DE2537593C3 - Verfahren zur Herstellung einer homogenen magnetischen Oxidschicht hoher Koerzitivfeldstärke - Google Patents

Verfahren zur Herstellung einer homogenen magnetischen Oxidschicht hoher Koerzitivfeldstärke

Info

Publication number
DE2537593C3
DE2537593C3 DE2537593A DE2537593A DE2537593C3 DE 2537593 C3 DE2537593 C3 DE 2537593C3 DE 2537593 A DE2537593 A DE 2537593A DE 2537593 A DE2537593 A DE 2537593A DE 2537593 C3 DE2537593 C3 DE 2537593C3
Authority
DE
Germany
Prior art keywords
magnetic
aluminum
layer
iron
oxide layer
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
DE2537593A
Other languages
German (de)
English (en)
Other versions
DE2537593A1 (de
DE2537593B2 (de
Inventor
Seizi Dipl.-Ing. Ibaraki Hattori
Nobuo Dipl.-Ing. Katsuta Inagaki
Yoshikazu Mito Ishii
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NTT Inc
Original Assignee
Nippon Telegraph and Telephone Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nippon Telegraph and Telephone Corp filed Critical Nippon Telegraph and Telephone Corp
Publication of DE2537593A1 publication Critical patent/DE2537593A1/de
Publication of DE2537593B2 publication Critical patent/DE2537593B2/de
Application granted granted Critical
Publication of DE2537593C3 publication Critical patent/DE2537593C3/de
Expired legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/58—After-treatment
    • C23C14/5806—Thermal treatment
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/08—Oxides
    • C23C14/085—Oxides of iron group metals
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/58—After-treatment
    • C23C14/5846—Reactive treatment
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01F—MAGNETS; INDUCTANCES; TRANSFORMERS; SELECTION OF MATERIALS FOR THEIR MAGNETIC PROPERTIES
    • H01F10/00—Thin magnetic films, e.g. of one-domain structure
    • H01F10/08—Thin magnetic films, e.g. of one-domain structure characterised by magnetic layers
    • H01F10/10—Thin magnetic films, e.g. of one-domain structure characterised by magnetic layers characterised by the composition
    • H01F10/18—Thin magnetic films, e.g. of one-domain structure characterised by magnetic layers characterised by the composition being compounds
    • H01F10/20—Ferrites
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01F—MAGNETS; INDUCTANCES; TRANSFORMERS; SELECTION OF MATERIALS FOR THEIR MAGNETIC PROPERTIES
    • H01F41/00—Apparatus or processes specially adapted for manufacturing or assembling magnets, inductances or transformers; Apparatus or processes specially adapted for manufacturing materials characterised by their magnetic properties
    • H01F41/14—Apparatus or processes specially adapted for manufacturing or assembling magnets, inductances or transformers; Apparatus or processes specially adapted for manufacturing materials characterised by their magnetic properties for applying magnetic films to substrates

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Organic Chemistry (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Power Engineering (AREA)
  • Physics & Mathematics (AREA)
  • Thermal Sciences (AREA)
  • Manufacturing & Machinery (AREA)
  • Manufacturing Of Magnetic Record Carriers (AREA)
  • Thin Magnetic Films (AREA)
  • Magnetic Record Carriers (AREA)
DE2537593A 1974-08-26 1975-08-23 Verfahren zur Herstellung einer homogenen magnetischen Oxidschicht hoher Koerzitivfeldstärke Expired DE2537593C3 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP9764774A JPS5311679B2 (OSRAM) 1974-08-26 1974-08-26

Publications (3)

Publication Number Publication Date
DE2537593A1 DE2537593A1 (de) 1976-03-11
DE2537593B2 DE2537593B2 (de) 1977-08-11
DE2537593C3 true DE2537593C3 (de) 1978-06-08

Family

ID=14197886

Family Applications (1)

Application Number Title Priority Date Filing Date
DE2537593A Expired DE2537593C3 (de) 1974-08-26 1975-08-23 Verfahren zur Herstellung einer homogenen magnetischen Oxidschicht hoher Koerzitivfeldstärke

Country Status (6)

Country Link
US (1) US4003813A (OSRAM)
JP (1) JPS5311679B2 (OSRAM)
DE (1) DE2537593C3 (OSRAM)
FR (1) FR2283533A1 (OSRAM)
GB (1) GB1464802A (OSRAM)
NL (1) NL170756B (OSRAM)

