NL7602429A - Werkwijze ter bereiding van kathodestraalgevoe- lige polymeren. - Google Patents

Werkwijze ter bereiding van kathodestraalgevoe- lige polymeren.

Info

Publication number
NL7602429A
NL7602429A NL7602429A NL7602429A NL7602429A NL 7602429 A NL7602429 A NL 7602429A NL 7602429 A NL7602429 A NL 7602429A NL 7602429 A NL7602429 A NL 7602429A NL 7602429 A NL7602429 A NL 7602429A
Authority
NL
Netherlands
Prior art keywords
cathode ray
ray sensitive
sensitive polymers
preparing cathode
preparing
Prior art date
Application number
NL7602429A
Other languages
English (en)
Dutch (nl)
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Publication of NL7602429A publication Critical patent/NL7602429A/xx

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/039—Macromolecular compounds which are photodegradable, e.g. positive electron resists

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
NL7602429A 1975-03-07 1976-03-08 Werkwijze ter bereiding van kathodestraalgevoe- lige polymeren. NL7602429A (nl)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2711875A JPS51105353A (ja) 1975-03-07 1975-03-07 Denshisenkannoseikobunshisoseibutsu

Publications (1)

Publication Number Publication Date
NL7602429A true NL7602429A (nl) 1976-09-09

Family

ID=12212138

Family Applications (1)

Application Number Title Priority Date Filing Date
NL7602429A NL7602429A (nl) 1975-03-07 1976-03-08 Werkwijze ter bereiding van kathodestraalgevoe- lige polymeren.

Country Status (3)

Country Link
JP (1) JPS51105353A (xx)
DE (1) DE2609218A1 (xx)
NL (1) NL7602429A (xx)

Families Citing this family (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5359367A (en) * 1976-11-10 1978-05-29 Hitachi Ltd Formation of electron beam resist image
JPS5466776A (en) * 1977-11-07 1979-05-29 Fujitsu Ltd Fine pattern forming method
JPS54118776A (en) * 1978-03-08 1979-09-14 Fujitsu Ltd Pattern forming method
JPS55117239A (en) * 1979-03-02 1980-09-09 Fujitsu Ltd Making method of microminiature pattern
JPS55133042A (en) * 1979-04-04 1980-10-16 Fujitsu Ltd Pattern forming method
DE3279090D1 (en) * 1981-12-19 1988-11-10 Daikin Ind Ltd Resist material and process for forming fine resist pattern
GB2163435B (en) * 1984-07-11 1987-07-22 Asahi Chemical Ind Image-forming materials sensitive to high-energy beam
DE68914140T2 (de) * 1988-10-12 1995-01-12 Tosoh Corp Polyalicyclische polyacryl ester-derivate.
US5587274A (en) * 1992-06-19 1996-12-24 Nippon Paint Co., Ltd. Resist composition
JP3202792B2 (ja) * 1992-06-19 2001-08-27 日本ペイント株式会社 レジスト組成物

Also Published As

Publication number Publication date
JPS51105353A (ja) 1976-09-17
JPS5513340B2 (xx) 1980-04-08
DE2609218A1 (de) 1976-09-09

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