of microminiature pattern
JPS55133042A (en) * 1979-04-04 1980-10-16 Fujitsu Ltd Pattern forming method
WO1990003987A1 (en) * 1988-10-12 1990-04-19 Tosoh Corporation Polyalicyclic polyacrylic ester derivatives

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0090089A2 (en) * 1981-12-19 1983-10-05 Daikin Kogyo Co., Ltd. Resist material and process for forming fine resist pattern
EP0090089A3 (en) * 1981-12-19 1984-05-23 Daikin Kogyo Co., Ltd. Resist material and process for forming fine resist pattern
DE3524633A1 (de) * 1984-07-11 1986-01-16 Asahi Kasei Kogyo K.K., Osaka Gegen energiereiche strahlung empfindliches bilderzeugendes material
EP0574939A1 (en) * 1992-06-19 1993-12-22 Nippon Paint Co., Ltd. Resist composition
US5587274A (en) * 1992-06-19 1996-12-24 Nippon Paint Co., Ltd. Resist composition

Also Published As

Publication number Publication date
JPS5513340B2 (ja) 1980-04-08
JPS51105353A (ja) 1976-09-17
NL7602429A (nl) 1976-09-09

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