Families Citing this family (17)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS52106500A (en) * 1976-03-03 1977-09-07 Fujitsu Ltd Magnetic recording medium
JPS5329703A (en) * 1976-09-01 1978-03-20 Fujitsu Ltd Production of thin magnetic film
US4271232A (en) * 1978-08-28 1981-06-02 International Business Machines Corporation Amorphous magnetic film
JPS57200945A (en) * 1981-06-03 1982-12-09 Tdk Corp Magnetic recording medium
US4544612A (en) * 1982-09-22 1985-10-01 Nippon Telegraph & Telephone Public Corporation Iron oxide magnetic film and process for fabrication thereof
GB2217349B (en) * 1988-03-29 1992-06-24 Univ Hull Vapour deposited self-sealing ceramic coatings
US5119258A (en) * 1990-02-06 1992-06-02 Hmt Technology Corporation Magnetic disc with low-friction glass substrate
FR2714205A1 (fr) * 1993-12-17 1995-06-23 Atg Sa Matériau composite pour l'enregistrement magnéto-optique, sa préparation et son utilisation.
US5460704A (en) * 1994-09-28 1995-10-24 Motorola, Inc. Method of depositing ferrite film
US20050119725A1 (en) * 2003-04-08 2005-06-02 Xingwu Wang Energetically controlled delivery of biologically active material from an implanted medical device
US20060102871A1 (en) * 2003-04-08 2006-05-18 Xingwu Wang Novel composition
US20050149002A1 (en) * 2003-04-08 2005-07-07 Xingwu Wang Markers for visualizing interventional medical devices
US20050149169A1 (en) * 2003-04-08 2005-07-07 Xingwu Wang Implantable medical device
US20060118758A1 (en) * 2004-09-15 2006-06-08 Xingwu Wang Material to enable magnetic resonance imaging of implantable medical devices
WO2018080589A1 (en) * 2016-10-27 2018-05-03 The Board Of Trustees Of The University Of Alabama Iron-aluminum alloy magnetic thin film
WO2019084141A1 (en) 2017-10-25 2019-05-02 The Board Of Trustees Of The University Of Alabama MAGNETIC THIN FILM BASED ON FE-CO-AL ALLOY
FR3091524B1 (fr) 2019-01-09 2021-10-29 Haulotte Group Nacelle elevatrice a pupitre de commande amovible comprenant une protection anti-ecrasement de l’operateur

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3438885A (en) * 1967-08-02 1969-04-15 Northern Electric Co Method of making ferrimagnetic films by cathodic sputtering
CA927317A (en) * 1970-06-15 1973-05-29 G. Peters Frank Technique for the preparation of iron oxide films by cathodic sputtering
US3681227A (en) * 1970-06-29 1972-08-01 Corning Glass Works Microcircuit mask and method
US3795542A (en) * 1971-06-09 1974-03-05 Corning Glass Works Method of making a magnetic recording and storage device
US3829372A (en) * 1972-05-25 1974-08-13 Ibm Multilayer magnetic structure and methods of making same
JPS5650340B2 (OSRAM) * 1973-07-25 1981-11-28

Also Published As

Publication number Publication date
JPS5124800A (OSRAM) 1976-02-28
FR2283533A1 (fr) 1976-03-26
GB1464802A (en) 1977-02-16
US4003813A (en) 1977-01-18
FR2283533B1 (OSRAM) 1979-05-18
DE2537593A1 (de) 1976-03-11
JPS5311679B2 (OSRAM) 1978-04-24
DE2537593B2 (de) 1977-08-11
NL7510020A (nl) 1976-03-01
NL170756B (nl) 1982-07-16

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Legal Events

Date Code Title Description
C3 Grant after two publication steps (3rd publication)
8327 Change in the person/name/address of the patent owner

Owner name: NIPPON TELEGRAPH AND TELEPHONE CORP., TOKIO/TOKYO,

8328 Change in the person/name/address of the agent

Free format text: REICHEL, W., DIPL.-ING. LIPPERT, H., DIPL.-ING., PAT.-ANW., 6000 FRANKFURT

8339 Ceased/non-payment of the annual fee