DE2547303A1 - Halbleiterbauelement - Google Patents

Halbleiterbauelement

Info

Publication number
DE2547303A1
DE2547303A1 DE19752547303 DE2547303A DE2547303A1 DE 2547303 A1 DE2547303 A1 DE 2547303A1 DE 19752547303 DE19752547303 DE 19752547303 DE 2547303 A DE2547303 A DE 2547303A DE 2547303 A1 DE2547303 A1 DE 2547303A1
Authority
DE
Germany
Prior art keywords
region
area
junction
semiconductor
conductivity type
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
DE19752547303
Other languages
German (de)
English (en)
Inventor
Tadaharu Tsuyuki
Hajime Yagi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Sony Corp
Original Assignee
Sony Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sony Corp filed Critical Sony Corp
Publication of DE2547303A1 publication Critical patent/DE2547303A1/de
Withdrawn legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10DINORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D18/00Thyristors
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/70Manufacture or treatment of devices consisting of a plurality of solid state components formed in or on a common substrate or of parts thereof; Manufacture of integrated circuit devices or of parts thereof
    • H01L21/71Manufacture of specific parts of devices defined in group H01L21/70
    • H01L21/76Making of isolation regions between components
    • H01L21/761PN junctions
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10DINORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D62/00Semiconductor bodies, or regions thereof, of devices having potential barriers
    • H10D62/10Shapes, relative sizes or dispositions of the regions of the semiconductor bodies; Shapes of the semiconductor bodies
    • H10D62/13Semiconductor regions connected to electrodes carrying current to be rectified, amplified or switched, e.g. source or drain regions
    • H10D62/141Anode or cathode regions of thyristors; Collector or emitter regions of gated bipolar-mode devices, e.g. of IGBTs
    • H10D62/148Cathode regions of thyristors
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10DINORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D84/00Integrated devices formed in or on semiconductor substrates that comprise only semiconducting layers, e.g. on Si wafers or on GaAs-on-Si wafers
    • H10D84/60Integrated devices formed in or on semiconductor substrates that comprise only semiconducting layers, e.g. on Si wafers or on GaAs-on-Si wafers characterised by the integration of at least one component covered by groups H10D10/00 or H10D18/00, e.g. integration of BJTs
    • H10D84/611Combinations of BJTs and one or more of diodes, resistors or capacitors
    • H10D84/613Combinations of vertical BJTs and one or more of diodes, resistors or capacitors
    • H10D84/617Combinations of vertical BJTs and only diodes
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10DINORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D84/00Integrated devices formed in or on semiconductor substrates that comprise only semiconducting layers, e.g. on Si wafers or on GaAs-on-Si wafers
    • H10D84/60Integrated devices formed in or on semiconductor substrates that comprise only semiconducting layers, e.g. on Si wafers or on GaAs-on-Si wafers characterised by the integration of at least one component covered by groups H10D10/00 or H10D18/00, e.g. integration of BJTs
    • H10D84/67Complementary BJTs
    • H10D84/673Vertical complementary BJTs
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10DINORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D99/00Subject matter not provided for in other groups of this subclass

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Bipolar Transistors (AREA)
DE19752547303 1974-10-31 1975-10-22 Halbleiterbauelement Withdrawn DE2547303A1 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP12586874A JPS5724659B2 (enrdf_load_stackoverflow) 1974-10-31 1974-10-31

Publications (1)

Publication Number Publication Date
DE2547303A1 true DE2547303A1 (de) 1976-05-06

Family

ID=14920910

Family Applications (1)

Application Number Title Priority Date Filing Date
DE19752547303 Withdrawn DE2547303A1 (de) 1974-10-31 1975-10-22 Halbleiterbauelement

Country Status (7)

Country Link
JP (1) JPS5724659B2 (enrdf_load_stackoverflow)
CA (1) CA1056068A (enrdf_load_stackoverflow)
DE (1) DE2547303A1 (enrdf_load_stackoverflow)
FR (1) FR2290039A1 (enrdf_load_stackoverflow)
GB (1) GB1514578A (enrdf_load_stackoverflow)
IT (1) IT1044307B (enrdf_load_stackoverflow)
NL (1) NL7512681A (enrdf_load_stackoverflow)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
AT374053B (de) * 1974-04-10 1984-03-12 Sony Corp Differenzverstaerker mit steuerbarer verstaerkung
AT374052B (de) * 1974-04-04 1984-03-12 Sony Corp Differenzverstaerker mit steuerbarer verstaerkung

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2413785A1 (fr) * 1977-12-30 1979-07-27 Radiotechnique Compelec Dispositif semi-conducteur monolithique a structure plane multicouche, de type mesa, comprenant au moins un transistor associe a une diode schottky
FR2462028A1 (fr) * 1979-07-17 1981-02-06 Thomson Csf Structure de thyristor pour circuit integre et son procede de fabrication
FR2543739B1 (fr) * 1983-03-30 1986-04-18 Radiotechnique Compelec Procede de realisation d'un transistor bipolaire haute tension
CN116047256B (zh) * 2023-03-24 2023-08-29 长鑫存储技术有限公司 测试方法、测试装置及电子设备

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
AT374052B (de) * 1974-04-04 1984-03-12 Sony Corp Differenzverstaerker mit steuerbarer verstaerkung
AT374053B (de) * 1974-04-10 1984-03-12 Sony Corp Differenzverstaerker mit steuerbarer verstaerkung

Also Published As

Publication number Publication date
FR2290039B3 (enrdf_load_stackoverflow) 1979-09-14
CA1056068A (en) 1979-06-05
GB1514578A (en) 1978-06-14
JPS5151286A (enrdf_load_stackoverflow) 1976-05-06
JPS5724659B2 (enrdf_load_stackoverflow) 1982-05-25
IT1044307B (it) 1980-03-20
NL7512681A (nl) 1976-05-04
FR2290039A1 (fr) 1976-05-28

Similar Documents

Publication Publication Date Title
DE1944793C3 (de) Verfahren zur Herstellung einer integrierten Halbleiteranordnung
DE1295093B (de) Halbleiterbauelement mit mindestens zwei Zonen entgegengesetzten Leitungstyps
DE69125390T2 (de) Laterale Bipolartransistorstruktur mit integriertem Kontrollschaltkreis und integriertem Leistungstransistor und deren Herstellungsprozess
DE2823967C2 (enrdf_load_stackoverflow)
DE2711562A1 (de) Halbleiteranordnung und deren herstellung
DE1539079A1 (de) Planartransistor
DE3545040A1 (de) Verfahren zur herstellung einer vergrabenen schicht und einer kollektorzone in einer monolithischen halbleitervorrichtung
DE1489031B1 (de) Transistor mit einem scheibenfoermigen Halbleiterkoerper und Verfahren zu seiner Herstellung
DE3027599C2 (enrdf_load_stackoverflow)
DE2364752A1 (de) Halbleitervorrichtung
DE2621791A1 (de) Integrierter transistor mit saettigungsverhindernder schottky- diode
DE2109352C2 (de) Verfahren zum Herstellen eines lateralen bipolaren Halbleiter-Bauelements
DE2515577C2 (de) Transistor
DE2063952A1 (de) Bipolartransistor
DE2547303A1 (de) Halbleiterbauelement
DE2364753A1 (de) Halbleitervorrichtung
DE19960234A1 (de) Halbleitervorrichtung und zugehöriges Herstellungsverfahren
DE2418560A1 (de) Halbleitervorrichtung
DE1764829B1 (de) Planartransistor mit einem scheibenfoermigen halbleiter koerper
DE2454561A1 (de) Halbleitervorrichtung
DE2513458A1 (de) Halbleiterbauelement
EP0017021B1 (de) Verfahren zur Herstellung einer Halbleiteranordnung mit komplementären Transistoren
DE1090330B (de) Halbleiteranordnung mit einem Halbleiterkoerper mit zwei Zonen entgegengesetzten Leitfaehigkeitstyps und je einer Elektrode an den beiden Zonen
DE2616925C2 (de) Halbleiterbauelement und Verfahren zu seiner Herstellung
AT395272B (de) Halbleitereinrichtung mit vertikalen und lateralen npn- und pnp-transistoren auf einem gemeinsamen substrat

Legal Events

Date Code Title Description
8110 Request for examination paragraph 44
8125 Change of the main classification

Ipc: H01L 29/72

AF Is addition to no.

Ref country code: DE

Ref document number: 2364753

Format of ref document f/p: P

8130 Withdrawal